公开(公告)号：US20110124163A1

公开(公告)日：2011-05-26

申请号：US13020467

申请日：2011-02-03

申请人： Byoung-June KIM ,  Jae-Ho Choi ,  Chang-Oh Jeong ,  Sung-Hoon Yang ,  Je-Hun Lee ,  Do-Hyun Kim ,  Hwa-Yeul Oh ,  Yong-Mo Choi

发明人： Byoung-June KIM ,  Jae-Ho Choi ,  Chang-Oh Jeong ,  Sung-Hoon Yang ,  Je-Hun Lee ,  Do-Hyun Kim ,  Hwa-Yeul Oh ,  Yong-Mo Choi

IPC分类号： H01L21/336 ,  H01L21/84

CPC分类号： H01L27/1255 ,  H01L27/12 ,  H01L27/1214 ,  H01L27/124 ,  H01L29/41733 ,  H01L29/4908 ,  H01L29/66742 ,  H01L29/66765

摘要： A manufacturing method of a thin film transistor (TFT) includes forming a gate electrode including a metal that can be combined with silicon to form silicide on a substrate and forming a gate insulation layer by supplying a gas which includes silicon to the gate electrode at a temperature below about 280° C. The method further includes forming a semiconductor on the gate insulation layer, forming a data line and a drain electrode on the semiconductor and forming a pixel electrode connected to the drain electrode.

摘要翻译： 薄膜晶体管（TFT）的制造方法包括形成包括可以与硅组合的金属的栅电极，以在衬底上形成硅化物，并通过在栅极电极中向栅电极提供包括硅的气体形成栅极绝缘层 该方法还包括在栅极绝缘层上形成半导体，在半导体上形成数据线和漏极并形成连接到漏电极的像素电极。

公开(公告)号：US07923287B2

公开(公告)日：2011-04-12

申请号：US12001031

申请日：2007-12-06

申请人： Eun-Guk Lee ,  Do-Hyun Kim ,  Chang-Oh Jeong ,  Je-Hun Lee ,  Soon-Kwon Lim

发明人： Eun-Guk Lee ,  Do-Hyun Kim ,  Chang-Oh Jeong ,  Je-Hun Lee ,  Soon-Kwon Lim

IPC分类号： H01L21/84 ,  H01L29/786

CPC分类号： H01L27/124 ,  H01L27/1214 ,  H01L27/1225 ,  H01L27/1288 ,  H01L29/45 ,  H01L29/7869

摘要： A thin film transistor substrate and a method of manufacturing the same are disclosed. The method of manufacturing a thin film transistor substrate includes forming a first conductive pattern group including a gate line, a gate electrode, and a lower gate pad electrode on a substrate, forming a gate insulating layer on the substrate on which the first conductive pattern group is formed, forming an oxide semiconductor pattern overlapping the gate electrode on the gate insulating layer, and forming first and second conductive layers on the substrate on which the oxide semiconductor pattern is formed and patterning the first and second conductive layers to form a second conductive pattern group including a data line, a source electrode, a drain electrode, and a data pad.

摘要翻译： 公开了一种薄膜晶体管基板及其制造方法。 制造薄膜晶体管基板的方法包括在基板上形成包括栅极线，栅电极和下栅极焊盘电极的第一导电图案组，在基板上形成栅极绝缘层，第一导电图案组 形成，在所述栅极绝缘层上形成与所述栅电极重叠的氧化物半导体图案，以及在其上形成有所述氧化物半导体图案的所述基板上形成第一和第二导电层，并且对所述第一导电层和所述第二导电层进行构图以形成第二导电图案 包括数据线，源电极，漏电极和数据焊盘。

公开(公告)号：US07767478B2

公开(公告)日：2010-08-03

申请号：US12031121

申请日：2008-02-14

申请人： Je-Hun Lee ,  Yang-Ho Bae ,  Beom-Seok Cho ,  Chang-Oh Jeong

发明人： Je-Hun Lee ,  Yang-Ho Bae ,  Beom-Seok Cho ,  Chang-Oh Jeong

IPC分类号： H01L21/00

CPC分类号： H01L27/3279 ,  H01L27/124 ,  H01L27/1288 ,  H01L51/0023 ,  H01L51/56

摘要： The invention provides a thin film transistor (TFT) array panel that includes an insulating substrate; a gate line formed on the insulating substrate and having a first layer of an Al containing metal, a second layer of a Cu containing metal that is thicker than the first layer, and a gate electrode; a gate insulating layer arranged on the gate line; a semiconductor arranged on the gate insulating layer; a data line having a source electrode and arranged on the gate insulating layer and the semiconductor; a drain electrode arranged on the gate insulating layer and the semiconductor and facing the source electrode; a passivation layer having a contact hole and arranged on the data line and the drain electrode; and a pixel electrode arranged on the passivation layer and coupled with the drain electrode through the contact hole.

摘要翻译： 本发明提供一种薄膜晶体管（TFT）阵列面板，其包括绝缘基板; 形成在所述绝缘基板上并具有含有Al的金属的第一层，比所述第一层更厚的含Cu金属的第二层的栅极线和栅电极; 栅极绝缘层，布置在栅极线上; 布置在栅绝缘层上的半导体; 数据线，其具有源电极并且布置在所述栅极绝缘层和所述半导体上; 布置在所述栅绝缘层和所述半导体上并面对所述源电极的漏电极; 钝化层，其具有接触孔并且布置在所述数据线和所述漏电极上; 以及设置在钝化层上并通过接触孔与漏电极耦合的像素电极。

公开(公告)号：US20090162982A1

公开(公告)日：2009-06-25

申请号：US12392629

申请日：2009-02-25

申请人： Je-Hun Lee ,  Do-Hyun Kim ,  Eun-Guk Lee ,  Chang-Oh Jeong

发明人： Je-Hun Lee ,  Do-Hyun Kim ,  Eun-Guk Lee ,  Chang-Oh Jeong

IPC分类号： H01L21/336

CPC分类号： G02F1/136286 ,  G02F2001/13629 ,  G02F2001/136295 ,  H01L27/124

摘要： An array substrate includes a switching element, a signal transmission line, a passivation layer and a pixel electrode. The switching element is disposed on an insulating substrate. The signal transmission line is connected to the switching element and includes a barrier layer, a conductive line, and a copper nitride layer. The barrier layer is disposed on the insulating substrate. The conductive line is disposed on the barrier layer and includes copper or copper alloy. The copper nitride layer covers the conductive line. The passivation layer covers the switching element and the signal transmission line and has a contact hole through which a drain electrode of the switching element is partially exposed. The pixel electrode is disposed on the insulating substrate, and is connected to the drain electrode of the switching element through the contact hole.

摘要翻译： 阵列基板包括开关元件，信号传输线，钝化层和像素电极。 开关元件设置在绝缘基板上。 信号传输线连接到开关元件，并且包括阻挡层，导电线和氮化铜层。 阻挡层设置在绝缘基板上。 导电线设置在阻挡层上并且包括铜或铜合金。 氮化铜层覆盖导电线。 钝化层覆盖开关元件和信号传输线，并且具有接触孔，开关元件的漏电极通过该接触孔部分露出。 像素电极设置在绝缘基板上，并通过接触孔与开关元件的漏电极连接。

公开(公告)号：US07511302B2

公开(公告)日：2009-03-31

申请号：US11049742

申请日：2005-02-04

申请人： Je-Hun Lee ,  Jae-Kyeong Lee ,  Chang-Oh Jeong ,  Beom-Seok Cho

发明人： Je-Hun Lee ,  Jae-Kyeong Lee ,  Chang-Oh Jeong ,  Beom-Seok Cho

IPC分类号： H01L27/14

CPC分类号： H01L29/66765 ,  H01L27/12 ,  H01L29/458 ,  H01L29/4908

摘要： Multi-layered wiring for a larger flat panel display is formed by depositing molybdenum on a substrate in presence of a precursor gas containing at least one oxygen, nitrogen and carbon to form a molybdenum layer. An aluminum layer is deposited on the molybdenum layer. Another metal layer may be formed on the aluminum layer. The molybdenum layer has a face-centered cubic (FCC) lattice structure with a preferred orientation of (111).

摘要翻译： 在含有至少一个氧，氮和碳的前体气体的存在下，在基板上沉积钼以形成钼层，形成用于较大平板显示器的多层布线。 铝层沉积在钼层上。 可以在铝层上形成另一金属层。 钼层具有面心立方（FCC）晶格结构，其优选取向为（111）。

公开(公告)号：US20080185590A1

公开(公告)日：2008-08-07

申请号：US11930536

申请日：2007-10-31

申请人： Byoung-June Kim ,  Jae-Ho Choi ,  Chang-Oh Jeong ,  Sung-Hoon Yang ,  Je-Hun Lee ,  Do-Hyun Kim ,  Hwa-Yeul Oh ,  Yong-Mo Choi

发明人： Byoung-June Kim ,  Jae-Ho Choi ,  Chang-Oh Jeong ,  Sung-Hoon Yang ,  Je-Hun Lee ,  Do-Hyun Kim ,  Hwa-Yeul Oh ,  Yong-Mo Choi

IPC分类号： H01L29/04 ,  H01L21/84

CPC分类号： H01L27/1255 ,  H01L27/12 ,  H01L27/1214 ,  H01L27/124 ,  H01L29/41733 ,  H01L29/4908 ,  H01L29/66742 ,  H01L29/66765

摘要： A manufacturing method of a thin film transistor (TFT) includes forming a gate electrode including a metal that can be combined with silicon to form silicide on a substrate and forming a gate insulation layer by supplying a gas which includes silicon to the gate electrode at a temperature below about 280° C. The method further includes forming a semiconductor on the gate insulation layer, forming a data line and a drain electrode on the semiconductor and forming a pixel electrode connected to the drain electrode.

摘要翻译： 薄膜晶体管（TFT）的制造方法包括形成包括可以与硅组合的金属的栅电极，以在衬底上形成硅化物，并通过在栅极电极中向栅电极提供包括硅的气体形成栅极绝缘层 该方法还包括在栅极绝缘层上形成半导体，在半导体上形成数据线和漏极并形成连接到漏电极的像素电极。

公开(公告)号：US20070289769A1

公开(公告)日：2007-12-20

申请号：US11844164

申请日：2007-08-23

申请人： Je-Hun Lee ,  Beom-Seok Cho ,  Chang-Oh Jeong ,  Yang-Ho Bae

发明人： Je-Hun Lee ,  Beom-Seok Cho ,  Chang-Oh Jeong ,  Yang-Ho Bae

IPC分类号： H01B5/00

CPC分类号： H01L27/12 ,  H01L21/76838 ,  H01L23/5283 ,  H01L23/53209 ,  H01L29/4908 ,  H01L2924/0002 ,  H01L2924/12044 ,  H01L2924/00

摘要： A multi-layer wiring for use with thin film transistors (TFTs), methods of manufacturing the multi-layer wiring, and TFTs employing the multi-layer wiring are provided. In one embodiment, the multi-layer wiring includes a main wiring and a sub-wiring on the main wiring. The main wiring includes a first metal and the sub-wiring includes an alloy wherein a majority of the alloy is the first metal. The multi-layer wiring can exhibit decreased electrical resistance and a reduced tendency to develop malfunctions such as hillocks or spiking. The multi-layer wiring can also exhibit improved contact characteristics with other conductive elements of TFT display devices.

摘要翻译： 提供了用于薄膜晶体管（TFT）的多层布线，多层布线的制造方法以及采用多层布线的TFT。 在一个实施例中，多层布线包括主布线和主布线上的副布线。 主配线包括第一金属，并且子布线包括其中大部分合金是第一金属的合金。 多层布线可以表现出降低的电阻和降低发展故障的倾向，如小丘或尖峰。 多层布线也可以表现出与TFT显示装置的其它导电元件的接触特性的改善。

公开(公告)号：US07301170B2

公开(公告)日：2007-11-27

申请号：US11180989

申请日：2005-07-12

申请人： Beom-Seok Cho ,  Yang-Ho Bae ,  Je-Hun Lee ,  Chang-Oh Jeong

发明人： Beom-Seok Cho ,  Yang-Ho Bae ,  Je-Hun Lee ,  Chang-Oh Jeong

IPC分类号： H01L29/04

CPC分类号： G02F1/136286 ,  G02F2001/13629 ,  G02F2001/136295 ,  H01L27/3276 ,  Y10S438/924

摘要： The present invention provides a TFT array panel and a manufacturing method of the same, which has signal lines including a lower layer of an Al containing metal and an upper layer of a molybdenum alloy (Mo-alloy) comprising molybdenum (Mo) and at least one of niobium (Nb), vanadium (V), and titanium (Ti). Accordingly, undercut, overhang, and mouse bites which may arise in an etching process, are prevented, and TFT array panels that have signal lines having low resistivity and good contact characteristics are provided.

摘要翻译： 本发明提供一种TFT阵列面板及其制造方法，其特征在于，具有含有Al的金属的下层和包含钼（Mo）的钼合金（Mo合金）的上层的信号线，至少包括 铌（Nb），钒（V）和钛（Ti）之一。 因此，防止在蚀刻工艺中可能出现的底切，突出和小鼠咬合，并且提供具有低电阻率和良好接触特性的信号线的TFT阵列面板。

公开(公告)号：US20070102770A1

公开(公告)日：2007-05-10

申请号：US11619451

申请日：2007-01-03

申请人： Woo-Geun Lee ,  Beom-Seok Cho ,  Je-Hun Lee ,  Chang-Oh Jeong ,  Sang-Gab Kim ,  Min-Seok Oh ,  Young-Wook Lee ,  Hee-Hwan Choe

发明人： Woo-Geun Lee ,  Beom-Seok Cho ,  Je-Hun Lee ,  Chang-Oh Jeong ,  Sang-Gab Kim ,  Min-Seok Oh ,  Young-Wook Lee ,  Hee-Hwan Choe

IPC分类号： H01L29/76

CPC分类号： H01L27/1288 ,  G02F2001/136236 ,  H01L21/31144 ,  H01L21/32139 ,  H01L27/1214 ,  H01L27/124 ,  H01L29/41733

摘要： A method of manufacturing a thin film transistor array panel including forming a gate line on a substrate, forming a gate insulating layer on the gate line, forming a semiconductor layer on the gate insulating layer, forming a data line and a drain electrode on the semiconductor layer, depositing a passivation layer on the data line and the drain electrode, forming a photoresist including a first portion and a second portion, which is thinner than the first portion, on the passivation layer, etching the passivation layer using the photoresist as a mask to expose a portion of the drain electrode, removing the second portion of the photoresist, depositing a conductive film, and removing the first portion of the photoresist to form a pixel electrode on the exposed portion of the drain electrode.

摘要翻译： 一种制造薄膜晶体管阵列面板的方法，包括在衬底上形成栅极线，在栅极线上形成栅极绝缘层，在栅极绝缘层上形成半导体层，在半导体上形成数据线和漏电极 在所述数据线和所述漏电极上沉积钝化层，在所述钝化层上形成包含比所述第一部分薄的第一部分和第二部分的光致抗蚀剂，使用所述光致抗蚀剂作为掩模蚀刻所述钝化层 露出漏极的一部分，去除光致抗蚀剂的第二部分，沉积导电膜，以及去除光致抗蚀剂的第一部分，以在漏电极的暴露部分上形成像素电极。

公开(公告)号：US20060091396A1

公开(公告)日：2006-05-04

申请号：US11249500

申请日：2005-10-14

申请人： Je-Hun Lee ,  Yang-Ho Bae ,  Beom-Seok Cho ,  Chang-Oh Jeong

发明人： Je-Hun Lee ,  Yang-Ho Bae ,  Beom-Seok Cho ,  Chang-Oh Jeong

IPC分类号： H01L29/04

CPC分类号： H01L27/3279 ,  H01L27/124 ,  H01L27/1288 ,  H01L51/0023 ,  H01L51/56

摘要： The invention provides a thin film transistor (TFT) array panel that includes an insulating substrate; a gate line formed on the insulating substrate and having a first layer of an Al containing metal, a second layer of a Cu containing metal that is thicker than the first layer, and a gate electrode; a gate insulating layer arranged on the gate line; a semiconductor arranged on the gate insulating layer; a data line having a source electrode and arranged on the gate insulating layer and the semiconductor; a drain electrode arranged on the gate insulating layer and the semiconductor and facing the source electrode; a passivation layer having a contact hole and arranged on the data line and the drain electrode; and a pixel electrode arranged on the passivation layer and coupled with the drain electrode through the contact hole.

摘要翻译： 本发明提供一种薄膜晶体管（TFT）阵列面板，其包括绝缘基板; 形成在所述绝缘基板上并具有含有Al的金属的第一层，比所述第一层更厚的含Cu金属的第二层的栅极线和栅电极; 栅极绝缘层，布置在栅极线上; 布置在栅绝缘层上的半导体; 数据线，其具有源电极并且布置在所述栅极绝缘层和所述半导体上; 布置在所述栅绝缘层和所述半导体上并面对所述源电极的漏电极; 钝化层，其具有接触孔并且布置在所述数据线和所述漏电极上; 以及设置在钝化层上并通过接触孔与漏电极耦合的像素电极。