公开(公告)号：USRE38320E1

公开(公告)日：2003-11-18

申请号：US09809224

申请日：2001-03-16

申请人： Kenji Nishi ,  Kazuo Ushida ,  Seiro Murakami ,  Tohru Kiuchi ,  Yasuaki Tanaka

发明人： Kenji Nishi ,  Kazuo Ushida ,  Seiro Murakami ,  Tohru Kiuchi ,  Yasuaki Tanaka

IPC分类号： G03B2754

CPC分类号： G03F7/70891 ,  G03B27/26 ,  G03B27/54 ,  G03F7/70883

摘要： A projection optical system of a projection exposure apparatus according to the present invention has a plurality of optical members made of glass materials at least one of which has a temperature characteristic of index of refraction different from that of the other glass material. Further, a temperature control device for controlling a temperature of at least one of the optical members is provided. An imaging characteristic of the projection optical system is controlled. The imaging characteristic to be controlled is a non-linear magnification or curvature of field. The temperature control device sets the temperature to be controlled to a variable target temperature determined in accordance with the imaging characteristic of the projection optical system. An exposing operation for transferring a mask pattern to a photosensitive substrate is started after the temperature of the optical member to be controlled reaches a predetermined allowable range of the target temperature.

公开(公告)号：US06433872B1

公开(公告)日：2002-08-13

申请号：US09276441

申请日：1999-03-25

申请人： Kenji Nishi ,  Yasuaki Tanaka ,  Seiro Murakami

发明人： Kenji Nishi ,  Yasuaki Tanaka ,  Seiro Murakami

IPC分类号： G01B1100

CPC分类号： G03F7/70358 ,  G03F9/7026

摘要： An apparatus for exposing a pattern, formed on a mask, on each of a plurality of partitioned areas on a photosensitive substrate by a step-and-repeat scheme includes a projection optical system for projecting the pattern of the mask on the photosensitive substrate, a substrate stage for holding the photosensitive substrate and two-dimensionally moving the photosensitive substrate within a plane perpendicular to the optical axis of the projection optical system, a detection unit for projecting a pattern image having a predetermined shape on the photosensitive substrate and photoelectrically detecting light reflected by the photosensitive substrate to detect a position at each of a plurality of points on the photosensitive substrate along the optical axis of the projection optical system, and a measurement unit for, when each of a plurality of measurement points in a partitioned area on which a pattern of the mask is to be exposed next coincides with or approaches the pattern image, detecting an offset amount between an imaging plane of the projection optical system and the next partitioned area along the optical axis during a stepping operation of the substrate stage, wherein the imaging plane and the next partitioned area are relatively moved along the optical axis in accordance with the measured offset amount before the pattern of the mask is exposed on the next partitioned area.

公开(公告)号：US5729337A

公开(公告)日：1998-03-17

申请号：US555176

申请日：1995-11-08

申请人： Yasuaki Tanaka

发明人： Yasuaki Tanaka

IPC分类号： G01B11/26 ,  G01C9/06 ,  G03F9/00 ,  H01L21/027 ,  G01C3/06

CPC分类号： G03F9/70 ,  G01C9/06

摘要： An inclination detecting apparatus has an irradiating optical system for illuminating a substrate to be measured with parallel light flux diagonally, a condensing optical system for condensing the parallel light flux reflected by the substrate, a photoelectric detecting device for generating detection signals corresponding to a position of the parallel light flux condensed by the condensing optical system, a relative scanning device for scanning the parallel light flux emitted from the irradiating optical system to the substrate and the substrate relatively and a calculating circuit for obtaining information corresponding to an inclination of an average plane of a surface of the substrate by performing a statistical processing for the detection signals taken from the photoelectric detecting device in accordance with a relative scanning position of the parallel light flux and the substrate.

摘要翻译： 倾斜检测装置具有用于对角地平行光束照射被测量基板的照射光学系统，用于冷凝由基板反射的平行光束的聚光光学系统，用于产生对应于基板的位置的检测信号的光电检测装置 由聚光光学系统聚光的平行光束，相对扫描装置，用于将从照射光学系统发射的平行光束相对于基板和基板扫描;以及计算电路，用于获得与平面的平面相对应的信息 通过根据平行光束和基板的相对扫描位置对从光电检测装置取得的检测信号进行统计处理，从而对基板的表面进行处理。

公开(公告)号：US10538823B2

公开(公告)日：2020-01-21

申请号：US13699845

申请日：2010-05-27

申请人： Yasuaki Tanaka ,  Toshiro Tomida ,  Kaori Kawano

发明人： Yasuaki Tanaka ,  Toshiro Tomida ,  Kaori Kawano

IPC分类号： C22C38/00 ,  C22C38/02 ,  C22C38/06 ,  C22C38/28 ,  C22C38/38 ,  C22C38/22 ,  C22C38/24 ,  C22C38/26 ,  C21D8/02

摘要： A high-strength steel sheet has a chemical composition comprising C: 0.05-0.20%, Si: 0.02-3.0%, Mn: 0.5-3.0%, P: at most 0.5%, S: at most 0.05%, Cr: 0.05-1.0%, sol. Al: 0.01-1.0%, one or more elements selected from the group consisting of Ti, Nb, Mo, V, and W: a total of 0.002-0.03%, and a remainder of Fe and impurities. The sheet has an average grain diameter of ferrite of at most 3.0 μm at least in a region of 100-200 μm in the sheet thickness direction from the surface of the steel sheet. The average spacing in the sheet thickness direction of the remaining structure in this region is at most 3.0 μm. Mechanical properties include at least 750 MPa tensile strength and at least 13,000 MPa·% (tensile strength×elongation).

公开(公告)号：US10041158B2

公开(公告)日：2018-08-07

申请号：US13643696

申请日：2011-04-07

申请人： Yasuaki Tanaka ,  Toshiro Tomida ,  Kaori Kawano

发明人： Yasuaki Tanaka ,  Toshiro Tomida ,  Kaori Kawano

IPC分类号： C22C38/58 ,  C22C38/00 ,  C22C38/38 ,  C22C38/04 ,  C22C38/28 ,  C22C38/02 ,  C21D8/02 ,  C21D6/00 ,  C21D9/46 ,  C22C38/06 ,  C22C38/20 ,  C22C38/22 ,  C22C38/24 ,  C22C38/40 ,  C22C38/50

摘要： A multi-phase hot-rolled steel sheet having improved strength in an intermediate strain rate region has a chemical composition comprising, in mass percent, C: 0.07-0.2%, Si+Al: 0.3-1.5%, Mn: 1.0-3.0%, P: at most 0.02%, S: at most 0.005%, Cr: 0.1-0.5%, N: 0.001-0.008%, at least one of Ti: 0.002-0.05% and Nb: 0.002-0.05%, and a remainder of Fe and impurities. The area fraction of ferrite is 7-35%, the grain diameter of ferrite is in the range of 0.5-3.0 μm, and the nanohardness of ferrite is in the range of 3.5-4.5 GPa. A second phase which is the remainder other than ferrite contains martensite and bainitic ferrite and/or bainite. The average nanohardness of the second phase is 5-12 GPa, and the second phase contains a high-hardness phase of 8-12 GPa with an area fraction of 5-35% based on the overall structure.

公开(公告)号：US20140241933A1

公开(公告)日：2014-08-28

申请号：US14130552

申请日：2012-06-27

申请人： Jun Haga ,  Takuya Nishio ,  Masayuki Wakita ,  Yasuaki Tanaka ,  Norio Imai ,  Toshiro Tomida

发明人： Jun Haga ,  Takuya Nishio ,  Masayuki Wakita ,  Yasuaki Tanaka ,  Norio Imai ,  Toshiro Tomida

IPC分类号： C22C38/38 ,  C22C38/14 ,  C22C38/00 ,  C22C38/06 ,  C22C38/04 ,  C22C38/02 ,  C22C38/26 ,  C22C38/12

CPC分类号： C22C38/38 ,  C21D1/673 ,  C21D9/48 ,  C21D2211/001 ,  C21D2211/002 ,  C21D2211/005 ,  C21D2211/008 ,  C22C38/001 ,  C22C38/002 ,  C22C38/005 ,  C22C38/02 ,  C22C38/04 ,  C22C38/06 ,  C22C38/12 ,  C22C38/14 ,  C22C38/26

摘要： A high-strength cold-rolled steel sheet excellent in ductility, work hardenability, and stretch flangeability, and having tensile strength of 780 MPa or more includes: a chemical composition containing, in mass percent, C: more than 0.020% to less than 0.30%, Si: more than 0.10% to 3.00% or less, Mn: more than 1.00% to 3.50% or less; and metallurgical structure whose main phase is a low-temperature transformation product, and whose secondary phase contains retained austenite. The retained austenite has a volume fraction relative to overall structure of more than 4.0% to less than 25.0% and an average grain size of less than 0.80 μm, and of the retained austenite, the number density of retained austenite grains whose grain size is 1.2 μm or more is 3.0×10−2 grains/μm2 or less.

摘要翻译： 具有优异的延展性，工作淬透性和拉伸凸缘性的拉伸强度为780MPa以上的高强度冷轧钢板包括：以质量％计含有C：大于0.020％至小于0.30的化学组成 ％，Si：大于0.10％〜3.00％以下，Mn：大于1.00％〜3.50％以下; 主要相为低温相变产物，二相为残余奥氏体的冶金结构。 残余奥氏体相对于总体结构的体积分数大于4.0％至小于25.0％，平均粒径小于0.80μm，残余奥氏体的晶粒尺寸为1.2的残余奥氏体晶粒的数量密度 μm以上为3.0×10 -2个/μm2以下。

公开(公告)号：US20140024758A1

公开(公告)日：2014-01-23

申请号：US14110322

申请日：2012-04-11

申请人： Takashi Sekito ,  Daishi Yokoyama ,  Takashi Fuke ,  Yuji Tashiro ,  Toshiaki Nonaka ,  Yasuaki Tanaka

发明人： Takashi Sekito ,  Daishi Yokoyama ,  Takashi Fuke ,  Yuji Tashiro ,  Toshiaki Nonaka ,  Yasuaki Tanaka

IPC分类号： C09D183/06

CPC分类号： C09D183/06 ,  C08G77/045 ,  C08G77/16 ,  C09D7/20 ,  C09D7/65 ,  C09D183/04 ,  G02B1/105 ,  G02B1/111 ,  G02B1/14 ,  C08K5/053

摘要： [Object]To provide a coating composition excellent in coatability and free from viscosity increase caused by degradation over time, and also to provide a hardened film-formation method employing that.[Means]The present invention provides a coating composition comprising: a siloxane resin having silanol groups or alkoxysilyl groups, and a polyol having hydroxyl groups at both ends of a straight 2 to 5 carbon atom hydrocarbon chain. This coating composition enables to form a hardened film of high transparency, of high insulation and of low dielectricity.

摘要翻译： 本发明提供一种涂布性优异且不随着时间的劣化而引起的粘度增加的涂料组合物，并提供使用该涂料组合物的硬化成膜方法。 本发明提供一种涂料组合物，其包含：具有硅烷醇基或烷氧基甲硅烷基的硅氧烷树脂，以及在直链2〜5个碳原子的烃链的两端具有羟基的多元醇。 该涂料组合物能够形成高透明度，高绝缘性和低介电性的硬化膜。

公开(公告)号：US20130274915A1

公开(公告)日：2013-10-17

申请号：US13916149

申请日：2013-06-12

申请人： Hidehiro Maeda ,  Kazuya Okamoto ,  Yasuaki Tanaka

发明人： Hidehiro Maeda ,  Kazuya Okamoto ,  Yasuaki Tanaka

IPC分类号： H01L21/677

CPC分类号： H01L21/677 ,  H01L21/67092 ,  H01L21/67259 ,  H01L21/68 ,  H01L24/34 ,  H01L2924/00014 ,  Y10T156/10 ,  H01L2224/37099 ,  H01L2224/84

摘要： Provided is a transport method comprising judging whether there is a possibility that misalignment greater than or equal to a threshold value occurs between substrates to be layered that are held by a pair of substrate holders aligned and stacked by an aligning section, the misalignment occurring when the pair of substrate holders is transported from the aligning section to a pressure applying section; and if the judgment indicates that there is the possibility of misalignment, transporting the pair of substrate holders to a region other than the pressure applying section. Whether there is the possibility of misalignment may be judged based on acceleration of the substrate holders. Whether there is the possibility of misalignment may be judged based on acceleration of a transporting section that transports the substrate holders. Whether there is the possibility of misalignment may be judged based on relative positions of the substrate holders. Whether there is the possibility of misalignment may be judged based on relative positions of (i) a transporting section that transports the pair of substrate holders and (ii) one of the pair of substrate holders.

摘要翻译： 提供了一种传送方法，包括判断是否存在由被对准部对准和堆叠的一对基板保持器保持的要分层的基板之间的大于或等于阈值的偏移的可能性， 一对基板支架从对准部分输送到压力施加部分; 并且如果判断表示存在不对准的可能性，则将一对基板保持器传送到除压力施加部以外的区域。 可以基于基板保持器的加速度判断是否存在未对准的可能性。 可以基于输送基板保持器的输送部的加速度判断是否存在未对准的可能性。 可以基于基板保持器的相对位置来判断是否存在未对准的可能性。 可以基于（i）输送一对基板保持器的输送部和（ii）一对基板保持件中的一个的相对位置来判断是否存在未对准的可能性。

公开(公告)号：US08489227B2

公开(公告)日：2013-07-16

申请号：US13548287

申请日：2012-07-13

申请人： Hidehiro Maeda ,  Kazuya Okamoto ,  Yasuaki Tanaka

发明人： Hidehiro Maeda ,  Kazuya Okamoto ,  Yasuaki Tanaka

IPC分类号： G06F7/00 ,  G06F19/00 ,  H01L21/68 ,  H01L23/544 ,  B29C65/00 ,  G01B11/00

CPC分类号： H01L21/677 ,  H01L21/67092 ,  H01L21/67259 ,  H01L21/68 ,  H01L24/34 ,  H01L2924/00014 ,  Y10T156/10 ,  H01L2224/37099 ,  H01L2224/84

摘要： Provided is a transport method comprising judging whether there is a possibility that misalignment greater than or equal to a threshold value occurs between substrates to be layered that are held by a pair of substrate holders aligned and stacked by an aligning section, the misalignment occurring when the pair of substrate holders is transported from the aligning section to a pressure applying section; and if the judgment indicates that there is the possibility of misalignment, transporting the pair of substrate holders to a region other than the pressure applying section. Whether there is the possibility of misalignment may be judged based on at least one of an acceleration of the substrate holders, an acceleration of a transporting section that transports the substrate holders, relative positions of the substrate holders, or relative positions of the transporting section and one of the pair of substrate holders.

摘要翻译： 提供了一种传送方法，包括判断是否存在由被对准部对准和堆叠的一对基板保持器保持的要分层的基板之间的大于或等于阈值的偏移的可能性， 一对基板支架从对准部分输送到压力施加部分; 并且如果判断表示存在不对准的可能性，则将一对基板保持器传送到除压力施加部以外的区域。 是否存在未对准的可能性可以基于基板保持器的加速度，输送基板保持器的输送部分的加速度，基板保持器的相对位置或输送部分的相对位置和 一对基板支架之一。

公开(公告)号：US06608681B2

公开(公告)日：2003-08-19

申请号：US10186687

申请日：2002-07-02

申请人： Yasuaki Tanaka ,  Seiro Murakami ,  Kenji Nishi

发明人： Yasuaki Tanaka ,  Seiro Murakami ,  Kenji Nishi

IPC分类号： G01B1100

CPC分类号： G03F7/70358 ,  G03F9/7026

摘要： An apparatus for exposing a pattern, formed on a mask, on each of a plurality of partitioned areas on a photosensitive substrate by a step-and-repeat scheme includes a projection optical system for projecting the pattern of the mask on the photosensitive substrate, a substrate stage for holding the photosensitive substrate and two-dimensionally moving the photosensitive substrate within a plane perpendicular to the optical axis of the projection optical system, a detection unit for projecting a pattern image having a predetermined shape on the photosensitive substrate and photoelectrically detecting light reflected by the photosensitive substrate to detect a position at each of a plurality of points on the photosensitive substrate along the optical axis of the projection optical system, and a measurement unit for, when each of a plurality of measurement points in a partitioned area on which a pattern of the mask is to be exposed next coincides with or approaches the pattern image, detecting an offset amount between an imaging plane of the projection optical system and the next partitioned area along the optical axis during a stepping operation of the substrate stage, wherein the imaging plane and the next partitioned area are relatively moved along the optical axis in accordance with the measured offset amount before the pattern of the mask is exposed on the next partitioned area.