公开(公告)号：US20080101684A1

公开(公告)日：2008-05-01

申请号：US11588281

申请日：2006-10-27

申请人： Stephen Roux

发明人： Stephen Roux

IPC分类号： G06K9/00

CPC分类号： G03F7/70783 ,  G03F7/70483

摘要： Systems and methods for inspection of lithographic reticles are provided. The method begins with the generation of a topographical map for a reticle surface with the reticle being in a load-free state. The reticle is then loaded onto a reticle chuck in a lithographic apparatus. A topographical map is then generated for the loaded reticle. The topographical maps for the reticle in a load-free and loaded state are then compared to generate differences. Based on these differences a control action is taken, which can include approving use of the reticle, rejecting the reticle use or applying forces to the reticle to compensate for the topography differences. In an embodiment, the method occurs in situ in that at least the generation of the loaded-state topography occurs within a lithographic apparatus during a wafer run (or other type of run). A lithographic reticle inspection system and a reticle inspection analyzer are also disclosed.

摘要翻译： 提供了用于光刻标线检查的系统和方法。 该方法开始于在掩模版处于无负载状态下生成掩模版表面的地形图。 然后将掩模版加载到光刻设备中的光罩卡盘上。 然后为加载的光罩生成地形图。 然后对无负载和负载状态下的掩模版的地形图进行比较，以产生差异。 基于这些差异，采取控制措施，其可以包括批准使用掩模版，拒绝掩模版使用或向掩模版施加力以补偿地形差异。 在一个实施例中，该方法在原地发生，因为至少在晶片运行（或其它类型的运行）期间在光刻设备内发生负载状态形貌的产生。 还公开了光刻掩模版检查系统和掩模版检查分析仪。

公开(公告)号：US07135693B2

公开(公告)日：2006-11-14

申请号：US11169016

申请日：2005-06-29

申请人： Stephen Roux

发明人： Stephen Roux

IPC分类号： G21K5/00

CPC分类号： G03F7/70933 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70841 ,  G03F7/70883

摘要： A system and method are used to recycle gases in a lithography tool. A first chamber includes an element that emits light based on a first gas. A second chamber uses the emitted light to perform a process and includes the second gas. The first and second gases converge between the two chambers, and at least one of the gases is pumped to a storage device. From the storage device, at least one of the two gases is recycled either within the system or remote from the system and possibly reused within the system. A gaslock can couple the first chamber to the second chamber. A gas source supplies a third gas between the first and the second gas in the gaslock, such that the first gas is isolated from the second gas in the gaslock. The first, second, and/or third gas can be pumped to the storage device and routed to the recycling device. The first, second, and/or third gas can be recycled for reuse to form the emitting light.

摘要翻译： 系统和方法用于回收光刻工具中的气体。 第一室包括基于第一气体发光的元件。 第二室使用发射的光进行处理并且包括第二气体。 第一和第二气体在两个室之间会聚，并且至少一个气体被泵送到存储装置。 从存储装置中，两种气体中的至少一种在系统内或远离系统再循环，并且可能在系统内重新使用。 气闸可以将第一腔室连接到第二腔室。 气体源在气闸中的第一和第二气体之间提供第三气体，使得第一气体与气闸中的第二气体隔离。 第一，第二和/或第三气体可以被泵送到存储装置并且被路由到回收装置。 第一，第二和/或第三气体可以被再循环以重新使用以形成发射光。

公开(公告)号：US07105836B2

公开(公告)日：2006-09-12

申请号：US10273405

申请日：2002-10-18

申请人： Santiago del Puerto ,  Daniel N. Galburt ,  Andrew W. McCullough ,  Stephen Roux ,  Joost Jeroen Ottens

发明人： Santiago del Puerto ,  Daniel N. Galburt ,  Andrew W. McCullough ,  Stephen Roux ,  Joost Jeroen Ottens

IPC分类号： G03F7/20 ,  F25B29/00 ,  H01J37/20

CPC分类号： G03F7/70716 ,  F28F3/048 ,  G03F7/70875

摘要： Systems and methods eliminate vibrations produced by coolant fluid flowing through a short stroke stage and prevent change in thermally-induced distortion of the short stroke stage by maintaining the temperature and temperature distribution within the short stroke stage constant regardless of actinic heat load incident on a reticle. This is done by: (1) conducting heat through the reticle and short stroke stage components, (2) radiatively transferring heat from the short stroke stage to a long stroke stage, and (3) using convection and a cooling system to dissipate heat from the long stroke stage. The short stroke stage can be magnetically levitated from the long stroke stage. This way there is no physical contact, but the long stroke stage's movements can still control the short stroke stage's movements. By not physically contacting the long stroke stage, the short stroke stage is not affected by vibrations in the long stroke stage caused by the flowing coolant.

摘要翻译： 系统和方法消除了通过短行程级流动的冷却剂流体产生的振动，并且通过将短程序段内的温度和温度分布保持恒定，并且防止入射到光罩上的光化热负荷而保持短行程级的热诱导变形的变化。 。 这通过以下方式完成：（1）通过标线和短行程部件进行热量，（2）将热量从短行程级辐射传递到长行程级，以及（3）使用对流和冷却系统来散发热量 长时间的阶段。 短行程阶段可以从长行程阶段磁悬浮。 这样就没有身体接触，但长时间运动的运动仍然可以控制短路阶段的动作。 通过不与长行程阶段物理接触，短行程级不受流动的冷却剂引起的长行程阶段的振动的影响。

公开(公告)号：US07087911B2

公开(公告)日：2006-08-08

申请号：US11087639

申请日：2005-03-24

申请人： Stephen Roux

发明人： Stephen Roux

IPC分类号： H01J61/12

CPC分类号： G03F7/70908 ,  G03F7/70858 ,  G03F7/70916

摘要： A system and method are used to isolate a first gas from a second gas using a third gas. A first chamber includes an element that emits light based on a first gas. A second chamber uses the emitted light to perform a process and includes the second gas. A gaslock that couples the first chamber to the second chamber. A gas source supplies a third gas between the first and the second gas in the gaslock, such that the first gas is isolated from the second gas in the gaslock. The first and third gas can be pumped from the first chamber and separated from one another, such that the first gas can be recycled for reuse to form the emitting light.

摘要翻译： 使用系统和方法使用第三气体将第一气体与第二气体隔离。 第一室包括基于第一气体发光的元件。 第二室使用发射的光进行处理并且包括第二气体。 将第一室耦合到第二室的气闸。 气体源在气闸中的第一和第二气体之间提供第三气体，使得第一气体与气闸中的第二气体隔离。 第一和第三气体可以从第一室泵送并彼此分离，使得第一气体可以被再循环以重新使用以形成发射光。

公开(公告)号：US20050264791A1

公开(公告)日：2005-12-01

申请号：US11182192

申请日：2005-07-15

申请人： Santiago del Puerto ,  Stephen Roux ,  Justin Kreuzer

发明人： Santiago del Puerto ,  Stephen Roux ,  Justin Kreuzer

IPC分类号： G03B27/58 ,  G03F7/20 ,  G03F9/00 ,  H01L21/00 ,  H01L21/027 ,  H01L21/677 ,  H01L21/68

CPC分类号： H01L21/67225 ,  G03F7/707 ,  G03F7/7075 ,  G03F7/70808 ,  G03F9/7011 ,  G03F9/7096 ,  H01L21/67201 ,  H01L21/681

摘要： A method utilizing a lithography system comprises a lithography patterning chamber, a wafer exchange chamber separated from the lithography patterning chamber by a first gate valve, and at least one alignment load-lock separated from the wafer exchange chamber by a second gate valve. The alignment load-lock includes an alignment stage that aligns a wafer during pump-down. The alignment load-lock can be uni-directional or bi-directional. The lithography system can include one or multiple alignment load-locks.

公开(公告)号：US06934005B2

公开(公告)日：2005-08-23

申请号：US10235499

申请日：2002-09-06

申请人： Stephen Roux ,  Todd J. Bednarek

发明人： Stephen Roux ,  Todd J. Bednarek

IPC分类号： G03F7/20 ,  G03F9/00 ,  G01B27/42

CPC分类号： G03F9/7026 ,  G03F7/70716 ,  G03F7/70725

摘要： A first set of interferometric measuring beams is used to determine a location of a patterned surface of a reticle and a reticle focus plane for a reticle that is back clamped to a reticle stage. A second set of interferometric measuring beams is used to determine a map of locations of the reticle stage during scanning in a Y direction. The two sets of interferometric measuring beams are correlated to relate the reticle focal plane to the map of the reticle stage. The information is used to control the reticle stage during exposure of a pattern on the patterned surface of the reticle onto a wafer.

摘要翻译： 第一组干涉测量光束用于确定掩模版的图案化表面的位置和用于后夹紧到标线片台的掩模版的掩模版聚焦平面。 第二组干涉测量光束用于确定在Y方向扫描期间光罩台的位置的图。 两组干涉测量光束相关联，将标线片焦平面与标线片平台的图相关。 该信息用于在将掩模版的图案化表面上的图案曝光到晶片上时控制掩模版阶段。

公开(公告)号：US06906789B2

公开(公告)日：2005-06-14

申请号：US10449663

申请日：2003-06-02

申请人： Frederick M. Carter ,  Daniel N. Galburt ,  Stephen Roux

发明人： Frederick M. Carter ,  Daniel N. Galburt ,  Stephen Roux

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/62 ,  G03B27/72

CPC分类号： G03F7/70066 ,  G03F7/70758 ,  G03F7/70816 ,  G03F7/70825 ,  H02K41/03 ,  H02K2201/18

摘要： A method, apparatus, and system for controlling a reticle-masking blade in a photolithography system. A reticle-masking blade is supported with a reticle-masking blade carriage assembly. The reticle-masking blade carriage assembly is levitated at a position with respect to a reference frame and at an orientation with respect to the reference frame. Preferably, the reticle-masking blade carriage assembly is electromagnetically levitated. At least one of the position and the orientation of the reticle-masking blade carriage assembly is measured. At least one of the position and the orientation of the reticle-masking blade carriage assembly is controlled. Optionally, the reticle-masking blade carriage assembly is moved within a dimension within a range defined by the reference frame. The dimension can be two dimensions. The movement of the reticle-masking blade carriage assembly can be controlled.

摘要翻译： 一种用于在光刻系统中控制掩模掩模刀片的方法，装置和系统。 掩模版掩模刀片由掩模版掩模刀片托架组件支撑。 掩模版掩模刀片托架组件相对于参考框架在相对于参考框架的取向处悬浮。 优选地，掩模版掩模片滑架组件是电磁悬浮的。 测量掩模版掩模片滑架组件的位置和取向中的至少一个。 掩模版掩模刀片支架组件的位置和取向中的至少一个被控制。 可选地，掩模版掩模刮板滑架组件在由参考框限定的范围内的尺寸内移动。 尺寸可以是两个维度。 可以控制掩模掩模刮板托架组件的运动。

公开(公告)号：US06770895B2

公开(公告)日：2004-08-03

申请号：US10300898

申请日：2002-11-21

申请人： Stephen Roux

发明人： Stephen Roux

IPC分类号： F01J6100

CPC分类号： G03F7/70908 ,  G03F7/70858 ,  G03F7/70916

摘要： A system and method are used to isolate a first gas from a second gas using a third gas. A first chamber includes an element that emits light based on a first gas. A second chamber uses the emitted light to perform a process and includes the second gas. A gaslock that couples the first chamber to the second chamber. A gas source supplies a third gas between the first and the second gas in the gaslock, such that the first gas is isolated from the second gas in the gaslock. The first and third gas can be pumped from the first chamber and separated from one another, such that the first gas can be recycled for reuse to form the emitting light.

摘要翻译： 使用系统和方法使用第三气体将第一气体与第二气体隔离。 第一室包括基于第一气体发光的元件。 第二室使用发射的光进行处理并且包括第二气体。 将第一室耦合到第二室的气闸。 气体源在气闸中的第一和第二气体之间提供第三气体，使得第一气体与气闸中的第二气体隔离。 第一和第三气体可以从第一室泵送并彼此分离，使得第一气体可以被再循环以重新使用以形成发射光。

公开(公告)号：US07853067B2

公开(公告)日：2010-12-14

申请号：US11588281

申请日：2006-10-27

申请人： Stephen Roux

发明人： Stephen Roux

IPC分类号： G06K9/62

CPC分类号： G03F7/70783 ,  G03F7/70483

摘要： Systems and methods for inspection of lithographic reticles are provided. The method begins with the generation of a topographical map for a reticle surface with the reticle being in a load-free state. The reticle is then loaded onto a reticle chuck in a lithographic apparatus. A topographical map is then generated for the loaded reticle. The topographical maps for the reticle in a load-free and loaded state are then compared to generate differences. Based on these differences a control action is taken, which can include approving use of the reticle, rejecting the reticle use or applying forces to the reticle to compensate for the topography differences. In an embodiment, the method occurs in situ in that at least the generation of the loaded-state topography occurs within a lithographic apparatus during a wafer run (or other type of run). A lithographic reticle inspection system and a reticle inspection analyzer are also disclosed.

摘要翻译： 提供了用于光刻标线检查的系统和方法。 该方法开始于在掩模版处于无负载状态下生成掩模版表面的地形图。 然后将掩模版加载到光刻设备中的光罩卡盘上。 然后为加载的光罩生成地形图。 然后对无负载和负载状态下的掩模版的地形图进行比较，以产生差异。 基于这些差异，采取控制措施，其可以包括批准使用掩模版，拒绝掩模版使用或向掩模版施加力以补偿地形差异。 在一个实施例中，该方法在原地发生，因为至少在晶片运行（或其它类型的运行）期间在光刻设备内发生负载状态形貌的产生。 还公开了光刻掩模版检查系统和掩模版检查分析仪。

公开(公告)号：US20080273180A1

公开(公告)日：2008-11-06

申请号：US11797649

申请日：2007-05-04

申请人： Stephen Roux

发明人： Stephen Roux

IPC分类号： G03B27/42

CPC分类号： G03F7/70891 ,  G03F7/70308

摘要： A projection system suitable for use in a lithographic apparatus, the projection system including a transmissive optical element and a thermal profile corrector configured to change a thermal profile of the transmissive optical element, the thermal profile corrector including a transfer member and a thermal profile conditioner, the transfer member being moveable into and out of proximity with the transmissive optical element to transfer a desired thermal profile from the thermal profile conditioner into the transmissive optical element.

摘要翻译： 一种适用于光刻设备的投影系统，所述投影系统包括透射光学元件和配置为改变所述透射光学元件的热分布的热分布校正器，所述热分布校正器包括转印部件和热分布调节器， 所述传送构件可移动到与所述透射光学元件接近和离开的位置，以将期望的热剖面从所述热剖面调节器转移到所述透射光学元件中。