Device and method for bonding of substrates

    公开(公告)号:US11251045B2

    公开(公告)日:2022-02-15

    申请号:US17088654

    申请日:2020-11-04

    摘要: A method for bonding a first substrate with a second substrate at respective contact faces of the substrates with the following steps: holding the first substrate to a first sample holder surface of a first sample holder with a holding force FH1 and holding the second substrate to a second sample holder surface of a second sample holder with a holding force FH2; contacting the contact faces at a bond initiation point and heating at least the second sample holder surface to a heating temperature TH; bonding of the first substrate with the second substrate along a bonding wave running from the bond initiation point to the side edges of the substrates, wherein the heating temperature TH is reduced at the second sample holder surface during the bonding.

    Apparatus and method for bonding substrates

    公开(公告)号:US11139170B2

    公开(公告)日:2021-10-05

    申请号:US16540133

    申请日:2019-08-14

    摘要: A device and method is described for producing an electrically conductive direct bond between a bonding side of a first substrate and a bonding side of a second substrate. A workspace is included that can be closed, gas-tight, against the environment and can be supplied with a vacuum. The workspace includes a) at least one plasma chamber for modifying at least one of the bonding sides and at least one bonding chamber for bonding the bonding sides, and/or b) at least one combined bonding/plasma chamber for modifying at least one of the bonding sides and for bonding the bonding sides.

    METHOD AND DEVICE FOR BONDING SUBSTRATES

    公开(公告)号:US20210183666A1

    公开(公告)日:2021-06-17

    申请号:US17188114

    申请日:2021-03-01

    IPC分类号: H01L21/67 H01L21/687

    摘要: A method and corresponding device for bonding a first contact surface of a first substrate to a second contact surface of a second substrate. The method includes the steps of arranging a substrate stack, formed from the first substrate and the second substrate and aligned on the contact surfaces, between a first heating surface of a first heating system and a second heating surface of a second heating system.

    METHOD AND DEVICE FOR EMBOSSING OF A NANOSTRUCTURE

    公开(公告)号:US20210129520A1

    公开(公告)日:2021-05-06

    申请号:US17124931

    申请日:2020-12-17

    发明人: Gerald Kreindl

    IPC分类号: B41F19/02 G03F7/20 G03F7/00

    摘要: A method for embossing a nanostructure, formed on a nanostructure punch, into a punch surface of a curable material which has been applied to a substrate. The method includes the following steps, especially following sequence: alignment of the nanostructure relative to the punch surface, embossing of the punch surface by a) prestressing of the nanostructure punch by deformation of the nanostructure punch and/or prestressing of the substrate by deformation of the substrate, b) making contact of a partial area of the punch surface with the nanostructure punch and c) automatic contacting of the remaining surface at least partially, especially predominantly, by the prestressing of the nanostructure punch and/or the prestressing of the substrate.

    Method for permanently bonding wafers

    公开(公告)号:US10825793B2

    公开(公告)日:2020-11-03

    申请号:US14007999

    申请日:2011-04-08

    摘要: This invention relates to a method for bonding of a first contact surface of a first substrate to a second contact surface of a second substrate with the following steps, especially the following sequence: forming a reservoir in a surface layer on the first contact surface, the first surface layer consisting at least largely of a native oxide material, at least partial filling of the reservoir with a first educt or a first group of educts, the first contact surface making contact with the second contact surface for formation of a prebond connection, forming a permanent bond between the first and second contact surface, at least partially strengthened by the reaction of the first educt with a second educt contained in a reaction layer of the second substrate.

    Device and method for bonding of substrates

    公开(公告)号:US10748770B2

    公开(公告)日:2020-08-18

    申请号:US16821139

    申请日:2020-03-17

    摘要: A method for bonding a first substrate with a second substrate at respective contact faces of the substrates with the following steps: holding the first substrate to a first sample holder surface of a first sample holder with a holding force FH1 and holding the second substrate to a second sample holder surface of a second sample holder with a holding force FH2; contacting the contact faces at a bond initiation point and heating at least the second sample holder surface to a heating temperature TH; bonding of the first substrate with the second substrate along a bonding wave running from the bond initiation point to the side edges of the substrates, wherein the heating temperature TH is reduced at the second sample holder surface during the bonding.

    METHOD AND DEVICE FOR EXPOSURE OF PHOTOSENSITIVE LAYER

    公开(公告)号:US20200089121A1

    公开(公告)日:2020-03-19

    申请号:US16470709

    申请日:2016-12-20

    IPC分类号: G03F7/20

    摘要: A method and device for exposing a light-sensitive layer, said method comprising: generating at least one light ray by use of at least one light source, illuminating pixels of an exposure pattern by use of at least one micromirror device having a plurality of micromirrors with respective mirror intensity profiles, and overlaying the mirror intensity profiles of adjacent micromirrors to provide a pattern intensity profile of the exposure pattern by summing the mirror intensity profiles of each illuminated pixel of the exposure pattern.

    Method for the production of an optical glass element

    公开(公告)号:US10519057B2

    公开(公告)日:2019-12-31

    申请号:US15509874

    申请日:2015-08-27

    IPC分类号: C03B19/12 G02B3/00

    摘要: A method for the production of an optical glass element, with the following process sequence: a) applying a liquid embossing material on an embossing die, b) embossing the embossing material at a temperature of less than 500° C., c) hardening the embossing material, d) sintering the embossing material and thus executing the primary forming of the optical glass element. In addition, an optical glass element that is produced with the method, a device for implementing the method, and a use of this device are disclosed.