Plasma generator
    12.
    发明授权

    公开(公告)号:US10728997B2

    公开(公告)日:2020-07-28

    申请号:US16465191

    申请日:2017-11-21

    申请人: TDK CORPORATION

    摘要: A plasma generator capable of adjusting the amount of plasma generation in a simple configuration includes a control circuit controlling a frequency of an AC power supplied to a piezoelectric transformer and a control signal generation circuit providing a control signal to the control circuit. The plasma generator is configured so that the control signal output from the control signal generation circuit is appropriately adjusted. The control circuit controls the frequency of the AC power so as to bring a target value, which is set based on the control signal provided from the control signal generation circuit.

    Oscillator, electronic apparatus, and vehicle

    公开(公告)号:US10511259B2

    公开(公告)日:2019-12-17

    申请号:US15919701

    申请日:2018-03-13

    发明人: Naohisa Obata

    摘要: An oscillator includes a vibration element, an oscillation circuit configured to oscillate the vibration element and output an oscillation signal, a temperature sensor, a temperature compensation circuit configured to compensate for a frequency temperature characteristic of the vibration element based on an output signal of the temperature sensor. The vibration element is within a first case having a first atmosphere, and the oscillation circuit, the temperature sensor, and the first case are within a second case having a second atmosphere, whereby the first atmosphere has a higher thermal conductivity than the second atmosphere.

    Method for fabricating RF resonators and filters

    公开(公告)号:US10439581B2

    公开(公告)日:2019-10-08

    申请号:US15494904

    申请日:2017-04-24

    发明人: Dror Hurwitz

    摘要: A method of fabricating an RF filter comprising an array of resonators comprising the steps of: Obtaining a removable carrier with release layer; Growing a piezoelectric film on a removable carrier; Applying a first electrode to the piezoelectric film; Obtaining a backing membrane on a cover, with or without prefabricated cavities between the backing film and cover; Attaching the backing membrane to the first electrode; Detaching the removable carrier; Measuring and trimming the piezoelectric film as necessary; Selectively etching away the piezoelectric layer to fabricate discrete resonator islands; Etching down through coatings and backing membrane to a silicon dioxide layer between the backing membrane and the cover to form trenches; Applying a passivation layer into the trenches and around the piezoelectric islands; Depositing a second electrode layer over the piezoelectric film islands and surrounding passivation layer; Applying connections for subsequent electrical coupling to an interposer; Selectively removing second electrode material leaving coupled resonator arrays; Creating a gasket around perimeter of the resonator array; Thinning down cover to desired thickness; Optionally fabricating upper cavities between the backing membrane and cover by drilling holes through the cover and then selectively etching away the silicon dioxide; Dicing the wafer into flip chip single unit filter arrays; Obtaining an interposer; Optionally applying a dam to the interposer surface to halt overfill flow; Coupling the flip chip single unit filter array to pads of the interposer by reflow of the solder cap; Encapsulating with polymer underfill/overfill; and Singulating into separate filter modules.

    BAW sensor with passive mixing structures

    公开(公告)号:US10371667B2

    公开(公告)日:2019-08-06

    申请号:US15353060

    申请日:2016-11-16

    申请人: Qorvo US, Inc.

    发明人: Rio Rivas

    摘要: A fluidic device includes a base structure, a wall structure, and a cover structure bounding a fluidic passage containing a functionalized active region of at least one bulk acoustic wave (BAW) resonator structure. One or more of the wall structure, the cover structure, or a portion of the base structure includes multiple features (e.g., protrusions and/or recesses) configured to interact with fluid flowing within the fluidic passage to promote mixing between constituents of the fluid. Methods for fabricating a fluidic device, as well as methods for biological or chemical sensing using a fluidic device, are further provided.

    Process for Producing Ozone and Apparatus for Ozone Generation

    公开(公告)号:US20190098739A1

    公开(公告)日:2019-03-28

    申请号:US16083430

    申请日:2017-02-23

    申请人: EPCOS AG

    摘要: A process for producing ozone and an apparatus for ozone generation are disclosed. In an embodiment, a process for producing ozone includes applying an input voltage to an input area of a piezoelectric transformer so that a high voltage is generated in an output area of the piezoelectric transformer, surrounding the piezoelectric transformer with an oxygenic process gas so that the ozone is formed from the process gas by the high voltage generated in the output area, measuring an amount of the generated ozone using a sensor and adapting the input voltage applied to the piezoelectric transformer on a basis of the measured amount of the generated ozone in order to set an ozone generation rate.

    Device for Generating an Atmospheric-Pressure Plasma

    公开(公告)号:US20190053366A1

    公开(公告)日:2019-02-14

    申请号:US16077414

    申请日:2017-02-07

    申请人: EPCOS AG

    IPC分类号: H05H1/24 H01L41/107 H01L41/04

    摘要: A device for generating an atmospheric-pressure plasma is disclosed. In an embodiment the device includes a piezoelectric transformer comprising an input region and an output region, wherein the input region is designed to convert an applied alternating voltage into a mechanical oscillation, wherein the output region is designed to convert a mechanical oscillation into a voltage, and wherein the output region adjoins the input region in a longitudinal direction, a contact element fastened to the piezoelectric transformer, the contact element being designed to apply the alternating voltage to the input region and a holder, wherein the contact element is connected to the holder by a form-fit connection, in such a manner that a movement of the piezoelectric transformer in the longitudinal direction, relative to the holder, is prevented.