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公开(公告)号:US08102507B2
公开(公告)日:2012-01-24
申请号:US12694880
申请日:2010-01-27
申请人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Jeroen Johannes Sophia Mertens , Johannes Catharinus Hubertus Mulkens , Christiaan Alexander Hoogendam
发明人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Jeroen Johannes Sophia Mertens , Johannes Catharinus Hubertus Mulkens , Christiaan Alexander Hoogendam
CPC分类号: G03F9/7023 , G03F7/70341 , G03F7/70883
摘要: A lithographic apparatus, includes a support structure configured to hold a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate table; a sensor configured to measure an exposure parameter using a measuring beam projected through the liquid; and a correction system configured to determine an offset based on a change of a physical property impacting a measurement made using the measuring beam to at least partly correct the measured exposure parameter.
摘要翻译: 光刻设备包括被配置为保持图案形成装置的支撑结构,所述图案形成装置被配置成在其横截面中赋予图案的辐射束; 被配置为保持基板的基板台; 投影系统,被配置为将所述图案化的光束投影到所述基板的目标部分上; 液体供应系统,被配置为向所述投影系统和所述基板台之间的空间提供液体; 传感器,被配置为使用通过所述液体投影的测量光束来测量曝光参数; 以及校正系统,其被配置为基于影响使用所述测量光束进行的测量的物理属性的变化来确定偏移,以至少部分地校正所测量的曝光参数。
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公开(公告)号:US07670730B2
公开(公告)日:2010-03-02
申请号:US11298942
申请日:2005-12-12
申请人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Jeroen Johannes Sophia Mertens , Johannes Catharinus Hubertus Mulkens , Christiaan Alexander Hoogendam
发明人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Jeroen Johannes Sophia Mertens , Johannes Catharinus Hubertus Mulkens , Christiaan Alexander Hoogendam
CPC分类号: G03F9/7023 , G03F7/70341 , G03F7/70883
摘要: A method for correcting an exposure parameter of an immersion lithographic apparatus is provided. In the method, an exposure parameter is measured using a measuring beam projected through a liquid between the projection system and a substrate table of the immersion lithographic apparatus and offset is determined based on a change of a physical property impacting a measurement made using the measuring beam to at least partly correct the measured exposure parameter. Also, there is provided an apparatus and method to measure a height of an optical element connected to liquid between the projection system and the substrate table in the immersion lithographic apparatus.
摘要翻译: 提供了一种用于校正浸没式光刻设备的曝光参数的方法。 在该方法中,使用通过投影系统和浸没式光刻设备的衬底台之间的液体投影的测量光束来测量曝光参数,并且基于影响使用测量光束进行的测量的物理性质的变化来确定偏移 至少部分地校正测量的曝光参数。 此外,提供了一种用于在浸没式光刻设备中测量连接到投影系统和基板台之间的液体的光学元件的高度的装置和方法。
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公开(公告)号:US20080218717A1
公开(公告)日:2008-09-11
申请号:US12068546
申请日:2008-02-07
申请人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
发明人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
IPC分类号: G03B27/42
CPC分类号: G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
摘要: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
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公开(公告)号:US20080192219A1
公开(公告)日:2008-08-14
申请号:US12081291
申请日:2008-04-14
申请人: Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
发明人: Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
IPC分类号: G03B27/42
CPC分类号: G03F9/7034 , G03F7/70341
摘要: A lithographic apparatus and method, in an embodiment for immersion lithography, are disclosed with a single stage in which leveling and exposure are performed simultaneously.
摘要翻译: 在用于浸没式光刻的实施例中的光刻设备和方法被公开在其中同时执行调平和曝光的单个阶段。
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公开(公告)号:US07248334B2
公开(公告)日:2007-07-24
申请号:US11005500
申请日:2004-12-07
申请人: Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
发明人: Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
CPC分类号: G03F7/7085 , G03F7/70341 , G03F7/70808
摘要: The lithographic apparatus includes a support structure configured to hold a patterning device. The patterning device is configured to pattern a beam of radiation according to a desired pattern. The lithographic apparatus further includes a substrate table configured to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate, a measurement system configured to measure a parameter of (a) the substrate table, or (b) the substrate, or (c) an image projected by the projection system, or (d) any combination of (a)-(c), and a liquid supply system configured to supply a liquid to a space between the substrate and the projection system. The lithographic apparatus also includes a shield disposed in a vicinity of a portion of the measurement system and configured to shield the portion of the measurement system from the liquid.
摘要翻译: 光刻设备包括构造成保持图案形成装置的支撑结构。 图案形成装置被配置成根据期望的图案对辐射束进行图案化。 所述光刻设备还包括被配置为保持基板的基板台,配置成将所述图案化的光束投影到所述基板的目标部分上的投影系统;被配置为测量(a)所述基板台的参数的测量系统,或(b )基板,或(c)由投影系统投影的图像,或(d)(a) - (c)的任何组合,以及被配置为将液体供应到基板和投影件之间的空间的液体供应系统 系统。 光刻设备还包括设置在测量系统的一部分附近并被配置为将测量系统的部分与液体隔离的屏蔽件。
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公开(公告)号:US08472006B2
公开(公告)日:2013-06-25
申请号:US12463242
申请日:2009-05-08
申请人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Paul Graupner , Jan Haisma , Nicodemus Hattu , Christiaan Alexander Hoogendam , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Bernard Gellrich
发明人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Paul Graupner , Jan Haisma , Nicodemus Hattu , Christiaan Alexander Hoogendam , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Bernard Gellrich
CPC分类号: G03F7/70341 , G03F7/7095
摘要: The joint between the projection system element and its support comprises an inorganic layer or a direct bond and is thus liquid tight, which can prevent deformation by an immersion liquid. The joint can be made either warm or cold. Solders, glue, and glue protection can all be used in the formation of this joint. In an embodiment, the elements and its support are made of quartz.
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公开(公告)号:US20120194790A1
公开(公告)日:2012-08-02
申请号:US13446687
申请日:2012-04-13
申请人: Johannes Catharinus Hubertus Mulkens , Johannes Jacobus Matheus Baselmans , Paul Graupner , Erik Roelof Loopstra , Bob Streefkerk
发明人: Johannes Catharinus Hubertus Mulkens , Johannes Jacobus Matheus Baselmans , Paul Graupner , Erik Roelof Loopstra , Bob Streefkerk
CPC分类号: G03F7/70891 , G02B3/14 , G02B21/33 , G03F7/70341
摘要: An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection system and the substrate. The tuner is arranged to adjust one or more properties of the liquid such as the shape, composition, refractive index and/or absorptivity as a function of space and/or time in order to change the imaging performance of the lithography apparatus.
摘要翻译: 浸没式光刻设备包括液体供应系统,其被配置为将液体供应到辐射束通过的空间,该液体具有可由调谐器调谐的光学特性。 该空间可以位于投影系统和基板之间。 调谐器布置成调节液体的一个或多个特性,例如作为空间和/或时间的函数的形状,组成,折射率和/或吸收率,以便改变光刻设备的成像性能。
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公开(公告)号:US20100141915A1
公开(公告)日:2010-06-10
申请号:US12694880
申请日:2010-01-27
申请人: Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
发明人: Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
IPC分类号: G03B27/42
CPC分类号: G03F9/7023 , G03F7/70341 , G03F7/70883
摘要: A lithographic apparatus, includes a support structure configured to hold a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate table; a sensor configured to measure an exposure parameter using a measuring beam projected through the liquid; and a correction system configured to determine an offset based on a change of a physical property impacting a measurement made using the measuring beam to at least partly correct the measured exposure parameter.
摘要翻译: 光刻设备包括被配置为保持图案形成装置的支撑结构,所述图案形成装置被配置成在其横截面中赋予图案的辐射束; 被配置为保持基板的基板台; 投影系统,被配置为将所述图案化的光束投影到所述基板的目标部分上; 液体供应系统,被配置为向所述投影系统和所述基板台之间的空间提供液体; 传感器,被配置为使用通过所述液体投影的测量光束来测量曝光参数; 以及校正系统,其被配置为基于影响使用所述测量光束进行的测量的物理属性的变化来确定偏移,以至少部分地校正所测量的曝光参数。
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公开(公告)号:US20090021707A1
公开(公告)日:2009-01-22
申请号:US12230979
申请日:2008-09-09
申请人: Johannes Catharinus Hubertus Mulkens , Johannes Jacobus Matheus Baselmans , Paul Graupner , Erik Roelof Loopstra , Bob Streefkerk
发明人: Johannes Catharinus Hubertus Mulkens , Johannes Jacobus Matheus Baselmans , Paul Graupner , Erik Roelof Loopstra , Bob Streefkerk
CPC分类号: G03F7/70891 , G02B3/14 , G02B21/33 , G03F7/70341
摘要: An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection system and the substrate. The tuner is arranged to adjust one or more properties of the liquid such as the shape, composition, refractive index and/or absorptivity as a function of space and/or time in order to change the imaging performance of the lithography apparatus.
摘要翻译: 浸没式光刻设备包括液体供应系统,其被配置为将液体供应到辐射束通过的空间,该液体具有可由调谐器调谐的光学特性。 该空间可以位于投影系统和基板之间。 调谐器布置成调节液体的一个或多个特性,例如作为空间和/或时间的函数的形状,组成,折射率和/或吸收率,以便改变光刻设备的成像性能。
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公开(公告)号:US07463330B2
公开(公告)日:2008-12-09
申请号:US10885489
申请日:2004-07-07
申请人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens
发明人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens
CPC分类号: G03F7/70341 , G03F7/70866 , G03F9/7026 , G03F9/7034
摘要: In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.
摘要翻译: 浸没式光刻在基材曝光完成后,检测器用于检测残留在基片和/或基片台上的任何残留液体。
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