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36 条记录 (耗时 0.026 秒)

    Photoresist monomers, polymers thereof and photoresist compositions containing the same
    15.
    发明授权
    Photoresist monomers, polymers thereof and photoresist compositions containing the same 失效
    光致抗蚀剂单体，其聚合物和含有它们的光致抗蚀剂组合物

    公开(公告)号：US06921622B2

    公开(公告)日：2005-07-26

    申请号：US10054532

    申请日：2002-01-22

    申请人： Geun Su Lee ,  Jae Chang Jung ,  Ki Soo Shin

    发明人： Geun Su Lee ,  Jae Chang Jung ,  Ki Soo Shin

    IPC分类号： C08F234/04 ,  G03F7/004 ,  G03F7/039 ,  G03F7/20

    CPC分类号： G03F7/0046 ,  C08F234/04 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106

    摘要： Photoresist monomers of following Formula 1, photoresist polymers thereof, and photoresist compositions containing the same. The photoresist polymer includes a repeating unit comprising the photoresist monomer of Formula 1 as a comonomer and the photoresist composition containing the same have excellent etching resistance, heat resistance and adhesiveness to a wafer, and is developable in aqueous tetramethylammonium hydroxide (TMAH) solution. In addition, the photoresist composition has low light absorbance at 157 nm wavelength, and thus is suitable for a photolithography process using ultraviolet light sources such as VUV (157 nm) in fabricating a minute circuit for a high integration semiconductor device

    摘要翻译： 下列通式1的光致抗蚀剂单体，其光致抗蚀剂聚合物和含有它们的光致抗蚀剂组合物。 光致抗蚀剂聚合物包括包含作为共聚单体的式1的光致抗蚀剂单体的重复单元，并且含有该光致抗蚀剂组合物的光致抗蚀剂组合物具有优异的耐蚀刻性，耐热性和与晶片的粘合性，并且可在四甲基氢氧化铵（TMAH）水溶液中显影。 此外，光致抗蚀剂组合物在157nm波长处具有低吸光度，因此适用于在制造用于高集成度半导体器件的微小电路中使用诸如VUV（157nm）的紫外光源的光刻工艺

    Polymer having butadiene sulfone repeating unit and resist composition comprising the same
    16.
    发明申请
    Polymer having butadiene sulfone repeating unit and resist composition comprising the same 失效
    具有丁二烯砜重复单元和含有它们的抗蚀剂组合物的聚合物

    公开(公告)号：US20030180661A1

    公开(公告)日：2003-09-25

    申请号：US10384727

    申请日：2003-03-11

    发明人： Sang-jun Choi ,  Woo-sung Han ,  Sang-gyun Woo

    IPC分类号： G03F007/038

    CPC分类号： G03F7/0397 ,  C08F234/04 ,  G03F7/0392 ,  G03F7/0395 ,  Y10S430/106 ,  Y10S430/111

    摘要： A polymer having a repeating unit comprising a copolymer of butadiene sulfone and maleic anhydride, and a chemically amplified resist composition comprising the polymer. The resist composition includes a photosensitive polymer having a first repeating unit comprising a copolymer of butadiene sulfone and maleic anhydride, the first repeating unit represented by a formula: 1 and a second repeating unit copolymerized with the first repeating unit.

    摘要翻译： 具有包含丁二烯砜和马来酸酐的共聚物的重复单元的聚合物和包含聚合物的化学放大抗蚀剂组合物。 抗蚀剂组合物包括具有包含丁二烯砜和马来酸酐的共聚物的第一重复单元的光敏聚合物，由式表示的第一重复单元和与第一重复单元共聚的第二重复单元。

    Polymers, resist compositions and patterning process
    17.
    发明申请
    Polymers, resist compositions and patterning process 有权
    聚合物，抗蚀剂组合物和图案化工艺

    公开(公告)号：US20010051315A1

    公开(公告)日：2001-12-13

    申请号：US09842113

    申请日：2001-04-26

    申请人： Shin-Etsu Chemical Co., Ltd.

    发明人： Tsunehiro Nishi ,  Seiichiro Tachibana ,  Mutsuo Nakashima ,  Takeshi Kinsho ,  Takeru Watanabe ,  Koji Hasegawa ,  Jun Hatakeyama

    IPC分类号： G03F007/038 ,  G03F007/20 ,  C08G063/02 ,  C08G063/18

    CPC分类号： G03F7/039 ,  C08F222/06 ,  C08F222/40 ,  C08F232/08 ,  G03F7/0045 ,  C08F2220/1866 ,  C08F232/04 ,  C08F234/04 ,  C08F232/00

    摘要： A polymer comprising units of formulas (1) and (2) and having a Mw of 1,000-500,000 is provided. R1 is H, CH3 or CH2CO2R3, R2 is H, CH3 or CO2R3, R3 is alkyl, R4 is H, alkyl, alkoxyalkyl or acyl, R5 is alkyl or aryl, Y is a divalent hydrocarbon group which may contain a hetero atom and which forms a ring with the carbon atom, Z is a trivalent hydrocarbon group, k is 0 or 1, and W is nullOnull or null(NR)null wherein R is H or alkyl. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and lends itself to micropatterning with electron beams or deep-UV rays. 1

    摘要翻译： 提供了包含式（1）和（2）单元并且Mw为1,000-500,000的聚合物。 R1是H，CH3或CH2CO2R3，R2是H，CH3或CO2R3，R3是烷基，R4是H，烷基，烷氧基烷基或酰基，R5是烷基或芳基，Y是可以含有杂原子的二价烃基， 与碳原子形成环，Z为三价烃基，k为0或1，W为-O-或 - （NR） - ，其中R为H或烷基。 包含作为基础树脂的聚合物的抗蚀剂组合物对高能辐射敏感，具有优异的灵敏度，分辨率和耐蚀刻性，并且适用于电子束或深紫外线的微图案化。

    ELECTRICALLY CONDUCTIVE POLYMERS WITH ENHANCED CONDUCTIVITY
    19.
    发明申请
    ELECTRICALLY CONDUCTIVE POLYMERS WITH ENHANCED CONDUCTIVITY 审中-公开
    具有增强电导性的导电导电聚合物

    公开(公告)号：US20150083977A1

    公开(公告)日：2015-03-26

    申请号：US14559558

    申请日：2014-12-03

    申请人： KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION

    发明人： Dong Hoon CHOI

    IPC分类号： H01B1/12 ,  C08F299/00

    CPC分类号： H01B1/127 ,  C08F234/04 ,  C08F299/00 ,  Y10S977/73 ,  Y10S977/738 ,  Y10S977/784

    摘要： An electrically conductive polymer linked to conductive nanoparticle is provided. The conductive polymer can include conductive monomers and one or more monomers in the conductive polymer can be linked to a conductive nanoparticle and can include a polymerizable moiety so that it can be incorporated into a polymer chain. The electrically conductive monomer can include a 3,4-ethylenedioxythiophene as a conductive monomer. The electrically conductive polymer having the conductive nanoparticle can be prepared into an electrically conductive layer or film for use in electronic devices.

    摘要翻译： 提供了连接到导电纳米颗粒的导电聚合物。 导电聚合物可以包括导电单体，并且导电聚合物中的一种或多种单体可以连接到导电纳米颗粒，并且可以包括可聚合部分，使得其可以结合到聚合物链中。 导电单体可以包括作为导电单体的3,4-亚乙二氧噻吩。 具有导电纳米颗粒的导电聚合物可以制备成用于电子器件的导电层或膜。

    Electrically conductive polymers with enhanced conductivity
    20.
    发明授权
    Electrically conductive polymers with enhanced conductivity 有权
    具有增强导电性的导电聚合物

    公开(公告)号：US08920681B2

    公开(公告)日：2014-12-30

    申请号：US12650175

    申请日：2009-12-30

    申请人： Dong Hoon Choi

    发明人： Dong Hoon Choi

    IPC分类号： H01B1/00 ,  B05D5/00 ,  C08G75/00 ,  H01B1/12 ,  C08F234/04

    CPC分类号： H01B1/127 ,  C08F234/04 ,  C08F299/00 ,  Y10S977/73 ,  Y10S977/738 ,  Y10S977/784

    摘要： An electrically conductive polymer linked to conductive nanoparticle is provided. The conductive polymer can include conductive monomers and one or more monomers in the conductive polymer can be linked to a conductive nanoparticle and can include a polymerizable moiety so that it can be incorporated into a polymer chain. The electrically conductive monomer can include a 3,4-ethylenedioxythiophene as a conductive monomer. The electrically conductive polymer having the conductive nanoparticle can be prepared into an electrically conductive layer or film for use in electronic devices.

    摘要翻译： 提供了连接到导电纳米颗粒的导电聚合物。 导电聚合物可以包括导电单体，并且导电聚合物中的一种或多种单体可以连接到导电纳米颗粒，并且可以包括可聚合部分，使得其可以结合到聚合物链中。 导电单体可以包括作为导电单体的3,4-亚乙二氧噻吩。 具有导电纳米颗粒的导电聚合物可以制备成用于电子器件的导电层或膜。