公开(公告)号：US07670283B2

公开(公告)日：2010-03-02

申请号：US10693432

申请日：2003-10-24

申请人： Hiroyuki Araki

发明人： Hiroyuki Araki

IPC分类号： A61B1/00

CPC分类号： A61B1/00059 ,  A61B1/00006 ,  A61B1/00057 ,  A61B1/04 ,  A61B2560/0271 ,  A61B2560/0276 ,  G06F19/00 ,  G06Q30/016 ,  G06Q50/22 ,  G16H40/40

摘要： A history information obtaining unit obtains information about a use history of an endoscope. An estimating unit makes an estimation of a secular change in the endoscope from its use start until the present time based on this information. A displaying unit displays a ratio of a result of the estimation made by the estimating unit to the degree of the secular change, which is preset for the endoscope.

摘要翻译： 历史信息获取单元获取关于内窥镜的使用历史的信息。 基于该信息，估计单元从其使用开始至现在的时间估计内窥镜的长期变化。 显示单元显示由估计单元估计的结果与针对内窥镜预设的长期变化的程度的比率。

公开(公告)号：US20080078423A1

公开(公告)日：2008-04-03

申请号：US11860733

申请日：2007-09-25

申请人： Hiroyuki Araki ,  Toyohide Hayashi

发明人： Hiroyuki Araki ,  Toyohide Hayashi

IPC分类号： B08B3/04

CPC分类号： H01L21/67051 ,  H01L21/02057 ,  H01L21/68728 ,  H01L21/68742

摘要： Holes having a variety of shapes exist on a surface of a substrate. When pure water is supplied on the substrate in a rinsing process, part of the pure water enters the holes. The pure water which have entered the holes can be hardly shaken off even though the substrate is rotated at a high speed. Therefore, HFE is held on the substrate so as to form an HFE layer after the rinsing process. In this case, the HFE enters the holes while the pure water emerges from the holes to the upper surface of the HFE due to a difference in specific gravity between the pure water and the HFE. Thus, the pure water is reliably prevented from remaining in the holes.

摘要翻译： 具有各种形状的孔存在于基板的表面上。 当在漂洗过程中在基材上供应纯水时，部分纯水进入孔中。 进入孔的纯水即使基材高速旋转也难以摇动。 因此，HFE被保持在基板上，以便在漂洗过程之后形成HFE层。 在这种情况下，由于纯水和HFE之间的比重差异，HFE进入孔，而纯水从孔到HFE的上表面出现。 因此，可靠地防止纯水残留在孔中。

公开(公告)号：US06354311B1

公开(公告)日：2002-03-12

申请号：US09522205

申请日：2000-03-09

申请人： Masahiro Kimura ,  Hiroyuki Araki

发明人： Masahiro Kimura ,  Hiroyuki Araki

IPC分类号： B08B704

CPC分类号： H01L21/67034 ,  H01L21/67028 ,  Y10S134/902

摘要： A deionized water temperature control part cools deionized water which is supplied from a deionized water supply source into a processing bath through a pipe after completely cleaning a substrate in the processing bath for maintaining the deionized water at a constant temperature which is lower than the ordinary temperature. A supply port of an IPA.N2 supply part provided in a casing of a multi-functional processing part is directed upward, thereby supplying IPA vapor upward with carrier gas of N2 for forming an atmosphere containing IPA vapor in high concentration above the processing bath. Thus, the substrate cooled to a low temperature is dried in the atmosphere containing the IPA vapor of the ordinary temperature in the upper portion of the processing bath when pulled up from the processing bath. Thus, the amount of the IPA vapor dissolved in the deionized water stored in the processing bath may be small, whereby consumption of the IPA vapor as well as generation of particles can be suppressed.

摘要翻译： 去离子水温度控制部件在去离子水中冷却去离子水，所述去离子水在完全清洁处理槽中的基底之后通过管道从加工槽中提供到处理槽中，以将去离子水保持在低于常温的恒定温度 。 设置在多功能处理部件的壳体中的IPA.N2供给部的供给口朝向上方，从而向N 2的载气向上供给IPA蒸气，以形成含有高浓度的IPA蒸汽的气氛，高于处理槽。 因此，在从处理槽拉出时，在含有处理槽上部的常温的IPA蒸气的气氛中冷却到低温的基板被干燥。 因此，溶解在处理槽中的去离子水中的IPA蒸气的量可能较小，从而可以抑制IPA蒸气的消耗以及颗粒的产生。

公开(公告)号：US06352083B1

公开(公告)日：2002-03-05

申请号：US09195190

申请日：1998-11-17

申请人： Hiroyuki Araki ,  Kenichiro Arai ,  Masaaki Yabuta

发明人： Hiroyuki Araki ,  Kenichiro Arai ,  Masaaki Yabuta

IPC分类号： B08B300

CPC分类号： H01L21/67057 ,  B08B3/102 ,  H01L21/67051

摘要： A control unit controls a lifter to raise at least part of each of a group of substrates above the liquid level of a treating liquid in a treating bath. Thereafter, a valve is opened to drain the treating liquid from the treating bath at a high speed. As a result, a physical force to tilt and adhere an upper portion of the adjacent substrates accompanied by lowering of the liquid level of the treating liquid due to the high speed drainage acts upon a lower portion of the substrates near the lowered liquid level of the treating liquid, thereby reducing the physical force exerted on the substrates. This arrangement, even if a holding interval between the substrates is narrowed at a half of a normal pitch, eliminates a contact of the adjacent substrates and prevents damage of the substrates due to the contact without providing an additional member such as a substrate support guide in the treating bath.

摘要翻译： 控制单元控制升降器，以将处理液中的处理液的液面以上的一组基板中的每一个的至少一部分升高。 此后，打开阀门以高速排出处理液。 结果，伴随着由于高速排水引起的处理液的液面的降低而倾斜并附着相邻基板的上部的物理力作用在基板的较低部分附近， 从而减少施加在基板上的物理力。 这种布置，即使基板之间的保持间隔在正常间距的一半处变窄，消除了相邻基板的接触，并且防止了由于接触而导致的基板的损坏，而没有提供诸如基板支撑引导件的附加构件 治疗浴。

公开(公告)号：US08768721B2

公开(公告)日：2014-07-01

申请号：US12533878

申请日：2009-07-31

申请人： Hiroyuki Araki ,  Tatsuya Shiobara ,  Chieko Watanabe ,  Nobuaki Matsubara ,  Kazuhiro Akiyama ,  Hidenori Tsuruma ,  Tasuku Ogawa

发明人： Hiroyuki Araki ,  Tatsuya Shiobara ,  Chieko Watanabe ,  Nobuaki Matsubara ,  Kazuhiro Akiyama ,  Hidenori Tsuruma ,  Tasuku Ogawa

IPC分类号： G06Q10/00 ,  G06Q50/00 ,  A61B5/00 ,  G06F19/00

CPC分类号： G06Q50/22 ,  G06F19/00 ,  G06Q10/087 ,  G06Q10/1093 ,  G16H40/20

摘要： The examination schedule memory unit stores an examination schedule including the starting time and the ending time of each examination. A cleaning capacity memory unit stores cleaning-capacity information that specifies the cleaning capacity of cleaning apparatuses that clean a scope used for the examination. A cleaning schedule generation unit generates a cleaning schedule for cleaning a used scope produced at the end of each examination with cleaning apparatuses having a cleaning capacity required by the cleaning-capacity information stored in the cleaning capacity memory unit. The scope shortage determination unit determines whether or not there will be a shortage of scopes to be used for each examination in accordance with both the examination starting time specified by the above examination schedule and the cleaning ending time specified by the cleaning schedule.

摘要翻译： 检查时间表存储单元存储包括每次检查的开始时间和结束时间的检查时间表。 清洁能力存储单元存储清洁用于检查的清洁范围的清洁装置的清洁能力的清洁能力信息。 清洁进度生成单元生成用于清洁每次检查结束时产生的使用范围的清洁进度，其具有清洁能力存储单元中存储的清洁能力信息所需的清洁能力的清洁装置。 范围不足判定单元根据上述检查时间表规定的检查开始时间和由清洗进度指定的清洁结束时间两者，确定是否将缺少要用于每次检查的范围。

公开(公告)号：US08524009B2

公开(公告)日：2013-09-03

申请号：US13590694

申请日：2012-08-21

申请人： Hiroyuki Araki ,  Kentaro Tokuri

发明人： Hiroyuki Araki ,  Kentaro Tokuri

IPC分类号： B08B3/00

CPC分类号： B08B3/10 ,  H01L21/67028 ,  H01L21/67051

摘要： A substrate processing method comprising: holding a substrate substantially horizontally by a rotatable substrate holding mechanism; supplying a rinsing liquid onto the top of the substrate held by the substrate holding mechanism at the substrate holding step; after the rinsing liquid supply step, spraying a gas onto the top of the substrate held by the substrate holding mechanism, by a gas knife mechanism, to form a gas spraying zone on the substrate top, and unidirectionally scanning the substrate top in its entirety by this gas spraying zone, without rotating the substrate; replenishing the rinsing liquid by supplying, in parallel to the gas knife spraying step, a rinsing liquid onto the substrate top at its area downstream in the gas-spraying-zone scanning direction rather than the gas spraying zone formed by the gas knife mechanism; and drying the substrate surface after the gas knife spraying step and the rinsing liquid replenishing step.

摘要翻译： 一种基板处理方法，包括：通过可旋转的基板保持机构基本水平地保持基板; 在所述基板保持步骤中将冲洗液体供给到由所述基板保持机构保持的所述基板的顶部; 在冲洗液体供给步骤之后，通过气刀机构将气体喷射到由基板保持机构保持的基板的顶部上，以在基板顶部上形成气体喷射区域，并将其整体上的基板顶部单向扫描 该气体喷涂区域，不旋转基板; 通过在喷气区域扫描方向的下游区域的气体喷射区域的喷涂区域的气体喷射区域的气体喷射区域扫描方向上的基板顶部供给冲洗液体来补充冲洗液体; 以及在气刀喷涂步骤和冲洗液补充步骤之后干燥基板表面。

公开(公告)号：US08417548B2

公开(公告)日：2013-04-09

申请号：US13091833

申请日：2011-04-21

申请人： Hiroyuki Araki ,  Takashi Hosaka ,  Masakazu Omura ,  Yusuke Kato ,  Emiko Ouchi ,  Ryoichi Hosoya

发明人： Hiroyuki Araki ,  Takashi Hosaka ,  Masakazu Omura ,  Yusuke Kato ,  Emiko Ouchi ,  Ryoichi Hosoya

IPC分类号： G06Q50/00

CPC分类号： G06Q50/24 ,  G06F19/00 ,  G06F19/325 ,  G06Q50/22 ,  G16H50/70

摘要： A recording unit holds a plurality of examination data including the examination date of a performed examination. A search unit extracts examination data matching a set condition, of the plurality of examination data held in the recording unit. An output unit outputs a search result by the search unit. A first narrowing unit extracts examination data in which the examination date is included within a designated first period. A reference data determination unit classifies the examination data extracted by the first narrowing unit by an examinee and determines, for every examinee, one piece of the examination data to be a reference in accordance with a predetermined rule. A second narrowing unit sets, for every examinee, a second period designated in at least one of the past direction and the future direction starting from a reference date that is the examination date of the examination data determined by the reference data determination unit and extracts examination data in which the examination date is included within the second period.

摘要翻译： 记录单元保存包括执行检查的检查日期的多个检查数据。 搜索单元提取与保持在记录单元中的多个检查数据相匹配的设定条件的检查数据。 输出单元通过搜索单元输出搜索结果。 第一缩小单元提取在指定的第一周期内包括检查日期的检查数据。 参考数据确定单元将由第一变窄单元提取的检查数据分类为受检者，并且根据预定规则为每个受检者确定一个检查数据作为参考。 第二缩小单元针对每个受试者设定从作为由参考数据确定单元确定的检查数据的检查日期的参考日期开始的至少一个过去方向和未来方向指定的第二时段，并且提取检查 在第二期间内包含审查日期的数据。

公开(公告)号：US08277569B2

公开(公告)日：2012-10-02

申请号：US12161263

申请日：2006-01-17

申请人： Hiroyuki Araki ,  Kentaro Tokuri

发明人： Hiroyuki Araki ,  Kentaro Tokuri

IPC分类号： B08B3/00

CPC分类号： B08B3/10 ,  H01L21/67028 ,  H01L21/67051

摘要： A substrate processing apparatus and a substrate processing method are capable of restraining or preventing the generation of streaky particles on a substrate surface by excellent removal of a rinsing liquid therefrom. The substrate processing apparatus has a substrate inclining mechanism for inclining a substrate held by a substrate holding mechanism. After a rinsing liquid has been supplied onto a substrate to form a liquid mass, the substrate is inclined at a small angle by the substrate inclining mechanism. Then, the liquid mass is downwardly moved without being fragmented and then falls down without leaving minute droplets on the substrate top. Thereafter, the substrate is returned to a horizontal posture and then dried.

摘要翻译： 基板处理装置和基板处理方法能够通过从其中除去漂洗液而抑制或防止在基板表面上产生条纹颗粒。 基板处理装置具有用于使由基板保持机构保持的基板倾斜的基板倾斜机构。 在冲洗液已经被供给到基板上以形成液体块之后，基板通过基板倾斜机构以小角度倾斜。 然后，液体物质向下移动而不被分散，然后落下而不在基板顶部上留下微小的液滴。 此后，将基板返回到水平姿势，然后干燥。

公开(公告)号：US20080070418A1

公开(公告)日：2008-03-20

申请号：US11853231

申请日：2007-09-11

申请人： Masahiro Miyagi ,  Masanobu Sato ,  Hiroyuki Araki

发明人： Masahiro Miyagi ,  Masanobu Sato ,  Hiroyuki Araki

IPC分类号： B08B3/04 ,  H01L21/461

CPC分类号： H01L21/67051

摘要： A substrate processing apparatus has a cup part for receiving processing liquid which is applied from a processing liquid applying part and is splashed from a substrate, and the cup part is formed of electrical insulation material. Hydrophilic treatment is performed on an outer annular surface of the cup part and water is held on the outer annular surface of the cup part while processing the substrate. With this structure, charged potential of the cup part generated in splashing of pure water can be suppressed by the water held on the outer annular surface, without greatly increasing the manufacturing cost of the substrate processing apparatus by forming the cup part with special conductive material. As a result, it is possible to prevent electric discharge from occurring on the substrate due to induction charging of the substrate, in application of the processing liquid onto the substrate.

摘要翻译： 基板处理装置具有用于接收从处理液施加部施加并从基板溅出的处理液的杯部，杯部由电绝缘材料形成。 在杯部的外环形表面上进行亲水处理，并且在处理基板的同时将水保持在杯部的外环形表面上。 通过这种结构，通过保持在外环形表面上的水可以抑制在纯水溅出中产生的杯部分的带电电位，而不会通过用特殊导电材料形成杯部而大大增加基板处理装置的制造成本。 结果，可以在将处理液施加到基板上时防止由于基板的感应充电而在基板上发生放电。

公开(公告)号：US20050177394A1

公开(公告)日：2005-08-11

申请号：US10992388

申请日：2004-11-18

申请人： Ryoichi Hosoya ,  Nobuaki Matsubara ,  Hiroyuki Araki ,  Hideki Yasuda ,  Shinichi Omori ,  Masafumi Kobayashi ,  Yoshinori Matsumoto ,  Kazuyuki Inokihara

发明人： Ryoichi Hosoya ,  Nobuaki Matsubara ,  Hiroyuki Araki ,  Hideki Yasuda ,  Shinichi Omori ,  Masafumi Kobayashi ,  Yoshinori Matsumoto ,  Kazuyuki Inokihara

IPC分类号： A61B1/00 ,  A61B5/00 ,  G06F19/00 ,  G06Q50/22 ,  G06Q50/24 ,  G06F17/60

CPC分类号： G06Q50/22 ,  G16H15/00

摘要： An examination management system according to the present invention comprises implemented information input means for inputting implemented information including information related to a content of implementation of medical service, implemented regarding an examination and information related to a report about the medical service, implemented information storing means for storing the implemented information input by the implemented information input means, implemented information acquisition means for obtaining the implemented information related to the report from the implemented information storage means by using information indicating the same examination of the same patient matching a key, report comparison means for the comparison of a plurality of reports obtained by the implemented information acquisition means, and report comparison result display means for the display of the result of the comparison by the report comparison means.

摘要翻译： 根据本发明的检查管理系统包括：实现的信息输入装置，用于输入实现的信息，包括与关于检查实现的医疗服务的实现内容有关的信息以及与关于医疗服务的报告相关的信息;实现的信息存储装置， 存储由所实现的信息输入装置输入的所实现的信息，实现信息获取装置，用于通过使用指示与一个密钥相匹配的相同病人的相同检查的信息从所实现的信息存储装置中获得与该报告有关的实现信息;报告比较装置， 通过实施信息获取装置获得的多个报告的比较以及用于通过报告比较装置显示比较结果的报告比较结果显示装置。