摘要:
A fluorination reactor having a reaction zone, an inlet for supplying an organic compound to be fluorinated to the reaction zone, an inlet for supplying elemental fluorine to the reaction zone, and an outlet for recovering a fluorinated reaction product, wherein the reaction zone includes a fluoride-adsorbing composition for adsorbing any HF produced as a byproduct of the reaction between the organic compound and elemental fluorine.
摘要:
The present technology provides compositions that are intimate mixtures of hydrogen fluoride and a polyacrylate-polyacrylamide cross-linked copolymer, as well as methods and preparing and using such compositions. The compositions are less hazardous and, therefore, more conveniently stored, transported, and handled in comparison to pure hydrogen fluoride. Further, the hydrogen fluoride may be readily recovered from the compositions of the invention for use.
摘要:
A method for suppressing an electric arc or corona discharge includes providing a device capable of storing, transmitting, or generating an electrical current or field; and enveloping at least a portion of said device with a dielectric gas consisting essentially of: sulfur hexafluoride; a second component selected from the group consisting of nitrous oxide; carbon dioxide; trifluoromethane (R32); trifluoroiodomethane; octafluoropropane (R218); 1,1,1,2,2-pentafluoroethane (R125); propane (R290); 1,1,1,2-tetrafluoropropene (HFO-1234yf); 1,2,3,3-tetrafluoro-2-propene (HFO-1234yc); 1,1,3,3-tetrafluoro-2-propene (HFO-1234zc); 1,1,1,3-tetrafluoro-2-propene (HFO-1234ze); 1,1,2,3-tetrafluoro-2-propene (HFO-1234ye); 1,1,1,2,3-pentafluoropropene (HFO-1225ye); 1,1,2,3,3-pentafluoropropene (HFO-1225yc); 1,1,1,3,3-pentafluoropropene (HFO-1225zc); (Z)1,1,1,3-tetrafluoropropene (HFO-1234zeZ); (Z)1,1,2,3-tetrafluoro-2-propene (HFO-1234yeZ); (E)1,1,1,3-tetrafluoropropene (HFO-1234zeE); (E)1,1,2,3-tetrafluoro-2-propene (HFO-1234yeE); (Z)1,1,1,2,3-pentafluoropropene (HFO-1225yeZ); (E)1,1,1,2,3-pentafluoropropene (HFO-1225yeE) and combinations of two or more of these; and optionally, an additive selected from the group consisting of stabilizers, metal passivators, corrosion inhibitors, and lubricants.
摘要:
A dielectric gaseous compound which exhibits the following properties: a boiling point in the range between about −20° C. to about −273° C.; non-ozone depleting; a GWP less than about 22,200; chemical stability, as measured by a negative standard enthalpy of formation (dHf
摘要:
Provided are novel azeotrope-like compositions of SF6 and N2O, as well as methods of using the same. Also provided are methods of using SF6 compositions, including azeotrope-like compositions, including a method for suppressing an electric arc or corona discharge and a method for flame suppression. Further provided are electrical devices using such SF6 compositions as a dielectric insulating gas and rigid closed-cell foams having such SF6 compositions within the cells, wherein the foam is both thermally and electrically insulative.
摘要:
A dielectric gaseous compound which exhibits the following properties: a boiling point in the range between about −20° C. to about −273° C.; non-ozone depleting; a GWP less than about 22,200; chemical stability, as measured by a negative standard enthalpy of formation (dHf
摘要:
Disclosed are cover gas compositions comprising fluoroolefins for impeding the oxidation of molten nonferrous metals and alloys, such as magnesium.
摘要:
A fluorination reactor having a reaction zone, an inlet for supplying an organic compound to be fluorinated to the reaction zone, an inlet for supplying elemental fluorine to the reaction zone, and an outlet for recovering a fluorinated reaction product, wherein the reaction zone includes a fluoride-adsorbing composition for adsorbing any HF produced as a byproduct of the reaction between the organic compound and elemental fluorine.
摘要:
Methods for etching or removing oxide scale from a substrate by applying a composition containing a polymer and an effective amount of hydrofluoric acid and maintaining the composition on the substrate until the substrate is etched or the oxide scale is removed.
摘要:
1,1-difluoroethane is produced by the reaction of 1,2-dichloroethane with anhydrous hydrogen fluoride in a liquid phase and in the presence of a Lewis acid. Preferably the Lewis acid is tin, antimony, titanium, molybdenum, tungsten, niobium or tantalum halide or a mixture thereof.