公开(公告)号：US20160266486A1

公开(公告)日：2016-09-15

申请号：US15034810

申请日：2014-10-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Sander Frederik WUISTER ,  Davide AMBESI

IPC: G03F1/70 ,  G06F17/50

CPC classification number: G03F1/70 ,  G03F7/0002 ,  G06F17/5068 ,  G06F2217/12

Abstract: A method of designing a feature guiding template for guiding self-assembly of block copolymer to form at least two features in a design layout for lithography, the feature guiding template including at least two portions joined by a bottleneck, the method including determining a characteristic of the feature guiding template based on at least a function of geometry of the feature guiding template including a value of a first width of at least one of the portions, a value of a second width of the bottleneck, or a value based on both the first width and the second width.

Abstract translation: 一种设计特征引导模板的方法，用于引导嵌段共聚物的自组装以在用于光刻的设计布局中形成至少两个特征，所述特征引导模板包括由瓶颈连接的至少两个部分，所述方法包括确定 所述特征引导模板至少基于所述特征引导模板的几何形状的函数，所述特征引导模板包括所述部分中的至少一个部分的第一宽度的值，所述瓶颈的第二宽度的值或基于所述第一 宽度和第二宽度。

公开(公告)号：US20150364335A1

公开(公告)日：2015-12-17

申请号：US14764133

申请日：2014-01-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Sander Frederik WUISTER ,  Tamara DRUZHININA ,  Mircea DUSA

IPC: H01L21/308 ,  G03F1/50 ,  G03F1/80 ,  H01L29/78

CPC classification number: H01L21/3086 ,  B82Y10/00 ,  G03F1/50 ,  G03F1/80 ,  G03F7/0002 ,  H01L21/0271 ,  H01L21/0337 ,  H01L29/0673 ,  H01L29/66439 ,  H01L29/66795 ,  H01L29/775 ,  H01L29/785

Abstract: A method of forming a plurality of regularly spaced lithography features, the method including providing a self-assemblable block copolymer having first and second blocks in a plurality of trenches on a substrate, each trench including opposing side-walls and a base, with the side-walls having a width therebetween, wherein a first trench has a greater width than a second trench; causing the self-assemblable block copolymer to self-assemble into an ordered layer in each trench, the layer having a first domain of the first block alternating with a second domain of the second block, wherein the first and second trenches have the same number of each respective domain; and selectively removing the first domain to form regularly spaced rows of lithography features having the second domain along each trench, wherein the pitch of the features in the first trench is greater than the pitch of the features in the second trench.

Abstract translation: 一种形成多个规则间隔的光刻特征的方法，所述方法包括提供在衬底上的多个沟槽中具有第一和第二块的自组装嵌段共聚物，每个沟槽包括相对的侧壁和底部， 在其间具有宽度的壁，其中第一沟槽具有比第二沟槽更大的宽度; 使得所述自组装嵌段共聚物自组装成每个沟槽中的有序层，所述层具有所述第一嵌段的第一区域与所述第二嵌段的第二区域交替，其中所述第一和第二沟槽具有相同数量的 各个域; 并且选择性地移除所述第一区域以形成沿着每个沟槽具有所述第二区域的规则间隔的光刻特征行，其中所述第一沟槽中的所述特征的间距大于所述第二沟槽中的所述特征的间距。