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公开(公告)号：US08710473B2
公开(公告)日：2014-04-29
申请号：US13283849
申请日：2011-10-28
IPC分类号： H05G2/00
摘要： A droplet generation and detection device may include: a droplet generation unit for outputting a charged droplet; at least one droplet sensor including a magnetic circuit including a coil configured of an electrically conductive material, the magnetic circuit being disposed such that the charged droplet passes around the magnetic circuit, and a current detection unit for detecting current flowing in the coil and outputting a detection signal; and a signal processing circuit for detecting the charged droplet based on the detection signal.
摘要翻译： 液滴生成和检测装置可以包括：用于输出带电液滴的液滴产生单元; 至少一个液滴传感器，其包括包括由导电材料构成的线圈的磁路，所述磁路被布置成使得所述带电液滴绕过所述磁路;以及电流检测单元，用于检测在所述线圈中流动的电流并输出 检测信号; 以及信号处理电路，用于根据检测信号检测带电液滴。
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公开(公告)号：US08710472B2
公开(公告)日：2014-04-29
申请号：US13192857
申请日：2011-07-28
申请人： Takanobu Ishihara , Youichi Sasaki , Kouji Kakizaki , Masahiro Inoue , Takayuki Yabu , Hideo Hoshino
发明人： Takanobu Ishihara , Youichi Sasaki , Kouji Kakizaki , Masahiro Inoue , Takayuki Yabu , Hideo Hoshino
IPC分类号： H05G2/00
摘要： A target output device may include: a main body for storing a target material; a nozzle unit, connected to the main body, for outputting the target material as a target; an electrode unit provided so as to face the nozzle unit; a voltage control unit that applies predetermined voltage between the electrode unit and the target material to generate electrostatic force therebetween for pulling out the target material through the nozzle unit; a pressure control unit that applies predetermined pressure to the target material; and an output control unit that causes the target to be outputted through the nozzle unit by controlling signal output timing of each of a first timing signal and a second timing signal, the first timing signal causing the voltage control unit to apply the predetermined voltage between the target material and the electrode unit at first timing, and the second timing signal causing the pressure control unit to apply the predetermined pressure to the target material at second timing.
摘要翻译： 目标输出装置可以包括：用于存储目标材料的主体; 喷嘴单元，连接到主体，用于输出目标材料作为目标; 设置成面向喷嘴单元的电极单元; 电压控制单元，其在所述电极单元和所述目标材料之间施加预定电压，以在其间产生静电力，以通过所述喷嘴单元拉出所述目标材料; 压力控制单元，其向所述目标材料施加预定压力; 以及输出控制单元，其通过控制第一定时信号和第二定时信号中的每一个的信号输出定时使所述目标通过所述喷嘴单元输出，所述第一定时信号使所述电压控制单元在所述第一定时信号和所述第二定时信号之间施加所述预定电压 目标材料和电极单元，以及第二定时信号，使得压力控制单元在第二定时将预定压力施加到目标材料。
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公开(公告)号：US20110284774A1
公开(公告)日：2011-11-24
申请号：US13192857
申请日：2011-07-28
申请人： Takanobu ISHIHARA , Youichi Sasaki , Kouji Kakizaki , Masahiro Inoue , Takayuki Yabu , Hideo Hoshino
发明人： Takanobu ISHIHARA , Youichi Sasaki , Kouji Kakizaki , Masahiro Inoue , Takayuki Yabu , Hideo Hoshino
摘要： A target output device may include: a main body for storing a target material; a nozzle unit, connected to the main body, for outputting the target material as a target; an electrode unit provided so as to face the nozzle unit; a voltage control unit that applies predetermined voltage between the electrode unit and the target material to generate electrostatic force therebetween for pulling out the target material through the nozzle unit; a pressure control unit that applies predetermined pressure to the target material; and an output control unit that causes the target to be outputted through the nozzle unit by controlling signal output timing of each of a first timing signal and a second timing signal, the first timing signal causing the voltage control unit to apply the predetermined voltage between the target material and the electrode unit at first timing, and the second timing signal causing the pressure control unit to apply the predetermined pressure to the target material at second timing.
摘要翻译： 目标输出装置可以包括：用于存储目标材料的主体; 喷嘴单元，连接到主体，用于输出目标材料作为目标; 设置成面向喷嘴单元的电极单元; 电压控制单元，其在所述电极单元和所述目标材料之间施加预定电压，以在其间产生静电力，以通过所述喷嘴单元拉出所述目标材料; 压力控制单元，其向所述目标材料施加预定压力; 以及输出控制单元，其通过控制第一定时信号和第二定时信号中的每一个的信号输出定时使所述目标通过所述喷嘴单元输出，所述第一定时信号使所述电压控制单元在所述第一定时信号和所述第二定时信号之间施加所述预定电压 目标材料和电极单元，以及第二定时信号，使得压力控制单元在第二定时将预定压力施加到目标材料。
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公开(公告)号：US08530869B2
公开(公告)日：2013-09-10
申请号：US13184047
申请日：2011-07-15
申请人： Shinji Nagai , Takanobu Ishihara , Kouji Kakizaki , Hiroshi Sobukawa , Takeshi Murakami , Masahiro Inoue
发明人： Shinji Nagai , Takanobu Ishihara , Kouji Kakizaki , Hiroshi Sobukawa , Takeshi Murakami , Masahiro Inoue
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70858 , G03F7/70916 , G03F7/70983 , H05G2/005
摘要： An extreme ultraviolet light source apparatus comprises a target supply unit supplying a target into a vacuum chamber, a laser oscillator outputting a laser light into the vacuum chamber, a collector mirror outputting an extreme ultraviolet light outside by reflecting the extreme ultraviolet light emitted from the target being ionized as a plasma by irradiation with the laser light at a plasma luminescence point in the vacuum chamber, and an ion debris removal unit at least a part of which is located in an obscuration region including the plasma luminescence point.
摘要翻译： 极紫外光源装置包括将目标供给到真空室中的目标供给单元，将激光输出到真空室中的激光振荡器，通过反射从目标发射的极紫外光而向外部输出极紫外光的集光镜 通过在真空室中的等离子体发光点用激光照射等离子体，以及离子碎片去除单元，其至少一部分位于包括等离子体发光点的遮蔽区域中。
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公开(公告)号：US20100108918A1
公开(公告)日：2010-05-06
申请号：US12605725
申请日：2009-10-26
申请人： Shinji Nagai , Takanobu Ishihara , Kouji Kakizaki , Hiroshi Sobukawa , Takeshi Murakami , Masahiro Inoue
发明人： Shinji Nagai , Takanobu Ishihara , Kouji Kakizaki , Hiroshi Sobukawa , Takeshi Murakami , Masahiro Inoue
IPC分类号： G21K5/00
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70858 , G03F7/70916 , G03F7/70983 , H05G2/005
摘要： An extreme ultraviolet light source apparatus comprises a target supply unit supplying a target into a vacuum chamber, a laser oscillator outputting a laser light into the vacuum chamber, a collector mirror outputting an extreme ultraviolet light outside by reflecting the extreme ultraviolet light emitted from the target being ionized as a plasma by irradiation with the laser light at a plasma luminescence point in the vacuum chamber, and an ion debris removal unit at least a part of which is located in an obscuration region including the plasma luminescence point.
摘要翻译： 极紫外光源装置包括将目标供给到真空室中的目标供给单元，将激光输出到真空室中的激光振荡器，通过反射从目标发射的极紫外光而向外部输出极紫外光的集光镜 通过在真空室中的等离子体发光点用激光照射等离子体，以及离子碎片去除单元，其至少一部分位于包括等离子体发光点的遮蔽区域中。
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公开(公告)号：US20110266468A1
公开(公告)日：2011-11-03
申请号：US13184047
申请日：2011-07-15
申请人： Shinji NAGAI , Takanobu Ishihara , Kouji Kakizaki , Hiroshi Sobukawa , Takeshi Murakami , Masahiro Inoue
发明人： Shinji NAGAI , Takanobu Ishihara , Kouji Kakizaki , Hiroshi Sobukawa , Takeshi Murakami , Masahiro Inoue
IPC分类号： G21K5/00
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70858 , G03F7/70916 , G03F7/70983 , H05G2/005
摘要： An extreme ultraviolet light source apparatus comprises a target supply unit supplying a target into a vacuum chamber, a laser oscillator outputting a laser light into the vacuum chamber, a collector mirror outputting an extreme ultraviolet light outside by reflecting the extreme ultraviolet light emitted from the target being ionized as a plasma by irradiation with the laser light at a plasma luminescence point in the vacuum chamber, and an ion debris removal unit at least a part of which is located in an obscuration region including the plasma luminescence point.
摘要翻译： 极紫外光源装置包括将目标供给到真空室中的目标供给单元，将激光输出到真空室中的激光振荡器，通过反射从目标发射的极紫外光而向外部输出极紫外光的集光镜 通过在真空室中的等离子体发光点用激光照射等离子体，以及离子碎片去除单元，其至少一部分位于包括等离子体发光点的遮蔽区域中。
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公开(公告)号：US08003963B2
公开(公告)日：2011-08-23
申请号：US12605725
申请日：2009-10-26
申请人： Shinji Nagai , Takanobu Ishihara , Kouji Kakizaki , Hiroshi Sobukawa , Takeshi Murakami , Masahiro Inoue
发明人： Shinji Nagai , Takanobu Ishihara , Kouji Kakizaki , Hiroshi Sobukawa , Takeshi Murakami , Masahiro Inoue
IPC分类号： G21K5/00
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70858 , G03F7/70916 , G03F7/70983 , H05G2/005
摘要： An extreme ultraviolet light source apparatus comprises a target supply unit supplying a target into a vacuum chamber, a laser oscillator outputting a laser light into the vacuum chamber, a collector mirror outputting an extreme ultraviolet light outside by reflecting the extreme ultraviolet light emitted from the target being ionized as a plasma by irradiation with the laser light at a plasma luminescence point in the vacuum chamber, and an ion debris removal unit at least a part of which is located in an obscuration region including the plasma luminescence point.
摘要翻译： 极紫外光源装置包括将目标供给到真空室中的目标供给单元，将激光输出到真空室中的激光振荡器，通过反射从目标发射的极紫外光而向外部输出极紫外光的集光镜 通过在真空室中的等离子体发光点用激光照射等离子体，以及离子碎片去除单元，其至少一部分位于包括等离子体发光点的遮蔽区域中。
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公开(公告)号：US08445876B2
公开(公告)日：2013-05-21
申请号：US12603872
申请日：2009-10-22
CPC分类号： G03F7/70891 , G03F7/70033 , G03F7/70141 , G03F7/70175 , G03F7/70191 , G03F7/70575 , G03F7/70591 , G03F7/7085 , H05G2/005
摘要： An extreme ultraviolet (EUV) light source apparatus in which a location or posture shift of an EUV collector mirror can be detected. The apparatus includes: a chamber; a target supply mechanism for supplying a target material into the chamber; a driver laser for irradiating the target material with a laser beam to generate plasma; a collector mirror having a first focal point and a second focal point, for reflecting light, which is generated at the first focal point, toward the second focal point; a splitter optical element provided in an optical path of the light reflected by the collector mirror, for splitting a part of the light reflected by the collector mirror; and an image sensor provided in an optical path of the light split by the splitter optical element, for detecting a profile of the light split by the splitter optical element.
摘要翻译： 可以检测EUV收集镜的位置或姿势偏移的极紫外（EUV）光源装置。 该装置包括：一个室; 用于将目标材料供应到所述室中的目标供给机构; 用于用激光束照射目标材料以产生等离子体的驱动器激光器; 收集器反射镜，具有第一焦点和第二焦点，用于将在第一焦点处产生的光朝向第二焦点反射; 分离器光学元件，设置在由集光镜反射的光的光路中，用于分离由集光镜反射的一部分光; 以及图像传感器，其设置在由分离光学元件分离的光的光路中，用于检测由分离光学元件分离的光的轮廓。
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29.发明授权公开(公告)号：US07965756B2
公开(公告)日：2011-06-21
申请号：US12545495
申请日：2009-08-21
IPC分类号： H01S3/22
CPC分类号： H01S3/005 , G02B1/02 , H01S3/0057 , H01S3/08009 , H01S3/08054 , H01S3/10061 , H01S3/2251
摘要： At least either of the light entering plane or the light exiting plane is parallel to the (111) crystal face of the CaF2 crystal and the laser beam entering from the entering plane passes through the plane located between the [111] axis and the first azimuth axis in the locus of rotation of the [001] axis around the [111] axis and including the [111] axis and the first azimuth axis, the plane located between the [111] axis and the second azimuth axis in the locus of rotation of the [010] axis around the [111] axis and including the [111] axis and the second azimuth axis or the plane located between the [111] axis and the third azimuth axis in the locus of rotation of the [100] axis around the [111] axis and including the [111] axis and the third azimuth axis and exits from the exiting plane.
摘要翻译： 进入平面或出射平面的光中的至少任一个平行于CaF 2晶体的（111）晶面，并且从入射平面入射的激光束穿过位于[111]轴和第一方位角 [001]轴围绕[111]轴的旋转轨迹的轴线，包括[111]轴和第一方位轴，位于旋转轨迹中的[111]轴和第二方位角轴之间的平面 围绕[111]轴的[010]轴线，并且包括[111]轴和第二方位角轴或位于[111]轴和第三方位角之间的平面 围绕[111]轴并且包括[111]轴和第三方位角轴并从出射平面离开。
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公开(公告)号：US20100054297A1
公开(公告)日：2010-03-04
申请号：US12545495
申请日：2009-08-21
IPC分类号： H01S3/08
CPC分类号： H01S3/005 , G02B1/02 , H01S3/0057 , H01S3/08009 , H01S3/08054 , H01S3/10061 , H01S3/2251
摘要： At least either of the light entering plane or the light exiting plane is parallel to the (111) crystal face of the CaF2 crystal and the laser beam entering from the entering plane passes through the plane located between the [111] axis and the first azimuth axis in the locus of rotation of the [001] axis around the [111] axis and including the [111] axis and the first azimuth axis, the plane located between the [111] axis and the second azimuth axis in the locus of rotation of the [010] axis around the [111] axis and including the [111] axis and the second azimuth axis or the plane located between the [111] axis and the third azimuth axis in the locus of rotation of the [100] axis around the [111] axis and including the [111] axis and the third azimuth axis and exits from the exiting plane.
摘要翻译： 进入平面或出射平面的光中的至少任一个平行于CaF 2晶体的（111）晶面，并且从入射平面入射的激光束穿过位于[111]轴和第一方位角 [001]轴围绕[111]轴的旋转轨迹的轴线，包括[111]轴和第一方位轴，位于旋转轨迹中的[111]轴和第二方位角轴之间的平面 围绕[111]轴的[010]轴线，并且包括[111]轴和第二方位角轴或位于[111]轴和第三方位角之间的平面 围绕[111]轴并且包括[111]轴和第三方位角轴并从出射平面离开。
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