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21.发明授权Method of generating a photolithography patterning device, computer program, patterning device, method of determining the position of a target image on or proximate a substrate, measurement device, and lithographic apparatus 有权产生光刻图案形成装置的方法，计算机程序，图案形成装置，确定基板上或附近的目标图像的位置的方法，测量装置和光刻装置公开(公告)号：US07960074B2
公开(公告)日：2011-06-14
申请号：US11345629
申请日：2006-02-02
Applicant: Uwe Mickan , Hendricus Johannes Maria Meijer
Inventor： Uwe Mickan , Hendricus Johannes Maria Meijer
CPC classification number: G03F7/70433 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F7/70283 , G03F7/70666 , G03F9/7003 , G03F9/7076 , G03F9/7088
Abstract: A method of generating a photolithography patterning device for transferring a pattern formed in the patterning device onto a substrate utilizing a lithographic projection apparatus includes defining features within the pattern formed in the device, wherein the features have dimensions and orientations chosen to create a desired image on the substrate during pattern transfer; and adjusting the dimensions of the features to compensate the desired image for displacement and dimension errors introduced by the effective shadow angle of the radiation on the features during pattern transfer or correlated to the position of the features within the exposure slit during pattern transfer. A measurement device for determining the position of a target image on or proximate a substrate in a lithographic projection apparatus, wherein the target image is formed by features on a patterning device, includes a detector configured to measure the position of the target image on or proximate the substrate, wherein the detector compensates the measured position of the target image for displacement and dimension errors introduced by the effective shadow angle of the radiation on the features of the patterning device during pattern transfer or correlated to the position of the features within the exposure slit during pattern transfer. A lithographic apparatus includes a measurement device.
Abstract translation: 使用光刻投影装置产生用于将形成在图案形成装置中的图案转印到基板上的光刻图案形成装置的方法包括限定在所述装置中形成的图案内的特征，其中所述特征具有选择的尺寸和取向以在 图案转印时的基板; 并且调整特征的尺寸以补偿在图案转印期间由辐射对特征的有效阴影角度引入的位移和尺寸误差所需的图像，或者与图案转印期间的曝光缝隙内的特征位置相关。 一种测量装置，用于在光刻投影设备中确定目标图像在基板上或其附近的位置，其中所述目标图像由图案形成装置上的特征形成，所述测量装置包括检测器，所述检测器被配置为测量所述目标图像在或近似的位置 所述基板，其中所述检测器补偿所述目标图像的测量位置，并且通过所述辐射的有效阴影角度在所述图案转印期间对所述图案形成装置的特征引入的尺寸误差或与所述曝光缝隙内的所述特征的位置相关联 在图案转移期间。 光刻设备包括测量装置。
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公开(公告)号：US09482966B2
公开(公告)日：2016-11-01
申请号：US13615190
申请日：2012-09-13
Applicant: Joeri Lof , Erik Theodorus Maria Bijlaart , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk
Inventor： Joeri Lof , Erik Theodorus Maria Bijlaart , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk
CPC classification number: G03F7/70858 , G03F7/70341 , G03F7/70716 , G03F7/70775 , G03F7/7085
Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
Abstract translation: 公开了一种光刻投影装置，其中投影系统和基板之间的空间填充有液体。 边缘密封构件至少部分地围绕衬底台面上的衬底或其它物体，以防止衬底或其他物体的边缘部分例如成像或照亮时的液体损失。 光刻投影装置包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置为根据期望的图案对辐射束进行图案化; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的光束投影到所述基板的目标部分上; 液体供应系统，被配置为向所述投影系统和所述基板之间的空间提供液体; 以及快门，被配置为隔离所述基板的空间或被基板占据的空间。
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公开(公告)号：US08558989B2
公开(公告)日：2013-10-15
申请号：US12850472
申请日：2010-08-04
Applicant: Joeri Lof , Erik Theodorus Maria Bijlaart , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
Inventor： Joeri Lof , Erik Theodorus Maria Bijlaart , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
CPC classification number: G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.
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24.发明授权Lithographic apparatus, method for levelling an object, and lithographic projection method 有权平版印刷设备，用于调平物体的方法和光刻投影方法公开(公告)号：US08514368B2
公开(公告)日：2013-08-20
申请号：US12809730
申请日：2008-12-22
Applicant: Peter Gerhardus Wilhelmus Bussink , Anastasius Jacobus Anicetus Bruinsma , Hendricus Johannes Maria Meijer
Inventor： Peter Gerhardus Wilhelmus Bussink , Anastasius Jacobus Anicetus Bruinsma , Hendricus Johannes Maria Meijer
CPC classification number: G03F9/7034 , G03F9/7003
Abstract: A lithographic apparatus configured to project a patterned radiation beam onto a substrate. The apparatus includes a support configured to hold a patterned object, and a measurement system configured to detect orientations and/or densities of user area structures that are present on a user area of the patterned object.
Abstract translation: 一种光刻设备，被配置为将图案化的辐射束投影到基底上。 该装置包括被配置为保持图案化物体的支撑件和被配置为检测存在于图案化物体的用户区域上的用户区域结构的取向和/或密度的测量系统。
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公开(公告)号：US08482845B2
公开(公告)日：2013-07-09
申请号：US12698932
申请日：2010-02-02
Applicant: Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
Inventor： Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
CPC classification number: G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
Abstract translation: 公开了一种光刻投影装置，其中投影系统和传感器之间的空间填充有液体。
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Patent Agency Ranking
公开(公告)号：US08208123B2
公开(公告)日：2012-06-26
申请号：US10927531
申请日：2004-08-27
Applicant: Erik Roelof Loopstra , Johannes Jacobus Matheus Baselmans , Marcel Mathijs Theodore Marie Dierichs , Johannes Christiaan Maria Jasper , Hendricus Johannes Maria Meijer , Uwe Mickan , Johannes Catharinus Hubertus Mulkens , Matthew Lipson , Tammo Utterdijk
Inventor： Erik Roelof Loopstra , Johannes Jacobus Matheus Baselmans , Marcel Mathijs Theodore Marie Dierichs , Johannes Christiaan Maria Jasper , Hendricus Johannes Maria Meijer , Uwe Mickan , Johannes Catharinus Hubertus Mulkens , Matthew Lipson , Tammo Utterdijk
IPC: G03B27/54
CPC classification number: G03F7/70966 , G03F7/70341 , G03F7/70958 , G03F7/70983 , Y10S430/162
Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
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公开(公告)号：US20110285977A1
公开(公告)日：2011-11-24
申请号：US13195248
申请日：2011-08-01
Applicant: Joeri LOF , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
Inventor： Joeri LOF , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
IPC: G03B27/52
CPC classification number: G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
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公开(公告)号：US07795603B2
公开(公告)日：2010-09-14
申请号：US12318036
申请日：2008-12-19
Applicant: Joeri Lof , Joannes Theodoor De Smit , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Hendricus Johannes Maria Meijer , Erik Roelof Loopstra
Inventor： Joeri Lof , Joannes Theodoor De Smit , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Hendricus Johannes Maria Meijer , Erik Roelof Loopstra
CPC classification number: G03F7/70341 , G03F7/707 , G03F7/7085 , G03F9/7003 , G03F9/7034 , G03F9/7088
Abstract: A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.
Abstract translation: 在测量站产生衬底表面的图。 然后将衬底移动到投影透镜和衬底之间的空间被液体填充到的位置。 然后使用例如透射图像传感器对衬底进行对准，并且使用先前的映射可以准确地暴露衬底。 因此，映射不会发生在液体环境中。
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29.发明授权Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权平版印刷设备，器件制造方法和由此制造的器件公开(公告)号：US07528935B2
公开(公告)日：2009-05-05
申请号：US11312654
申请日：2005-12-21
Applicant: Koen Jacobus Johannes Maria Zaal , Tjarko Adriaan Rudolf Van Empel , Hendricus Johannes Maria Meijer , Joost Jeroen Ottens , Marco Le Kluse , Jan Hopman
Inventor： Koen Jacobus Johannes Maria Zaal , Tjarko Adriaan Rudolf Van Empel , Hendricus Johannes Maria Meijer , Joost Jeroen Ottens , Marco Le Kluse , Jan Hopman
CPC classification number: G03F7/707 , G03F7/70708 , G03F7/70783
Abstract: A lithographic projection apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and an article holder. The article holder includes a plurality of protrusions arranged to provide a substantially flat plane of support for supporting an article to be placed in a beam path of the beam of radiation. The protrusions are generally spaced apart equidistantly at a first distance. The article holder also includes a pair of electrodes for clamping the article to the holder. The electrodes are disposed in substantially the same plane above or below the protrusions, and are spaced apart from one another by a gap. Neighboring protrusions within the plurality of protrusions that are located on opposite sides of the gap are spaced apart by a second distance that is greater than the first distance.
Abstract translation: 公开了一种光刻投影装置。 该装置包括用于调节辐射束的照明器和物品保持器。 物品保持器包括多个突出部，其布置成提供基本平坦的支撑平面，用于支撑待放置在辐射束的光束路径中的物品。 这些突起通常在第一距离处等距离间隔开。 物品保持器还包括用于将物品夹持到保持器的一对电极。 电极设置在突起上方或下方的基本上相同的平面中，并且通过间隙彼此间隔开。 位于间隙的相对侧上的多个突起内的相邻突起被间隔开大于第一距离的第二距离。
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公开(公告)号：US07482611B2
公开(公告)日：2009-01-27
申请号：US11371235
申请日：2006-03-09
Applicant: Joeri Lof , Joannes Theodoor De Smit , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Hendricus Johannes Maria Meijer , Erik Roelof Loopstra
Inventor： Joeri Lof , Joannes Theodoor De Smit , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Hendricus Johannes Maria Meijer , Erik Roelof Loopstra
CPC classification number: G03F7/70341 , G03F7/707 , G03F7/7085 , G03F9/7003 , G03F9/7034 , G03F9/7088
Abstract: A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.
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