公开(公告)号：US06652069B2

公开(公告)日：2003-11-25

申请号：US10000888

申请日：2001-11-15

申请人： Yoshiro Toda ,  Kazuhiro Fukuda ,  Akira Nishiwaki

发明人： Yoshiro Toda ,  Kazuhiro Fukuda ,  Akira Nishiwaki

IPC分类号： B41J2135

CPC分类号： B41J2/1606 ,  B05D1/60 ,  B05D3/142 ,  B41J2/16 ,  B41J2/1623 ,  B41J2/1632 ,  B41J2/1642 ,  C23C16/513

摘要： In a surface treatment for treating a surface of a subject of treating by a discharge-activated gas, under an atmospheric pressure or a pressure in the neighborhood of it, by arranging a second electrode at a position separated from the discharging section for generating said discharge-activated gas by a first electrode coated with a dielectric substance, and arranging a surface to be treated of a subject of treating between said plasma generating part, serving as a discharging section, and said second electrode, a surface treatment of said subject of treating is practiced.

公开(公告)号：US5374382A

公开(公告)日：1994-12-20

申请号：US592366

申请日：1990-10-03

申请人： Akira Nishiwaki ,  Yasuo Moroboshi ,  Atsushi Saito ,  Kazuhiro Fukuda

发明人： Akira Nishiwaki ,  Yasuo Moroboshi ,  Atsushi Saito ,  Kazuhiro Fukuda

IPC分类号： B01J3/00 ,  C09B67/02 ,  B29B9/00

CPC分类号： C09B67/0097 ,  B01J3/006

摘要： The invention provides a method of producing ultra-fine particles and an apparatus therefor. A particle carrier is moved in a chamber which is decompresed and charged with inert gas. An evaporable material is heated so as to deposit evaporated ultra-fine particles onto a part of the moving particle carrier. The deposited ultra-fine particles are collected from the part of the moving particle carrier while evaporated ultra-fine particles deposit onto another part of the moving particle carrier.

摘要翻译： 本发明提供一种生产超细颗粒的方法及其设备。 颗粒载体在被分解并且装有惰性气体的室中移动。 将蒸发的材料加热以将蒸发的超细颗粒沉积在移动的颗粒载体的一部分上。 从移动颗粒载体的一部分收集沉积的超细颗粒，同时蒸发的超细颗粒沉积到移动颗粒载体的另一部分上。

公开(公告)号：US4576797A

公开(公告)日：1986-03-18

申请号：US527667

申请日：1983-08-30

申请人： Akira Nishiwaki ,  Yasuo Morohoshi ,  Hitoshi Mitake ,  Hiroyuki Moriguchi ,  Hiroyuki Nomori ,  Kunio Ito

发明人： Akira Nishiwaki ,  Yasuo Morohoshi ,  Hitoshi Mitake ,  Hiroyuki Moriguchi ,  Hiroyuki Nomori ,  Kunio Ito

IPC分类号： B01D1/00 ,  C23C14/24 ,  C23C14/28 ,  G03G5/082 ,  C03C13/00

CPC分类号： C23C14/243 ,  B01D1/00 ,  C23C14/28 ,  Y10S117/90

摘要： A vapor source-holding container has an opening smaller than the evaporating area of the material held in the container and a wall portion in contact with the material and having an emissivity lower than the external surface of the wall portion not in contact with the material.

摘要翻译： 蒸汽源保持容器具有比保持在容器中的材料的蒸发区域小的开口和与材料接触的壁部分，并且具有低于不与该材料接触的壁部分的外表面的发射率。

公开(公告)号：US5186872A

公开(公告)日：1993-02-16

申请号：US722973

申请日：1991-06-28

申请人： Akira Nishiwaki ,  Yasuo Morohoshi

发明人： Akira Nishiwaki ,  Yasuo Morohoshi

IPC分类号： B01D3/10 ,  B01D3/34 ,  C23C14/00 ,  G03G5/06

CPC分类号： C23C14/228 ,  B01D3/10 ,  B01D3/346 ,  C23C14/0005 ,  G03G5/06 ,  G03G5/0609

摘要： A method of producing fine particles of a material by evaporating the material into an inert gas. The material is evaporated in a evaporation vessel and the fine particles are generated by cooling the evaporated material with the inert gas blown into the evaporated material from the evaporation vessel. The flow of the fine particles is restricted within a path from the evaporation vessel toward a deposit holding body by means of a scatter preventing wall around the path. The fine particles are deposited on the surface of the evaporation vessel and then receovered.

摘要翻译： 通过将材料蒸发成惰性气体来生产材料的细颗粒的方法。 材料在蒸发容器中蒸发，并且通过从蒸发容器吹入蒸发的材料中的惰性气体冷却蒸发的材料来产生微粒。 微粒的流动通过围绕路径的防散射壁在从蒸发容器朝向沉积物保持体的路径内受到限制。 细颗粒沉积在蒸发容器的表面上，然后被收集。

公开(公告)号：US4601922A

公开(公告)日：1986-07-22

申请号：US649858

申请日：1984-09-12

申请人： Yasuo Moroboshi ,  Akira Nishiwaki

发明人： Yasuo Moroboshi ,  Akira Nishiwaki

IPC分类号： C23C14/04 ,  C23C14/24 ,  G03G5/12 ,  C23C16/00

CPC分类号： G03G5/12 ,  C23C14/042 ,  C23C14/24

摘要： A method of forming a thin layer on a substrate by vapor deposition wherein particles of the material to be constituted the thin layer are caused to fly in such a direction that they reach the surface of the substrate at substantially a right angle relative to the latter. The substrate is located opposite to a particle generating source. A shield device with a slit is provided in the proximity of the substrate located opposite to the particle generating source and between the substrate and the particle generating source so that they are introduced onto the surface of the substrate through the slit at substantially a right angle relative to the surface of the substrate.

摘要翻译： 通过气相沉积在基板上形成薄层的方法，其中使构成薄层的材料的颗粒沿其相对于基板以基本上直角到达基板表面的方向飞行。 衬底位于与颗粒发生源相对的位置。 具有狭缝的屏蔽装置设置在与颗粒产生源相对的基板附近以及基板和颗粒发生源之间，使得它们以基本上直角相对的方式通过狭缝引入到基板的表面上 到基底的表面。