公开(公告)号：US20030222053A1

公开(公告)日：2003-12-04

申请号：US10159504

申请日：2002-05-31

发明人： Tian-Shosi Tsai

IPC分类号： B23H001/04 ,  B23H007/26

CPC分类号： B23H7/26

摘要： A tool holder for an electric discharge machine has a top base, a securing collar, a positioning sleeve, an adjusting base and a rotating base. The top base has a central hole and an elongated opening communicating with the central hole. The securing collar is screwed into the central hole in the top base and has a central hole with a conical inner surface. The securing collar has multiple holes corresponding to the elongated opening in the top base. A positioning sleeve has a conical outer surface fitting with the conical inner surface in the securing collar. The adjusting base has a main shaft penetrating through the central hole in the positioning sleeve. Consequently, the locked condition of the main shaft is released by means of the rotating the securing collar, such that the adjustment of the tool holder is convenient.

摘要翻译： 用于放电加工机的工具架具有顶部基座，固定套环，定位套筒，调节基座和旋转底座。 顶部基座具有中心孔和与中心孔连通的细长开口。 固定环被拧入顶部基座的中心孔，并具有一个具有锥形内表面的中心孔。 固定环具有与顶部基部中的细长开口对应的多个孔。 定位套筒具有与固定套环中的锥形内表面配合的锥形外表面。 调整基座具有穿过定位套筒中的中心孔的主轴。 因此，通过旋转固定环将主轴的锁定状态释放，使得工具架的调节方便。

公开(公告)号：US20030089600A1

公开(公告)日：2003-05-15

申请号：US10237975

申请日：2002-09-10

发明人： Masuhiro Natsuhara ,  Hirohiko Nakata ,  Akira Kuibira

IPC分类号： C25C007/00 ,  C25F007/00 ,  C25D017/04 ,  B23H011/00 ,  B23H007/26 ,  C25B009/00

CPC分类号： H01L21/6831

摘要： An inexpensive workpiece holder having high reliability and a processing apparatus equipped with the workpiece holder are provided, in which damage caused by oxygen in the air is prevented The holder comprises: a ceramic body which has an electrode and a heater circuit and which can holds a workpiece; a tubular member having an end portion connected to the ceramic body; a sealing member which is disposed inside the tubular member and which isolates a space inside the tubular member into two regions: a region on the first end portion (nullsealed portionnull) and a region on the opposite side (nullopposite regionnull); and power supply conductive members which extend from the opposite region side, penetrating the sealing member to the sealed region side, and which are electrically connected to the electrode and the heater circuit.

摘要翻译： 提供了具有高可靠性的便宜的工件保持器和配备有工件保持器的处理装置，其中防止由空气中的氧引起的损坏。保持器包括：陶瓷体，其具有电极和加热器电路，并且能够保持 工件; 管状构件，其具有连接到所述陶瓷体的端部; 密封构件，其设置在所述管状构件的内部，并且将所述管状构件内的空间隔离成两个区域：所述第一端部（“密封部”）上的区域和相对侧（“相对区域”）上的区域。 以及从相对区域侧延伸穿过密封构件到密封区域侧并且与电极和加热器电路电连接的电源导电构件。

公开(公告)号：US20030051999A1

公开(公告)日：2003-03-20

申请号：US10240785

申请日：2002-10-03

发明人： Egon Hubel

IPC分类号： C25D005/00 ,  C25B009/00 ,  C25C007/00 ,  C25F007/00 ,  B23H007/26

CPC分类号： C25D7/0657 ,  H05K3/241

摘要： For manufacturing printed circuit boards and films 7 with little variations in the layer thickness of the circuit structures without damaging the surfaces of the boards and films, a rotatory element 9, 10, more specifically a contact roll, is used for placing the printed circuit boards and films in electric contact, an elastic, electrically conductive material 2, 5, 6 being at least partially applied on the running tread unreeling on the printed circuit boards and films.

摘要翻译： 为了制造印刷电路板和膜7，电路结构的层厚度几乎没有变化，而不损坏电路板和膜的表面，旋转元件9,10，更具体地是接触辊被用于放置印刷电路板 和电接触的薄膜，弹性的导电材料2,5,6至少部分地施加在运行的胎面上，在印刷电路板和薄膜上展开。

公开(公告)号：US20030010626A1

公开(公告)日：2003-01-16

申请号：US09907332

申请日：2001-07-16

发明人： Daniel J. Gramarossa ,  Gary C. Downes

IPC分类号： C25D017/00 ,  C25C007/00 ,  C25B009/00 ,  C25F007/00 ,  B23H011/00 ,  B23H007/26 ,  C25D017/04 ,  C25D017/06 ,  C25D017/16

CPC分类号： H01L21/67748 ,  C25D17/001 ,  H01L21/2885 ,  H01L21/67712 ,  H01L21/67718 ,  H01L21/67751 ,  H01L21/6776

摘要： A wafer plating system horizontally transporting vertically oriented wafers into one or more process cells. The wafer processing system includes a carrier rotatable from a substantially horizontal orientation to a substantially vertical orientation. A cathode assembly secures the wafer onto the carrier and electrically couples the wafer to a power supply.

摘要翻译： 将垂直取向的晶片水平地输送到一个或多个处理单元中的晶圆电镀系统。 晶片处理系统包括可从基本上水平的方向旋转到基本垂直取向的载体。 阴极组件将晶片固定在载体上并将晶片电耦合到电源。

公开(公告)号：US20020185472A1

公开(公告)日：2002-12-12

申请号：US10167686

申请日：2002-06-10

发明人： Hakon Nordquist ,  Christer Modin

IPC分类号： B23H007/26

CPC分类号： B23H11/003 ,  B23H7/26 ,  B23Q1/0063 ,  B23Q16/001 ,  B23Q16/08 ,  Y10T279/1224 ,  Y10T279/26 ,  Y10T409/30952

摘要： A holder for a workpiece or tool, in the surface of which a plurality of grooves with substantially planar flanks are made, the opposing edges of which, formed on the surface, have a predetermined spacing, wherein the holder consists of a sintered material, at least in the region of the elastically deformable edges.

摘要翻译： 一种用于工件或工具的保持器，其表面上形成有多个具有基本上平面的侧面的凹槽，其形成在表面上的相对边缘具有预定间隔，其中保持器由烧结材料组成， 至少在可弹性变形的边缘的区域中。

公开(公告)号：US20020079292A1

公开(公告)日：2002-06-27

申请号：US10022091

申请日：2001-12-13

发明人： Peter Wehrli

IPC分类号： B23H007/26

CPC分类号： B23H7/02 ,  B23Q1/012 ,  B23Q39/02 ,  Y10T83/9292

摘要： A machine tool with a machine frame is disclosed. A first tool guide is provided on the frame to guide a tool to a first guide position. The first tool guide is a movable gantry carrier with a movable first sliding carriage. The tool guide can be moved with respect to the machine frame in a first plane along a first direction and in a second direction which is orthogonal with respect to the first direction. Furthermore, a second tool guide is provided on the machine frame to guide the tool to a second guide position. The second tool guide can be moved with respect to the machine frame in a second plane along a third direction and a fourth direction which is orthogonal to the third direction, independently of the first tool guide. Finally, a tool holder is provided on the machine frame to hold the machined part. The machined part is led between the first and the second guide positions of the tool. The second tool guide is a movable gantry carrier with a movable second sliding carriage.

摘要翻译： 公开了一种具有机架的机床。 第一工具引导件设置在框架上以将工具引导到第一引导位置。 第一工具导向件是具有可移动的第一滑动滑架的活动式龙门架。 刀具引导件可以沿着第一方向和与第一方向正交的第二方向相对于机架在第一平面中移动。 此外，第二工具导向器设置在机架上以将工具引导到第二导向位置。 第二工具引导件可以在与第一工具引导件无关的沿第三方向和与第三方向正交的第四方向的第二平面中相对于机架移动。 最后，在机架上设置工具架以保持加工部件。 加工的部件被引导在工具的第一和第二引导位置之间。 第二工具导轨是具有可移动的第二滑动滑架的活动式龙门架。

公开(公告)号：US20040222086A1

公开(公告)日：2004-11-11

申请号：US10338200

申请日：2003-01-07

发明人： Daniel J. Woodruff ,  Kyle M. Hanson ,  Robert W. Batz JR. ,  James T. Kuechmann

IPC分类号： C25C007/00 ,  C25B009/00 ,  C25F007/00 ,  C25D017/04 ,  C25D017/06 ,  C25D017/16 ,  B23H007/26 ,  B23H011/00

CPC分类号： H01L21/68728 ,  C25D17/001 ,  H01L21/68785

摘要： An apparatus for electroplating a workpiece is disclosed in which the apparatus includes a workpiece holding structure. The workpiece holding structure includes a workpiece support having at least one surface that is disposed to engage a front side of the workpiece and at least one electrical contact disposed for contact with at least one corresponding electrical contact on a back-side of the workpiece. The workpiece includes one or more electrically conductive paths between the at least one corresponding electrical contact and a front-side of the workpiece to facilitate electroplating of the front-side surface. An actuator is provided for driving the workpiece support between a first position in which the at least one electrical contact of the workpiece and the at least one contact of the workpiece holding structure are disengaged from one another, and a second position in which the at least one surface clamps the workpiece in a position in which the at least one electrical contact of the workpiece holding structure electrically engages the at least one electrical contact of the workpiece.

摘要翻译： 公开了一种用于电镀工件的设备，其中该设备包括工件保持结构。 工件保持结构包括具有至少一个表面的工件支撑件，所述至少一个表面设置成与工件的前侧相接合，以及至少一个电触点，该电触点设置成用于与工件的背面上的至少一个对应的电触点接触。 所述工件包括在所述至少一个对应的电触点和所述工件的前侧之间的一个或多个导电路径，以便于所述前侧表面的电镀。 提供致动器，用于在第一位置和第二位置之间驱动工件支撑件，在第一位置，工件的至少一个电触点与工件保持结构的至少一个触点彼此脱离，第二位置至少 一个表面将工件夹紧在其中工件保持结构的至少一个电接触与工件的至少一个电接触电接合的位置。

公开(公告)号：US20040163950A1

公开(公告)日：2004-08-26

申请号：US10758752

申请日：2004-01-15

发明人： Ismail Emesh

IPC分类号： B23H007/26

CPC分类号： C25D17/14 ,  B23H3/00 ,  C25D17/001 ,  H01L21/2885

摘要： An apparatus for performing an electrochemical process on a surface of a workpiece comprises a platen assembly comprising a support platen, an electrolyte distribution plate, and a first conductive layer intermediate the support platen and distribution plate and configured to be coupled to at least a first potential. A carrier is configured to carry the workpiece and position the workpiece proximate the electrolyte distribution plate. A reservoir delivers an electrolyte to the electrolyte distribution plate. At least one contact separate from the platen assembly engages a peripheral region of the workpiece for coupling the workpiece to a second potential.

摘要翻译： 一种用于在工件的表面上执行电化学过程的装置包括压板组件，该压板组件包括支撑压板，电解质分配板和位于支撑压板和分配板之间的第一导电层，并且被配置为耦合到至少第一电位 。 载体构造成承载工件并将工件定位在电解质分配板附近。 储存器将电解质递送到电解质分配板。 与压板组件分离的至少一个触点与工件的周边区域接合，以将工件耦合到第二电位。

公开(公告)号：US20040056004A1

公开(公告)日：2004-03-25

申请号：US10624341

申请日：2003-07-22

发明人： Stephan Aurich ,  Carsten Brandt ,  Wilhelm Frank ,  Rudiger Garn ,  Jens Hornig

IPC分类号： B23H001/00 ,  B23H007/26

CPC分类号： B23H7/105 ,  B23H7/265

摘要： An electrode guide and a method for the spark-erosion of workpieces are disclosed. The electrode guide (1), consisting of a two-piece prism-shaped (2, 3) guide with a pretensioning device (6), enables an electrode (4) to be guided in a play-free manner, thus allowing the production of bores that is accurate to within 1 nullm. A pivoting device (10) for pivoting the electrode guide and an alignment device (14) for the parallel displacement of the electrode guide (1) are also provided, enabling the production of conical bores.

摘要翻译： 公开了电极引导件和用于工件的火花腐蚀的方法。 电极引导件（1）由具有预张紧装置（6）的两件式棱柱形（2,3）引导件构成，能够以无游隙的方式引导电极（4），从而允许生产 的钻孔准确到1um以内。 还提供了用于使电极引导件枢转的枢转装置（10）和用于电极引导件（1）的平行移位的对准装置（14），使得能够生产锥形孔。

公开(公告)号：US20020148734A1

公开(公告)日：2002-10-17

申请号：US10102040

申请日：2002-03-19

发明人： Martin C. Bleck ,  Lyndon W. Graham ,  Kyle M. Hanson

IPC分类号： C25D007/12 ,  C25D017/04 ,  C25C007/00 ,  B23H007/26 ,  C25F007/00 ,  C25D011/32

CPC分类号： H01L21/68728 ,  H01L21/68785 ,  H01L21/68792

摘要： A semiconductor workpiece holder used in electroplating systems for plating metal layers onto a semiconductor workpieces, and is of particular advantage in connection with plating copper onto semiconductor materials. The workpiece holder includes electrode assemblies which have a contact part which connects to a distal end of an electrode shaft and bears against the workpiece and conducts current therebetween. The contact part is preferably made from a corrosion resistant material, such as platinum. The electrode assembly also preferably includes a dielectric layer which covers the distal end of the electrode shaft and seals against the contact part to prevent plating liquid from corroding the joint between these parts.

摘要翻译： 一种用于电镀系统中用于将金属层镀在半导体工件上的半导体工件保持器，并且在将铜电镀到半导体材料上方面具有特别的优点。 工件保持器包括电极组件，其具有接触部分，该接触部分连接到电极轴的远端并承受工件并在其间传导电流。 接触部分优选由诸如铂的耐腐蚀材料制成。 电极组件还优选包括覆盖电极轴的远端并密封接触部分的电介质层，以防止电镀液腐蚀这些部件之间的接合部。