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11.发明申请NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS 有权含氮单体，聚合物，电阻组合物和方法公开(公告)号：US20120183904A1
公开(公告)日：2012-07-19
申请号：US13349754
申请日：2012-01-13
IPC分类号： G03F7/20 , G03F7/039 , C07D211/44 , C08F226/06
CPC分类号： G03F7/0397 , C07D211/44 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/2037 , G03F7/2039 , G03F7/2041 , G03F7/30
摘要： A chemically amplified positive resist composition of better performance can be formulated using a polymer having a quencher incorporated therein, specifically a polymer comprising recurring units having a carbamate structure which is decomposed with an acid to generate an amino group and optionally recurring units having an acid labile group capable of generating a carboxyl and/or hydroxyl group under the action of an acid. The polymer is highly effective for suppressing diffusion of acid and diffuses little itself, and the composition forms a pattern of rectangular profile at a high resolution.
摘要翻译： 具有更好性能的化学放大型正性抗蚀剂组合物可以使用其中掺入猝灭剂的聚合物，特别是包含具有氨基甲酸酯结构的重复单元的聚合物来配制，该聚合单元用酸分解以产生氨基，以及任选的具有酸不稳定性的重复单元 能够在酸的作用下产生羧基和/或羟基的基团。 该聚合物对于抑制酸的扩散非常有效，并且自身扩散，并且组合物以高分辨率形成矩形轮廓的图案。
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12.发明授权Nitrogen-containing organic compound, chemically amplified positive resist composition, and patterning process 有权含氮有机化合物，化学放大阳性抗蚀剂组合物和图案化工艺公开(公告)号：US08808964B2
公开(公告)日：2014-08-19
申请号：US13217319
申请日：2011-08-25
IPC分类号： G03F7/004
CPC分类号： C07D235/08 , C07D233/60 , G03F7/0045 , G03F7/0397
摘要： An aralkylcarbamate of imidazole base is effective as the quencher. In a chemically amplified positive resist composition comprising the carbamate, deprotection reaction of carbamate takes place by reacting with the acid generated upon exposure to high-energy radiation, whereby the composition changes its basicity before and after exposure, resulting in a pattern profile with advantages including high resolution, rectangular shape, and minimized dark-bright difference.
摘要翻译： 咪唑碱的芳烷基氨基甲酸酯作为猝灭剂是有效的。 在包含氨基甲酸酯的化学放大型正性抗蚀剂组合物中，氨基甲酸酯的脱保护反应通过与暴露于高能量辐射时产生的酸反应而发生，由此组合物在暴露之前和之后改变其碱度，得到具有以下优点的图案图案，包括 高分辨率，矩形形状和最小暗亮差异。
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公开(公告)号：US08778591B2
公开(公告)日：2014-07-15
申请号：US13217319
申请日：2011-08-25
IPC分类号： G03F7/004
摘要： An aralkylcarbamate of imidazole base is effective as the quencher. In a chemically amplified positive resist composition comprising the carbamate, deprotection reaction of carbamate takes place by reacting with the acid generated upon exposure to high-energy radiation, whereby the composition changes its basicity before and after exposure, resulting in a pattern profile with advantages including high resolution, rectangular shape, and minimized dark-bright difference.
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14.发明授权Nitrogen-containing monomer, polymer, resist composition, and patterning process 有权含氮单体，聚合物，抗蚀剂组合物和图案化工艺公开(公告)号：US09207534B2
公开(公告)日：2015-12-08
申请号：US13349754
申请日：2012-01-13
IPC分类号： G03F7/039 , G03F7/004 , G03F7/30 , G03F7/20 , C07D211/44
CPC分类号： G03F7/0397 , C07D211/44 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/2037 , G03F7/2039 , G03F7/2041 , G03F7/30
摘要： A chemically amplified positive resist composition of better performance can be formulated using a polymer having a quencher incorporated therein, specifically a polymer comprising recurring units having a carbamate structure which is decomposed with an acid to generate an amino group and optionally recurring units having an acid labile group capable of generating a carboxyl and/or hydroxyl group under the action of an acid. The polymer is highly effective for suppressing diffusion of acid and diffuses little itself, and the composition forms a pattern of rectangular profile at a high resolution.
摘要翻译： 具有更好性能的化学放大型正性抗蚀剂组合物可以使用其中掺入猝灭剂的聚合物，特别是包含具有氨基甲酸酯结构的重复单元的聚合物来配制，该聚合单元用酸分解以产生氨基，以及任选的具有酸不稳定性的重复单元 能够在酸的作用下产生羧基和/或羟基的基团。 该聚合物对于抑制酸的扩散非常有效，并且自身扩散，并且组合物以高分辨率形成矩形轮廓的图案。
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15.发明授权Acid-labile ester monomer having spirocyclic structure, polymer, resist composition, and patterning process 有权具有螺环结构的酸不稳定酯单体，聚合物，抗蚀剂组合物和图案化工艺公开(公告)号：US08791288B2
公开(公告)日：2014-07-29
申请号：US12787004
申请日：2010-05-25
申请人： Takeshi Kinsho , Tomohiro Kobayashi , Masayoshi Sagehashi , Takeru Watanabe , Koji Hasegawa , Seiichiro Tachibana
发明人： Takeshi Kinsho , Tomohiro Kobayashi , Masayoshi Sagehashi , Takeru Watanabe , Koji Hasegawa , Seiichiro Tachibana
CPC分类号： C07C69/54 , C07C69/753 , C07C2602/42 , C07C2602/50 , C07C2603/94 , C08F232/08 , G03F7/0045 , G03F7/0397
摘要： An acid-labile ester monomer of spirocyclic structure has formula (1) wherein Z is a monovalent group having a polymerizable double bond, X is a divalent group which forms a cyclopentane, cyclohexane or norbornane ring, R2 is H or monovalent hydrocarbon, R3 and R4 are H or monovalent hydrocarbon, or R3 and R4, taken together, stand for a divalent group which forms a cyclopentane or cyclohexane ring, and n is 1 or 2. A polymer obtained from the acid-labile ester monomer has so high reactivity in acid-catalyzed elimination reaction that the polymer may be used to formulate a resist composition having high resolution.
摘要翻译： 螺环结构的酸不稳定酯单体具有式（1）其中Z是具有可聚合双键的一价基团，X是形成环戊烷，环己烷或降冰片烷环的二价基团，R 2是H或一价烃，R 3和 R 4为H或一价烃，或者R 3和R 4一起代表形成环戊烷或环己烷环的二价基团，n为1或2.由酸不稳定酯单体获得的聚合物具有如此高的反应性 酸催化的消除反应，聚合物可用于配制具有高分辨率的抗蚀剂组合物。
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16.发明申请ACID-LABILE ESTER MONOMER HAVING SPIROCYCLIC STRUCTURE, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS 有权具有螺旋结构的酸可可酯单体，聚合物，树脂组合物和方法公开(公告)号：US20100304295A1
公开(公告)日：2010-12-02
申请号：US12787004
申请日：2010-05-25
申请人： Takeshi Kinsho , Tomohiro Kobayashi , Masayoshi Sagehashi , Takeru Watanabe , Koji Hasegawa , Seiichiro Tachibana
发明人： Takeshi Kinsho , Tomohiro Kobayashi , Masayoshi Sagehashi , Takeru Watanabe , Koji Hasegawa , Seiichiro Tachibana
IPC分类号： G03F7/20 , C07C69/533 , C08F220/00 , C08F232/08 , G03F7/004
CPC分类号： C07C69/54 , C07C69/753 , C07C2602/42 , C07C2602/50 , C07C2603/94 , C08F232/08 , G03F7/0045 , G03F7/0397
摘要： An acid-labile ester monomer of spirocyclic structure has formula (1) wherein Z is a monovalent group having a polymerizable double bond, X is a divalent group which forms a cyclopentane, cyclohexane or norbornane ring, R2 is H or monovalent hydrocarbon, R3 and R4 are H or monovalent hydrocarbon, or R3 and R4, taken together, stand for a divalent group which forms a cyclopentane or cyclohexane ring, and n is 1 or 2. A polymer obtained from the acid-labile ester monomer has so high reactivity in acid-catalyzed elimination reaction that the polymer may be used to formulate a resist composition having high resolution.
摘要翻译： 螺环结构的酸不稳定酯单体具有式（1）其中Z是具有可聚合双键的一价基团，X是形成环戊烷，环己烷或降冰片烷环的二价基团，R 2是H或一价烃，R 3和 R 4为H或一价烃，或者R 3和R 4一起代表形成环戊烷或环己烷环的二价基团，n为1或2.由酸不稳定酯单体获得的聚合物具有如此高的反应性 酸催化的消除反应，聚合物可用于配制具有高分辨率的抗蚀剂组合物。
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公开(公告)号：US08968979B2
公开(公告)日：2015-03-03
申请号：US12623155
申请日：2009-11-20
CPC分类号： G03F7/0395 , C08F12/24 , C08F220/30 , C08F232/08 , C09D125/18 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/2041 , C08F212/14 , C08F212/32
摘要： A positive resist composition comprises a polymer comprising repeat units having formula (1) or (2). Herein denotes an aromatic hydrocarbon group, R1 is H, methyl or trifluoromethyl, R2 is H, C1-C12 alkyl or aromatic hydrocarbon group, R3 is C1-C12 alkyl, or R2 and R3 may bond together to form a ring, and a is 1 or 2. When used in the ArF lithography, the resist composition exhibits high resolution. When used in the EB image writing for mask processing, the resist composition exhibits high resolution and sensitivity sufficient to comply with high-accelerating-voltage EB irradiation, and high etch resistance.
摘要翻译： 正型抗蚀剂组合物包含包含具有式（1）或（2）的重复单元的聚合物。 本文表示芳族烃基，R 1为H，甲基或三氟甲基，R 2为H，C 1 -C 12烷基或芳族烃基，R 3为C 1 -C 12烷基，或R 2和R 3可以键合在一起形成环， 当用于ArF光刻时，抗蚀剂组合物显示出高分辨率。 当用于掩模处理的EB图像写入中时，抗蚀剂组合物显示出高分辨率和高灵敏度，足以符合高加速电压EB照射和高耐蚀刻性。
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公开(公告)号：US20120183903A1
公开(公告)日：2012-07-19
申请号：US13350153
申请日：2012-01-13
CPC分类号： G03F7/004 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/094 , G03F7/11 , G03F7/20 , G03F7/2037 , G03F7/2041 , G03F7/325
摘要： A pattern is formed by applying a resist composition comprising a polymer comprising recurring units having a nitrogen atom bonded to an acid labile group, an acid generator, and an organic solvent onto a substrate, prebaking to form a resist film, exposing the resist film to high-energy radiation, baking, and developing the exposed film with an organic solvent developer to form a negative pattern wherein the unexposed region of film is dissolved and the exposed region of film is not dissolved.
摘要翻译： 通过将包含含有具有与酸不稳定基团键合的氮原子的重复单元，酸发生剂和有机溶剂的聚合物的抗蚀剂组合物涂布在基材上，预烘烤以形成抗蚀剂膜，将抗蚀剂膜暴露于 高能辐射，烘烤，并用有机溶剂显影剂显影曝光的薄膜以形成其中未暴露的薄膜区域溶解并且曝光区域不溶解的负图案。
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19.发明授权公开(公告)号：US08647808B2
公开(公告)日：2014-02-11
申请号：US13081182
申请日：2011-04-06
IPC分类号： G03F7/004 , C08F24/00 , C08F220/24 , G03F7/039
CPC分类号： C07C69/013 , C07C69/653 , C07D317/34 , C07D317/72 , C08F24/00 , C08F220/22 , C08F220/24 , C08F220/28 , C08F222/18 , C08F222/20 , C08F222/22 , G03F7/0046 , G03F7/0397 , Y10S430/108 , Y10S430/111
摘要： A fluorinated monomer has formula (1) wherein R1 is H, F, methyl or trifluoromethyl, R2 and R3 are H or a monovalent hydrocarbon group, R4 to R6 each are a monovalent fluorinated hydrocarbon group, A is a divalent hydrocarbon group, and k1 is 0, 1 or 2. A polymer derived from the fluorinated monomer may be endowed with appropriate water repellency, water slip, acid lability and hydrolysis and is useful as an additive polymer in formulating a resist composition.
摘要翻译： 氟化单体具有式（1）其中R 1为H，F，甲基或三氟甲基，R 2和R 3为H或一价烃基，R 4至R 6各为一价氟化烃基，A为二价烃基，k1 衍生自氟化单体的聚合物可赋予适当的防水性，水滑性，酸性和水解性，并且可用作配制抗蚀剂组合物中的添加剂聚合物。
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20.发明申请FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS 有权氟化单体，氟化聚合物，耐腐蚀组合物和方法公开(公告)号：US20110151381A1
公开(公告)日：2011-06-23
申请号：US12952304
申请日：2010-11-23
CPC分类号： C07C69/73 , C08F220/22 , C08F220/24 , C08F220/26 , C08F222/18 , C08F222/22 , C08K5/36 , C08L33/14 , C08L33/16 , G03F7/0046 , G03F7/0397 , G03F7/2041 , C08L2666/04
摘要： A fluorinated monomer has formula (1) wherein R1 is H, F, methyl or trifluoromethyl, R2 is a monovalent hydrocarbon group which may have halogen or oxygen, A is a divalent hydrocarbon group, and k1 is 0, 1 or 2. A polymer derived from the fluorinated monomer may be endowed with appropriate water repellency, water slip, acid lability and hydrolysis and is useful as an additive polymer in formulating a resist composition.
摘要翻译： 氟化单体具有式（1）其中R1是H，F，甲基或三氟甲基，R2是可以具有卤素或氧的一价烃基，A是二价烃基，k1是0,1或2.聚合物 来自氟化单体的化合物可赋予适当的防水性，水滑性，酸性和水解性，并且可用作配制抗蚀剂组合物中的添加剂聚合物。
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