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    Magnetic recording medium and method of manufacturing the same
    21.
    发明授权
    Magnetic recording medium and method of manufacturing the same 有权
    磁记录介质及其制造方法

    公开(公告)号：US08003163B2

    公开(公告)日：2011-08-23

    申请号：US11748566

    申请日：2007-05-15

    Applicant: Du-hyun Lee ,  Seong-yong Yoon ,  Jin-seung Sohn ,  Byung-kyu Lee

    Inventor： Du-hyun Lee ,  Seong-yong Yoon ,  Jin-seung Sohn ,  Byung-kyu Lee

    IPC: G11B5/82

    CPC classification number: G11B5/82 ,  B82Y10/00 ,  G11B5/65 ,  G11B5/743 ,  G11B5/855

    Abstract: Provided are a magnetic recording medium and a method of manufacturing the magnetic recording medium. The magnetic recording medium includes a substrate, a soft magnetic underlayer formed on the substrate, a texturing layer formed on the soft magnetic underlayer and including a uniform pattern, and a recording layer including magnetic grains and a non-magnetic boundary region isolating the magnetic grains. The magnetic grains and the non-magnetic boundary region of the recording layer are formed into a regular granular structure by segregation according to the regular pattern of the texturing layer. Therefore, a regular granular structure can be formed in the recording layer without a process such as etching of the recording layer, so that the recording density of the magnetic recording medium can be largely improved.

    Abstract translation: 提供磁记录介质和制造磁记录介质的方法。 磁记录介质包括基板，形成在基板上的软磁性底层，形成在软磁性底层上的包含均匀图案的纹理层，以及包括磁性颗粒和磁性颗粒隔离的非磁性边界区域的记录层 。 根据纹理层的规则图案，记录层的磁性颗粒和非磁性边界区域通过偏析形成规则的颗粒结构。 因此，可以在记录层中形成规则的颗粒结构，而不需要诸如蚀刻记录层的处理，从而可以大大提高磁记录介质的记录密度。

    Soft template with alignment mark
    22.
    发明授权
    Soft template with alignment mark 有权
    具有对准标记的软模板

    公开(公告)号：US07858010B2

    公开(公告)日：2010-12-28

    申请号：US11945400

    申请日：2007-11-27

    Applicant: Eun-hyoung Cho ,  Sung-hoon Choa ,  Jin-seung Sohn ,  Du-hyun Lee ,  Hae-sung Kim

    Inventor： Eun-hyoung Cho ,  Sung-hoon Choa ,  Jin-seung Sohn ,  Du-hyun Lee ,  Hae-sung Kim

    IPC: G03F1/00

    CPC classification number: G03F9/7084 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/7076 ,  G03F9/708 ,  H01L2924/0002 ,  H01L2924/00

    Abstract: A pattern template includes a flexible substrate, a template mold formed on the flexible substrate to include a pattern, and an alignment mark, the alignment mark has a greater refractive index than that of the template mold. The template is manufactured by providing a master template including a pattern area, coating resin for mold in the pattern area, forming a template mold by installing a flexible plate on the resin for mold and curing the resin for mold by radiating UV rays, separating the template mold and the master template, coating a metal thin film on the template mold, and forming an alignment mark at both sides of the template mold.

    Abstract translation: 图案模板包括柔性基板，形成在柔性基板上以包括图案的模板模具和对准标记，对准标记具有比模板模具更大的折射率。 该模板通过在图案区域中提供包括图案区域，模具用涂料树脂，模塑模板，通过在模具树脂上安装柔性板并通过辐射紫外线固化模具来分离模板来制造模板 模板模具和主模板，在模板模具上涂覆金属薄膜，并在模板模具的两面形成对准标记。

    SOFT TEMPLATE WITH ALIGNMENT MARK
    23.
    发明申请
    SOFT TEMPLATE WITH ALIGNMENT MARK 有权
    具有对准标记的软模板

    公开(公告)号：US20080131791A1

    公开(公告)日：2008-06-05

    申请号：US11945400

    申请日：2007-11-27

    Applicant: Eun-hyoung Cho ,  Sung-hoon Choa ,  Jin-seung Sohn ,  Du-hyun Lee ,  Hae-sung Kim

    Inventor： Eun-hyoung Cho ,  Sung-hoon Choa ,  Jin-seung Sohn ,  Du-hyun Lee ,  Hae-sung Kim

    IPC: G03F1/00

    CPC classification number: G03F9/7084 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/7076 ,  G03F9/708 ,  H01L2924/0002 ,  H01L2924/00

    Abstract: A pattern template includes a flexible substrate, a template mold formed on the flexible substrate to include a pattern, and an alignment mark, the alignment mark has a greater refractive index than that of the template mold. The template is manufactured by providing a master template including a pattern area, coating resin for mold in the pattern area, forming a template mold by installing a flexible plate on the resin for mold and curing the resin for mold by radiating UV rays, separating the template mold and the master template, coating a metal thin film on the template mold, and forming an alignment mark at both sides of the template mold.

    Abstract translation: 图案模板包括柔性基板，形成在柔性基板上以包括图案的模板模具和对准标记，对准标记具有比模板模具更大的折射率。 该模板通过在图案区域中提供包括图案区域，模具用涂料树脂，模塑模板，通过在模具树脂上安装柔性板并通过辐射紫外线固化模具来分离模板来制造模板 模板模具和主模板，在模板模具上涂覆金属薄膜，并在模板模具的两面形成对准标记。

    Method of manufacturing nanoimprint stamp
    24.
    发明授权
    Method of manufacturing nanoimprint stamp 有权
    制造纳米压印印花的方法

    公开(公告)号：US08603349B2

    公开(公告)日：2013-12-10

    申请号：US13170766

    申请日：2011-06-28

    Applicant: Byung-kyu Lee ,  Du-hyun Lee ,  Woong Ko

    Inventor： Byung-kyu Lee ,  Du-hyun Lee ,  Woong Ko

    IPC: B44C1/22 ,  C03C15/00 ,  C03C25/68 ,  C23F1/00

    CPC classification number: B41C1/02 ,  B29C33/3842 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/0015

    Abstract: Methods of manufacturing a nanoimprint stamp are provided. The method may include forming a pattern on a surface of a master substrate, depositing an etch barrier layer on a surface of a stamp substrate, coating a photoresist on one of the surfaces of the master substrate and the stamp substrate on which an etch barrier layer is formed, forming a photoresist pattern by pressing the master substrate against the stamp substrate, forming a hard mask by etching the etch barrier layer using the photoresist pattern, and etching the stamp substrate using the hard mask as an etch mask.

    Abstract translation: 提供制造纳米压印印模的方法。 该方法可以包括在母板的表面上形成图案，在印模基板的表面上沉积蚀刻阻挡层，在主基板和印模基板的一个表面上涂覆光致抗蚀剂，在其上具有蚀刻阻挡层 形成光刻胶图案，通过将母版基板压靠在印模基板上，通过使用光致抗蚀剂图案蚀刻蚀刻阻挡层形成硬掩模，并使用硬掩模作为蚀刻掩模蚀刻印模基板。

    Imprinting Stamp And Nano-Imprinting Method Using The Same
    27.
    发明申请
    Imprinting Stamp And Nano-Imprinting Method Using The Same 有权
    印刷邮票和使用它的纳米印刷方法

    公开(公告)号：US20130147096A1

    公开(公告)日：2013-06-13

    申请号：US13617874

    申请日：2012-09-14

    Applicant: Ki-yeon YANG ,  Woong KO ,  Jae-kwan KIM ,  Du-hyun LEE ,  Byung-kyu LEE

    Inventor： Ki-yeon YANG ,  Woong KO ,  Jae-kwan KIM ,  Du-hyun LEE ,  Byung-kyu LEE

    IPC: B29C59/02 ,  B29C35/08

    CPC classification number: G03F7/0002 ,  B29C59/022 ,  B82Y10/00 ,  B82Y40/00 ,  Y10S977/887

    Abstract: An imprinting stamp and a nano-imprinting method using the imprinting stamp are provided. The imprinting stamp includes a first substrate; one or more field regions on the first substrate, the first substrate including nano-patterns; and a first dummy pattern region on the first substrate and adjacent to the field region, the dummy pattern region including first dummy patterns having greater dimensions than that of the nano-patterns, the first dummy patterns being a plurality of polygons, each of the polygons having a vertex pointing in a first direction proceeding from the field region toward the first dummy pattern region.

    Abstract translation: 提供使用印记印记的印记印记和纳米印记法。 印记印模包括第一基板; 所述第一基板上的一个或多个场区域，所述第一基板包括纳米图案; 以及在所述第一基板上并与所述场区域相邻的第一虚拟图案区域，所述虚设图案区域包括具有比所述纳米图案的尺寸大的第一虚拟图案，所述第一虚设图案是多个多边形，每个所述多边形 具有指向从场区域朝向第一虚拟图案区域的第一方向的顶点。

    Dual-side imprinting lithography system
    30.
    发明授权
    Dual-side imprinting lithography system 有权
    双面压印光刻系统

    公开(公告)号：US07798802B2

    公开(公告)日：2010-09-21

    申请号：US12035702

    申请日：2008-02-22

    Applicant: Eun-hyoung Cho ,  Sung-hoon Choa ,  Jin-seung Sohn ,  Du-hyun Lee

    Inventor： Eun-hyoung Cho ,  Sung-hoon Choa ,  Jin-seung Sohn ,  Du-hyun Lee

    IPC: B29C59/00 ,  B29B13/08

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    Abstract: Provided is a dual-side imprinting lithography system that includes a medium supporting unit that supports a medium wherein both surfaces of the medium are coated with a ultraviolet (UV) hardening resin; a first mold supporting unit and a second mold supporting unit that respectively support a first mold and a second mold, disposed respectively above the medium supporting unit and under the medium supporting unit; a vertical moving device that moves vertically at least one of the medium supporting unit, the first mold supporting unit, and the second mold supporting unit; a first UV radiating device that is installed above the first mold supporting unit to radiate UV rays; and a second UV radiating device that is installed under the second mold supporting unit to radiate UV rays.

    Abstract translation: 提供了一种双面压印光刻系统，其包括支撑介质的介质支撑单元，其中介质的两个表面都涂覆有紫外线（UV）硬化树脂; 第一模具支撑单元和第二模具支撑单元，其分别支撑分别位于介质支撑单元的上方和介质支撑单元下方的第一模具和第二模具; 垂直移动装置，其垂直移动介质支撑单元，第一模具支撑单元和第二模具支撑单元中的至少一个; 第一UV辐射装置，其安装在第一模具支撑单元上方以辐射紫外线; 以及第二UV辐射装置，其安装在所述第二模具支撑单元的下方以辐射紫外线。

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