Methods of fabricating nanoimprint stamp
    6.
    发明授权
    Methods of fabricating nanoimprint stamp 失效
    制造纳米压印印章的方法

    公开(公告)号:US08562842B2

    公开(公告)日:2013-10-22

    申请号:US13181660

    申请日:2011-07-13

    IPC分类号: B44C1/22 C23F1/02

    摘要: A method of fabricating a nanoimprint stamp includes forming a resist pattern having a nano size width on a stamp substrate by performing imprint processes repeatedly. In the imprint processes, resist layers that are selectively etched are sequentially used. The stamp substrate is etched using the resist pattern as an etch mask.

    摘要翻译: 制造纳米压印印模的方法包括通过重复进行压印处理,在印模基板上形成具有纳米尺寸宽度的抗蚀剂图案。 在压印工艺中,依次使用被选择性蚀刻的抗蚀剂层。 使用抗蚀剂图案作为蚀刻掩模蚀刻印模基板。

    Method Of Manufacturing Nanoimprint Stamp
    7.
    发明申请
    Method Of Manufacturing Nanoimprint Stamp 有权
    制造纳米印记邮票的方法

    公开(公告)号:US20120152887A1

    公开(公告)日:2012-06-21

    申请号:US13170766

    申请日:2011-06-28

    IPC分类号: B29C33/42 B82Y30/00

    摘要: Methods of manufacturing a nanoimprint stamp are provided. The method may include forming a pattern on a surface of a master substrate, depositing an etch barrier layer on a surface of a stamp substrate, coating a photoresist on one of the surfaces of the master substrate and the stamp substrate on which an etch barrier layer is formed, forming a photoresist pattern by pressing the master substrate against the stamp substrate, forming a hard mask by etching the etch barrier layer using the photoresist pattern, and etching the stamp substrate using the hard mask as an etch mask.

    摘要翻译: 提供制造纳米压印印模的方法。 该方法可以包括在母板的表面上形成图案,在印模基板的表面上沉积蚀刻阻挡层,在主基板和印模基板的一个表面上涂覆光致抗蚀剂,在其上具有蚀刻阻挡层 形成光刻胶图案,通过将母版基板压靠在印模基板上,通过使用光致抗蚀剂图案蚀刻蚀刻阻挡层形成硬掩模,并使用硬掩模作为蚀刻掩模蚀刻印模基板。

    Magnetic recording medium and method of manufacturing the same
    9.
    发明授权
    Magnetic recording medium and method of manufacturing the same 有权
    磁记录介质及其制造方法

    公开(公告)号:US08003163B2

    公开(公告)日:2011-08-23

    申请号:US11748566

    申请日:2007-05-15

    IPC分类号: G11B5/82

    摘要: Provided are a magnetic recording medium and a method of manufacturing the magnetic recording medium. The magnetic recording medium includes a substrate, a soft magnetic underlayer formed on the substrate, a texturing layer formed on the soft magnetic underlayer and including a uniform pattern, and a recording layer including magnetic grains and a non-magnetic boundary region isolating the magnetic grains. The magnetic grains and the non-magnetic boundary region of the recording layer are formed into a regular granular structure by segregation according to the regular pattern of the texturing layer. Therefore, a regular granular structure can be formed in the recording layer without a process such as etching of the recording layer, so that the recording density of the magnetic recording medium can be largely improved.

    摘要翻译: 提供磁记录介质和制造磁记录介质的方法。 磁记录介质包括基板,形成在基板上的软磁性底层,形成在软磁性底层上的包含均匀图案的纹理层,以及包括磁性颗粒和磁性颗粒隔离的非磁性边界区域的记录层 。 根据纹理层的规则图案,记录层的磁性颗粒和非磁性边界区域通过偏析形成规则的颗粒结构。 因此,可以在记录层中形成规则的颗粒结构,而不需要诸如蚀刻记录层的处理,从而可以大大提高磁记录介质的记录密度。

    Imprinting stamp and nano-imprinting method using the same
    10.
    发明授权
    Imprinting stamp and nano-imprinting method using the same 有权
    印记邮票和使用相同的纳米印记法

    公开(公告)号:US09360751B2

    公开(公告)日:2016-06-07

    申请号:US13617874

    申请日:2012-09-14

    摘要: An imprinting stamp and a nano-imprinting method using the imprinting stamp are provided. The imprinting stamp includes a first substrate; one or more field regions on the first substrate, the first substrate including nano-patterns; and a first dummy pattern region on the first substrate and adjacent to the field region, the dummy pattern region including first dummy patterns having greater dimensions than that of the nano-patterns, the first dummy patterns being a plurality of polygons, each of the polygons having a vertex pointing in a first direction proceeding from the field region toward the first dummy pattern region.

    摘要翻译: 提供使用印记印记的印记印记和纳米印记法。 印记印模包括第一基板; 所述第一基板上的一个或多个场区域,所述第一基板包括纳米图案; 以及在所述第一基板上并且与所述场区域相邻的第一虚设图案区域,所述虚设图案区域包括具有比所述纳米图案的尺寸更大的尺寸的第一虚设图案,所述第一虚设图案是多个多边形,每个所述多边形 具有指向从场区域朝向第一虚拟图案区域的第一方向的顶点。