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公开(公告)号：US20120067843A1
公开(公告)日：2012-03-22
申请号：US13064301
申请日：2011-03-16
申请人： Akira Watanabe , Kaori Kimura , Yousuke Isowaki , Yoshiyuki Kamata , Naoko Kihara , Akira Kikitsu
发明人： Akira Watanabe , Kaori Kimura , Yousuke Isowaki , Yoshiyuki Kamata , Naoko Kihara , Akira Kikitsu
IPC分类号： C23F1/02
CPC分类号： H01L21/3086 , B82Y10/00 , G03F7/0002 , G03F7/165 , G03F7/168 , G11B5/743 , G11B5/82 , G11B5/855 , H01L21/0332 , H01L21/0337 , H01L21/3081
摘要： A method of forming a fine pattern according to an embodiment includes: forming a hard mask on a substrate; forming a mask reinforcing member on the hard mask; forming a di-block copolymer layer on the mask reinforcing member, the di-block copolymer layer comprising a sea-island structure; forming a pattern comprising a concave-convex structure in the di-block copolymer layer, with island portions of the sea-island structure being convex portions; and transferring the pattern onto the hard mask by performing etching on the mask reinforcing member and the hard mask, with a mask being the pattern formed in the di-block copolymer layer. The mask reinforcing member is comprised of a material having an etching speed that is higher than an etching speed for the hard mask and is lower than an etching speed for sea portions of the sea-island structure of the di-block copolymer layer.
摘要翻译： 根据实施例的形成精细图案的方法包括：在基底上形成硬掩模; 在所述硬掩模上形成掩模加强部件; 在掩模加强部件上形成二嵌段共聚物层，二嵌段共聚物层包含海岛结构体; 在所述二嵌段共聚物层中形成包括凹凸结构的图案，所述海岛结构的岛部是凸部; 并通过在掩模增强部件和硬掩模上进行蚀刻将图案转印到硬掩模上，其中掩模是在二嵌段共聚物层中形成的图案。 掩模加强部件由蚀刻速度高于硬掩模的蚀刻速度的材料构成，并且低于二嵌段共聚物层的海岛结构的海水部分的蚀刻速度。
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公开(公告)号：US08012361B2
公开(公告)日：2011-09-06
申请号：US12705421
申请日：2010-02-12
IPC分类号： B44C1/22
摘要： According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a first hard mask, a second hard mask and a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses to the resist, removing residues remaining in the recesses of the patterned resist, etching the second hard mask by using the patterned resist as a mask to transfer the patterns of protrusions and recesses to the second hard mask, etching the first hard mask by using the second hard mask as a mask to transfer the patterns of protrusions and recesses to the first hard mask, removing the second hard mask remaining on the protrusions of the first hard mask, and deactivating the magnetic recording layer exposed in the recesses by means of ion beam irradiation.
摘要翻译： 根据一个实施例，一种制造磁记录介质的方法包括在磁记录层上形成第一硬掩模，第二硬掩模和抗蚀剂，将压模压印到抗蚀剂上，以将凹凸图案转印到抗蚀剂上， 去除残留在图案化抗蚀剂的凹部中的残留物，通过使用图案化抗蚀剂作为掩模蚀刻第二硬掩模以将突起和凹陷的图案转移到第二硬掩模，通过使用第二硬掩模蚀刻第一硬掩模 用于将突起和凹陷的图案转移到第一硬掩模的掩模，去除残留在第一硬掩模的突起上的第二硬掩模，以及通过离子束照射去除在凹部中暴露的磁记录层。
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公开(公告)号：US08002997B2
公开(公告)日：2011-08-23
申请号：US12544606
申请日：2009-08-20
IPC分类号： B44C1/22
摘要： According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses, and partially etching the magnetic recording layer in areas not covered with patterns of the resist used as masks by ion beam etching using a mixed gas of He and N2 as well as modifying a remainder of the magnetic recording layer to leave behind a nonmagnetic layer having a reduced thickness.
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公开(公告)号：US20100214695A1
公开(公告)日：2010-08-26
申请号：US12705490
申请日：2010-02-12
摘要： According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a first hard mask, a second hard mask and a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses to the resist, removing residues remaining in the recesses of the patterned resist by means of a first etching gas, etching the second hard mask by means of the first etching gas using the patterned resist as a mask to transfer the patterns to the second hard mask, etching the first hard mask by means of a second etching gas different from the first etching gas using the second hard mask as a mask to transfer the patterns to the first hard mask, and performing ion beam etching in order to deactivate the magnetic recording layer exposed in the recesses and to remove the second hard mask.
摘要翻译： 根据一个实施例，一种制造磁记录介质的方法包括在磁记录层上形成第一硬掩模，第二硬掩模和抗蚀剂，将压模压印到抗蚀剂上，以将凹凸图案转印到抗蚀剂上， 通过第一蚀刻气体去除残留在图案化抗蚀剂的凹部中的残留物，利用第一蚀刻气体，使用图案化抗蚀剂作为掩模蚀刻第二硬掩模，以将图案转移到第二硬掩模，蚀刻第一 通过不同于使用第二硬掩模的第一蚀刻气体作为掩模的第二蚀刻气体将硬掩模转印到第一硬掩模，并且执行离子束蚀刻以使暴露在凹部中的磁记录层失活 并移除第二个硬掩模。
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15.发明申请公开(公告)号：US20090135519A1
公开(公告)日：2009-05-28
申请号：US12292564
申请日：2008-11-20
摘要： A magnetic recording medium includes a disk substrate, and recording cells arrayed on the disk substrate in a track direction, the recording cells includes a ferromagnetic pattern and a magnetic pattern formed on one of two sidewalls of the ferromagnetic pattern in the track direction and having a lower crystalline magnetic anisotropy constant Ku than that of the ferromagnetic pattern.
摘要翻译： 磁记录介质包括磁盘基板和磁道基板上沿轨道方向排列的记录单元，记录单元包括铁磁图案和形成在轨道方向的铁磁图案的两个侧壁中的一个侧壁上的磁性图案，并且具有 比铁磁性图案低的结晶磁各向异性常数Ku。
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16.发明授权公开(公告)号：US08298690B2
公开(公告)日：2012-10-30
申请号：US12292564
申请日：2008-11-20
IPC分类号： G11B5/65
摘要： A magnetic recording medium includes a disk substrate, and recording cells arrayed on the disk substrate in a track direction, the recording cells includes a ferromagnetic pattern and a magnetic pattern formed on one of two sidewalls of the ferromagnetic pattern in the track direction and having a lower crystalline magnetic anisotropy constant Ku than that of the ferromagnetic pattern.
摘要翻译： 磁记录介质包括磁盘基板和磁道基板上沿轨道方向排列的记录单元，记录单元包括铁磁图案和形成在轨道方向的铁磁图案的两个侧壁中的一个侧壁上的磁性图案，并且具有 比铁磁性图案低的结晶磁各向异性常数Ku。
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公开(公告)号：US08029682B2
公开(公告)日：2011-10-04
申请号：US12705456
申请日：2010-02-12
IPC分类号： B44C1/22
摘要： According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a first hard mask, a second hard mask and a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses to the resist, removing residues remaining in the recesses of the patterned resist, etching the second hard mask by using the patterned resist as a mask to transfer the patterns of protrusions and recesses to the second hard mask, etching the first hard mask by using the second hard mask as a mask to transfer the patterns of protrusions and recesses to the first hard mask, subjecting the magnetic recording layer exposed in the recesses to modifying treatment to change an etching rate, and deactivating the magnetic recording layer exposed in the recesses.
摘要翻译： 根据一个实施例，一种制造磁记录介质的方法包括在磁记录层上形成第一硬掩模，第二硬掩模和抗蚀剂，将压模压印到抗蚀剂上，以将凹凸图案转印到抗蚀剂上， 去除残留在图案化抗蚀剂的凹部中的残留物，通过使用图案化抗蚀剂作为掩模蚀刻第二硬掩模以将突起和凹陷的图案转移到第二硬掩模，通过使用第二硬掩模蚀刻第一硬掩模 用于将突起和凹陷的图案转移到第一硬掩模的掩模，对暴露于凹部中的磁记录层进行修改处理以改变蚀刻速率，以及使在凹部中暴露的磁记录层失活。
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公开(公告)号：US07972523B2
公开(公告)日：2011-07-05
申请号：US12509261
申请日：2009-07-24
IPC分类号： B44C1/22
摘要： According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a magnetic recording layer, an oxidation inhibiting layer, a hard mask layer includes carbon on a substrate, coating the hard mask layer with a resist, transferring patterns of protrusions and recesses to the resist by imprinting to form resist patterns, sequentially performing etching of the hard mask layer using the resist patterns as masks, etching of the oxidation inhibiting layer, and etching and/or magnetism deactivation of the magnetic recording layer to form patterns of the magnetic recording layer, and sequentially performing stripping of the resist patterns, stripping of the hard mask layer and stripping of the oxidation inhibiting layer, in which ion beam etching is used for stripping the oxidation inhibiting layer.
摘要翻译： 根据一个实施例，制造磁记录介质的方法包括形成磁记录层，氧化抑制层，硬掩模层包括在基板上的碳，用抗蚀剂涂覆硬掩模层，转移凸起和凹槽的图案 通过压印形成抗蚀剂以形成抗蚀剂图案，使用抗蚀剂图案作为掩模，蚀刻氧化抑制层顺序地进行硬掩模层的蚀刻，以及磁记录层的蚀刻和/或磁性失活以形成磁性图案 记录层，顺序地进行剥离抗蚀剂图案，汽提硬掩模层和剥离氧化抑制层，其中使用离子束蚀刻来剥离氧化抑制层。
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公开(公告)号：US07967993B2
公开(公告)日：2011-06-28
申请号：US12508269
申请日：2009-07-23
IPC分类号： B44C1/22
摘要： According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a hard mask and a resist on a magnetic recording layer, imprinting a stamper on the resist to transfer patterns of protrusions and recesses, removing resist residues left in the recesses of the patterned resist, etching the hard mask using the patterned resist as a mask to transfer the patterns of protrusions and recesses, stripping the resist, and performing ion beam etching to remove the remaining hard mask and to modify a surface of the magnetic recording layer uncovered with the remaining hard mask.
摘要翻译： 根据一个实施例，一种制造磁记录介质的方法包括在磁记录层上形成硬掩模和抗蚀剂，在抗蚀剂上印刷压模以转移突起和凹槽的图案，去除留在凹槽中的抗蚀剂残留物 使用图案化的抗蚀剂作为掩模蚀刻硬掩模，以转移突起和凹陷的图案，剥离抗蚀剂，并执行离子束蚀刻以去除剩余的硬掩模并修改未覆盖的磁记录层的表面 剩下的硬面罩。
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20.发明申请公开(公告)号：US20120275059A1
公开(公告)日：2012-11-01
申请号：US13351167
申请日：2012-01-16
申请人： Tomoyuki Maeda , Yousuke Isowaki , Akira Watanabe
发明人： Tomoyuki Maeda , Yousuke Isowaki , Akira Watanabe
CPC分类号： G11B5/7325 , G11B5/746 , G11B5/855
摘要： According to one embodiment, a magnetic recording medium includes a substrate, an auxiliary layer formed on the substrate, and at least one perpendicular magnetic recording layer formed on the auxiliary layer. The perpendicular magnetic recording layer includes a magnetic dot pattern. The perpendicular magnetic recording layer is made of an alloy material containing one element selected from iron and cobalt, and one element selected from platinum and palladium. This alloy material has the L10 structure, and is (001)-oriented. The auxiliary layer includes a dot-like first region covered with the magnetic dot pattern, and a second region not covered with the magnetic dot pattern. The first region is made of one metal selected from (100)-oriented nickel and (100)-oriented iron. The second region contains an oxide of the metal used in the first region.
摘要翻译： 根据一个实施例，磁记录介质包括基板，形成在基板上的辅助层以及形成在辅助层上的至少一个垂直磁记录层。 垂直磁记录层包括磁点图形。 垂直磁记录层由含有选自铁和钴的一种元素的合金材料和选自铂和钯的一种元素制成。 该合金材料具有L10结构，为（001）取向。 辅助层包括用磁点图案覆盖的点状第一区域和未被磁点图案覆盖的第二区域。 第一区域由选自（100）取向的镍和（100）取向的铁中的一种金属制成。 第二区域包含在第一区域中使用的金属的氧化物。
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