公开(公告)号：US06791664B2

公开(公告)日：2004-09-14

申请号：US10050041

申请日：2002-01-17

申请人： Frank Auer ,  Franciscus Andreas Cornelis Johannes Spanjers ,  Jan Holterman ,  Marinus Pieter Koster ,  Theodorus Jacobus Adrianus De Vries

发明人： Frank Auer ,  Franciscus Andreas Cornelis Johannes Spanjers ,  Jan Holterman ,  Marinus Pieter Koster ,  Theodorus Jacobus Adrianus De Vries

IPC分类号： G03B2742

CPC分类号： G03F7/70833 ,  G03F7/709

摘要： Vibrational movement between the top of a lens and a main plate on which the lens is mounted is reduced by attaching between the lens and the main plate a lens support which detects relative movement between the lens and the main plates using piezoelectric sensors and compensates for that movement to reduce vibration using piezoelectric actuators which are in series with the piezoelectric sensors. The control signal which is generated to actuate the actuated piezoelectrics is generated by a controller.

摘要翻译： 通过在透镜和主板之间安装透镜支架来减少透镜顶部和安装透镜的主板之间的振动运动，该透镜支架使用压电传感器检测透镜和主板之间的相对运动，并补偿该透镜 使用与压电传感器串联的压电致动器减少振动的运动。 产生以致动致动压电体的控制信号由控制器产生。

公开(公告)号：US06788386B2

公开(公告)日：2004-09-07

申请号：US10322777

申请日：2002-12-19

申请人： Hendrikus Herman Marie Cox ,  Frank Auer ,  Marc Wilhelmus Maria Van Der Wijst ,  Bastiaan Stephanus Hendrikus Jansen ,  Dominicus Jacobus Petrus Adrianus Franken

发明人： Hendrikus Herman Marie Cox ,  Frank Auer ,  Marc Wilhelmus Maria Van Der Wijst ,  Bastiaan Stephanus Hendrikus Jansen ,  Dominicus Jacobus Petrus Adrianus Franken

IPC分类号： G03B2742

CPC分类号： G03F7/70141 ,  G03F7/70258 ,  G03F7/70825 ,  G03F7/709

摘要： A reaction mass and an actuator are used to reduce unwanted vibrations of an optical element in the projection system of a lithographic projection apparatus. The reaction mass may be mechanically connected only to the optical element or may be compliantly mounted to the projection system frame.

摘要翻译： 反应物质和致动器用于减少光刻投影装置的投影系统中的光学元件的不必要的振动。 反应物质可以仅机械连接到光学元件，或者可以顺应地安装到投影系统框架。

公开(公告)号：US6144442A

公开(公告)日：2000-11-07

申请号：US90034

申请日：1998-06-10

申请人： Jacob J. 'T Mannetje ,  Frank Auer

发明人： Jacob J. 'T Mannetje ,  Frank Auer

IPC分类号： F16F15/023 ,  F16F15/027 ,  G03F7/20 ,  H01L21/027 ,  G03B27/60 ,  G03B27/42

CPC分类号： F16C32/06 ,  F16F15/0232 ,  F16F15/0275 ,  G03F7/70691 ,  G03F7/70833

摘要： Support device (53) provided with a first part (69) and a second part (71) which is supported relative to the first part by means of a gas spring (73) having a pressure chamber (75). A gas supply (117), which compensates for gas leakage from the pressure chamber (75) during operation, is connected to an intermediate space (119) which is in communication with the pressure chamber (75) via a pneumatic restriction (121). The gas pressure present in the intermediate space (119) is held as constant as possible during operation by means of a control loop (123), to prevent transmission of pressure fluctuations which are present in the gas supply (117) to the pressure chamber (75) as much as possible. Such pressure fluctuations are undesirable in the pressure chamber because they cause mechanical vibrations in the second part of the support device and the device to be supported. The support device is used in a lithographic device for the support of a frame (39) with respect to a base (37), the frame (39) supporting a focusing unit (5).

摘要翻译： 支撑装置（53）具有第一部分（69）和第二部分（71），第二部分（71）通过具有压力室（75）的气体弹簧（73）相对于第一部分被支撑。 在操作期间补偿来自压力室（75）的气体泄漏的气体供给（117）通过气动限制（121）连接到与压力室（75）连通的中间空间（119）。 存在于中间空间119中的气体压力在操作期间通过控制回路123保持为恒定，以防止气体供应（117）中存在于压力室（117）中的压力波动 75）。 这种压力波动在压力室中是不期望的，因为它们在支撑装置的第二部分和被支撑的装置中引起机械振动。 支撑装置用于光刻设备中，用于相对于基座（37）支撑框架（39），框架（39）支撑聚焦单元（5）。

公开(公告)号：US08847575B2

公开(公告)日：2014-09-30

申请号：US13273251

申请日：2011-10-14

申请人： Benno Koeppl ,  Frank Auer ,  Andreas Kiep

发明人： Benno Koeppl ,  Frank Auer ,  Andreas Kiep

IPC分类号： G01R19/32 ,  G01K7/01 ,  H02M1/32 ,  G01R31/42 ,  G01R31/02 ,  H02M7/5387

CPC分类号： G01R31/2628 ,  G01K7/01 ,  G01K2217/00 ,  G01R21/02 ,  G01R31/025 ,  G01R31/42 ,  H02M1/32 ,  H02M7/5387

摘要： According to various embodiments, a circuit arrangement is provided which includes a bridge circuit having at least two field effect transistors and a measurement circuit configured to measure a forward voltage of a body diode of any one of the at least two field effect transistors resulting from a predefined current flowing through the field effect transistor.

摘要翻译： 根据各种实施例，提供了一种电路装置，其包括具有至少两个场效应晶体管的桥接电路和被配置为测量至少两个场效应晶体管中任一个的体二极管的正向电压的测量电路， 流过场效应晶体管的预定电流。

公开(公告)号：US08189174B2

公开(公告)日：2012-05-29

申请号：US12616279

申请日：2009-11-11

申请人： Matthias Kruizinga ,  Frank Auer ,  Fransiscus Mathijs Jacobs ,  Ronnie Herman Anna Hensen

发明人： Matthias Kruizinga ,  Frank Auer ,  Fransiscus Mathijs Jacobs ,  Ronnie Herman Anna Hensen

IPC分类号： G03B27/58 ,  G03B27/42

CPC分类号： G03F7/70716 ,  G03F7/70341 ,  G03F7/70733

摘要： A lithographic apparatus includes two stages that are each configured to hold a substrate, wherein each stage is provided with a short stroke module to move a table with a substrate and a long stroke module to move the short stroke module of that stage. The lithographic apparatus includes a swap bridge to couple the stages, and wherein, in use, in a first configuration, the stages are moveable with respect to each other, and wherein, in use, in a second configuration, the stages are coupled via the swap bridge to make a joint movement.

摘要翻译： 光刻设备包括两个阶段，每个阶段被配置为保持基底，其中每个阶段设置有短行程模块，以移动具有基底的台面和长行程模块以移动该阶段的短冲程模块。 光刻设备包括用于耦合级的交换桥，并且其中，在使用中，在第一配置中，所述级可相对于彼此移动，并且其中，在使用中，在第二配置中，所述级经由 互换桥联合运动。

公开(公告)号：US08164240B2

公开(公告)日：2012-04-24

申请号：US12448282

申请日：2007-12-05

申请人： Frank Auer ,  Gerhard Behr ,  Peter Helbig ,  Christian Seichter ,  Klaus Wittmann ,  Sascha Zelt

发明人： Frank Auer ,  Gerhard Behr ,  Peter Helbig ,  Christian Seichter ,  Klaus Wittmann ,  Sascha Zelt

IPC分类号： H01K1/26

CPC分类号： H01K9/08 ,  H01K1/26

摘要： The invention relates to a dipping cap comprising a filament for a dual-filament lamp. The dimension between an outlet of an outgoing section of the filament, on the side of the base, and the point on the outgoing section of the filament, arranged opposite the outgoing section of the filament on the side of the base and welded to the dipping cap, measures more than approximately 5.2 mm and less than 9.7 mm, and the dimension between the outlet of the outgoing section of the filament, on the side of the base, and the front surface of the dipping cap, which is adjacent to the outgoing section of the filament, welded to the dipping cap, measures more than approximately 5.9 mm and less than 11.9 mm.

摘要翻译： 本发明涉及一种包含用于双色灯的灯丝的浸渍盖。 在灯丝的出口部分的出口部分与基部的出口部分之间的尺寸与灯丝的出口部分相对，并且焊接到浸渍部分 帽的尺寸大于约5.2mm且小于9.7mm，并且在基部侧的长丝的出口部分的出口与浸渍盖的前表面之间的尺寸与出口 焊接到浸渍盖上的细丝部分测量超过约5.9毫米，小于11.9毫米。

公开(公告)号：US08102109B2

公开(公告)日：2012-01-24

申请号：US12448283

申请日：2007-12-06

申请人： Frank Auer ,  Gerhard Behr ,  Peter Helbig ,  Christian Seichter ,  Klaus Wittmann ,  Sascha Zelt

发明人： Frank Auer ,  Gerhard Behr ,  Peter Helbig ,  Christian Seichter ,  Klaus Wittmann ,  Sascha Zelt

IPC分类号： H01J5/48 ,  H01J5/50

CPC分类号： H01K1/46

摘要： Disclosed is a lamp, particularly a halogen incandescent lamp, comprising a bulb that is provided with a pinch seal which is inserted into a base by means of an attachment ring. The attachment ring has a receiving section within which the pinch seal is clampingly fastened by means of attachment ring brackets that are supported on support surfaces. According to the invention, the support surfaces are placed at an angle from the longitudinal axis of the lamp.

摘要翻译： 公开了一种灯，特别是卤素白炽灯，包括灯泡，该灯泡设置有通过附接环插入到基座中的夹紧密封件。 附接环具有接收部分，夹紧密封件通过支撑在支撑表面上的附接环支架夹紧紧固。 根据本发明，支撑表面以与灯的纵向轴线成一定角度放置。

公开(公告)号：US07936443B2

公开(公告)日：2011-05-03

申请号：US11430181

申请日：2006-05-09

申请人： Hans Butler ,  Frank Auer

发明人： Hans Butler ,  Frank Auer

IPC分类号： G03B27/42

CPC分类号： G03F7/709 ,  G03F7/70833 ,  H01L21/0274

摘要： Data from the piezo-electric sensors in the mounts for the projection system can be used in the control loops for other parts of the lithographic apparatus, for example the mask table, the substrate table or the air mounts for the frame bearing the projection system. Information from, for example, a geophone, which is used to measure the absolute velocity of the frame bearing the projection system, can be used in the control loop for the piezo-electric actuator in the mount for the projection system.

摘要翻译： 来自用于投影系统的安装座中的压电传感器的数据可以用于光刻设备的其它部分的控制回路中，例如掩模台，衬底台或用于支撑投影系统的框架的空气支架。 来自例如用于测量承载投影系统的框架的绝对速度的地震检波器的信息可以用于用于投影系统的安装座中的压电致动器的控制回路中。

公开(公告)号：US07916267B2

公开(公告)日：2011-03-29

申请号：US11511532

申请日：2006-08-29

申请人： Frank Auer

发明人： Frank Auer

IPC分类号： G03B27/52 ,  H02K9/00

CPC分类号： G03B21/16 ,  G03F7/70758 ,  G03F7/70858 ,  H02K5/20

摘要： A lithographic device includes a cooling device for removing heat from a motor. The cooling device has a cooling element provided in thermal contact with at least part of the motor. The cooling device further has a cooling duct assembly with a supply duct to supply a cooling fluid to the cooling element, and a discharge duct to discharge the cooling fluid from the cooling element. A pump causes the cooling fluid to flow through at least part of the cooling duct assembly. A flow control device controls a flow rate of the cooling fluid through at least part of the cooling duct assembly, to maintain a predetermined average temperature of the cooling fluid in the cooling element.

摘要翻译： 平版印刷装置包括用于从马达移除热量的冷却装置。 冷却装置具有设置成与电动机的至少一部分热接触的冷却元件。 冷却装置还具有冷却管道组件，其具有用于向冷却元件供应冷却流体的供应管道和用于从冷却元件排出冷却流体的排放管道。 泵使冷却流体流过冷却管道组件的至少一部分。 流量控制装置通过冷却管道组件的至少一部分来控制冷却流体的流量，以保持冷却元件中的冷却流体的预定平均温度。

公开(公告)号：US20100148733A1

公开(公告)日：2010-06-17

申请号：US12332849

申请日：2008-12-11

申请人： Benno Koeppl ,  Karl-Dieter Hein ,  Frank Auer

发明人： Benno Koeppl ,  Karl-Dieter Hein ,  Frank Auer

IPC分类号： G05F1/613

CPC分类号： H02H7/0844 ,  H02H11/002 ,  H03K17/0822 ,  H03K2217/0045 ,  Y10T307/839

摘要： The invention relates to a control circuit and a corresponding method for controlling MOSFETs coupled to the control circuit. The MOSFETs are coupled to a load to couple the load to a power supply, or the MOSFETs are coupled to a generator. In case of inverted polarity, the control circuit switches the MOSFETs to their conducting state to prevent damaging the MOSFETs.

摘要翻译： 本发明涉及一种用于控制耦合到控制电路的MOSFET的控制电路和相应的方法。 MOSFET耦合到负载以将负载耦合到电源，或者MOSFET耦合到发电机。 在反相极性的情况下，控制电路将MOSFET切换到导通状态，以防止损坏MOSFET。