摘要:
An integrated circuit memory device includes a refresh control circuit that generates an internal memory refresh command signal having a period that is changed relative to a period of an external memory refresh command signal received by the memory device. This change in the period of the internal memory refresh command may be in response to detecting a change in temperature of the memory device. In particular, the refresh control circuit is configured so that the period of the internal memory refresh command signal is increased in response to detecting a reduction in temperature of the memory device.
摘要:
A dynamic random access memory (DRAM) device, including a DRAM core having memory cells for storing data information, and a read protection unit, prevents data stored in the memory cells before power-off, from being read out at power-on.
摘要:
A method for forming a STI of a semiconductor device includes steps of sequentially forming a pad oxide film and a pad nitride film on the semiconductor device and carrying out a pattern process PR; etching the pad oxide film and the nitride film and carrying out a cleaning process; selectively growing epitaxial silicon; and carrying out liner oxidation on the epitaxial silicon and carrying out CMP so as to form an oxidation fill and STI.
摘要:
A method of forming a trench in a semiconductor device includes forming a polish stop layer on a semiconductor substrate. The polish stop layer and the semiconductor substrate are then etched to form a trench. The semiconductor substrate is etched to a predetermined depth. Also, etching is performed such that ends of the polish stop layer adjacent to the trench are rounded. Next, an insulation layer that fills the trench is formed.
摘要:
An internal reference voltage generating circuit that reduces a standby current and the number of pins of a semiconductor memory device, in which a reference voltage is provided to an input buffer that receives a signal through an input to which an on die transmitor resistor is connected, includes, a voltage dividing circuit outputting the reference voltage by a power voltage; a pull down driver connected to an end of the voltage dividing circuit; and a calibration control circuit comparing a voltage level of the input and a voltage level of an end of the voltage dividing circuits and controlling the on resistor value of the pull down driver according to a result of the comparison. The internal reference voltage generating circuit is operated white the memory controller inputs a signal into a mode register set (MRS) to enable the internal reference voltage generating circuit and the output signal of the MRS is activated.
摘要:
A temperature sensor includes a proportional to absolute temperature (PTAT) current generator configured to generate a first current proportional to temperature, a first complementary to absolute temperature (CTAT) current generator configured to generate a second current inversely proportional to temperature, a second CTAT current generator configured to generate a third current inversely proportional to temperature, and a temperature sensing unit configured to convert the first current, the second current, and the third current into a signal related to the temperature.
摘要:
Semiconductor devices having an elevated contact region and methods of fabricating the same are disclosed. A disclosed semiconductor device includes a semiconductor substrate, a gate on the semiconductor substrate, spacers on sidewalls of the gate, an epitaxial layer on the semiconductor substrate, source/drain regions within the semiconductor substrate below the epitaxial layer, and low doping concentration regions within the semiconductor below the spacers. In an example, the spacers partially overlap onto the epitaxial layer.
摘要:
Methods for forming STI structures in semiconductor devices are disclosed. A disclosed method comprises: forming a buffer oxide layer on a silicon substrate; implanting ions into the entire surface of the resulting structure and removing the buffer oxide layer; depositing a gate oxide layer, a polysilicon layer and a nitride layer, forming a photoresist pattern; forming the trench of the STI structure by perform an etching process using the photoresist pattern as an etching mask; forming a thin oxide layer inside the trench and on the nitride layer on the entire surface of the resulting structure; filling the trench with an insulating layer; planarizing the insulating layer by performing a CMP process using the nitride layer as an etching stop layer; performing a recessing process to etch the planarized insulating layer and the thin oxide layer on the trench to a predetermined depth; forming a photoresist pattern on the nitride layer; and forming the gate electrodes by performing an etching process using the photoresist pattern as a mask pattern.
摘要:
An input/output circuit for a semiconductor memory device, including a data output circuit configured to buffer output data in the semiconductor memory device in response to an input/output enable signal to output the buffered output data to an input/output signal line, a data input circuit configured to receive input data from the input/output signal line and buffer the input data to transfer the buffered input data to the semiconductor memory device, and a load controller configured to control a load on the input/output signal line in response to the input/output enable signal.
摘要:
A semiconductor memory device includes a core block having sub-arrays and sense amplifier regions. First and second charge storing regions are disposed at sides of the core block. First and second decoupling capacitors are formed at the first and second charge storing regions, respectively. A plurality of first voltage supply lines are disposed to supply a power supply voltage to the sense amplifier regions and are connected to one electrode of each of the first and second decoupling capacitors. A plurality of second voltage supply lines are disposed to supply a ground voltage to the sense amplifier regions and are connected to the other electrode of each of the first and second decoupling capacitors.