Imprinting stamp and nano-imprinting method using the same
    3.
    发明授权
    Imprinting stamp and nano-imprinting method using the same 有权
    印记邮票和使用相同的纳米印记法

    公开(公告)号:US09360751B2

    公开(公告)日:2016-06-07

    申请号:US13617874

    申请日:2012-09-14

    摘要: An imprinting stamp and a nano-imprinting method using the imprinting stamp are provided. The imprinting stamp includes a first substrate; one or more field regions on the first substrate, the first substrate including nano-patterns; and a first dummy pattern region on the first substrate and adjacent to the field region, the dummy pattern region including first dummy patterns having greater dimensions than that of the nano-patterns, the first dummy patterns being a plurality of polygons, each of the polygons having a vertex pointing in a first direction proceeding from the field region toward the first dummy pattern region.

    摘要翻译: 提供使用印记印记的印记印记和纳米印记法。 印记印模包括第一基板; 所述第一基板上的一个或多个场区域,所述第一基板包括纳米图案; 以及在所述第一基板上并且与所述场区域相邻的第一虚设图案区域,所述虚设图案区域包括具有比所述纳米图案的尺寸更大的尺寸的第一虚设图案,所述第一虚设图案是多个多边形,每个所述多边形 具有指向从场区域朝向第一虚拟图案区域的第一方向的顶点。

    Imprinting Stamp And Nano-Imprinting Method Using The Same
    6.
    发明申请
    Imprinting Stamp And Nano-Imprinting Method Using The Same 有权
    印刷邮票和使用它的纳米印刷方法

    公开(公告)号:US20130147096A1

    公开(公告)日:2013-06-13

    申请号:US13617874

    申请日:2012-09-14

    IPC分类号: B29C59/02 B29C35/08

    摘要: An imprinting stamp and a nano-imprinting method using the imprinting stamp are provided. The imprinting stamp includes a first substrate; one or more field regions on the first substrate, the first substrate including nano-patterns; and a first dummy pattern region on the first substrate and adjacent to the field region, the dummy pattern region including first dummy patterns having greater dimensions than that of the nano-patterns, the first dummy patterns being a plurality of polygons, each of the polygons having a vertex pointing in a first direction proceeding from the field region toward the first dummy pattern region.

    摘要翻译: 提供使用印记印记的印记印记和纳米印记法。 印记印模包括第一基板; 所述第一基板上的一个或多个场区域,所述第一基板包括纳米图案; 以及在所述第一基板上并与所述场区域相邻的第一虚拟图案区域,所述虚设图案区域包括具有比所述纳米图案的尺寸大的第一虚拟图案,所述第一虚设图案是多个多边形,每个所述多边形 具有指向从场区域朝向第一虚拟图案区域的第一方向的顶点。