公开(公告)号：US20110269619A1

公开(公告)日：2011-11-03

申请号：US13090123

申请日：2011-04-19

Applicant: Guido Fridolin Verbeck ,  Stephen Davila

Inventor： Guido Fridolin Verbeck ,  Stephen Davila

IPC: B01J37/34 ,  C23C14/04 ,  B05C11/00 ,  C23C14/08 ,  C23C14/10 ,  C23C14/06 ,  C23C14/12 ,  C23C14/14

CPC classification number: C23C14/221 ,  B81C2201/112 ,  B82B3/00 ,  B82Y30/00 ,  B82Y40/00 ,  C23C14/04 ,  C23C14/12 ,  C23C14/28 ,  C23C14/54

Abstract: A soft-landing (SL) instrument for depositing ions onto substrates using a laser ablation source is described herein. The instrument of the instant invention is designed with a custom drift tube and a split-ring ion optic for the isolation of selected ions. The drift tube allows for the separation and thermalization of ions formed after laser ablation through collisions with an inert bath gas that allow the ions to be landed at energies below 1 eV onto substrates. The split-ring ion optic is capable of directing ions toward the detector or a landing substrate for selected components. The inventors further performed atomic force microscopy (AFM) and drift tube measurements to characterize the performance characteristics of the instrument.

Abstract translation: 本文描述了使用激光烧蚀源将离子沉积到衬底上的软着陆（SL）仪器。 本发明的仪器设计有用于分离选定离子的定制漂移管和分离环离子光学器件。 漂移管允许通过与允许离子以低于1eV的能量降落到基底上的惰性浴气碰撞在激光烧蚀之后形成的离子的分离和热化。 分裂环离子光学器件能够将离子引向检测器或用于选定部件的着陆衬底。 本发明人进一步进行原子力显微镜（AFM）和漂移管测量以表征仪器的性能特征。

公开(公告)号：US20110205615A1

公开(公告)日：2011-08-25

申请号：US13098292

申请日：2011-04-29

Applicant: Ming-Hau Tung ,  Lior Kogut

Inventor： Ming-Hau Tung ,  Lior Kogut

IPC: G02B26/00 ,  B05D5/06 ,  B05D3/10 ,  B05D1/36 ,  C23C16/44 ,  B05D5/00 ,  C23C14/34

CPC classification number: B81C1/00801 ,  B81B3/001 ,  B81B3/0072 ,  B81B2201/042 ,  B81C2201/0109 ,  B81C2201/017 ,  B81C2201/112 ,  B81C2201/115 ,  G02B26/001 ,  Y10T428/30 ,  Y10T428/31678 ,  Y10T428/31935

Abstract: Methods of forming a protective coating on one or more surfaces of a microelectromechanical device are disclosed comprising the steps of forming a composite layer of a sacrificial material and a protective material, and selectively etching the sacrificial material to form a protective coating. The protective coatings of the invention preferably improve one or more aspects of the performance of the microelectromechanical devices in which they are incorporated. Also disclosed are microelectromechanical devices formed by methods of the invention, and visual display devices incorporating such devices.

Abstract translation: 公开了在微机电装置的一个或多个表面上形成保护涂层的方法，其包括以下步骤：形成牺牲材料和保护材料的复合层，并选择性地蚀刻牺牲材料以形成保护涂层。 本发明的保护性涂层优选地改进了其中并入其中的微机电装置的性能的一个或多个方面。 还公开了通过本发明的方法形成的微机电装置以及包括这种装置的视觉显示装置。

公开(公告)号：US07952789B2

公开(公告)日：2011-05-31

申请号：US12719751

申请日：2010-03-08

Applicant: Ming-Hau Tung ,  Lior Kogut

Inventor： Ming-Hau Tung ,  Lior Kogut

IPC: G02B26/00 ,  G02F1/03

CPC classification number: B81C1/00801 ,  B81B3/001 ,  B81B3/0072 ,  B81B2201/042 ,  B81C2201/0109 ,  B81C2201/017 ,  B81C2201/112 ,  B81C2201/115 ,  G02B26/001 ,  Y10T428/30 ,  Y10T428/31678 ,  Y10T428/31935

Abstract: Methods of forming a protective coating on one or more surfaces of a microelectromechanical device are disclosed comprising the steps of forming a composite layer of a sacrificial material and a protective material, and selectively etching the sacrificial material to form a protective coating. The protective coatings of the invention preferably improve one or more aspects of the performance of the microelectromechanical devices in which they are incorporated. Also disclosed are microelectromechanical devices formed by methods of the invention, and visual display devices incorporating such devices.

Abstract translation: 公开了在微机电装置的一个或多个表面上形成保护涂层的方法，其包括以下步骤：形成牺牲材料和保护材料的复合层，并选择性地蚀刻牺牲材料以形成保护涂层。 本发明的保护性涂层优选地改进了其中并入其中的微机电装置的性能的一个或多个方面。 还公开了通过本发明的方法形成的微机电装置以及包括这种装置的视觉显示装置。

公开(公告)号：US20090200619A1

公开(公告)日：2009-08-13

申请号：US12029433

申请日：2008-02-11

Applicant: Jeff A. Ridley

Inventor： Jeff A. Ridley

IPC: H01L29/84 ,  H01L21/00

CPC classification number: B81C1/0096 ,  B81B3/001 ,  B81B2203/0361 ,  B81C2201/112 ,  Y10S438/951

Abstract: Systems and methods for MEMS device fabrication. A layer of photoresist is formed on a substrate. A first region of the substrate is exposed to a radiation source through a photomask. The first region of exposed photoresist is developed with a developer solution in order to etch the exposed regions to a first depth. A second region is exposed to radiation through a second photomask. The second photomask defines areas in which a bump feature is intended on the substrate. The second region is developed with the developer solution, preparing the first and second exposed regions for a layer of metal. A layer of metal is deposited on the substrate, such that the metal attaches to both the substrate and any remaining photoresist on the substrate. The remaining photoresist and its attached metal is dissolved away leaving an interconnect pattern and at least one bump feature.

Abstract translation: 用于MEMS器件制造的系统和方法。 在基板上形成一层光致抗蚀剂。 衬底的第一区域通过光掩模暴露于辐射源。 暴露的光致抗蚀剂的第一区域用显影剂溶液显影，以便将暴露的区域蚀刻到第一深度。 通过第二光掩模将第二区域暴露于辐射。 第二光掩模定义了在基板上预期凸起特征的区域。 用显影剂溶液显影第二区域，制备用于一层金属的第一和第二暴露区域。 金属层沉积在基板上，使得金属附着到基板和基板上的任何剩余的光致抗蚀剂。 剩余的光致抗蚀剂及其附着的金属被溶解掉，留下互连图案和至少一个凹凸特征。

公开(公告)号：US07459325B2

公开(公告)日：2008-12-02

申请号：US11029985

申请日：2005-01-05

Applicant: Simon Joshua Jacobs ,  Seth Adrian Miller

Inventor： Simon Joshua Jacobs ,  Seth Adrian Miller

IPC: H01L21/00

CPC classification number: G02B1/14 ,  B81B3/0005 ,  B81C1/0096 ,  B81C2201/112 ,  B82Y30/00 ,  G02B1/105 ,  G02B26/0833 ,  H01L23/26 ,  H01L2924/0002 ,  H01L2924/00

Abstract: Organic surfactants are employed to passivate the surfaces of MEMS devices, such as digital micromirrors. The binding of these surfactants to the surface is improved by first associating with the surface transition metal atoms or ions from Groups IVB, VB, and IVB of the periodic table.

Abstract translation: 有机表面活性剂用于钝化MEMS器件的表面，例如数字微镜。 这些表面活性剂与表面的结合通过首先与元素周期表的IVB，VB和IVB族元素的表面过渡金属原子或离子缔合来改善。

公开(公告)号：US20080248613A1

公开(公告)日：2008-10-09

申请号：US11862178

申请日：2007-09-26

Applicant: Dongmin Chen ,  William Spencer Worley ,  Hung-Nan Chen

Inventor： Dongmin Chen ,  William Spencer Worley ,  Hung-Nan Chen

IPC: H01L21/54

CPC classification number: B81C1/0096 ,  B81B3/0005 ,  B81B2201/042 ,  B81C2201/112 ,  G02B26/0833

Abstract: A micromechanical device assembly includes a micromechanical device enclosed within a processing region and a lubricant channel formed through an interior wall of the processing region and in fluid communication with the processing region. Lubricant is injected into the lubricant channel via capillary forces and held therein via surface tension of the lubricant against the internal surfaces of the lubrication channel. The lubricant channel containing the lubricant provides a ready supply of fresh lubricant to prevent stiction from occurring between interacting components of the micromechanical device disposed within the processing region.

Abstract translation: 微机械装置组件包括封闭在处理区域内的微机械装置和通过处理区域的内壁形成并与处理区域流体连通的润滑剂通道。 润滑剂通过毛细管力注入润滑剂通道并通过润滑剂的表面张力保持在润滑通道的内表面上。 包含润滑剂的润滑剂通道提供了新鲜的润滑剂的容易供应，以防止在设置在处理区域内的微机械装置的相互作用的部件之间发生静电。

公开(公告)号：US07410820B2

公开(公告)日：2008-08-12

申请号：US11031655

申请日：2005-01-05

Applicant: Simon Joshua Jacobs ,  Seth Adrian Miller

Inventor： Simon Joshua Jacobs ,  Seth Adrian Miller

IPC: H01L21/00

CPC classification number: B81B3/0005 ,  B81B2201/042 ,  B81C2201/112 ,  B82Y30/00

Abstract: Phosphonate surfactants are employed to passivate the surfaces of MEMS devices, such as digital micromirror devices. The surfactants are adsorbed from vapor or solution to form self-assembled monolayers at the device surface. The higher binding energy of the phosphonate end groups (as compared to carboxylate surfactants) improves the thermal stability of the resulting layer.

Abstract translation: 磷酸盐表面活性剂用于钝化MEMS器件的表面，例如数字微镜器件。 表面活性剂从蒸气或溶液中吸附，在器件表面形成自组装的单层膜。 膦酸酯端基（与羧酸酯表面活性剂相比）的较高的结合能改善了所得层的热稳定性。

公开(公告)号：US20080116554A1

公开(公告)日：2008-05-22

申请号：US11562403

申请日：2006-11-21

Applicant: Shaoher X. Pan

Inventor： Shaoher X. Pan

IPC: H01L23/02 ,  H01L21/02

CPC classification number: B81B3/0005 ,  B81C1/00992 ,  B81C2201/0181 ,  B81C2201/112

Abstract: A method for applying anti-stiction material to a micro device includes encapsulating a micro device in a chamber, vaporizing anti-stiction material in a container to form vaporized anti-stiction material, transferring the vaporized anti-stiction material from the container to the chamber, and depositing the vaporized anti-stiction material on a surface of the micro device.

Abstract translation: 将抗静电材料施加到微型装置的方法包括将微型装置封装在室中，将容器内的抗静电材料蒸发以形成蒸发的抗静电材料，将蒸发的抗静电材料从容器转移到室 ，并将蒸发的抗静电材料沉积在微型装置的表面上。

公开(公告)号：US20080108163A1

公开(公告)日：2008-05-08

申请号：US11541993

申请日：2006-10-02

Applicant: Chien-Hua Chen ,  Paul Felice Reboa ,  Charles C. Haluzak

Inventor： Chien-Hua Chen ,  Paul Felice Reboa ,  Charles C. Haluzak

IPC: H01L21/00

CPC classification number: B81C1/00849 ,  B81C2201/112 ,  B81C2203/0145

Abstract: A method for preparing a microelectomechanical system (MEMS) device for subsequent processing is disclosed. The method includes establishing an anti-stiction material on exposed surfaces of the MEMS device. The exposed surfaces include at least an interior surface of a chamber and an external surface of the MEMS device. The anti-stiction material is selectively removed from at least a portion of the external surface via a plasma sputtering process under controlled conditions.

Abstract translation: 公开了一种用于制备用于后续处理的微机电系统（MEMS）装置的方法。 该方法包括在MEMS器件的暴露表面上建立抗静电材料。 暴露的表面包括至少室的内表面和MEMS装置的外表面。 在受控条件下，通过等离子体溅射工艺，从外表面的至少一部分选择性地除去抗静电材料。

公开(公告)号：US20070215965A1

公开(公告)日：2007-09-20

申请号：US11596343

申请日：2004-12-20

Applicant: Woo Seok Yang ,  Sung Kang ,  Youn Kim

Inventor： Woo Seok Yang ,  Sung Kang ,  Youn Kim

IPC: H01L29/84

CPC classification number: B81C1/00952 ,  B81C2201/112

Abstract: Provided is a micro-mechanical structure and method for manufacturing the same, including a hydrophilic surface on at least a part of a surface of the micro-mechanical structure, so as to prevent generation of an adhesion phenomenon in the process of removing a sacrificial layer to release the micro-mechanical, wherein the sacrificial layer comes into contact with the surface of the micro-mechanical structure.

Abstract translation: 提供了一种微机械结构及其制造方法，其包括在微机械结构的表面的至少一部分上的亲水表面，以防止在去除牺牲层的过程中产生粘附现象 以释放微机械，其中牺牲层与微机械结构的表面接触。