Developing system for alkaline-developable lithographic printing plates
    11.
    发明授权
    Developing system for alkaline-developable lithographic printing plates 有权
    碱性显影平版印刷版的开发系统

    公开(公告)号:US6143479A

    公开(公告)日:2000-11-07

    申请号:US449072

    申请日:1999-11-24

    IPC分类号: G03F7/32

    CPC分类号: G03F7/322

    摘要: An aqueous alkaline composition comprising at least one phosphonic acid, at least one polyglycol derivative and at least one glycol. The composition can be used as either a developer or a replenisher for either positive-working or negative-working alkaline developable lithographic printing plates, including thermal plates.

    摘要翻译: 一种包含至少一种膦酸,至少一种聚乙二醇衍生物和至少一种二醇的含水碱性组合物。 该组合物可用作用于正性或负性碱性可显影平版印刷版(包括热敏板)的显影剂或补充剂。

    Method for reuse of loaded developer
    12.
    发明授权
    Method for reuse of loaded developer 失效
    加载显影剂重用方法

    公开(公告)号:US06759185B2

    公开(公告)日:2004-07-06

    申请号:US09992688

    申请日:2001-11-14

    IPC分类号: G03C531

    CPC分类号: G03F7/3092

    摘要: A method for the refreshment and reuse of loaded developers used in lithographic printing is disclosed. A polyoxyalkylene derivative is added to a silicate-containing loaded developer. Insoluble material is separated and the alkalinity level of the resulting essentially colorless liquid adjusted to produce a refreshed developer. The refreshed developer may be used to develop additional exposed imageable elements.

    摘要翻译: 公开了一种用于平版印刷中使用的加载显影剂的刷新和再利用的方法。 将聚氧化烯衍生物加入到含硅酸盐的负载显影剂中。 分离不溶物,调节所得到的基本无色液体的碱度水平以产生刷新的显影剂。 刷新的显影剂可用于开发额外的可曝光可成像元件。

    Lithographic printing plate precursors with mercapto-functionlalized free-radical polymerizable monomers

    公开(公告)号:US20070148583A1

    公开(公告)日:2007-06-28

    申请号:US10586509

    申请日:2005-01-19

    IPC分类号: G03C1/00

    摘要: Lithographic printing plate precursor comprising: a) an untreated or pretreated substrate and b) a radiation-sensitive coating comprising: (i) at least one polymeric binder soluble or swellable in aqueous alkaline developers; (ii) at least one free-radical polymerizable monomer and/or oligomer comprising at least one non-aromatic C—C double bond and at least one SH group in the molecule; and (iii) a radiation-sensitive initiator or initiator system for free-radical polymerization, wherein component (ii) has the formula (I) wherein each R1a, R1b and R1c is independently selected from H, C1-C6 alkyl, C2-C8 alkenyl, aryl, halogen, CN and COOR1d, wherein R1d is H, C1-C18 alkyl, C2-C8 alkenyl, C2-C8 alkynyl or aryl; and Z is an aliphatic, heterocyclic or heteroaromatic spacer or a combination of two or more thereof, wherein Z can optionally comprise one or more additional SH groups and/or one or more additional non-aromatic C—C double bonds; and each Z1 is independently selected from a single bond, formulae (Ia), (Ib), (Ic), (Id), (Ie), (If), (Ig), (Ih), (Ij), (Ik), (Im), (In), (Io), (Ip), (Iq), (Ir), (Is), (It), (Iu), (Iv), wherein R2a, R2b and R2c are independently selected from H, C1-C6 alkyl and aryl, Z2 is selected from a single bond, O, S and NR2c, Z3 is a single bond which is connected to Z, b is an integer from 1 to 10 and c is an integer from 1 to 3.

    Lithographic printing plate precursors with mercapto-functionalized free-radical polymerizable monomers
    17.
    发明授权
    Lithographic printing plate precursors with mercapto-functionalized free-radical polymerizable monomers 有权
    具有巯基官能化自由基可聚合单体的平版印刷版前体

    公开(公告)号:US07560221B2

    公开(公告)日:2009-07-14

    申请号:US10586509

    申请日:2005-01-19

    摘要: Lithographic printing plate precursor comprising: a) an untreated or pretreated substrate and b) a radiation-sensitive coating comprising: (i) at least one polymeric binder soluble or swellable in aqueous alkaline developers; (ii) at least one free-radical polymerizable monomer and/or oligomer comprising at least one non-aromatic C—C double bond and at least one SH group in the molecule; and (iii) a radiation-sensitive initiator or initiator system for free-radical polymerization, wherein component (ii) has the formula (I) wherein each R1a, R1b and R1c is independently selected from H, C1-C6 alkyl, C2-C8 alkenyl, aryl, halogen, CN and COOR1d, wherein R1d is H, C1-C18 alkyl, C2-C8 alkenyl, C2-C8 alkynyl or aryl; and Z is an aliphatic, heterocyclic or heteroaromatic spacer or a combination of two or more thereof, wherein Z can optionally comprise one or more additional SH groups and/or one or more additional non-aromatic C—C double bonds; and each Z1 is independently selected from a single bond, formulae (Ia), (Ib), (Ic), (Id), (Ie), (If), (Ig), (Ih), (Ij), (Ik), (Im), (In), (Io), (Ip), (Iq), (Ir), (Is), (It), (Iu), (Iv), wherein R2a, R2b and R2c are independently selected from H, C1-C6 alkyl and aryl, Z2 is selected from a single bond, O, S and NR2c, Z3 is a single bond which is connected to Z, b is an integer from 1 to 10 and c is an integer from 1 to 3.

    摘要翻译: 包括:a)未处理或预处理的底物和b)辐射敏感性涂层,其包含:(i)至少一种可溶于或溶胀在含水碱性显影剂中的聚合物粘合剂; (ii)至少一种包含分子中至少一个非芳族C-C双键和至少一个SH基团的自由基可聚合单体和/或低聚物; 和(iii)用于自由基聚合的辐射敏感引发剂或引发剂体系,其中组分(ii)具有式(I),其中每个R 1a,R 1b和R 1c独立地选自H,C 1 -C 6烷基,C 2 -C 8 烯基,芳基,卤素,CN和COOR1d,其中R1d是H,C1-C18烷基,C2-C8链烯基,C2-C8炔基或芳基; 并且Z是脂族,杂环或杂芳族间隔基或其两个或多个的组合,其中Z可以任选地包含一个或多个另外的SH基团和/或一个或多个另外的非芳族C-C双键; 并且每个Z 1独立地选自单键,式(Ia),(Ib),(Ic),(Id),(Ie),(If),(Ig),(Ih),(Ij) ),(I 1),(I 1),(I 1),(I 1),(I q),(Ir),(Is),(It),(I u),(Iv) 选自H,C1-C6烷基和芳基,Z2选自单键,O,S和NR2c,Z3为与Z连接的单键,b为1至10的整数,c为 1到3。

    Lithographic printing plates with high print run stability
    18.
    发明申请
    Lithographic printing plates with high print run stability 审中-公开
    平版印刷版印刷运行稳定性高

    公开(公告)号:US20070184381A1

    公开(公告)日:2007-08-09

    申请号:US11571934

    申请日:2005-07-14

    IPC分类号: G03C1/00

    CPC分类号: G03F7/0757 G03F7/028

    摘要: Radiation-sensitive element comprising (a) an optionally pretreated substrate and (b) a radiation-sensitive coating consisting of a composition comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a freeradical polymerization, (ii) at least one radiation-sensitive initiator or initiator system for free-radical polymerization absorbing radiation selected from the wavelength range of 300 to 1,200 nm; and (iii) at least one silsesquioxane comprising at least one substituent with at least one ethylenically unsaturated group each; applied onto the substrate.

    摘要翻译: 辐射敏感元件包括(a)任选地预处理的底物和(b)由组合物组成的辐射敏感性涂层,所述组合物包含(i)一种或多种类型的单体和/或低聚物和/或聚合物,每种包含至少一种烯属 不饱和基团可以进行自由基聚合,(ii)至少一种辐射敏感的引发剂或引发剂体系,用于自由基聚合吸收选自波长范围为300至1200nm的辐射; 和(iii)至少一种包含至少一个具有至少一个烯属不饱和基团的取代基的倍半硅氧烷; 施加到基底上。

    Heat-sensitive positive working lithographic printing plate precursor with a high resistance to chemicals

    公开(公告)号:US20060130689A1

    公开(公告)日:2006-06-22

    申请号:US10526138

    申请日:2003-08-28

    IPC分类号: B41N1/00

    摘要: Heat-sensitive element comprising (a) an optionally pre-treated substrate (b) a positive working heat-sensitive coating comprising (i) at least one novolak resin, (ii) at least one component which reduces the aqueous alkaline developer solubility of novolak, wherein said reduction in solubility is reversed upon the application of heat, and (iii) at least one acidic polyvinyl acetal comprising the structural units (A), (B), (C) (A) (B) (C) and (D) wherein (D) is at least one unit selected from (D-1), (D-2), and (D-3): (D-1) (D-2) (D-3) wherein R1 is a hydrogen atom or a C1-C4 alkyl group, R2 is a hydrogen atom or a C1-C18 alkyl group, R3 is a hydrogen atom or a C1-C4 alkyl group, R4 is a hydrogen atom or a C1-C4 alkyl group, R5 is —COOH, —(CH2)a—COOH, —O—(CH2)a—COOH, —SO3H, —PO3H2 or —PO4H2, a is an integer from 1 to 8, and X is selected from —(CR6R7)n— and —CR8═CR9— wherein n is an integer of 1 to 6, each R6 and R7 is independently selected from a hydrogen atom and C1-C6 alkyl group, and R8 and R9 are independently selected from a hydrogen atom and a C1-C6 alkyl group or R8 and R9 together with the two carbon atoms to which they are bonded, form an optionally substituted aryl or heteroaryl group, wherein components (i) and (ii) do not have to be present as separate substances but may be used in the form of an appropriately functionalized novolak.

    Thermal digital lithographic printing plate
    20.
    发明授权
    Thermal digital lithographic printing plate 有权
    热数码平版印刷版

    公开(公告)号:US06352812B1

    公开(公告)日:2002-03-05

    申请号:US09301866

    申请日:1999-04-29

    IPC分类号: G03F709

    摘要: A thermal lithographic printing plate, which can be imaged by thermal energy typically by imagewise exposure with an infrared emitting laser, a thermal printing head, etc., is made up of a hydrophilic substrate, and a composite layer structure composed of two layer coatings. Preferably, the first layer of the composite is composed of an aqueous developable polymer mixture containing a photothermal conversion material which is contiguous to the hydrophilic substrate. The second layer of the composite is composed of one or more non-aqueous soluble polymers which are soluble or dispersible in a solvent which does not dissolve the first layer. The plate is exposed with an infrared laser or a thermal print head, and upon aqueous development of the imaged plate, the exposed portions are removed exposing hydrophilic substrate surfaces receptive to conventional aqueous fountain solutions. The unexposed portions contain the ink-receptive image areas. The second layer may also contain a photothermal conversion material. Alternatively, the composite layer may be free of photothermal conversion material when thermal imaging is carried out using a thermal printing head.

    摘要翻译: 可以通过热能成像通过用红外发射激光成像曝光,热打印头等来成像的热平版印刷版由亲水基材和由两层涂层组成的复合层结构构成。 优选地,复合材料的第一层由包含与亲水基底邻接的光热转换材料的水性可显影聚合物混合物组成。 复合材料的第二层由一种或多种可溶于或不溶于不溶于第一层的溶剂中的非水溶性聚合物组成。 该板用红外激光或热打印头曝光,并且在成像板的水性显影时,去除曝光部分,暴露接受常规水性喷泉溶液的亲水底物表面。 未曝光部分包含吸墨图像区域。 第二层也可以含有光热转换材料。 或者,当使用热敏打印头进行热成像时,复合层可以不含光热转换材料。