公开(公告)号：US20170038691A1

公开(公告)日：2017-02-09

申请号：US15299562

申请日：2016-10-21

申请人： Carl Zeiss SMT GmbH

发明人： Michael Patra ,  Stig Bieling ,  Markus Deguenther ,  Frank Schlesener ,  Markus Schwab

IPC分类号： G03F7/20

CPC分类号： G03F7/70158 ,  G03F7/70058

摘要： An illumination system of a microlithographic projection exposure apparatus includes a light source to produce projection light beam, and a first and a second diffractive optical element between the light source and a pupil plane of the illumination system. The diffractive effect produced by each diffractive optical element depends on the position of a light field that is irradiated by the projection light on the diffractive optical elements. A displacement mechanism changes the mutual spatial arrangement of the diffractive optical elements. In at least one of the mutual spatial arrangements, which can be obtained with the help of the displacement mechanism, the light field extends both over the first and the second diffractive optical element. This makes it possible to produce in a simple manner continuously variable illumination settings.

摘要翻译： 微光刻投影曝光装置的照明系统包括产生投射光束的光源和在光源和照明系统的光瞳面之间的第一和第二衍射光学元件。 由每个衍射光学元件产生的衍射效应取决于由投射光照射的衍射光学元件的光场的位置。 位移机构改变衍射光学元件的相互空间排列。 在借助位移机构可以获得的相互空间布置中的至少一个中，光场在第一和第二衍射光学元件的两端延伸。 这使得可以以简单的方式生产连续可变的照明设置。

公开(公告)号：US20160306272A1

公开(公告)日：2016-10-20

申请号：US15194072

申请日：2016-06-27

申请人： TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

发明人： Yen-Cheng Lu ,  Jeng-Horng Chen ,  Shinn-Sheng Yu ,  Anthony Yen

IPC分类号： G03F1/24 ,  G03F7/20

CPC分类号： G03F7/70283 ,  G03F1/24 ,  G03F1/48 ,  G03F1/54 ,  G03F7/2004 ,  G03F7/70091 ,  G03F7/70158 ,  G03F7/703

摘要： An extreme ultraviolet lithography (EUVL) system is disclosed. The system includes an extreme ultraviolet (EUV) mask with three states having respective reflection coefficient is r1, r2 and r3, wherein r3 is a pre-specified value that is a function of r1 and r2. The system also includes a nearly on-axis illumination (ONI) with partial coherence a less than 0.3 to expose the EUV mask to produce diffracted light and non-diffracted light. The system further includes a projection optics box (PUB) to remove a portion of the non-diffracted light and to collect and direct the diffracted light and the remaining non-diffracted light to expose a target.

摘要翻译： 公开了一种极紫外光刻（EUVL）系统。 该系统包括具有各自反射系数的三种状态的极紫外（EUV）掩模为r1，r2和r3，其中r3是作为r1和r2的函数的预定值。 该系统还包括具有小于0.3的部分相干性的近轴上照明（ONI），以暴露EUV掩模以产生衍射光和非衍射光。 该系统还包括用于去除非衍射光的一部分并且收集并引导衍射光和剩余的非衍射光以暴露目标的投影光学盒（PUB）。

公开(公告)号：US09383651B2

公开(公告)日：2016-07-05

申请号：US14189663

申请日：2014-02-25

申请人： Samsung Display Co., Ltd.

发明人： Hi Kuk Lee ,  Tsunemitsu Torigoe ,  Chang Hoon Kim ,  Ki Beom Lee ,  Su-Yeon Sim ,  Sang Hyun Lee

IPC分类号： G03F7/20

CPC分类号： G03F7/70158 ,  G03F7/70291

摘要： In an aspect, a grating light valve module including: a substrate; and a plurality of ribbons disposed on the substrate, wherein each of the ribbons includes an insulating layer, a conductive layer disposed on the insulating layer, and an anti-oxidation layer disposed on the conductive layer is provided.

摘要翻译： 一方面，一种光栅光阀模块，包括：基板; 以及设置在基板上的多个带，其中每个带包括绝缘层，设置在绝缘层上的导电层和设置在导电层上的抗氧化层。

公开(公告)号：US09171107B2

公开(公告)日：2015-10-27

申请号：US13787971

申请日：2013-03-07

申请人： CANON KABUSHIKI KAISHA

发明人： Kosuke Asano

IPC分类号： G06F17/50 ,  G06F17/14 ,  G03F7/20

CPC分类号： G06F17/50 ,  G03F7/70108 ,  G03F7/70158 ,  G03F7/705 ,  G06F17/14 ,  G06F17/5036

摘要： A calculating method for calculating structural data of a two-level diffractive optical element configured to form a set of light intensity distributions point-symmetrical with respect to an axis on an image plane utilizing an iterative Fourier transform algorithm executed by a computer includes calculating a light intensity distribution and a phase distribution of a plane of the two-level diffractive optical element which has a Fourier transform relationship with the image plane by performing an inverse Fourier transform for a light intensity that is made by removing one of the set of light intensity distributions from the set of light intensity distributions, and calculating structural data of the diffractive optical element based upon the light intensity distribution and the phase distribution which have been calculated.

摘要翻译： 一种计算方法，用于计算利用由计算机执行的迭代傅立叶变换算法，被配置为形成相对于图像上的轴点对称的一组光强度分布的两级衍射光学元件的结构数据，包括计算光 强度分布和与图像平面具有傅里叶变换关系的两级衍射光学元件的平面的相位分布，通过对通过去除所述一组光强度分布中的一组而进行的光强度进行傅里叶逆变换 并根据所计算的光强度分布和相位分布来计算衍射光学元件的结构数据。

公开(公告)号：US09122170B2

公开(公告)日：2015-09-01

申请号：US13196535

申请日：2011-08-02

申请人： Naonori Kita

发明人： Naonori Kita

IPC分类号： G03F7/20

CPC分类号： G03F7/70158 ,  G03F7/70058

摘要： According to one embodiment, a transmission optical system which guides light in a nearly parallel beam state emitted from an optical outlet port of a light source, to an optical inlet port of an exposure apparatus body and which injects the light in the nearly parallel beam state into the optical inlet port is provided with a condensing optical system which keeps the optical outlet port and the optical inlet port in an optical Fourier transform relation, and an angle distribution providing element which is arranged in an optical path between the optical outlet port and the condensing optical system and which provides an emergent beam with an angle distribution in a range larger than a range of an angle distribution of an incident beam.

摘要翻译： 根据一个实施例，一种传输光学系统，其将从光源的光学出口端射出的几乎平行的光束状态的光引导到曝光装置主体的光学入口端口，并将光以几乎平行的光束状态 光入口具有将光输出口和光入口保持为光学傅里叶变换关系的聚光系统，以及角度分布提供元件，其设置在光出口和光入口之间的光路中 并且其提供在大于入射光束的角度分布的范围的范围内的角度分布的紧急光束。

公开(公告)号：US20150234291A1

公开(公告)日：2015-08-20

申请号：US14696653

申请日：2015-04-27

申请人： Carl Zeiss SMT GmbH

发明人： Michael Patra ,  Stig Bieling ,  Markus Deguenther ,  Frank Schlesener ,  Markus Schwab

IPC分类号： G03F7/20

CPC分类号： G03F7/70158 ,  G03F7/70058

摘要： An illumination system of a microlithographic projection exposure apparatus includes a light source to produce projection light beam, and a first and a second diffractive optical element between the light source and a pupil plane of the illumination system. The diffractive effect produced by each diffractive optical element depends on the position of a light field that is irradiated by the projection light on the diffractive optical elements. A displacement mechanism changes the mutual spatial arrangement of the diffractive optical elements. In at least one of the mutual spatial arrangements, which can be obtained with the help of the displacement mechanism, the light field extends both over the first and the second diffractive optical element. This makes it possible to produce in a simple manner continuously variable illumination settings.

摘要翻译： 微光刻投影曝光装置的照明系统包括产生投射光束的光源和在光源和照明系统的光瞳面之间的第一和第二衍射光学元件。 由每个衍射光学元件产生的衍射效应取决于由投射光照射的衍射光学元件的光场的位置。 位移机构改变衍射光学元件的相互空间排列。 在借助位移机构可以获得的相互空间布置中的至少一个中，光场在第一和第二衍射光学元件的两端延伸。 这使得可以以简单的方式生产连续可变的照明设置。

公开(公告)号：US09046874B2

公开(公告)日：2015-06-02

申请号：US13056023

申请日：2009-07-30

申请人： Peter Anthony Ivey ,  Richard Peter McWilliam ,  Alan Purvis ,  Gavin Lewis Williams ,  Nicholas Luke Seed ,  Richard Ian Curry ,  Jose Juan De Jesus Toriz-Garcia

发明人： Peter Anthony Ivey ,  Richard Peter McWilliam ,  Alan Purvis ,  Gavin Lewis Williams ,  Nicholas Luke Seed ,  Richard Ian Curry ,  Jose Juan De Jesus Toriz-Garcia

IPC分类号： G03B27/32 ,  G03B27/52 ,  G03B27/54 ,  G03B27/72 ,  G03F1/00 ,  G03H1/08 ,  G03F7/20 ,  G03H1/00 ,  G03H1/04 ,  G03H1/22 ,  G03H1/26

CPC分类号： G03H1/08 ,  G03F7/70158 ,  G03F7/70291 ,  G03F7/703 ,  G03F7/70408 ,  G03F7/70416 ,  G03H1/0005 ,  G03H1/0443 ,  G03H1/22 ,  G03H1/2294 ,  G03H2001/0038 ,  G03H2001/005 ,  G03H2001/0088 ,  G03H2001/0094 ,  G03H2001/2215 ,  G03H2001/2221 ,  G03H2001/264 ,  G03H2225/32

摘要： A light beam collimated by illumination optics (4) from a radiation source (6) illuminates the surface of a wave front modulator (8) such as an Spatial Light Modulator (SLM) or Computer Generated Hologram photomask (CGH). The resulting wave travels via projection optics (10) to the substrate (12), passing through a projection lens assembly (14). The SLM (8) is programmed or CGH configured with a modulation pattern that is determined by the substrate (12) topography and desired pattern. The substrate topography is provided by Digital Holography (DH) surface profilometery performed by a DH microscope (18), which provides geometrical or topographical input to the CGH calculation routines (16). An arrangement for vertical or sloping surface patterning has a grating (22) superimposed onto the CGH pattern (24) to generate +1 and −1 orders. The SLM or CGH may be configured: using Fresnel patterns to provide an extended depth of field of the projected wave front; by encoding line segments of the desired pattern as cylindrical lines; by calculating inverse propagation between non-planar topography of the substrate and the SLM or CGH (using a Rayleigh-Sommerfield diffraction formula); and/or using iteration to determine a restricted encoding in the configuration of the SLM or CGH.

摘要翻译： 来自辐射源（6）的由照明光学器件（4）准直的光束照射诸如空间光调制器（SLM）或计算机生成的全息照相掩模（CGH）的波前调制器（8）的表面。 所产生的波通过投影光学器件（10）传播到基底（12），穿过投影透镜组件（14）。 SLM（8）被编程或CGH配置有由衬底（12）形貌和期望图案确定的调制图案。 衬底形貌由数字全息（DH）表面轮廓提供，由DH显微镜（18）执行，其提供CGH计算程序（16）的几何或形貌输入。 用于垂直或倾斜表面图案化的布置具有叠加在CGH图案（24）上的光栅（22），以产生+1和-1个顺序。 可以配置SLM或CGH：使用菲涅尔图案提供投影波前的扩展景深; 通过将期望图案的线段编码为圆柱线; 通过计算衬底的非平面形貌与SLM或CGH之间的反向传播（使用Rayleigh-Sommerfield衍射公式）; 和/或使用迭代来确定SLM或CGH的配置中的受限编码。

公开(公告)号：US20140340662A1

公开(公告)日：2014-11-20

申请号：US14189663

申请日：2014-02-25

申请人： SAMSUNG DISPLAY CO., LTD.

发明人： Hi Kuk Lee ,  Tsunemitsu Torigoe ,  Chang Hoon Kim ,  Ki Beom Lee ,  Su-Yeon Sim ,  Sang Hyun Lee

IPC分类号： G03F7/20

CPC分类号： G03F7/70158 ,  G03F7/70291

摘要： In an aspect, a grating light valve module including: a substrate; and a plurality of ribbons disposed on the substrate, wherein each of the ribbons includes an insulating layer, a conductive layer disposed on the insulating layer, and an anti-oxidation layer disposed on the conductive layer is provided.

摘要翻译： 一方面，一种光栅光阀模块，包括：基板; 以及设置在基板上的多个带，其中每个带包括绝缘层，设置在绝缘层上的导电层和设置在导电层上的抗氧化层。

公开(公告)号：US20130308113A1

公开(公告)日：2013-11-21

申请号：US13890142

申请日：2013-05-08

申请人： NIKON CORPORATION

发明人： Takehito KUDO ,  Shigeru HIRUKAWA

IPC分类号： G03F7/20

CPC分类号： G03F7/70191 ,  G03B27/42 ,  G03F7/70091 ,  G03F7/701 ,  G03F7/70108 ,  G03F7/70158 ,  G03F7/70566

摘要： An exposure method and apparatus for illuminating a pattern with an illumination system to expose a substrate through a projection system. The pattern is illuminated with illumination light with a light amount distribution in which an amount of light is larger in a pair of first areas and a pair of second areas than in an area other than the first and second areas on a pupil plane of the illumination system. The pair of the first areas being arranged outside an optical axis, the pair of the second areas being arranged on ten same straight line as the pair of the first areas are arranged on, and the pair of the second areas being arranged outside the pair of the first areas.

摘要翻译： 一种用照明系统照亮图案以通过投影系统曝光衬底的曝光方法和装置。 在照明光照射的情况下，照明光照射光，其中光量在一对第一区域和一对第二区域中比在照明光瞳面上的第一和第二区域之外的区域更大 系统。 一对第一区域布置在光轴的外侧，一对第二区域布置在与该对第一区域相同的直线上，并且该对第二区域布置在一对 第一个地区。

公开(公告)号：US08451427B2

公开(公告)日：2013-05-28

申请号：US12191821

申请日：2008-08-14

申请人： Osamu Tanitsu

发明人： Osamu Tanitsu

IPC分类号： G02B5/08 ,  G03B27/32 ,  G03B27/42 ,  G03B27/54 ,  G03B27/72

CPC分类号： G03F7/70058 ,  G02B26/00 ,  G02B26/02 ,  G02B27/0927 ,  G03F7/70108 ,  G03F7/70116 ,  G03F7/70141 ,  G03F7/70158

摘要： An illumination optical system which illuminates a surface to be illuminated on the basis of light from a light source has a first optical path in which a diffractive optical element can be arranged at a first position thereof; a second optical path in which a spatial light modulator with a plurality of optical elements arrayed two-dimensionally and controlled individually can be arranged at a second position thereof; and a third optical path which is an optical path of light having passed via at least one of the first optical path and the second optical path and in which a distribution forming optical system is arranged. The distribution forming optical system forms a predetermined light intensity distribution on an illumination pupil located in the third optical path, based on the light having passed via at least one of the first and second optical paths.