公开(公告)号：US11158525B2

公开(公告)日：2021-10-26

申请号：US16074445

申请日：2017-01-20

Applicant: TOKYO ELECTRON LIMITED

Inventor： Yasuhiro Takaki ,  Shinichi Umeno ,  Takashi Nagai ,  Hisashi Morita ,  Nobuhiro Ogata ,  Yusuke Takamatsu ,  Jiro Higashijima

IPC: H01L21/67

Abstract: A recovery route returns, to a retaining tank, mixed solution supplied to a substrate processing unit. A discarding route discards the supplied mixed solution to a place other than the retaining tank. A switching controller causes the supplied mixed solution to flow into the discarding route during a time interval until a first time interval has elapsed from a time point when the substrate processing unit starts to supply the mixed solution; causes the supplied mixed solution to flow into the recovery route during a time interval until a second time interval, which is decided based on a predetermined recovery rate, has elapsed after the first time interval elapses; and causes the supplied mixed solution to flow into the discarding route during a time interval until supply of the mixed solution has been ended from a time point when the second time interval elapses.

公开(公告)号：US10573539B2

公开(公告)日：2020-02-25

申请号：US15535882

申请日：2015-12-15

Applicant: Tokyo Electron Limited

Inventor： Hiroshi Komiya ,  Yasuhiro Takaki ,  Shinichi Umeno ,  Koji Tanaka ,  Takami Satoh ,  Atsushi Anamoto

IPC: H01L21/67 ,  B08B3/04

Abstract: A substrate liquid processing apparatus includes a transfer section, a processing section, a reservoir and a liquid sending mechanism. The transfer section includes a transfer device configured to transfer a substrate. The processing section is provided adjacent to the transfer section in a horizontal direction, and includes a liquid processing unit configured to process the substrate by using a processing liquid. The reservoir is configured to store the processing liquid therein. The liquid sending mechanism is configured to send out the processing liquid stored in the reservoir into the liquid processing unit. The reservoir is disposed directly under the transfer section. Further, the liquid sending mechanism is disposed directly under the processing section. Space saving of the substrate liquid processing apparatus can be achieved.

公开(公告)号：US10162371B2

公开(公告)日：2018-12-25

申请号：US14536989

申请日：2014-11-10

Applicant: Tokyo Electron Limited

Inventor： Yasuhiro Takaki ,  Hiroshi Komiya ,  Chikara Nobukuni ,  Keigo Satake ,  Atsushi Anamoto

IPC: B01F15/00 ,  B01F3/08 ,  G05D11/13

Abstract: A substrate liquid processing apparatus includes a tank; a circulation line; a processing unit connected to the circulation line through a branch line and configured to perform a liquid processing on a substrate using a processing liquid flowing through the circulation line; a processing liquid producing mechanism configured to produce the processing liquid by mixing at least two kinds of raw material liquids supplied from respective raw material liquid sources at a controlled mixing ratio; a concentration measuring device configured to measure a concentration of the processing liquid flowing through the circulation line and a concentration of the processing liquid flowing through the processing liquid supply line; and a control device configured to control the processing liquid producing mechanism based on the measured concentrations of the processing liquid.

公开(公告)号：US20150131403A1

公开(公告)日：2015-05-14

申请号：US14536989

申请日：2014-11-10

Applicant: Tokyo Electron Limited

Inventor： Yasuhiro Takaki ,  Hiroshi Komiya ,  Chikara Nobukuni ,  Keigo Satake ,  Atsushi Anamoto

IPC: B01F15/00 ,  B01F3/08

CPC classification number: G05D11/138

Abstract: A substrate liquid processing apparatus includes a tank; a circulation line; a processing unit connected to the circulation line through a branch line and configured to perform a liquid processing on a substrate using a processing liquid flowing through the circulation line; a processing liquid producing mechanism configured to produce the processing liquid by mixing at least two kinds of raw material liquids supplied from respective raw material liquid sources at a controlled mixing ratio; a concentration measuring device configured to measure a concentration of the processing liquid flowing through the circulation line and a concentration of the processing liquid flowing through the processing liquid supply line; and a control device configured to control the processing liquid producing mechanism based on the measured concentrations of the processing liquid.

Abstract translation: 基板液体处理装置包括罐; 循环线 处理单元，其通过分支管线连接到循环管线，并且被配置为使用流过循环管线的处理液体在基板上进行液体处理; 处理液生成机构，其通过以受控混合比混合由各原料液源供给的至少两种原料液体来制造处理液; 浓度测量装置，被配置为测量流过所述循环管线的处理液体的浓度和流经所述处理液体供给管线的处理液体的浓度; 以及控制装置，其被配置为基于所测量的处理液体的浓度来控制处理液生成机构。