公开(公告)号：US20080193882A1

公开(公告)日：2008-08-14

申请号：US11958661

申请日：2007-12-18

申请人： Masayuki Endo ,  Masaru Sasago

发明人： Masayuki Endo ,  Masaru Sasago

IPC分类号： G03F7/20

CPC分类号： G03F7/0035 ,  G03F7/2041

摘要： After forming a lower layer film, an intermediate layer film and a first resist film on a substrate, a first resist pattern is formed by performing first exposure. Then, after a first intermediate layer pattern is formed by transferring the first resist pattern onto the intermediate layer film, a second resist film is formed thereon, and a second resist pattern is formed by performing second exposure. Thereafter, a second intermediate layer pattern is formed by transferring the second resist pattern onto the intermediate layer film. After removing the second resist film, the lower layer film is etched by using the second intermediate layer pattern as a mask, so as to form a lower layer pattern.

摘要翻译： 在基板上形成下层膜，中间层膜和第一抗蚀剂膜之后，通过进行第一曝光来形成第一抗蚀剂图案。 然后，在通过将第一抗蚀剂图案转印到中间层膜上形成第一中间层图案之后，在其上形成第二抗蚀剂膜，并通过进行第二曝光形成第二抗蚀剂图案。 此后，通过将第二抗蚀剂图案转印到中间层膜上来形成第二中间层图案。 在除去第二抗蚀剂膜之后，通过使用第二中间层图案作为掩模来蚀刻下层膜，以形成下层图案。

公开(公告)号：US07338743B2

公开(公告)日：2008-03-04

申请号：US11197296

申请日：2005-08-05

申请人： Masayuki Endo ,  Masaru Sasago

发明人： Masayuki Endo ,  Masaru Sasago

IPC分类号： G03C1/76 ,  G03C1/492 ,  G03C1/494 ,  G03C5/00

CPC分类号： G03F7/0392 ,  G03F7/0395 ,  G03F7/0397

摘要： A resist material includes a first polymer in which part of alkali-soluble groups are protected by an acid labile group labilized by an acid; a second polymer in which substantially all alkali-soluble groups are protected by an acid labile group labilized by an acid; and an acid generator.

摘要翻译： 抗蚀剂材料包括第一聚合物，其中碱溶性基团的一部分被酸酸化的酸不稳定基团保护; 其中基本上所有的碱溶性基团都被被酸化的酸不稳定基团保护的第二聚合物; 和酸发生剂。

公开(公告)号：US07273820B2

公开(公告)日：2007-09-25

申请号：US10399755

申请日：2001-10-09

申请人： Hideo Nakagawa ,  Masaru Sasago ,  Masayuki Endo ,  Yoshihiko Hirai

发明人： Hideo Nakagawa ,  Masaru Sasago ,  Masayuki Endo ,  Yoshihiko Hirai

IPC分类号： H01L21/469

CPC分类号： H01L21/76819 ,  H01L21/31051

摘要： After a fluid film is formed by supplying a material with fluidity to the surface of a substrate formed with a stepped layer, the fluid film is pressed against the substrate by a pressing member having a planar pressing surface so that the surface of the fluid film is planarized. The fluid film is heated in this state and thereby solidified to form a solidified film having a planar surface.

摘要翻译： 在通过向形成有阶梯层的基板的表面供给流动性的材料形成流体膜之后，通过具有平面的按压面的按压部件将流体膜压在基板上，使得流体膜的表面为 平面化 在该状态下加热流体膜，由此固化，形成具有平坦表面的固化膜。

公开(公告)号：US20070082292A1

公开(公告)日：2007-04-12

申请号：US11602377

申请日：2006-11-21

申请人： Masayuki Endo ,  Masaru Sasago

发明人： Masayuki Endo ,  Masaru Sasago

IPC分类号： G03C1/00

CPC分类号： G03F7/11 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/095

摘要： A water-soluble material used for forming a water-soluble film on a chemically amplified resist film includes a water-soluble polymer, an acid generator and a compound constructing an inclusion compound for incorporating the acid generator. Also, in a pattern formation method, a chemically amplified resist film is formed on a substrate, and a water-soluble film made of a water-soluble material including a water-soluble polymer, an acid generator and a compound constructing an inclusion compound for incorporating the acid generator is formed on the resist film. Thereafter, pattern exposure is carried out by selectively irradiating the resist film with exposing light through the water-soluble film, the resultant resist film is developed and the water-soluble film is removed. Thus, a resist pattern made of the resist film is formed.

摘要翻译： 用于在化学放大抗蚀剂膜上形成水溶性膜的水溶性材料包括水溶性聚合物，酸产生剂和构成用于掺入酸产生剂的包合物的化合物。 此外，在图案形成方法中，在基板上形成化学放大抗蚀剂膜，以及由水溶性材料构成的水溶性膜，所述水溶性物质包含水溶性聚合物，酸产生剂和构成包合物的化合物， 在抗蚀剂膜上形成并入酸产生剂。 此后，通过选择性地照射通过水溶性膜曝光光的抗蚀剂膜来进行图案曝光，使得到的抗蚀剂膜显影并除去水溶性膜。 因此，形成由抗蚀剂膜制成的抗蚀剂图案。

公开(公告)号：US20070026341A1

公开(公告)日：2007-02-01

申请号：US11492957

申请日：2006-07-26

申请人： Jun Hatakeyama ,  Yuji Harada ,  Yoshio Kawai ,  Masayuki Endo ,  Masaru Sasago ,  Haruhiko Komoriya ,  Michitaka Ootani ,  Satoru Miyazawa ,  Kazuhiko Maeda

发明人： Jun Hatakeyama ,  Yuji Harada ,  Yoshio Kawai ,  Masayuki Endo ,  Masaru Sasago ,  Haruhiko Komoriya ,  Michitaka Ootani ,  Satoru Miyazawa ,  Kazuhiko Maeda

IPC分类号： G03C1/00

CPC分类号： G03F7/11 ,  G03F7/0046 ,  G03F7/2041 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/111

摘要： A resist protective coating material is provided comprising an α-trifluoromethylacrylic acid/norbornene copolymer having cyclic perfluoroalkyl groups as pendant. In a pattern-forming process, the material forms on a resist film a protective coating which is water-insoluble, dissolvable in alkaline developer and immiscible with the resist film, allowing for effective implementation of immersion lithography.

摘要翻译： 提供抗蚀剂保护涂层材料，其包含具有环状全氟烷基的α-三氟甲基丙烯酸/降冰片烯共聚物作为侧基。 在图案形成过程中，材料在抗蚀剂膜上形成保护性涂层，其是不溶于水的，可溶于碱性显影剂中并且与抗蚀剂膜不混溶，从而有​​效地实施浸渍光刻。

公开(公告)号：US07166418B2

公开(公告)日：2007-01-23

申请号：US10932316

申请日：2004-09-02

申请人： Shinji Kishimura ,  Masayuki Endo ,  Masaru Sasago ,  Mitsuru Ueda ,  Hirokazu Imori ,  Toshiaki Fukuhara

发明人： Shinji Kishimura ,  Masayuki Endo ,  Masaru Sasago ,  Mitsuru Ueda ,  Hirokazu Imori ,  Toshiaki Fukuhara

IPC分类号： G03F7/30

CPC分类号： C08F220/18 ,  C08F212/02 ,  C08F228/02 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/107 ,  Y10S430/108 ,  Y10S430/111

摘要： A base polymer of a resist material includes a unit represented by a general formula of the following Chemical Formula 3: wherein R1, R2 and R3 are the same or different and are a hydrogen atom, a fluorine atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; R4 is a straight-chain alkylene group or a branched or cyclic alkylene group with a carbon number not less than 0 and not more than 20; and R5 and R6 are the same or different and are a hydrogen atom, a straight-chain alkyl group, a branched or cyclic alkyl group, a fluoridated alkyl group with a carbon number not less than 1 and not more than 20, or a protecting group released by an acid.

公开(公告)号：US20060281025A1

公开(公告)日：2006-12-14

申请号：US11409207

申请日：2006-04-24

申请人： Masayuki Endo ,  Masaru Sasago

发明人： Masayuki Endo ,  Masaru Sasago

IPC分类号： G03C1/00

CPC分类号： C08L59/00 ,  C08L2205/02 ,  G03F7/0392 ,  G03F7/2041 ,  Y10S430/106 ,  C08L2666/16

摘要： In a pattern formation method, a resist film made of a chemically amplified resist material including a first polymer having hemiacetal or hemiketal is formed on a substrate. Then, with a liquid provided on the resist film, pattern exposure is performed by selectively irradiating the resist film with exposing light. After the pattern exposure, the resist film is developed so as to form a resist pattern made of the resist film.

摘要翻译： 在图案形成方法中，在基板上形成由包含半缩醛或半缩醛的第一聚合物的化学放大抗蚀剂材料制成的抗蚀剂膜。 然后，通过设置在抗蚀剂膜上的液体，通过用曝光光选择性地照射抗蚀剂膜来进行图案曝光。 在图案曝光之后，抗蚀剂膜被显影以形成由抗蚀剂膜制成的抗蚀剂图案。

公开(公告)号：US20060263719A1

公开(公告)日：2006-11-23

申请号：US11415158

申请日：2006-05-02

申请人： Masayuki Endo ,  Masaru Sasago

发明人： Masayuki Endo ,  Masaru Sasago

IPC分类号： G03C1/00

CPC分类号： G03F7/085 ,  G03F7/0392 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/12

摘要： A resist film made of a resist material including 4-pentanelactam, that is, hetero cyclic ketone, is formed on a substrate, and subsequently, pattern exposure is performed by irradiating the resist film with exposing light through a mask. Then, the resist film having been subjected to the pattern exposure is developed, thereby forming a resist pattern.

摘要翻译： 在基板上形成由包含4-戊内酰胺的抗蚀剂材料（即杂环酮）制成的抗蚀剂膜，随后通过用掩模曝光光照射抗蚀剂膜来进行图案曝光。 然后，对经过图案曝光的抗蚀剂膜进行显影，从而形成抗蚀剂图案。

公开(公告)号：US20060163198A1

公开(公告)日：2006-07-27

申请号：US11260385

申请日：2005-10-28

申请人： Masayuki Endo ,  Masaru Sasago

发明人： Masayuki Endo ,  Masaru Sasago

IPC分类号： C23F1/00 ,  B44C1/22 ,  H01L21/302 ,  H01L21/461

CPC分类号： G03F7/0392 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/40

摘要： In a pattern formation method, a resist film including a lactone ring is formed on a substrate of silicon oxide. Then, pattern exposure is performed by selectively irradiating the resist film with exposing light, and the resist film is developed after the pattern exposure so as to form a resist pattern made of the resist film. Subsequently, the lactone ring included in the resist pattern is opened by exposing the resist pattern to an acrylic acid aqueous solution. Thereafter, with the resist pattern where the lactone ring has been opened used as a mask, the substrate is etched, so as to form a recess in a good shape.

摘要翻译： 在图案形成方法中，在氧化硅的基板上形成包含内酯环的抗蚀剂膜。 然后，通过用曝光来选择性地照射抗蚀剂膜来进行图案曝光，并且在图案曝光之后使抗蚀剂膜显影，以形成由抗蚀剂膜制成的抗蚀剂图案。 随后，通过将抗蚀剂图案暴露于丙烯酸水溶液来打开包含在抗蚀剂图案中的内酯环。 然后，利用其中已经打开内酯环的抗蚀剂图案作为掩模，蚀刻基板，以形成良好形状的凹部。

公开(公告)号：US20060024937A1

公开(公告)日：2006-02-02

申请号：US11237869

申请日：2005-09-29

申请人： Yasuaki Yokoyama ,  Isamu Yonekura ,  Takashi Satoh ,  Tamaki Wakasaki ,  Yasumasa Takeuchi ,  Masayuki Endo

发明人： Yasuaki Yokoyama ,  Isamu Yonekura ,  Takashi Satoh ,  Tamaki Wakasaki ,  Yasumasa Takeuchi ,  Masayuki Endo

IPC分类号： H01L21/3205 ,  H01L21/4763

CPC分类号： H01L21/288 ,  C23C18/02 ,  C23C18/06 ,  C23C18/08 ,  C23C18/14 ,  Y10T428/24917

摘要： There is provided a method for forming wiring or an electrode by coating a substrate with a composition comprising (A) a complex of an amine compound and a hydrogenated aluminum compound and (B) a titanium compound or a composition comprising the complex and (C) metal particles and subjecting the obtained coating film to heating and/or a light treatment. By the method, a film can be formed that uses a conductive film forming composition with which wiring and an electrode that can be suitably used for electronic devices can be formed easily and inexpensively.

摘要翻译： 提供了一种通过用（A）胺化合物和氢化铝化合物的配合物和（B）钛化合物或包含该络合物的组合物和（C）的组合物的组合物涂布基材来形成布线或电极的方法， 金属颗粒，对所得涂膜进行加热和/或光处理。 通过该方法，可以形成能够容易且廉价地形成可以适合用于电子器件的布线和电极的导电膜形成用组合物的膜。