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    Cleaning a structure surface in an EUV chamber
    21.
    发明授权
    Cleaning a structure surface in an EUV chamber 有权

    公开(公告)号：US11347154B2

    公开(公告)日：2022-05-31

    申请号：US16961747

    申请日：2019-02-12

    Applicant: ASML Netherlands B.V.

    Inventor： Chunguang Xia ,  Jonghoon Baek ,  John Tom Stewart, IV ,  Andrew David LaForge ,  Deniz Van Heijnsbergen ,  David Robert Evans ,  Nina Vladimirovna Dziomkina ,  Yue Ma

    IPC: G03F7/20 ,  H01J37/32 ,  H05G2/00 ,  H05H1/46

    Abstract: In some general aspects, a surface of a structure within a chamber of an extreme ultraviolet (EUV) light source is cleaned using a method. The method includes generating a plasma state of a material that is present at a location adjacent to a non-electrically conductive body that is within the chamber. The generation of the plasma state of the material includes electromagnetically inducing an electric current at the location adjacent the non-electrically conductive body to thereby transform the material that is adjacent the non-electrically conductive body from a first state into the plasma state. The plasma state of the material includes plasma particles, at least some of which are free radicals of the material. The method also includes enabling the plasma particles to pass over the structure surface to remove debris from the structure surface without removing the structure from the chamber of the EUV light source.

    Coatings
    26.
    发明授权
    Coatings 有权
    涂料

    公开(公告)号：US09323164B2

    公开(公告)日：2016-04-26

    申请号：US14514019

    申请日：2014-10-14

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Nina Vladimirovna Dziomkina

    IPC: G03F7/20

    CPC classification number: G03F7/7095 ,  G03F7/2041 ,  G03F7/2043 ,  G03F7/70341 ,  G03F7/70958

    Abstract: A coating is disclosed. The coating may be used in an apparatus having a radiation source, e.g. a lithographic apparatus. The coating comprises the elements Si, O, F and, optionally, C and H. An article is also disclosed. The article may be any one of the group consisting of a substrate table, an optical element, a shutter member, a sensor, a projection system, and a confinement structure. At least a portion of a surface of the article is coated with a coating. The coating comprises the elements Si, O, F and, optionally, C and H. The coating may comprise the elements Si, O, C and H.

    Abstract translation: 公开了一种涂层。 该涂层可用于具有辐射源的设备中，例如， 光刻设备。 涂层包含元素Si，O，F以及任选的C和H.还公开了一种制品。 该物品可以是由衬底台，光学元件，遮挡构件，传感器，投影系统和限制结构组成的组中的任何一个。 制品的表面的至少一部分涂覆有涂层。 涂层包含元素Si，O，F以及任选的C和H.涂层可以包括元素Si，O，C和H.

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