Abstract:
The present invention relates to a blanket for offset printing and a manufacturing method thereof. The blanket for offset printing according to an exemplary embodiment of the present invention comprises a cushion layer, a support layer, and at least two surface printing layers, wherein the at least two surface printing layers comprise a silicon-based resin in which at least one of a hardness value, a fluorine group content value, and a silicon oil content value is different. The blanket for offset printing according to the exemplary embodiment of the present invention comprises the surface printing layer formed in at least two layers to prevent the surface printing layer from being swollen due to ink, thereby reducing a process waiting time and improving a process margin.
Abstract:
A siloxane based coating composition having excellent dyeability, abrasion resistance, glossiness and transparency, a preparation method thereof, and an optical lens coated by the coating composition are suggested. The siloxane based coating composition includes organo silane compound, inorganic oxide (H-index filler), solvent and a dyeing improving material. The dyeing improving material adopts nitric acid, hydrochloric acid, phosphoric acid, sodium nitrate, potassium nitrate, silver nitrate, or the like. The siloxane based coating composition shows excellent dyeability owing to the dyeing improving material, excellent abrasion resistance owing to the organo silane compound, and excellent glossiness and transparency, so it may be applied as a coating film on a surface of a plastic lens such as optical lens, industrial safety lens and leisure-purpose goggle that require high transparency.
Abstract:
The present invention provides a method for manufacturing a conductive pattern, comprising the steps of: a) forming a conductive film on a substrate; b) forming an etching resist pattern on the conductive film; and c) forming a conductive pattern having a smaller line width than a width of the etching resist pattern by over-etching the conductive film by using the etching resist pattern, and a conductive pattern manufactured by using the same. According to the exemplary embodiment of the present invention, it is possible to effectively and economically provide a conductive pattern having a ultrafine line width.
Abstract:
A method for forming fine patterns includes (S1) closely contacting a cliche-forming film to a hard mold concavely patterned, thereby making a disposable cliche; (S2) coating an elastic blanket cylinder with ink or resin; (S3) compressing the elastic blanket cylinder to the disposable cliche to remove ink or resin on a surface of the elastic blanket cylinder at a portion contacting with a relatively protruded embossed portion of the disposable cliche; and (S4) transcribing ink or resin remaining on the surface of the elastic blanket cylinder to a substrate. This method allows simple and fast works and greatly reduces costs by adopting a disposable cliche that may be easily installed and removed. Also, this method may be effectively utilized to form a fine pattern of an electronic device or a display device such as color filter and electrode.
Abstract:
Disclosed is a coating composition that can provide structural materials having hydrophilicity, excellent self-cleaning property and long service life. The present invention also discloses a method for preparing the composition, a substrate, such as a film or structural exterior material like vinyl sidings, with the applied coating composition, and a method to prepare a substrate with the coating composition. The coating composition has hydroxy group-containing inorganic particles that improve the initial hydrophilicity of conventional coating agents. Additionally, by using two types of inorganic particles having different particles diameters, the coating composition can form a hydrophilic coating layer having a contact angle with water of 30° or less. Additionally, a low boiling point organic solvent having erosive property to a substrate to be coated may be used to allow the application of the coating layer to a conventional production line for structural exterior materials without adding a separate coating line.
Abstract:
An isolation structure may include a trench formed on a surface of a substrate. A first isolation pattern may be provided on an inner face of the trench to define an auxiliary trench. A second isolation pattern may be provided on the first isolation pattern to partially fill the auxiliary trench. A third isolation pattern may be provided on the second isolation pattern to fill up the auxiliary trench. The second isolation pattern may have an etching selectivity with respect to the first isolation pattern.
Abstract:
A method for forming fine patterns includes (S1) closely contacting a cliche-forming film to a hard mold concavely patterned, thereby making a disposable cliche; (S2) coating an elastic blanket cylinder with ink or resin; (S3) compressing the elastic blanket cylinder to the disposable cliche to remove ink or resin on a surface of the elastic blanket cylinder at a portion contacting with a relatively protruded embossed portion of the disposable cliche; and (S4) transcribing ink or resin remaining on the surface of the elastic blanket cylinder to a substrate. This method allows simple and fast works and greatly reduces costs by adopting a disposable cliche that may be easily installed and removed. Also, this method may be effectively utilized to form a fine pattern of an electronic device or a display device such as color filter and electrode.
Abstract:
Provided are a method for producing two or more patterned substrates, which has a simple process and is efficient, and an apparatus for producing two or more patterned substrates.
Abstract:
The present invention relates to a cliché and a method for manufacturing the same, and the cliché according to the present invention comprises a cliché comprising: a groove pattern, wherein the groove pattern comprises a region composed of linear patterns which do not intersect with each other and the region composed of linear patterns is a square region comprising two or more lines of a linear pattern in the region and comprises a region in which the line width (W) and the depth (D) of the linear pattern and the ratio (R) of a region which does not comprise the linear pattern in the square region and the aperture line width (W0) of a mask pattern for forming a pattern, which corresponds to the linear pattern, satisfy specific relationship equation(s). The cliché according to the present invention may prevent the bottom touch phenomenon of ink transferred onto the cliché.
Abstract:
The present invention relates to a cliché and a method for manufacturing the same, and the cliché according to the present invention comprises a cliché comprising: a groove pattern, wherein the groove pattern comprises a region composed of linear patterns which do not intersect with each other and the region composed of linear patterns is a square region comprising two or more lines of a linear pattern in the region and comprises a region in which the line width (W) and the depth (D) of the linear pattern and the ratio (R) of a region which does not comprise the linear pattern in the square region and the aperture line width (W0) of a mask pattern for forming a pattern, which corresponds to the linear pattern, satisfy specific relationship equation(s). The cliché according to the present invention may prevent the bottom touch phenomenon of ink transferred onto the cliché.