公开(公告)号：US20090078867A1

公开(公告)日：2009-03-26

申请号：US11861206

申请日：2007-09-25

Applicant: Michal Avinun-Kalish ,  Jacob Levin ,  Dror Shemesh

Inventor： Michal Avinun-Kalish ,  Jacob Levin ,  Dror Shemesh

IPC: H01J37/26

CPC classification number: G01N23/2202 ,  H01J2237/2443 ,  H01J2237/24455 ,  H01J2237/245 ,  H01J2237/2802 ,  H01J2237/2803 ,  H01J2237/31745

Abstract: A system and method for generating a thin sample, the method includes: milling an intermediate section of a thin sample such as to enable an upper portion of the thin sample to tilt in relation to a lower portion of the thin sample; wherein the lower portion is connected to a wafer from which the thin sample was formed. A system and method for inspecting a thin sample, the method includes: A method for inspecting a thin sample, the method comprising: illuminating, by a charged particle beam, a tilted upper portion of a thin sample that is connected, via a milled intermediate section, to a lower portion of the thin sample; wherein the lower portion is connected to a wafer from which the thin sample was formed; and collecting particles and photons resulting from the illumination.

Abstract translation: 一种用于产生薄样品的系统和方法，所述方法包括：铣削薄样品的中间部分，使得薄样品的上部相对于薄样品的下部倾斜; 其中下部连接到形成薄样品的晶片。 一种用于检查薄样品的系统和方法，所述方法包括：一种用于检查薄样品的方法，所述方法包括：通过带电粒子束照射通过研磨的中间体连接的薄样品的倾斜上部 到薄样品的下部; 其中所述下部连接到形成所述薄样品的晶片; 并收集由照明产生的颗粒和光子。

公开(公告)号：US07184137B1

公开(公告)日：2007-02-27

申请号：US10702524

申请日：2003-11-06

Applicant: David L. Adler

Inventor： David L. Adler

IPC: G01N21/00 ,  H01L27/00

CPC classification number: G03F1/84 ,  G01N2021/95676 ,  H01J2237/06333 ,  H01J2237/244 ,  H01J2237/245

Abstract: One embodiment disclosed relates to an apparatus for inspecting or revieiwing a mask or reticle. The apparatus includes at least an optical system, a converter plate, and an electron system. The optical system projects an optical illumination onto the mask. The optical signal from the mask is received by the converter plate. The converter plate transforms the optical signal to a corresponding electron signal. The electron signal is imaged by the electron system.

Abstract translation: 公开的一个实施例涉及一种用于检查或修复掩模或掩模版的装置。 该装置至少包括光学系统，转换器板和电子系统。 光学系统将光学照明投射到掩模上。 来自掩模的光信号由转换器板接收。 转换器板将光信号转换成相应的电子信号。 电子信号由电子系统成像。