公开(公告)号：US20230161271A1

公开(公告)日：2023-05-25

申请号：US18100400

申请日：2023-01-23

Applicant: ASML Netherlands B.V.

Inventor： Hessel Bart KOOLMEES ,  Johannes Petrus Martinus Bernardus VERMEULEN

IPC: G03F7/20 ,  H02K3/02 ,  H02K41/02 ,  H02K55/00

CPC classification number: G03F7/70775 ,  H02K3/02 ,  H02K41/02 ,  H02K55/00

Abstract: The invention provides an assembly comprising a cryostat and a flat coil layer of superconducting coils for use with a magnetic levitation and/or acceleration motor system of a lithographic apparatus. The cryostat comprises two insulation coverings. The coil layer is arranged between the two coverings. The coverings each comprise an inner plate configured to be cryocooled and an outer plate parallel to the inner plate, and an insulation system with a vacuum layer between the inner and outer plate. The insulation system of said covering comprises a layers of circular bodies, the central axes of these bodies extending perpendicular to the inner and outer plate, and is configured to provide a layer of point contacts between two layers of circular bodies or between a layer of circular bodies and the inner and/or outer plate.

公开(公告)号：US20210263431A1

公开(公告)日：2021-08-26

申请号：US17269909

申请日：2019-07-16

Applicant: ASML Netherlands B.V.

Inventor： Johannes Petrus Martinus Bernardus VERMEULEN ,  Luc Leonardus Adrianus Martinus MEULENDIJKS ,  Antonius Franciscus Johannes DE GROOT ,  Johannes Adrianus Cornelis Maria PIJNENBURG

IPC: G03F7/20

Abstract: The invention provides a substrate support for supporting a substrate, comprising: a support body, which support body comprises a support surface for supporting the substrate, a rotary dither device, which is configured to induce a relative rotary dither motion between the substrate and the support surface of the support body around a rotation axis which is perpendicular to the support surface.

公开(公告)号：US20200064731A1

公开(公告)日：2020-02-27

申请号：US16667956

申请日：2019-10-30

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： David Ferdinand VLES ,  Erik Achilles ABEGG ,  Aage BENDIKSEN ,  Derk Servatius Gertruda BROUNS ,  Pradeep K. GOVIL ,  Paul JANSSEN ,  Maxim Aleksandrovich NASALEVICH ,  Arnould Willem NOTENBOOM ,  Mária PÉTER ,  Marcus Adrianus VAN DE KERKHOF ,  Willem Joan VAN DER ZANDE ,  Pieter-Jan VAN-ZWOL ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  Willem-Pieter VOORTHUIJZEN ,  James Norman WILEY

IPC: G03F1/64 ,  G03F1/22 ,  G03F7/20 ,  G03F1/62

Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.

公开(公告)号：US20180340767A1

公开(公告)日：2018-11-29

申请号：US15778061

申请日：2016-11-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Stoyan NIHTIANOV ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Johannes Paul Marie DE LA ROSETTE ,  Thibault Simon Mathieu LAURENT ,  Kofi Afoiabi MAKINWA ,  Jacobus NEEFS ,  Johannes Petrus Martinus Bernardus VERMEULEN

IPC: G01B7/16 ,  G03F7/20 ,  G01K7/01 ,  H01L21/67

CPC classification number: G01B7/20 ,  G01K7/01 ,  G03F7/70625 ,  G03F7/7085 ,  G03F7/70866 ,  G03F7/70875 ,  H01L21/67248 ,  H01L21/67276 ,  H01L22/34

Abstract: A measurement substrate for measuring a condition pertaining in an apparatus for processing production substrates during operation thereof, the measurement substrate including: a body having dimensions compatible with the apparatus; a plurality of sensor modules embedded in the body, each sensor module having: a sensor configured generate an analog measurement signal, an analog to digital converter to generate digital measurement information from the analog measurement signal, and a module controller configured to output the digital measurement information; and a central control module configured to receive the digital measurement information from each of the module controllers and to communicate the digital measurement information to an external device.

公开(公告)号：US20180239240A1

公开(公告)日：2018-08-23

申请号：US15752302

申请日：2016-08-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Zomer Silvester HOUWELING ,  Eric Willem Felix CASIMIRI ,  Tamara DRUZHININA ,  JANSSEN Paul ,  Michael Alfred Josephus KUIJKEN ,  Martinus Hendrikus Antonius LEENDERS ,  Sicco OOSTERHOFF ,  Mária PÉTER ,  Willem Joan VAN DER ZANDE ,  Pieter-Jan VAN ZWOL ,  Beatrijs Louise Marie-Joseph Katrie VERBRUGGE ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  David Ferdinand VLES ,  Willem-Pieter VOORTHUIJZEN

IPC: G03F1/62 ,  G03F7/20

CPC classification number: G03F1/62 ,  G03F7/70983

Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.