公开(公告)号：US10676858B2

公开(公告)日：2020-06-09

申请号：US15358276

申请日：2016-11-22

申请人： IHI Corporation ,  IHI Machinery and Furnace Co., Ltd.

发明人： Kazuhiko Katsumata ,  Masatoshi Mitsuzuka ,  Osamu Sakamoto ,  Takahiro Nagata

IPC分类号： D06F43/08 ,  B08B3/00 ,  F28D7/10 ,  F28F1/40 ,  B01D5/00 ,  F28F3/04 ,  F28D1/04 ,  F28D7/02 ,  C23G5/00 ,  F28B1/02 ,  F28D1/06 ,  F28B9/08 ,  F28B9/04 ,  F28D21/00 ,  F28B9/02

摘要： The present disclosure provides a drying chamber (condenser) including a container having a steam intake opening, the condenser liquefying steam taken from the steam intake opening into the container, and the drying chamber including a cooling pipe which is disposed in the container and through which coolant circulates.

公开(公告)号：US20200016643A1

公开(公告)日：2020-01-16

申请号：US16485878

申请日：2018-02-19

申请人： MOLITEC STEEL CO., LTD.

发明人： Toshihiko TAKEMOTO ,  Takahiro TOKAI ,  Takuma FUKUDA

IPC分类号： B21B45/02 ,  B08B3/10 ,  C23G5/00

摘要： Provided are an oil removal system and an oil removal method with which good oil removal can be achieved, and a superheated steam generation device which can be used in the execution thereof. An oil removal device imparts, from a discharge part, superheated steam obtained by a superheated steam generation device to a treatment object, which includes oil on the surface thereof. The treatment object is set so that the surface temperature thereof is cooled by a cooling part so as to be lower than the superheated steam. Dew condensation is produced on the surface of treatment object by the discharge of the superheated steam from the discharge part, and the dew condensation is blown off and removed from the surface of the treatment object by a removal part, and thereby oil on the surface is removed together with the dew condensation.

公开(公告)号：US20190244786A1

公开(公告)日：2019-08-08

申请号：US16390319

申请日：2019-04-22

申请人： ASM IP Holding B.V.

发明人： Tom E. Blomberg ,  Varun Sharma ,  Suvi P. Haukka ,  Marko J. Tuominen ,  Chiyu Zhu

IPC分类号： H01J37/32 ,  C23F1/12 ,  H01L21/311 ,  C23G5/00

CPC分类号： H01J37/32009 ,  C23F1/12 ,  C23G5/00 ,  H01L21/31116 ,  H01L21/32135

摘要： Atomic layer etching (ALE) processes are disclosed. In some embodiments, the methods comprise at least one etch cycle in which the substrate is alternately and sequentially exposed to a first vapor phase non-metal halide reactant and a second vapor phase halide reactant. In some embodiments both the first and second reactants are chloride reactants. In some embodiments the first reactant is fluorinating gas and the second reactant is a chlorinating gas. In some embodiments a thermal ALE cycle is used in which the substrate is not contacted with a plasma reactant.

公开(公告)号：US10316390B2

公开(公告)日：2019-06-11

申请号：US15564332

申请日：2016-01-29

申请人： NITTAN VALVE CO., LTD. ,  SUKEGAWA ELECTRIC CO., LTD.

发明人： Shigeru Uchida ,  Ryo Onose ,  Koichi Homma ,  Kuniaki Miura ,  Masashige Hanawa

IPC分类号： B01D8/00 ,  C22B9/02 ,  C23G5/00 ,  B01D53/14 ,  C22B26/10 ,  C22B5/16 ,  C22B9/00 ,  F01L3/14

摘要： It is preferable that metallic sodium to be loaded to an engine valve used for an internal combustion engine such as automobile engine have high purity. However, conventionally, an organic solvent remaining in micropores on a surface of the metallic sodium have been hardly attracted attention. Provided is a method for purifying metallic sodium including steps of placing metallic sodium containing organic solvent in the micropores thereof in a melting tank which is sealed, and heating the melting tank under reduced pressure to vaporize and remove the organic solvent coating the metallic sodium.

公开(公告)号：US10293371B2

公开(公告)日：2019-05-21

申请号：US15285244

申请日：2016-10-04

申请人： FORD GLOBAL TECHNOLOGIES, LLC

发明人： Larry Paul Haack ,  Kimberly Ann Lazarz ,  Ann Marie Straccia ,  Joy Hines Forsmark

IPC分类号： B05D3/14 ,  B29C65/60 ,  B23K11/00 ,  B21J15/02 ,  F16B11/00 ,  F16B5/04 ,  F16B19/08 ,  B05D1/00 ,  B05D7/14 ,  B32B7/12 ,  B32B15/01 ,  B32B37/12 ,  C23G5/00

摘要： An assembly and a method of joining a first part with a second part at an attachment area that includes a localized area on the first part. The localized area is cleaned and activated by a plasma jet. An organosilicon composition is applied by plasma-enhanced chemical vapor deposition to the localized area. An adhesive is applied to the localized area and the second part is mechanically fastened to the first part in the localized area.

公开(公告)号：US10240230B2

公开(公告)日：2019-03-26

申请号：US14428959

申请日：2012-12-18

申请人： SEASTAR CHEMICALS INC.

发明人： Rajesh Odedra

IPC分类号： C23C16/44 ,  H01L21/02 ,  C23G5/00 ,  C23C14/56

摘要： The invention relates to the use of thionyl chloride and related materials for dry etching of internal surfaces of metalorganic vapor phase epitaxy (MOVPE) reactors to remove deposits. The method is also useful for the dry etching of process substrates within such reactors for cleaning and processing of those substrates. The invention may be particularly adaptable to chemical vapor deposition reactors used in the manufacture of high brightness LED's based on III-V semiconductors such as GaN and related materials. Features of the process include thermal, UV, and plasma activated dry cleaning, and the use of etchant gases such as COCl2, COBr2, COl2, SOl2, SOCl2, SOBr2, SO2Cl2, SO2Br2, NOCI, NOBr, NOl, S2Cl2, S2Br2, SCI2, SBr2, SOClBr, SOClF and SOFBr, either formed from neat materials or combinations of constituent gases such as CO, SO, SO2 or NO with halogens, to achieve the desired effect.

公开(公告)号：US20190027375A1

公开(公告)日：2019-01-24

申请号：US16143760

申请日：2018-09-27

申请人： The Chemours Company FC, LLC

发明人： Sheng Peng ,  Gary Loh ,  Yoshimasa Oosaki

IPC分类号： H01L21/311 ,  H01J37/32 ,  C09K13/00 ,  C09K13/08 ,  C23C16/44 ,  C23G5/00 ,  H01L21/3065

摘要： The present invention relates to fluoroolefin compositions useful as gases for CVD semiconductor manufacture, particularly for etching applications including methods for removing surface deposits from the interior of a chemical vapor deposition chamber by using an activated gas mixture, and methods for etching the surface of a semiconductor.

公开(公告)号：US10125426B1

公开(公告)日：2018-11-13

申请号：US14972110

申请日：2015-12-17

申请人： American International Materials, Inc.

发明人： Mei-Kao Liu ,  Eric Y. Liu ,  Jueguang Wang

IPC分类号： C21D9/08 ,  C23G5/00 ,  C22F1/10 ,  C21D9/00 ,  C21D1/26 ,  C21D1/767

摘要： A thermal scavenging system to remove remnant lubricants from interior of bright annealing steel tubes is provided. The system is retrofitted to bright annealing furnace with a conveyer belt and hydrogen gas source and comprises hydrogen-blowing rack, flexible rubber hoses and a lighter. The tubes are placed on the conveyer belt. The hydrogen-blowing rack comprises a hydrogen gas manifold and outlet nozzles connected to tailing ends of the tubes by flexible rubber hoses. At the leading ends of the tubes, a lighter ignites the hydrogen gas to insure all tubes are filled with hydrogen gas, instead of atmospheric air. Then rubber hoses are unplugged from the leading ends and the hydrogen-filled tubes are fed into the furnace for heat treatment. At high annealing temperature, lubricant remnants are burned off the tube's interior surfaces. A negative difference in atmospheric pressure, combustion products of hydrocarbons are scavenged out from the tailing ends.

公开(公告)号：US20160158817A1

公开(公告)日：2016-06-09

申请号：US14214404

申请日：2014-03-14

申请人： Mark S. Zediker ,  Brian O. Faircloth ,  Daryl L. Grubb ,  Paul D. Deutch

发明人： Mark S. Zediker ,  Brian O. Faircloth ,  Daryl L. Grubb ,  Paul D. Deutch

IPC分类号： B08B9/08 ,  B08B7/00 ,  C23G5/00

CPC分类号： B08B9/0865 ,  B08B7/0042 ,  C10G75/00 ,  C23G5/00

摘要： There are provides systems, methods and tools for delivering high power laser beams to selectively vaporizing contaminates in the surface layers of materials, and to remove these contaminates with minimal effect on the underlying substrate material. In particular, mercury contaminates can be removed in this manner.

摘要翻译： 提供了用于提供高功率激光束以选择性地蒸发材料表面层中的污染物的系统，方法和工具，并且以对基底材料的最小影响去除这些污染物。 特别地，可以以这种方式去除汞污染物。

公开(公告)号：US09353625B2

公开(公告)日：2016-05-31

申请号：US12352641

申请日：2009-01-13

申请人： Ansgar Luttermann ,  Alexander Stankowski ,  Karsten Bindernagel

发明人： Ansgar Luttermann ,  Alexander Stankowski ,  Karsten Bindernagel

IPC分类号： C23C16/00 ,  C23F1/00 ,  H01L21/306 ,  F01D5/00 ,  C23G5/00

CPC分类号： F01D5/005 ,  C23G5/00 ,  F05D2230/11

摘要： A device for cleaning oxidized or corroded components (26), especially gas turbine components which are exposed to hot gases, in the presence of a halogenous gas, includes a cleaning retort which is designed in the shape of a boiler or cylinder and into which, indirectly or directly, leads a feed line which is connected via a flow control unit to a gas reservoir which stores the halogenous gas, and in which a device for gas distribution is integrated. The flow control unit has a gas volume control valve (5), a heat exchanger unit (9), and also a gas volume measuring unit (6) in sequence along the throughflow direction of the halogenous gas which flows through the feed line. Furthermore, a gas distribution in the retort directs the halogenous gas directly to the components which are to be cleaned.

摘要翻译： 一种用于清洁氧化或腐蚀的部件（26）的设备，特别是在存在卤素气体的情况下暴露于热气体的燃气涡轮机部件，包括设计成锅炉或汽缸形式的清洗蒸馏器， 间接地或直接地将通过流量控制单元连接的进料管线引导到储存有卤素气体的气体储存器，并且其中集成了用于气体分配的装置。 流量控制单元具有气体量控制阀（5），热交换器单元（9），以及气体体积测量单元（6），其顺次沿着流过供给管线的卤素气体的流动方向。 此外，蒸馏器中的气体分布将卤素气体直接引导到待清洁的部件。