公开(公告)号：US06300020B1

公开(公告)日：2001-10-09

申请号：US09041012

申请日：1998-03-12

Applicant: Hideki Ina ,  Setsuo Minami

Inventor： Hideki Ina ,  Setsuo Minami

IPC: H01L21027

CPC classification number: G03F7/24 ,  G03F1/42 ,  G03F1/50

Abstract: A circuit pattern surface curving in correspondence with the surface shape of a ball-like semiconductor device material such as a silicon ball is formed in a reticle. A resist-applied surface of the device material is so exposed as to move the ball-like semiconductor device material close to the circuit pattern surface. In this manner, a circuit pattern is formed on the surface of the ball-like device material.

Abstract translation: 在光罩中形成与硅球等球状半导体器件材料的表面形状对应地弯曲的电路图形表面。 使装置材料的抗蚀剂涂敷表面暴露以使球状半导体器件材料靠近电路图形表面移动。 以这种方式，在球状器件材料的表面上形成电路图案。

公开(公告)号：US5137363A

公开(公告)日：1992-08-11

申请号：US532229

申请日：1990-06-05

Applicant: Masao Kosugi ,  Akiyoshi Suzuki ,  Hideki Ina ,  Hitoshi Fukuda

Inventor： Masao Kosugi ,  Akiyoshi Suzuki ,  Hideki Ina ,  Hitoshi Fukuda

IPC: G03F9/00

CPC classification number: G03F9/70

Abstract: A projection exposure apparatus for projecting a pattern formed on a first object such as a reticle upon a second object such as a semiconductor wafer by use of a projection lens system, is disclosed. In the apparatus, a light of a predetermined wavelength is used for the pattern projection, and a light having a different wavelength is used to align the first and second objects by way of the projection lens system. A dichroic mirror film is disposed inclinedly between the first object and the projection lens system so as to reflect one of the light of the predetermined wavelength and the light of the different wavelength, and also to transmit the other. By this dichroic mirror film, the light used for the alignment and reflected back from the second object is extracted out of a light path between the first and second objects. After correcting effects of chromatic aberrations of the projection lens system with respect to the different wavelength, the light for the alignment is passed through the first object. By this, accurate alignment using the light of a wavelength different from that to be used for the pattern projection, is made practically attainable. Also, use of lights of different wavelengths, other than the wavelength to be used for the pattern projection, is made practically attainable. Thus, accurate and stable alignment is attainable regardless of the configuration of the mark provided on the second object.

Abstract translation: 公开了一种投影曝光装置，用于通过使用投影透镜系统将形成在第一物体（例如掩模版）上的图案投射到诸如半导体晶片的第二物体上的投影曝光装置。 在该装置中，对于图案投影使用预定波长的光，并且使用具有不同波长的光来通过投影透镜系统对准第一和第二物体。 二分色镜膜倾斜地设置在第一物体和投影透镜系统之间，以便反射预定波长的光和不同波长的光之一，并且还传送另一个。 通过这种二向色镜膜，从第二物体的对准和反射回来的光从第一和第二物体之间的光路中提取出来。 在校正投影透镜系统的色差相对于不同波长的效果之后，用于对准的光通过第一物体。 由此，实际上可以实现使用与用于图案投影的波长不同的波长的光的精确对准。 此外，实际上可以使用除了用于图案投影的波长之外的不同波长的光。 因此，无论设置在第二物体上的标记的构造如何，均可实现准确和稳定的对准。

公开(公告)号：US4669885A

公开(公告)日：1987-06-02

申请号：US476252

申请日：1983-03-17

Applicant: Hideki Ina

Inventor： Hideki Ina

IPC: G01N21/88 ,  G01N21/94 ,  G01N21/956 ,  G03F1/84 ,  G03F1/86 ,  G03F9/00 ,  G06T1/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/66

CPC classification number: G03F9/70 ,  H01L21/30

Abstract: Disclosed is an apparatus for inspecting negatives which is provided with a laser beam generating source, a scanner for scanning the laser beam, a holding device for holding a negative having a pattern formed in a reflective area on a first surface of a transparent plate and transferring the negative in a direction perpendicular to the scanning direction of the laser beam, a first converging lens for converging the laser beam on said first surface, a second converging lens for converging on a first photocell the beam transmitted through the negative, a third converging lens for converging on a second photocell the beam reflected by the first surface of the negative, and a comparator for comparing a first signal stream put out from the first photocell and a second signal stream put out from the second photocell and detecting an undesirable adhering matter.

Abstract translation: 公开了一种用于检查设有激光束发生源的负片的装置，用于扫描激光束的扫描仪，用于保持具有形成在透明板的第一表面上的反射区域中的图案的负片的保持装置， 在与激光束的扫描方向垂直的方向上为负的，用于将激光束会聚在所述第一表面上的第一会聚透镜，用于会聚在第一光电池上的第二会聚透镜，透射通过负的光束;第三会聚透镜 用于会聚在第二光电池上的由负极的第一表面反射的光束，以及用于比较从第一光电池放出的第一信号流和从第二光电池放出的第二信号流的比较器，并检测不期望的粘附物质。

公开(公告)号：US08973495B2

公开(公告)日：2015-03-10

申请号：US12536317

申请日：2009-08-05

Applicant: Kazuyuki Kasumi ,  Hideki Ina

Inventor： Kazuyuki Kasumi ,  Hideki Ina

IPC: G03F7/00 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

Abstract: There is provided an imprint apparatus configured to perform an imprint in which a resin on a substrate is molded using a mold and a pattern is formed on the substrate. The apparatus includes a press unit configured to press the resin on the substrate and the mold to each other, a cure unit configured to irradiate light to the resin molded by the mold to cure the resin, and a movement unit configured to move the mold and the substrate, from a position at which the press is performed by the press unit to a position at which the light is irradiated by the cure unit, and from the position at which the light is irradiated by the cure unit to a position at which the mold is released.

Abstract translation: 提供了一种压印装置，其被配置为执行压印，其中使用模具模制基板上的树脂并且在基板上形成图案。 该装置包括：压制单元，其构造成将基板和模具上的树脂彼此挤压;固化单元，被配置为将光照射到由模具成型的树脂上以使树脂固化;以及移动单元，其构造成使模具和 基板，从通过压制单元执行压制的位置到由固化单元照射光的位置以及从固化单元被光照射的位置到达位置 模具被释放。

公开(公告)号：US08845317B2

公开(公告)日：2014-09-30

申请号：US11719878

申请日：2007-04-18

Applicant: Nobuhito Suehira ,  Junichi Seki ,  Hideki Ina ,  Koichi Sentoku

Inventor： Nobuhito Suehira ,  Junichi Seki ,  Hideki Ina ,  Koichi Sentoku

IPC: G01B11/00 ,  B29C43/58 ,  B82Y10/00 ,  G03F9/00 ,  B82Y40/00 ,  G03F7/00

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/00 ,  G03F9/703 ,  G03F9/7049 ,  G03F9/7088

Abstract: An imprint apparatus for performing alignment between a mold and a substrate and imprinting a pattern of the mold to a layer of the substrate. A holder holds the mold. A stage holds the substrate opposite to the mold held by the holder. A microscope, including an image pickup device, detects a first alignment mark formed in the mold, via a first image pickup area of the image pickup device, and detects a second alignment mark formed in the substrate, via a second image pickup area of the image pickup device. The first and second image pickup areas do not overlap with each other. A contrast of signals obtained by the image pickup device is adjusted with respect to each of the first and second image pickup areas, and the alignment is performed by changing relative positions of the holder and the stage based on first information about a deviation of the detected first alignment mark from a predetermined position in the first image pickup area and second information about a deviation of the detected second alignment mark from a predetermined position in the second image pickup area.

Abstract translation: 一种用于在模具和基板之间进行对准并将模具的图案压印到基板的层的压印装置。 持有人持有模具。 阶段保持与由保持器保持的模具相对的基板。 包括图像拾取装置的显微镜经由图像拾取装置的第一图像拾取区域检测在模具中形成的第一对准标记，并且经由第二图像拾取区域检测形成在基板中的第二对准标记 图像拾取装置。 第一和第二摄像区域彼此不重叠。 基于图像拾取装置获得的信号的对比度相对于第一和第二图像拾取区域中的每一个被调整，并且通过基于关于检测到的偏移的第一信息来改变保持器和台的相对位置来执行对准 第一对准标记从第一图像拾取区域中的预定位置开始，以及关于所检测到的第二对准标记与第二图像拾取区域中的预定位置的偏差的第二信息。

公开(公告)号：US08562846B2

公开(公告)日：2013-10-22

申请号：US13175071

申请日：2011-07-01

Applicant: Atsunori Terasaki ,  Junichi Seki ,  Nobuhito Suehira ,  Hideki Ina ,  Shingo Okushima

Inventor： Atsunori Terasaki ,  Junichi Seki ,  Nobuhito Suehira ,  Hideki Ina ,  Shingo Okushima

IPC: C03C15/00

CPC classification number: B29C59/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/0017 ,  G03F9/7042

Abstract: A mold capable of a highly accurate alignment with a member to be processed in such a state that a photocurable resin material is disposed between the mold and the member to be processed, and is constituted by a substrate 2010 formed of a first material and an alignment mark 2102 formed of a second material different from the first material. The first material and the second material have transmissivities to light in a part of an ultraviolet wavelength range. The second material has a refractive index of not less than 1.7.

Abstract translation: 该模具能够在将待固化的树脂材料设置在模具和待加工构件之间的状态下与要处理的构件高度准确地对准，并且由第一材料和对准构成的基板2010构成 标记2102由与第一材料不同的第二材料形成。 第一材料和第二材料在紫外线波长范围的一部分中具有透光性。 第二种材料的折射率不小于1.7。

公开(公告)号：US20110278259A1

公开(公告)日：2011-11-17

申请号：US13175071

申请日：2011-07-01

Applicant: Atsunori TERASAKI ,  Junichi SEKI ,  Nobuhito SUEHIRA ,  Hideki INA ,  Shingo OKUSHIMA

Inventor： Atsunori TERASAKI ,  Junichi SEKI ,  Nobuhito SUEHIRA ,  Hideki INA ,  Shingo OKUSHIMA

IPC: C03C15/00

CPC classification number: B29C59/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/0017 ,  G03F9/7042

Abstract: A mold capable of a highly accurate alignment with a member to be processed in such a state that a photocurable resin material is disposed between the mold and the member to be processed, and is constituted by a substrate 2010 formed of a first material and an alignment mark 2102 formed of a second material different from the first material. The first material and the second material have transmissivities to light in a part of an ultraviolet wavelength range. The second material has a refractive index of not less than 1.7.

Abstract translation: 该模具能够在将待固化的树脂材料设置在模具和待加工构件之间的状态下与要处理的构件高度准确地对准，并且由第一材料和对准构成的基板2010构成 标记2102由与第一材料不同的第二材料形成。 第一材料和第二材料在紫外线波长范围的一部分中具有透光性。 第二种材料的折射率不小于1.7。

公开(公告)号：US20110272840A1

公开(公告)日：2011-11-10

申请号：US13153512

申请日：2011-06-06

Applicant: Nobuhito Suehira ,  Junichi Seki ,  Masao Majima ,  Atsunori Terasaki ,  Hideki Ina

Inventor： Nobuhito Suehira ,  Junichi Seki ,  Masao Majima ,  Atsunori Terasaki ,  Hideki Ina

IPC: B29C59/02 ,  B29C43/58 ,  C03C25/68 ,  B29C43/00

CPC classification number: G03F9/7084 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/7076

Abstract: A light transmissive mold used for imprinting a pattern onto a material applied on a semiconductor workpiece. The mold includes a first surface having an area of a pattern to be imprinted onto the material, a second surface located opposite from the first surface, and a third surface disposed between the first surface and the second surface, at a position inwardly away from the first surface. The third surface is arranged opposite to an area of the workpiece subjected to dicing. An alignment structure, provided for alignment between the mold and the workpiece, is formed in the third surface.

Abstract translation: 用于将图案压印到施加在半导体工件上的材料上的透光模具。 模具包括具有待印在材料上的图案区域的第一表面，与第一表面相对的第二表面和设置在第一表面和第二表面之间的第三表面， 第一表面。 第三表面布置成与被切割的工件的区域相对。 在第三表面中形成有用于在模具和工件之间对准的对准结构。

公开(公告)号：US07884935B2

公开(公告)日：2011-02-08

申请号：US11736696

申请日：2007-04-18

Applicant: Nobuhito Suehira ,  Junichi Seki ,  Hideki Ina ,  Koichi Sentoku

Inventor： Nobuhito Suehira ,  Junichi Seki ,  Hideki Ina ,  Koichi Sentoku

IPC: G01B11/00 ,  G01B15/00 ,  G01N21/86 ,  G01V8/00 ,  B41F1/34 ,  B41F21/12 ,  B41F21/14 ,  B41L1/02 ,  B29C45/76 ,  B29C35/08 ,  B29C35/12 ,  B29C47/92 ,  B29C47/96 ,  B29B13/00 ,  B29B15/00 ,  B28B17/00

CPC classification number: G03F7/0002 ,  B41M3/00 ,  B41M2205/26 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/00 ,  G03F9/7015 ,  G03F9/7042 ,  G03F9/7088

Abstract: A pattern transfer apparatus transfers an imprint pattern formed on a mold, provided with an alignment mark, to a resin material on a substrate, provided with an alignment mark. A first image pickup device obtains an image of an object positioned at a first object position. A second image pickup device obtains an image of an object positioned at a second object position. The second object position is more distant from the alignment mark of the mold than the first object position. An optical system forms an image of an object positioned at the first object position and an image of an object positioned at the second object position. Alignment is performed based on first and second information obtained about positions of images of an alignment mark of a reference substrate and an alignment mark of the substrate, to transfer the imprinting pattern to the resin material.

Abstract translation: 图案转印装置将形成在具有对准标记的模具上的印模图案转印到具有对准标记的基板上的树脂材料上。 第一图像拾取装置获取位于第一对象位置的对象的图像。 第二图像拾取装置获取位于第二对象位置的对象的图像。 第二物体位置比第一物体位置更远离模具的对准标记。 光学系统形成位于第一物体位置的物体的图像和位于第二物体位置的物体的图像。 基于获得的关于参考基板的对准标记的图像的位置和基板的对准标记获得的第一和第二信息进行对准，以将印刷图案转印到树脂材料上。

公开(公告)号：US20100072664A1

公开(公告)日：2010-03-25

申请号：US12566572

申请日：2009-09-24

Applicant: Eigo Kawakami ,  Hideki Ina ,  Junichi Seki ,  Atsunori Terasaki ,  Shingo Okushima ,  Motoki Okinaka

Inventor： Eigo Kawakami ,  Hideki Ina ,  Junichi Seki ,  Atsunori Terasaki ,  Shingo Okushima ,  Motoki Okinaka

IPC: B29C59/02

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/00

Abstract: An imprint apparatus for pressing resin and a mold to each other in a Z-axis direction to form a resin pattern on a shot region includes: a mold chuck; an X-Y stage; a reference mark formed on the stage; a first scope configured to measure a positional deviation in an x-y plane between a mold mark and the reference mark; a second scope configured to measure a position of a substrate mark in the plane not via the mold mark; and a dispenser configured to dispense resin. In the plane, the dispenser center is deviated in position from the mold chuck center by a first distance in a first direction, and the second scope center is deviated in position from the dispenser center by a distance smaller than twice the first distance in the first direction or a second direction opposite thereto.

Abstract translation: 在Z轴方向上按压树脂和模具以在射出区域形成树脂图案的压印装置包括：模具卡盘; X-Y舞台; 在舞台上形成参考标记; 第一范围，被配置为测量模具标记和参考标记之间的x-y平面中的位置偏差; 第二范围，被配置为不经由模具标记来测量所述平面中的基板标记的位置; 以及配置成分配树脂的分配器。 在平面中，分配器中心从第一方向偏离模具卡盘中心第一距离，并且第二范围中心从分配器中心偏离距离小于第一距离的距离的距离 方向或与其相反的第二方向。