公开(公告)号：USD1051838S1

公开(公告)日：2024-11-19

申请号：US29818782

申请日：2021-12-10

Applicant: Applied Materials, Inc.

Designer： Bon-Woong Koo ,  Frank Sinclair ,  Alexandre Likhanskii ,  Svetlana Radovanov ,  Alexander Perel ,  Graham Wright ,  Jay T. Scheuer ,  Daniel Tieger ,  You Chia Li ,  Jay Johnson ,  Tseh-Jen Hsieh ,  Ronald Johnson

公开(公告)号：US20240371602A1

公开(公告)日：2024-11-07

申请号：US18143666

申请日：2023-05-05

Applicant: Applied Materials, Inc.

Inventor： Frank Sinclair ,  Paul Joseph Murphy ,  Bon-Woong Koo ,  Gregory Edward Stratoti ,  Tseh-Jen Hsieh ,  Alexandre Likhanskii ,  Glenn Green

IPC: H01J37/317 ,  H01J37/08 ,  H01J37/147

Abstract: An ion implanter that includes an ion source to generate an ion beam, a platen disposed in a process chamber to support a workpiece that is treated with the ion beam, and a plasma flood gun that results in fewer particles in the process chamber is disclosed. The plasma flood gun includes at least one plasma chamber, each having at least one aperture through which low energy ions and electrons are emitted. A sweeper is located near the aperture, positioned so as to be between the aperture and the upstream components. The sweeper is heated using resistive elements or a halogen lamp so as to elevate its temperature, which limited the amount of deposition that occurs on the sweeper.

公开(公告)号：US11424097B2

公开(公告)日：2022-08-23

申请号：US16923304

申请日：2020-07-08

Applicant: APPLIED Materials, Inc.

Inventor： Bon-Woong Koo ,  Svetlana Radovanov ,  Frank Sinclair ,  You Chia Li ,  Peter Ewing ,  Ajdin Sarajlic ,  Christopher A. Rowland ,  Nunzio Carbone

IPC: H01J37/08 ,  H01J37/317

Abstract: Provided herein are approaches for increasing efficiency of ion sources. In some embodiments, an apparatus, such as an ion source, may include a chamber housing having a first end wall and a second end wall, and an extraction plate coupled to at least one of the first end wall and the second end wall. The extraction plate may include an extraction aperture. The apparatus may further include a tubular cathode extending between the first end wall and the second end wall.

公开(公告)号：US20210383995A1

公开(公告)日：2021-12-09

申请号：US17407714

申请日：2021-08-20

Applicant: Applied Materials, Inc.

Inventor： Bon-Woong Koo ,  Frank Sinclair ,  Alexandre Likhanskii ,  Svetlana Radovanov ,  Alexander Perel ,  Graham Wright ,  Jay T. Scheuer ,  Daniel Tieger ,  You Chia Li ,  Jay Johnson ,  Tseh-Jen Hsieh ,  Ronald Johnson

IPC: H01J27/02

Abstract: An ion source including a chamber housing defining an ion source chamber and including an extraction plate on a front side thereof, the extraction plate having an extraction aperture formed therein, and a tubular cathode disposed within the ion source chamber and having an opening formed in a front half thereof nearest the extraction aperture, wherein a rear half of the tubular cathode furthest from the extraction aperture is closed.

公开(公告)号：US11127557B1

公开(公告)日：2021-09-21

申请号：US16817500

申请日：2020-03-12

Applicant: Applied Materials, Inc.

Inventor： Bon-Woong Koo ,  Frank Sinclair ,  Alexandre Likhanskii ,  Svetlana Radovanov ,  Alexander Perel ,  Graham Wright ,  Jay T. Scheuer ,  Daniel Tieger ,  You Chia Li ,  Jay Johnson ,  Tseh-Jen Hsieh ,  Ronald Johnson

IPC: H01J37/08 ,  H01J37/317

Abstract: An ion source including a chamber housing defining an ion source chamber and including an extraction plate on a front side thereof, the extraction plate having an extraction aperture formed therein, and a tubular cathode disposed within the ion source chamber and having a slot formed in a front-facing semi-cylindrical portion thereof disposed in a confronting relationship with the extraction aperture, wherein a rear-facing semi-cylindrical portion of the tubular cathode directed away from the extraction aperture is closed.

公开(公告)号：US20210134569A1

公开(公告)日：2021-05-06

申请号：US17150031

申请日：2021-01-15

Applicant: Applied Materials, Inc.

Inventor： Svetlana B. Radovanov ,  Bon-Woong Koo ,  Alexandre Likhanskii

IPC: H01J37/32 ,  H01J37/08 ,  H01J37/24

Abstract: An ion source having an electrically isolated extraction plate is disclosed. By isolating the extraction plate, a different voltage can be applied to the extraction plate than to the body of the arc chamber. By applying a more positive voltage to the extraction plate, more efficient ion source operation with higher plasma density can be achieved. In this mode the plasma potential is increased, and the electrostatic sheath reduces losses of electrons to the chamber walls. By applying a more negative voltage, an ion rich sheath adjacent to the extraction aperture can be created. In this mode, conditioning and cleaning of the extraction plate is achieved via ion bombardment. Further, in certain embodiments, the voltage applied to the extraction plate can be pulsed to allow ion extraction and cleaning to occur simultaneously.

公开(公告)号：US10923309B2

公开(公告)日：2021-02-16

申请号：US16178167

申请日：2018-11-01

Applicant: APPLIED Materials, Inc.

Inventor： Bon-Woong Koo ,  Ajdin Sarajlic ,  Ronald Johnson ,  Nunzio V. Carbone ,  Peter Ewing ,  Mervyn Deegan

IPC: H01J37/08 ,  H01J37/317

Abstract: A method for improving the beam current for certain ion beams, and particularly germanium and argon, is disclosed. The use of argon as a second gas has been shown to improve the ionization of germane, allowing the formation of a germanium ion beam of sufficient beam current without the use of a halogen. Additionally, the use of germane as a second gas has been shown to improve the beam current of an argon ion beam.