公开(公告)号：US20060077126A1

公开(公告)日：2006-04-13

申请号：US11078025

申请日：2005-03-11

Applicant: Manish Kothari

Inventor： Manish Kothari

IPC: G09G3/04

CPC classification number: B81B7/04 ,  B81B2201/045 ,  G02B26/001 ,  G02F1/13336 ,  G09G3/3466 ,  G09G2300/026 ,  G09G2300/06

Abstract: Apparatus and methods for arranging devices having a reduced area between adjacent devices are provided. In an exemplary embodiment, display devices in an array are provided wherein a gap between the display devices is reduced to less than or equal to ⅛th of a pixel pitch. Exemplary embodiments use wire bonding to provide an electrical connection to an active area of the display to components on the display backplate, thereby reducing the ledge area and gap between display devices in an interconnected array.

Abstract translation: 提供了用于布置在相邻设备之间具有减小的面积的设备的设备和方法。 在示例性实施例中，提供阵列中的显示装置，其中显示装置之间的间隙减小到小于或等于像素间距的1/8以上。 示例性实施例使用引线接合来提供与显示器背板上的部件的显示器的有效区域的电连接，由此减小了互连阵列中的突出区域和显示设备之间的间隙。

公开(公告)号：US07022249B2

公开(公告)日：2006-04-04

申请号：US10467174

申请日：2002-02-13

Applicant: Serge Valette

Inventor： Serge Valette

IPC: B29D11/00 ,  H01L21/00

CPC classification number: B81B3/0062 ,  B81B2201/045 ,  B81B2203/0181 ,  B81B2203/058 ,  G02B26/0841

Abstract: A method for manufacturing an optical micro-mirror including a fixed part and a moveable part, with a reflection device connected to the fixed part by an articulation mechanism. This method realizes a stack including a mechanical substrate, a first layer of thermal oxidation material, and at least one second layer of material for forming the moveable part, realizes the articulation mechanism, realizes the reflection device on the second layer, realizes the moveable part by etching of at least the second layer of material, and eliminates the thermal oxidation layer to liberate the moveable part. Such an optical micro-mirror may find possible applications to optical routing or image projection systems.

Abstract translation: 一种用于制造包括固定部分和可移动部分的光学微镜的方法，其中反射装置通过铰接机构连接到固定部分。 该方法实现了包括机械衬底，第一层热氧化材料层和用于形成可移动部件的至少一个第二材料层的堆叠，实现了关节运动机构，实现了第二层上的反射装置，实现了可移动部分 通过蚀刻至少第二层材料，并且消除热氧化层以释放可移动部件。 这种光学微镜可以发现可能的应用于光路由或图像投影系统。

公开(公告)号：US07002730B2

公开(公告)日：2006-02-21

申请号：US10473532

申请日：2002-04-18

Applicant: Tohru Ishizuya ,  Keiichi Akagawa

Inventor： Tohru Ishizuya ,  Keiichi Akagawa

IPC: G02B26/08 ,  G02F1/29

CPC classification number: G02B26/0841 ,  B81B3/0062 ,  B81B2201/032 ,  B81B2201/045 ,  B81B2203/053 ,  B81B2203/055 ,  B81B2203/058

Abstract: The mirror device has a mirror 2, and a supporting mechanism which elastically supports the mirror 2 on a substrate 1 in a state in which the mirror floats from the substrate 1, so that the mirror can be inclined in an arbitrary direction. The supporting mechanism has three supporting parts 3A, 3B and 3C that mechanically connect the substrate 1 and mirror 2. Each of the supporting parts 3A, 3B and 3C has one or more plate spring parts 5 that are constructed from a thin film consisting of one or more layers. One end portion of each plate spring part 5 is connected to the substrate 1 via a leg part 9 which has a rising part that rises from the substrate 1. The other end portion of the plate spring part 5 is mechanically connected to the mirror 2 via a connecting part which has a rising part that rises from this other end portion. The mirror 2 is supported on the substrate 1 only via the plate spring part 5 of the respective 3A, 3B and 3C. As a result, compactness and mass production characteristics can be greatly improved while maintaining superior optical characteristics.

Abstract translation: 镜装置具有反射镜2和支撑机构，其以反射镜从基板1浮起的状态将基板1上的反射镜2弹性支撑，使得反射镜能够在任意方向上倾斜。 支撑机构具有机械地连接基板1和反射镜2的三个支撑部分3A，3B和3C。 每个支撑部分3A，3B和3C具有一个或多个由一层或多层构成的薄膜构成的板簧部分5。 每个板簧部分5的一个端部经由腿部9连接到基板1，腿部9具有从基板1上升的上升部分。 板簧部5的另一端部经由具有从该另一端部上升的上升部的连接部与镜2机械连接。 反射镜2仅通过相应的3A，3B和3C的板簧部分5支撑在基板1上。因此，可以在保持优异的光学特性的同时，大大提高紧凑性和批量生产特性。

公开(公告)号：US06989582B2

公开(公告)日：2006-01-24

申请号：US10456319

申请日：2003-06-06

Applicant: Jeffry Joseph Sniegowski ,  Murray Steven Rodgers

Inventor： Jeffry Joseph Sniegowski ,  Murray Steven Rodgers

IPC: H01L23/544

CPC classification number: H01L23/544 ,  B81B2201/045 ,  B81C1/00873

Abstract: The present invention generally relates to a die perimeter region of a die having a microelectromechanical assembly fabricated thereon. This die perimeter region may be configured to facilitate electrically interconnecting adjacent die on a wafer. Moreover, this die perimeter region may be configured to facilitate separating the die from a wafer.

公开(公告)号：US20050260782A1

公开(公告)日：2005-11-24

申请号：US11192621

申请日：2005-07-28

Applicant: James Hunter

Inventor： James Hunter

IPC: G02B26/08 ,  B81B3/00 ,  B81C1/00 ,  H01L21/00

CPC classification number: G02B26/0833 ,  B81B2201/045 ,  B81C1/00531 ,  B81C2201/0132 ,  G02B26/0841

Abstract: In one embodiment, a micro device is formed by depositing a sacrificial layer over a metallic electrode, forming a moveable structure over the sacrificial layer, and then etching the sacrificial layer with a noble gas fluoride. Because the metallic electrode is comprised of a metallic material that also serves as an etch stop in the sacrificial layer etch, charge does not appreciably build up in the metallic electrode. This helps stabilize the driving characteristic of the moveable structure. In one embodiment, the moveable structure is a ribbon in a light modulator.

Abstract translation: 在一个实施例中，通过在金属电极上沉积牺牲层来形成微器件，在牺牲层上形成可移动结构，然后用惰性气体氟化物蚀刻牺牲层。 因为金属电极由在牺牲层蚀刻中也用作蚀刻停止层的金属材料组成，所以电荷在金属电极中不会明显地积聚。 这有助于稳定可移动结构的驱动特性。 在一个实施例中，可移动结构是光调制器中的带状物。

公开(公告)号：US06960305B2

公开(公告)日：2005-11-01

申请号：US10402777

申请日：2003-03-28

Applicant: Jonathan C. Doan ,  Satyadev R. Patel ,  Andrew G. Huibers ,  Jason S. Reid

Inventor： Jonathan C. Doan ,  Satyadev R. Patel ,  Andrew G. Huibers ,  Jason S. Reid

IPC: B81C1/00 ,  C23F1/00

CPC classification number: C23F4/00 ,  B81B2201/045 ,  B81C1/00476 ,  C03C17/36 ,  C03C17/3663 ,  G02B26/0841 ,  H01L21/32135

Abstract: A method for making a spatial light modulator is disclosed, that comprises forming an array of micromirrors each having a hinge and a micromirror plate held via the hinge on a substrate, the micromirror plate being disposed in a plane separate from the hinge and having a hinge made of a transition metal nitride, followed by releasing the micromirrors in a spontaneous gas phase chemical etchant. Also disclosed is a projection system that comprises such a spatial light modulator, as well as a light source, condensing optics, wherein light from the light source is focused onto the array of micromirrors, projection optics for projecting light selectively reflected from the array of micromirrors onto a target, and a controller for selectively actuating the micromirrors in the array.

Abstract translation: 公开了一种用于制造空间光调制器的方法，其包括形成各自具有铰链的微镜阵列和通过所述铰链保持在基板上的微镜板，所述微镜板设置在与所述铰链分离的平面中并且具有铰链 由过渡金属氮化物制成，然后在自发气相化学蚀刻剂中释放微反射镜。 还公开了一种投影系统，其包括这样的空间光调制器以及光源，聚光光学器件，其中来自光源的光聚焦到微镜阵列上，用于投射从微镜阵列反射的光的投影光学器件 以及用于选择性地致动阵列中的微镜的控制器。

公开(公告)号：US06958123B2

公开(公告)日：2005-10-25

申请号：US10167272

申请日：2002-06-10

Applicant: Jason S. Reid ,  Nungavaram S. Viswanathan

Inventor： Jason S. Reid ,  Nungavaram S. Viswanathan

IPC: B81B3/00 ,  C23F1/00 ,  H01L21/00

CPC classification number: B81C1/00476 ,  B81B2201/045 ,  B81C2201/0108 ,  B81C2201/112 ,  B81C2201/117 ,  B82Y30/00

Abstract: A method comprises depositing an organic material on a substrate; depositing additional material different from the organic material after depositing the organic material; and removing the organic material with a compressed fluid. Also disclosed is a method comprising: providing an organic layer on a substrate; after providing the organic layer, providing one or more layers of a material different than the organic material of the organic layer; removing the organic layer with a compressed fluid; and providing an anti-stiction agent with a compressed fluid to material remaining after removal of the organic layer.

Abstract translation: 一种方法包括在衬底上沉积有机材料; 在沉积有机材料之后沉积与有机材料不同的附加材料; 并用压缩流体除去有机材料。 还公开了一种方法，包括：在衬底上提供有机层; 在提供有机层之后，提供与有机层的有机材料不同的一层或多层材料; 用压缩流体去除有机层; 并且在去除有机层之后向剩余的材料提供具有压缩流体的抗静电剂。

公开(公告)号：US06942811B2

公开(公告)日：2005-09-13

申请号：US09954864

申请日：2001-09-17

Applicant: Satyadev R. Patel ,  Gregory P. Schaadt ,  Douglas B. MacDonald ,  Hongqin Shi

Inventor： Satyadev R. Patel ,  Gregory P. Schaadt ,  Douglas B. MacDonald ,  Hongqin Shi

IPC: B44C1/22 ,  B81B3/00 ,  C03C15/00 ,  C03C25/68 ,  C23F1/00 ,  C23F1/08 ,  C23F1/12

CPC classification number: B81B3/00 ,  B81B2201/045 ,  B81C1/00476 ,  B81C1/00531 ,  B81C1/00595 ,  B81C99/0025 ,  B81C2201/0138 ,  B82Y30/00 ,  H01L21/3065 ,  H01L21/3081 ,  H01L21/32135

Abstract: The etching of a sacrificial silicon portion in a microstructure such as a microelectromechanical structure by the use of etchant gases that are noble gas fluorides or halogen fluorides is performed with greater selectivity toward the silicon portion relative to other portions of the microstructure by slowing the etch rate. The etch rate is preferably 30 um/hr or less, and can be 3 um/hr or even less. The selectivity is also improved by the addition of non-etchant gaseous additives to the etchant gas. Preferably the non-etchant gaseous additives that have a molar-averaged formula weight that is below that of molecular nitrogen offer significant advantages over gaseous additives of higher formula weights by causing completion of the etch in a shorter period of time while still achieving the same improvement in selectivity. The etch process is also enhanced by the ability to accurately determine the end point of the removal step. A vapor phase etchant is used to remove a material that has been deposited on a substrate, with or without other deposited structure thereon. By creating an impedance at the exit of an etching chamber (or downstream thereof), as the vapor phase etchant passes from the etching chamber, a gaseous product of the etching reaction is monitored, and the end point of the removal process can be determined. The vapor phase etching process can be flow through, a combination of flow through and pulse, or recirculated back to the etching chamber. Also, the etch selectivity can be improved by doping the sacrificial material.

Abstract translation: 通过使用作为惰性气体氟化物或卤素氟化物的蚀刻剂气体在诸如微机电结构的微结构中蚀刻牺牲硅部分，相对于微结构的其它部分，通过减慢蚀刻速率对硅部分具有更大的选择性 。 蚀刻速率优选为30um / hr或更小，并且可以为3um / hr或甚至更小。 通过向蚀刻剂气体中添加非蚀刻剂气体添加剂也提高了选择性。 优选地，具有低于分子氮的摩尔平均配方重量的非蚀刻剂气态添加剂相对于具有较高配方重量的气体添加剂提供了显着的优点，通过在更短的时间段内完成蚀刻，同时仍然实现相同的改进 选择性。 通过精确确定去除步骤的终点的能力也可以增强蚀刻工艺。 气相蚀刻剂用于去除已经沉积在基底上的材料，其上具有或不具有其它沉积结构。 通过在蚀刻室（或其下游）的出口处产生阻抗，当气相蚀刻剂从蚀刻室通过时，监测蚀刻反应的气态产物，并且可以确定去除过程的终点。 气相蚀刻工艺可以流过，流过和脉冲的组合，或再循环回蚀刻室。 此外，通过掺杂牺牲材料可以改善蚀刻选择性。

公开(公告)号：US20050194840A1

公开(公告)日：2005-09-08

申请号：US11069184

申请日：2005-02-28

Applicant: Keiichi Mori ,  Yoshichika Kato ,  Satoshi Yoshida ,  Kenji Kondou ,  Yoshihiko Hamada ,  Osamu Imaki

Inventor： Keiichi Mori ,  Yoshichika Kato ,  Satoshi Yoshida ,  Kenji Kondou ,  Yoshihiko Hamada ,  Osamu Imaki

IPC: G02B26/08 ,  B81B3/00 ,  B81C1/00 ,  H02H3/18

CPC classification number: B81C1/00825 ,  B81B7/0029 ,  B81B2201/045 ,  B81B2203/033 ,  G02B26/0841 ,  Y10T29/49 ,  Y10T29/49002 ,  Y10T307/865

Abstract: In a microminiature moving device that has disposed, on a single-crystal silicon substrate, movable elements (a movable rod 46, a movable comb electrode 49, etc.) displaceable in parallel to the substrate surface and stationary parts (a stationary part 40a, etc.), the stationary parts are fixedly secured to the single-crystal silicon substrate 61 with an insulating layer 62 sandwiched therebetween, and depressions 64 are formed in those surface regions of the single-crystal silicon substrate 61 where no stationary parts are present, and the movable parts are positioned above the depressions 64. The depressions 64 form gaps 50 large enough to prevent foreign bodies from causing troubles such as malfunction of the movable parts and shoring.

Abstract translation: 在微单元移动装置中，在单晶硅基板上设置可移动的元件（可移动的杆46，可移动梳状电极49等），其可平行于基底表面和静止部分（静止部分40a 等），固定部分固定地固定在单晶硅衬底61上，绝缘层62夹在其间，并且在单晶硅衬底61的不存在固定部分的那些表面区域形成凹陷64 并且可动部件位于凹部64的上方。凹部64形成足够大的间隙50，以防止异物引起诸如可移动部件和支撑物的故障等麻烦。

公开(公告)号：US20050164127A1

公开(公告)日：2005-07-28

申请号：US11041834

申请日：2005-01-24

Applicant: Jason Reid ,  Nungavaram Viswanathan

Inventor： Jason Reid ,  Nungavaram Viswanathan

IPC: B81B3/00 ,  G03C5/00

CPC classification number: B81C1/00476 ,  B81B2201/045 ,  B81C2201/0108 ,  B81C2201/112 ,  B81C2201/117 ,  B82Y30/00

Abstract: A method comprises depositing an organic material on a substrate; depositing additional material different from the organic material after depositing the organic material; and removing the organic material with a compressed fluid. Also disclosed is a method comprising: providing an organic layer on a substrate; after providing the organic layer, providing one or more layers of a material different than the organic material of the organic layer; removing the organic layer with a compressed fluid; and providing an anti-stiction agent with a compressed fluid to material remaining after removal of the organic layer.