Apparatus for making epitaxial film
    21.
    发明授权
    Apparatus for making epitaxial film 有权
    用于制造外延膜的装置

    公开(公告)号:US07905197B2

    公开(公告)日:2011-03-15

    申请号:US12607776

    申请日:2009-10-28

    Abstract: An apparatus for growing an epitaxial film and transferring it to an assembly substrate is disclosed. The film growth and transfer are made using an epitaxy lateral overgrowth technique. The formed epitaxial film on an assembly substrate can be further processed to form devices such as solar cell, light emitting diode, and other devices and assembled into higher integration of desired applications.

    Abstract translation: 公开了一种用于生长外延膜并将其转移到组件衬底的装置。 膜生长和转移使用外延侧向过度生长技术进行。 可以进一步处理组装衬底上形成的外延膜以形成诸如太阳能电池,发光二极管和其它器件的器件,并组装成所需应用的更高集成度。

    Apparatus for Making Epitaxial Film
    22.
    发明申请
    Apparatus for Making Epitaxial Film 有权
    外延膜制造装置

    公开(公告)号:US20100101725A1

    公开(公告)日:2010-04-29

    申请号:US12607776

    申请日:2009-10-28

    Abstract: An apparatus for growing an epitaxial film and transferring it to an assembly substrate is disclosed. The film growth and transfer are made using an epitaxy lateral overgrowth technique. The formed epitaxial film on an assembly substrate can be further processed to form devices such as solar cell, light emitting diode, and other devices and assembled into higher integration of desired applications.

    Abstract translation: 公开了一种用于生长外延膜并将其转移到组件衬底的装置。 膜生长和转移使用外延侧向过度生长技术进行。 可以进一步处理组装衬底上形成的外延膜以形成诸如太阳能电池,发光二极管和其它器件的器件,并组装成所需应用的更高集成度。

    Method of forming epitaxial semiconductor structure
    26.
    发明授权
    Method of forming epitaxial semiconductor structure 有权
    形成外延半导体结构的方法

    公开(公告)号:US08507371B2

    公开(公告)日:2013-08-13

    申请号:US13487610

    申请日:2012-06-04

    Abstract: A method of growing an epitaxial semiconductor structure is disclosed. The growth and transfer are made using an epitaxy lateral overgrowth technique. The formed epitaxial film on an assembly substrate can be further processed to form devices such as solar cell, light emitting diode, and other devices and assembled into higher integration of desired applications.

    Abstract translation: 公开了一种生长外延半导体结构的方法。 生长和转移使用外延侧向过度生长技术进行。 可以进一步处理组装衬底上形成的外延膜以形成诸如太阳能电池,发光二极管和其它器件的器件,并组装成所需应用的更高集成度。

    Apparatus for making epitaxial film
    27.
    发明授权
    Apparatus for making epitaxial film 有权
    用于制造外延膜的装置

    公开(公告)号:US08430056B2

    公开(公告)日:2013-04-30

    申请号:US13047360

    申请日:2011-03-14

    Abstract: An apparatus for growing an epitaxial film and transferring it to an assembly substrate is disclosed. The film growth and transfer are made using an epitaxy lateral overgrowth technique. The formed epitaxial film on an assembly substrate can be further processed to form devices such as solar cell, light emitting diode, and other devices and assembled into higher integration of desired applications.

    Abstract translation: 公开了一种用于生长外延膜并将其转移到组件衬底的装置。 膜生长和转移使用外延侧向过度生长技术进行。 可以进一步处理组装衬底上形成的外延膜以形成诸如太阳能电池,发光二极管和其它器件的器件,并组装成所需应用的更高集成度。

    Method of Forming Epitaxial Based Integrated Circuit
    28.
    发明申请
    Method of Forming Epitaxial Based Integrated Circuit 有权
    形成基于外延的集成电路的方法

    公开(公告)号:US20120238084A1

    公开(公告)日:2012-09-20

    申请号:US13487772

    申请日:2012-06-04

    Abstract: A method of growing an epitaxial semiconductor structure is disclosed. The growth and transfer are made using an epitaxy lateral overgrowth technique. The formed epitaxial film on an assembly substrate can be further processed to form devices such as solar cell, light emitting diode, and other devices and assembled into higher integration of desired applications.

    Abstract translation: 公开了一种生长外延半导体结构的方法。 生长和转移使用外延侧向过度生长技术进行。 可以进一步处理组装衬底上形成的外延膜以形成诸如太阳能电池,发光二极管和其它器件的器件,并组装成所需应用的更高集成度。

    Method of Forming Epitaxial Semiconductor Structure
    29.
    发明申请
    Method of Forming Epitaxial Semiconductor Structure 有权
    形成外延半导体结构的方法

    公开(公告)号:US20120238083A1

    公开(公告)日:2012-09-20

    申请号:US13487610

    申请日:2012-06-04

    Abstract: A method of growing an epitaxial semiconductor structure is disclosed. The growth and transfer are made using an epitaxy lateral overgrowth technique. The formed epitaxial film on an assembly substrate can be further processed to form devices such as solar cell, light emitting diode, and other devices and assembled into higher integration of desired applications.

    Abstract translation: 公开了一种生长外延半导体结构的方法。 生长和转移使用外延侧向过度生长技术进行。 可以进一步处理组装衬底上形成的外延膜以形成诸如太阳能电池,发光二极管和其它器件的器件,并组装成所需应用的更高集成度。

    Method of Transferring Epitaxial Film
    30.
    发明申请
    Method of Transferring Epitaxial Film 有权
    传输外延膜的方法

    公开(公告)号:US20120238079A1

    公开(公告)日:2012-09-20

    申请号:US13487574

    申请日:2012-06-04

    Abstract: A method of growing an epitaxial film and transferring it to an assembly substrate is disclosed. The film growth and transfer are made using an epitaxy lateral overgrowth technique. The formed epitaxial film on an assembly substrate can be further processed to form devices such as solar cell, light emitting diode, and other devices and assembled into higher integration of desired applications.

    Abstract translation: 公开了一种生长外延膜并将其转移到组件衬底的方法。 膜生长和转移使用外延侧向过度生长技术进行。 可以进一步处理组装衬底上形成的外延膜以形成诸如太阳能电池,发光二极管和其它器件的器件,并组装成所需应用的更高集成度。

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