Non-linear actuator suspension for microelectromechanical systems
    1.
    发明授权
    Non-linear actuator suspension for microelectromechanical systems 有权
    用于微机电系统的非线性致动器悬架

    公开(公告)号:US06894420B2

    公开(公告)日:2005-05-17

    申请号:US10099893

    申请日:2002-03-14

    CPC classification number: H02N1/008

    Abstract: The present invention is generally directed to a method and assembly for supporting an actuation apparatus (e.g. a movable electrostatic comb) of a microelectromechanical (MEM) system. A suspension assembly of the present invention generally resists actuation forces inherent to electrostatically controlled MEM systems by utilizing an opposingly-directed non-linear tensile force. This can be accomplished by utilizing a suspension assembly of the invention including a longitudinal center beam and a plurality of first and second lateral beams extending out from lateral sides of the center beam. When the center beam of the suspension assembly is drawn in a first direction due to the actuation force(s), either or both of the plurality of first lateral beams and the plurality of second lateral beams are stretched to exert a non-linear tensile force having a force vector component generally oriented in a second direction generally opposite the first direction.

    Abstract translation: 本发明一般涉及用于支撑微机电(MEM)系统的致动装置(例如,可动静电梳)的方法和组件。 本发明的悬架组件通常利用相对定向的非线性拉力来抵抗静电控制的MEM系统固有的致动力。 这可以通过利用本发明的悬架组件来实现,该悬架组件包括纵向中心梁和从中心梁的横向侧面延伸出的多个第一和第二横梁。 当由于致动力使悬架组件的中心梁沿第一方向拉动时,多个第一横梁和多个第二横梁中的任一个或两个被拉伸以发挥非线性拉力 具有通常沿与第一方向相反的第二方向定向的力矢量分量。

    Self-shadowing MEM structures
    3.
    发明授权
    Self-shadowing MEM structures 失效
    自遮蔽MEM结构

    公开(公告)号:US06824278B2

    公开(公告)日:2004-11-30

    申请号:US10098266

    申请日:2002-03-15

    Abstract: Self-shadowed microelectromechanical structures such as self-shadowed bond pads, fuses and compliant members and a method of fabricating self-shadowing microelectromechanical structures that anticipate and accommodate blanket metalization process steps are disclosed. In one embodiment, a self-shadowed bond pad (10) configured for shadowing an exposed end (44A) of a shielded interconnect line (44) connected to the bond pad (10) from undesired metalization during a metalization fabrication process step includes electrically connected overlaying first, second and third bond pad areas (42, 72, 92) patterned from respective first, second and third layers (40, 70, 90) of material deposited on a substrate (20). The exposed end (44A) of the interconnect line (44) abuts an edge of the first bond pad area (42). The third bond pad area (92) includes at least one tab portion (94) extending laterally from an edge of the third bond pad area (92) to shadow an area on the substrate (20) including the exposed end (44A) of the interconnect line (44) abutting the edge of the first bond pad area (42).

    Abstract translation: 公开了自遮蔽微电子机械结构,例如自遮盖接合焊盘,熔断器和柔性元件,以及制造预期并适应覆盖金属化工艺步骤的自阴影微机电结构的方法。 在一个实施例中,被配置用于遮蔽在金属化制造工艺步骤期间连接到接合焊盘(10)的屏蔽互连线(44)的暴露端(44A)与不期望的金属化的自阴影接合焊盘(10A),电连接 覆盖从沉积在衬底(20)上的材料的相应的第一,第二和第三层(40,70,90)构图的第一,第二和第三接合焊盘区域(42,72,92)。 互连线(44)的露出端(44A)邻接第一接合焊盘区域(42)的边缘。 第三接合焊盘区域(92)包括从第三接合焊盘区域(92)的边缘横向延伸的至少一个突片部分(94),以遮蔽包括基板(20)的暴露端部(44A)的区域 互连线(44)邻接第一接合焊盘区域(42)的边缘。

    Apparatus to position a microelectromechanical platform
    4.
    发明授权
    Apparatus to position a microelectromechanical platform 失效
    用于定位微机电平台的装置

    公开(公告)号:US06624548B1

    公开(公告)日:2003-09-23

    申请号:US09964922

    申请日:2001-09-26

    CPC classification number: H02N1/008

    Abstract: The present invention comprises a microelectromechanical positioner to achieve substantially translational positioning of a platform without rotational motion, thereby maintaining a constant angular orientation of the platform during movement. A linkage mechanism of the positioner can comprise parallelogram linkages to constrain the rotational motion of the platform. Such linkages further can comprise flexural hinges or other turning joints at the linkage pivots to eliminate the need for rubbing surfaces. A plurality of the linkage mechanisms can be used to enable translational motion of the platform with two degrees of freedom. A variety of means can be used to actuate the positioner. Independent actuation of the anchor links of the linkage mechanisms with rotary electrostatic actuators can be used to provide controlled translational movement of the platform.

    Abstract translation: 本发明包括微机电定位器,以实现平台的基本平移定位而无需旋转运动,从而在运动期间保持平台的恒定的角度定向。 定位器的连杆机构可以包括平行四边形连杆以约束平台的旋转运动。 这种连接件还可以包括在连接枢轴处的弯曲铰链或其他转动接头,以消除对摩擦表面的需要。 可以使用多个连杆机构来实现平台具有两个自由度的平移运动。 可以使用各种手段来驱动定位器。 连杆机构与旋转式静电执行机构的锚固连接件的独立驱动可用于提供平台受控的平移运动。

    Low voltage control of MEM actuators
    5.
    发明授权
    Low voltage control of MEM actuators 有权
    MEM执行器的低压控制

    公开(公告)号:US06621681B2

    公开(公告)日:2003-09-16

    申请号:US10012827

    申请日:2001-12-05

    CPC classification number: G02B26/0841

    Abstract: A low voltage method and system for controlling electrically activated microelectromechanical (MEM) actuators such as electrostatic comb actuators in reflective microstructure positioning systems are provided. In one embodiment, a low voltage control system (110) includes a single fixed DC voltage source (14) and a plurality of variable DC voltage sources (16). The fixed DC voltage source (14) is electrically connected to commonly connected first terminals (12a) of a plurality of MEM actuators (12) between the MEM actuators (12) and a reference potential (18). Each variable DC voltage source (16) is associated with a separate MEM actuator (12) and is electrically connected between the reference potential (18) and a second terminal (12b) of its associated MEM actuator (12). The fixed DC voltage source supplies a fixed DC voltage that is common to the MEM actuators (12). Each variable DC source (16) supplies a controllable DC voltage to its associated MEM actuator (12). The fixed and controllable voltages are selected to permit control of the variable DC voltage sources (16) using inexpensive control electronics.

    Abstract translation: 提供了用于控制电激活微机电(MEM)致动器的低电​​压方法和系统,例如反射微结构定位系统中的静电梳状致动器。 在一个实施例中,低压控制系统(110)包括单个固定DC电压源(14)和多个可变直流电压源(16)。 固定直流电压源(14)电连接到MEM致动器(12)和参考电位(18)之间的多个MEM致动器(12)的共同连接的第一端子(12a)。 每个可变直流电压源(16)与单独的MEM致动器(12)相关联,并且电连接在其相关的MEM致动器(12)的参考电位(18)和第二端子(12b)之间。 固定的DC电压源提供与MEM致动器(12)通用的固定DC电压。 每个可变直流电源(16)向其相关的MEM致动器(12)提供可控的直流电压。 选择固定和可控电压以允许使用廉价的控制电子装置来控制可变直流电压源(16)。

    Microkeratome blade with arbitrary blade angle
    7.
    发明授权
    Microkeratome blade with arbitrary blade angle 失效
    任意刀片角度的小角刀刀片

    公开(公告)号:US07060081B2

    公开(公告)日:2006-06-13

    申请号:US10431003

    申请日:2003-05-07

    Abstract: A cutting blade (56) having a cutting edge (80) defined by an intersection of a first cutting edge surface (72) and a second cutting edge surface (66) is disclosed. The angle between the first cutting edge surface (72) and the second cutting edge surface (66) defines a blade angle (θ). The blade (56) may be fabricated from a wafer (130) by an anisotropic etch. An upper surface (134) of the wafer (130) is defined by a first set of 3 Miller indices, where at least one individual Miller index of this first set has an absolute value greater than 3. A top surface (60) of the blade (56) is defined by part of the upper surface (134) of the wafer (130). The anisotropic etch proceeds until reaching a particular crystallographic plane to define the first cutting edge surface (72). Having the top surface (60) of the blade (56) defined by the noted set of 3 Miller indices increases the potential that a blade angle (θ) of a desired magnitude may be realized.

    Abstract translation: 公开了一种具有由第一切削刃表面(72)和第二切削刃表面(66)的交点限定的切削刃(80)的切削刃(56)。 第一切削刃表面(72)和第二切削刃表面(66)之间的角度限定刀片角度(θ)。 刀片(56)可以通过各向异性蚀刻由晶片(130)制成。 晶片(130)的上表面(134)由第一组3米勒指数定义,其中该第一组的至少一个单独的米勒指数具有大于3的绝对值。顶表面(60) 刀片(56)由晶片(130)的上表面(134)的一部分限定。 各向异性蚀刻进行到达到特定的结晶平面以限定第一切削刃表面(72)。 具有由所述的3米勒指数所定义的叶片(56)的顶表面(60)增加可以实现期望幅度的叶片角度(θ)的电位。

    Multi-fixture assembly of cutting tools
    8.
    发明授权
    Multi-fixture assembly of cutting tools 失效
    多功能组装切割工具

    公开(公告)号:US06993818B2

    公开(公告)日:2006-02-07

    申请号:US10390488

    申请日:2003-03-17

    Abstract: Multiple cutting blades (56) are fabricated from a wafer (130). This wafer (130) is disposed on a blade handle mounting fixture (224) such that a blade handle (24) maybe mounted on each of the individual blades (56). A cutting edge (80) of each blade (56) is maintained in spaced relation to the fixture (224) as these blade handles (24) are being mounted. Thereafter, the wafer (130) is transferred to a blade separation fixture (300). Each blade 56 is suspended above the fixture (300). An appropriate force is transmitted to the individual blades (56) to separate the same from the wafer (130). Separation preferably occurs before the blade (56) contacts the fixture (300). Thereafter, the blade (56) in effect pivots into an inclined position where its cutting edge (80) projects at least generally upwardly. Preferably, at no time does the cutting edge (80) of any blade (56) contact either the blade handle mounting fixture (224) or the blade separation fixture (300).

    Abstract translation: 多个切割刀片(56)由晶片(130)制成。 该晶片(130)设置在刀柄安装夹具(224)上,使得刀片柄(24)可以安装在每个单独刀片(56)上。 当这些叶片手柄(24)正在安装时,每个叶片(56)的切割边缘(80)保持与夹具(224)间隔开。 此后,将晶片(130)转移到叶片分离固定装置(300)。 每个叶片56悬挂在固定装置(300)上方。 适当的力传递到各个叶片(56)以将其从晶片(130)分离。 分离优选在刀片(56)接触夹具(300)之前进行。 此后,刀片56实际上枢转到其切割刃(80)至少大致向上突出的倾斜位置。 优选地,任何叶片(56)的切割刃(80)不随时接触刀柄安装夹具(224)或刀片分离固定件(300)。

    Particle filter for microelectromechanical systems
    9.
    发明授权
    Particle filter for microelectromechanical systems 有权
    微机电系统的粒子滤波器

    公开(公告)号:US06875257B2

    公开(公告)日:2005-04-05

    申请号:US10223987

    申请日:2002-08-20

    CPC classification number: B81B7/0012 Y10T428/12674

    Abstract: A particle filter for microelectromechanical systems is provided that includes a particle trap formed on a substrate material. The particle trap includes an array of multidimensional geometric structures in an adjacent relationship. The geometric structures further define a plurality of multidimensional voids therebetween for trapping particles therein. The individual multidimensional geometric structures are formed by a plurality of vertically interconnected geometric shapes to define different configurations of voids between the adjacent geometric structures. In one embodiment of the filter system, an electrical bias is applied to the array of multidimensional geometric structures to facilitate attracting and trapping of particles in the filter.

    Abstract translation: 提供了一种用于微机电系统的颗粒过滤器,其包括形成在基底材料上的颗粒捕集器。 颗粒捕获器包括在相邻关系中的多维几何结构的阵列。 几何结构还在其间限定了多个多维空隙,用于在其中捕获颗粒。 单个多维几何结构由多个垂直互连的几何形状形成,以限定相邻几何结构之间的空隙的不同构型。 在过滤器系统的一个实施例中,电偏压被施加到多维几何结构的阵列以便于吸引和捕获过滤器中的颗粒。

    Microelectromechnical system for tilting a platform
    10.
    发明授权
    Microelectromechnical system for tilting a platform 有权
    用于倾斜平台的微机电系统

    公开(公告)号:US06847152B2

    公开(公告)日:2005-01-25

    申请号:US10697385

    申请日:2003-10-30

    CPC classification number: B81B3/0062 B33Y80/00 H02N1/006 H02N1/008

    Abstract: The present invention provides a MEM system (10) having a platform (14) that is both elevatable from the substrate (12) on which it is fabricated and tiltable with one, two or more degrees of freedom with respect to the substrate (12). In one embodiment, the MEM system (10) includes the platform (14), a pair of A-frame structures (40), and two pairs of actuators (30) formed on the substrate (12). Ends (46A) of rigid members (46) extending from apexes (40A) of the A-frame structures (40) are attached to the platform (14) by compliant members (48A, 48B). The platform (14) is also attached to the substrate (12) by a compliant member (48C). The A-frame structures (40) are separately pivotable about bases (40B) thereof. Each pair of actuators (30) is coupled through a yoke (32) and displacement multiplier (34) to one of the A-frame structures (40) and is separately operable to effect pivoting of the A-frame structures (40) with respect to the substrate (12) by equal or unequal angular amounts. Upon pivoting, the A-frame structures (40) act as lever arms to both lift the platform (14) and tilt the platform (14) with respect to the substrate (12) with at least one degree of freedom. Since the platform (14) lifts up from the surface of the substrate (12), it may be tilted at large angles with respect to the substrate (12).

    Abstract translation: 本发明提供了一种具有平台(14)的MEM系统(10),该平台可从其上制造并可相对于基板(12)的一个或多个自由度倾斜的基板(12)升高, 。 在一个实施例中,MEM系统(10)包括平台(14),一对A框架结构(40)和形成在基板(12)上的两对致动器(30)。 从A框架结构(40)的顶点(40A)延伸的刚性构件(46)的端部(46A)通过柔性构件(48A,48B)附接到平台(14)。 平台(14)也通过顺应构件(48C)附接到基板(12)。 A框架结构(40)可以围绕其基部(40B)分开枢转。 每对致动器(30)通过轭(32)和位移乘法器(34)耦合到A框架结构(40)中的一个,并且可单独地操作以实现A框架结构(40)相对于 通过相等或不相等的角度量到基板(12)。 在枢转时,A框架结构(40)用作杠杆臂,以提升平台(14)并且以至少一个自由度相对于基板(12)倾斜平台(14)。 由于平台(14)从基板(12)的表面上升,所以可以相对于基板(12)以大的角度倾斜。

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