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公开(公告)号:US20230250579A1
公开(公告)日:2023-08-10
申请号:US18006080
申请日:2021-07-23
Applicant: ARKEMA FRANCE , BOSTIK SA
Inventor: Thomas PRENVEILLE , Quentin PINEAU , Sophie CHHUN
IPC: D06M15/592 , D06M17/08
CPC classification number: D06M15/592 , D06M17/08 , D06M2101/34
Abstract: The use, for seamless textile assembly by printing, of a copolyamide including: a) at least one hard segment obtained by polycondensation of at least one of the following: (i) an α,ω-aminocarboxylic acid; (ii) a lactam; and/or (iii) an aliphatic diacid with 6 to 22 carbon atoms and at least one aliphatic diamine with 2 to 14 carbon atoms, and, optionally, b) at least one soft segment obtained by polycondensation of at least one diacid with 4 to 44 carbon atoms with at least one diamine chosen from diamines with 2 to 44 carbon atoms and polyoxyalkylene diamines, the copolyamide having a melting temperature Tm above 80° C. and below 210° C. and a viscosity at 170° C., as measured according to standard ASTM D3236-88 (2009), using a Brookfield rheometer with SC 4-27 spindle, of between 5 Pa·s and 100-200 Pa·s.
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公开(公告)号:US20220220257A1
公开(公告)日:2022-07-14
申请号:US17614017
申请日:2020-05-27
Applicant: Arkema France
Inventor: Quentin PINEAU , Jean-Jacques FLAT , Marie-Ange LEMAITRE
Abstract: The invention relates to a self-retardant copolyesteramide, characterised in that it is obtained by means of polycondensation of at least one polyamide monomer with at least one phosphorus-containing diol. The invention also relates to the use of such a copolyesteramide according to the invention for the manufacture of electrical and/or electrotechnical objects, tubes, cables, electrical safety objects, moulded objects, and/or objects obtained by 3D printing.
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23.
公开(公告)号:US20170130000A1
公开(公告)日:2017-05-11
申请号:US15322934
申请日:2015-06-22
Applicant: Arkema France
Inventor: Quentin PINEAU
IPC: C08G69/26 , C09J177/06
Abstract: A semi-crystalline polyamide including at least one monomer resulting from the condensation of a diacid and of a diamine of formula AP.Y, the semi-crystalline polyamide having the following general formula (I): AP.Y/(A)m/(Pip.Y′)n/(B.Y″)q and the semi-crystalline polyamide having an Mp1 less than or equal to approximately 150° C., in particular less than or equal to approximately 130° C., in particular less than or equal to approximately 120° C. and/or a Tg less than or equal to approximately 60° C., in particular less than or equal to approximately 50° C., in particular less than or equal to approximately 40° C., as determined respectively by DSC according to standard ISO 11357-3 (2013) and ISO 11357-2 (2013).
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公开(公告)号:US20170096529A1
公开(公告)日:2017-04-06
申请号:US15126492
申请日:2015-03-05
Applicant: ARKEMA FRANCE
Inventor: Quentin PINEAU , Bruno D'HERBECOURT
IPC: C08G69/44 , C08G69/40 , C09J177/02 , C09J177/12
Abstract: Composition comprising, on a weight basis, the total being equal to 100%: from 98% to 100% of at least one copolyamide bearing amide units and polyether units, having a melting point (Tm) from about 90 to about 150° C., in particular from about 100° C. to about 125° C., and having a flexural modulus of less than 100 MPa, as determined according to standard ISO 178 (2010); from 0 to 2% of at least one additive chosen from stabilizers and dyes, or a mixture thereof, for the manufacture of a heat-sensitive adhesive, in particular a veil, a film, granules, a filament, a grate, a powder or a suspension.
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25.
公开(公告)号:US20160068675A1
公开(公告)日:2016-03-10
申请号:US14786058
申请日:2014-04-10
Applicant: ARKEMA FRANCE
Inventor: Quentin PINEAU , Maho YASUDA
CPC classification number: C08L63/00 , C08G59/245 , C08G59/504 , C08G69/265 , C08G69/36 , C08L13/00 , C08L19/006 , C08L77/06 , C08L2205/03 , C08L2205/05 , C08L2205/06
Abstract: The present invention relates to a composition including, by weight, the total being 100%: 50 to 99% of a curable resin and of a curing agent in a molar ratio in the range of 1/5 to 5/1, and 1 to 50% of a mixture: of a polyamide which includes at least one monomer resulting from the condensation of a diacid and of a diamine of formula (1) where: R1 is H or —Z1-NH2 and Z1 is an alkyl, a cycloalkyl or an aryl having up to 15 carbon atoms, and R2 is H or —Z2-NH2 and Z2 is an alkyl, a cycloalkyl or an aryl having up to 15 carbon atoms, R1 and R2 being either identical or different, and of an oligomer made from butadiene and acrylonitrile which are terminated by carboxyl functions or by amine functions, such as the reactive rubbers CTBN or ATBN; the polyamide and the oligomer being present in respective proportions of 1/10 to 10/1 by weight.
Abstract translation: 本发明涉及一种组合物,其组合物的重量百分比为100%:50〜99%的固化性树脂和固化剂,其摩尔比为1/5〜5/1,1〜 50%的混合物:包含由二酸和式(1)的二胺缩合得到的至少一种单体的聚酰胺,其中:R1是H或-Z1-NH2,Z1是烷基,环烷基或 具有至多15个碳原子的芳基,R2是H或-Z2-NH2,Z2是具有至多15个碳原子的烷基,环烷基或芳基,R1和R2可以相同或不同, 由通过羧基官能或胺官能团终止的丁二烯和丙烯腈,例如反应性橡胶CTBN或ATBN; 聚酰胺和低聚物以1/10至10/1重量比的比例存在。
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公开(公告)号:US20230391059A1
公开(公告)日:2023-12-07
申请号:US18250656
申请日:2021-10-27
Applicant: ARKEMA FRANCE
Inventor: Quentin PINEAU , Charlotte HERDT , Sébastien Jun MOUGNIER
IPC: B32B27/12 , B32B5/02 , B32B27/34 , B32B27/28 , B32B7/12 , B32B27/18 , B32B37/12 , B32B27/08 , B32B37/18
CPC classification number: B32B27/12 , B32B5/02 , B32B27/34 , B32B27/285 , B32B7/12 , B32B27/18 , B32B37/1207 , B32B27/08 , B32B37/182 , B32B2262/0261 , B32B2307/7376 , B32B2307/4026 , B32B2307/3065 , B32B2272/00 , B32B2037/1223 , B32B2305/18 , B32B2307/7246
Abstract: The invention relates to a multilayer structure comprising a textile layer comprising at least one polymer chosen from a polyamide and a copolymer containing polyamide blocks and polyether blocks, and combinations thereof; and a film comprising at least one copolymer containing polyamide blocks and polyether blocks, the polyether blocks comprising polyethylene glycol blocks, the polyethylene glycol blocks representing at least 40% by mass relative to the mass of the film; in which the film adheres to the textile layer via a copolyamide.
The invention also relates to a process for manufacturing said multilayer structure, to a process for recycling said multilayer structure and also to an article comprising said multilayer structure.-
公开(公告)号:US20230357481A1
公开(公告)日:2023-11-09
申请号:US18245171
申请日:2021-09-15
Applicant: ARKema FRANCE
Inventor: Blandine TESTUD , Quentin PINEAU , Florent ABGRALL , Clio COCQUET
IPC: C08F293/00 , C08J9/02
CPC classification number: C08F293/00 , C08J9/02 , C08J2353/00
Abstract: A composition including a copolymer containing polyamide blocks and polyether blocks including at least one carboxylic acid chain end having reacted with an epoxide function, the process for preparing same, and also the use thereof. A foam formed from this composition, the process for preparing same, and the use thereof.
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公开(公告)号:US20220315701A1
公开(公告)日:2022-10-06
申请号:US17627142
申请日:2020-07-15
Applicant: Arkema France
Inventor: Quentin PINEAU , Clio COCQUET , Helena CHEMINET , Claude-Olivier BOISSIERE
Abstract: A method relating to a copolymer containing rigid polyamides blocks and flexible blocks including, relative to the total weight of the copolymer: from 55% to 90% by weight of flexible blocks, including at least 35% by weight from polyethylene glycol; from 10% to 45% by weight of rigid polyamide blocks, in which the mean carbon content of the repeating units of the polyamide blocks is greater than or equal to 7. A method also relating to a process for preparing such a copolymer, to a membrane including such a copolymer and to a process for preparing such a membrane.
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公开(公告)号:US20220242994A1
公开(公告)日:2022-08-04
申请号:US17614835
申请日:2020-05-27
Applicant: Arkema France
Inventor: Blandine TESTUD , Quentin PINEAU
IPC: C08F293/00 , C08L77/12
Abstract: The present invention concerns the use of PCL in preparing a block copolymer comprising at least one rigid block and at least one flexible block, for enhancing the sebum resistance of said block copolymer.
The present invention also provides a sebum-resistant block copolymer, characterized in that it comprises rigid blocks and flexible blocks comprising at least 50% by weight of PCL, based on the total weight of flexible blocks, which represents 100%; a process for synthesizing said copolymer; and also compositions and articles comprising a sebum-resistant copolymer of this kind.-
公开(公告)号:US20220135746A1
公开(公告)日:2022-05-05
申请号:US17434777
申请日:2020-03-16
Applicant: Arkema France
Inventor: Clio COCQUET , Quentin PINEAU
Abstract: The invention relates to a branched copolymer containing rigid blocks and flexible blocks, wherein the branchings are made by a polyol residue binding rigid blocks of the copolymer, said polyol being a polyol comprising at least three hydroxyl groups, said copolymer having a weight-average molar mass Mw of greater than or equal to 80 000 g/mol, and wherein the ratio of the weight-average molar mass Mw of the copolymer to the number-average molar mass Mn of the copolymer is greater than or equal to 2.2. The invention also relates to a process for manufacturing such a copolymer and also to a foam of such a copolymer, to a process for manufacturing such a foam and articles made from such a foam.
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