公开(公告)号：US07145641B2

公开(公告)日：2006-12-05

申请号：US10748751

申请日：2003-12-31

申请人： Mark Kroon ,  Michael Cornelis Van Beek ,  Peter Dirksen ,  Ralph Kurt ,  Cassandra May Owen

发明人： Mark Kroon ,  Michael Cornelis Van Beek ,  Peter Dirksen ,  Ralph Kurt ,  Cassandra May Owen

IPC分类号： G03B27/72 ,  G03B27/42 ,  G03B27/52 ,  G03G27/54

CPC分类号： G03F7/70983 ,  G03F7/70808 ,  G03F7/70916 ,  G03F7/70933

摘要： A lithographic apparatus is disclosed. The apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The projection system includes an optical element that has a beam entry area and an optical element that has a beam exit area through each of which the patterned beam passes. The apparatus further includes a nucleated surface that is associated with the projection system on which a plurality of nucleation sites are provided. The surface is disposed away from at least one of the beam entry area and the beam exit area.

公开(公告)号：US07142287B2

公开(公告)日：2006-11-28

申请号：US11345316

申请日：2006-02-02

申请人： Mark Kroon ,  Michael Cornelis Van Beek ,  Peter Dirksen ,  Ralph Kurt ,  Cassandra May Owen

发明人： Mark Kroon ,  Michael Cornelis Van Beek ,  Peter Dirksen ,  Ralph Kurt ,  Cassandra May Owen

IPC分类号： G03B27/72 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70983 ,  G03F7/70808 ,  G03F7/70916 ,  G03F7/70933

摘要： A lithographic apparatus is disclosed. The apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The projection system includes an optical element that has a beam entry area and an optical element that has a beam exit area through each of which the patterned beam passes. The apparatus further includes a nucleated surface that is associated with the projection system on which a plurality of nucleation sites are provided. The surface is disposed away from at least one of the beam entry area and the beam exit area.

公开(公告)号：US20060215132A1

公开(公告)日：2006-09-28

申请号：US11373503

申请日：2006-03-13

申请人： Mark Kroon ,  Michael Van Beek ,  Peter Dirksen ,  Ralph Kurt ,  Cassandra Owen

发明人： Mark Kroon ,  Michael Van Beek ,  Peter Dirksen ,  Ralph Kurt ,  Cassandra Owen

IPC分类号： G03B27/52

CPC分类号： G03F7/70983 ,  G03F7/70808 ,  G03F7/70916 ,  G03F7/70933

摘要： A lithographic apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The projection system includes an optical element that has a beam exit area through each of which the patterned beam passes. The apparatus further includes a fluid cleaning system that cleans a fluid to be introduced into a region in between the optical element and the substrate. The fluid cleaning system includes a fluid inlet, a fluid outlet, and a cleaning zone disposed between the inlet and outlet. The cleaning zone includes a nucleated surface provided with a plurality of nucleation sites.

摘要翻译： 光刻设备包括提供辐射束的辐射系统和支撑图案化结构的支撑结构。 图形结构被配置为根据期望的图案对辐射束进行图案化。 该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。 投影系统包括光学元件，该光学元件具有通过图案化光束通过的每一个的光束出射区域。 该装置还包括清洁被引入到光学元件和基板之间的区域中的流体的流体清洁系统。 流体清洁系统包括流体入口，流体出口和布置在入口和出口之间的清洁区域。 清洁区包括具有多个成核位点的成核表面。

公开(公告)号：US20060176463A1

公开(公告)日：2006-08-10

申请号：US11345316

申请日：2006-02-02

申请人： Mark Kroon ,  Michael Van Beek ,  Peter Dirksen ,  Ralph Kurt ,  Cassandra Owen

发明人： Mark Kroon ,  Michael Van Beek ,  Peter Dirksen ,  Ralph Kurt ,  Cassandra Owen

IPC分类号： G03B27/72

CPC分类号： G03F7/70983 ,  G03F7/70808 ,  G03F7/70916 ,  G03F7/70933

摘要： A lithographic apparatus is disclosed. The apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The projection system includes an optical element that has a beam entry area and an optical element that has a beam exit area through each of which the patterned beam passes. The apparatus further includes a nucleated surface that is associated with the projection system on which a plurality of nucleation sites are provided. The surface is disposed away from at least one of the beam entry area and the beam exit area.

摘要翻译： 公开了一种光刻设备。 该装置包括提供辐射束的辐射系统和支撑图形结构的支撑结构。 图形结构被配置为根据期望的图案对辐射束进行图案化。 该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。 投影系统包括具有光束入射区域的光学元件和具有通过图案化光束通过的每一个的光束出射区域的光学元件。 该装置还包括与投影系统相关联的成核表面，其上设置有多个成核位置。 表面远离光束入射区域和光束出射区域中的至少一个设置。

公开(公告)号：US07315346B2

公开(公告)日：2008-01-01

申请号：US10733771

申请日：2003-12-12

申请人： Michael Cornelis Van Beek ,  Levinus Pieter Bakker ,  Theodorus Hubertus Josephus Bisschops ,  Jeroen Jonkers ,  Mark Kroon ,  Robertus Adrianus Maria Wolters ,  Adrianus Johannes Henricus Maas

发明人： Michael Cornelis Van Beek ,  Levinus Pieter Bakker ,  Theodorus Hubertus Josephus Bisschops ,  Jeroen Jonkers ,  Mark Kroon ,  Robertus Adrianus Maria Wolters ,  Adrianus Johannes Henricus Maas

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/54 ,  G03B27/32

CPC分类号： G03F7/70925 ,  B08B7/0057

摘要： A lithographic projection apparatus is disclosed. The apparatus includes a support structure constructed to support a patterning structure. The patterning structure is adapted to pattern a beam of radiation according to a desired pattern. The apparatus also includes a substrate holder that is constructed to hold a substrate, a projection system that is constructed and arranged to project the patterned beam onto a target portion of the substrate, and a downstream radical source that is connected to a gas supply and is configured to provide a beam of radicals onto a surface to be cleaned.

摘要翻译： 公开了一种光刻投影装置。 该装置包括构造成支撑图形结构的支撑结构。 图形结构适于根据期望的图案对辐射束进行图案化。 该装置还包括被构造成保持基板的基板保持器，被构造和布置成将图案化的光束投影到基板的目标部分上的投影系统，以及连接到气体源的下游自由基源，并且是 被配置为在待清洁的表面上提供自由基束。

公开(公告)号：US20050008978A1

公开(公告)日：2005-01-13

申请号：US10840508

申请日：2004-05-07

申请人： Johannes Adrianus Antonius Dams ,  Mark Kroon ,  Harm-Jan Voorma ,  Carolus Ida Maria Spee

发明人： Johannes Adrianus Antonius Dams ,  Mark Kroon ,  Harm-Jan Voorma ,  Carolus Ida Maria Spee

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03C5/00

CPC分类号： G03F7/70983 ,  G03F7/70916

摘要： A method of preparing components for use in a vacuum chamber of a lithographic apparatus is disclosed. The method includes coating the component with a non-metallic material. The method may further include treating the coating so as to harden the coating. Preferably, the coating material is a hydrogen silsesquioxane (HSQ), which may be applied via spraying, brushing, or spinning and can be treated by heating or by irradiation with an electron beam. The resulting components strongly reduce outgassing of water and hydrocarbons when subjected to a vacuum environment.

摘要翻译： 公开了一种制备用于光刻设备的真空室中的组件的方法。 该方法包括用非金属材料涂覆该组分。 该方法还可以包括处理涂层以使涂层硬化。 优选地，涂层材料是氢倍半硅氧烷（HSQ），其可以通过喷涂，刷涂或纺丝施加，并且可以通过加热或通过用电子束的照射进行处理。 所产生的组分在经受真空环境时强烈地减少了水和烃的除气。

公开(公告)号：US07599811B2

公开(公告)日：2009-10-06

申请号：US10582247

申请日：2004-12-09

申请人： Frits Jurgen Van Hout ,  Josephus Antonius Maria Van Bommel ,  Peter Dirksen ,  Mark Kroon ,  Casparus Anthonius Henricus Juffermans ,  Renatus Maria Adrianus Mathias Van Den Eijnden

发明人： Frits Jurgen Van Hout ,  Josephus Antonius Maria Van Bommel ,  Peter Dirksen ,  Mark Kroon ,  Casparus Anthonius Henricus Juffermans ,  Renatus Maria Adrianus Mathias Van Den Eijnden

IPC分类号： G06F15/00

CPC分类号： G03F7/70591 ,  G03F7/7085

摘要： A sensor arrangement may be used to measure properties, such as optical properties, of a device arranged to process substrates. The sensor arrangement includes a substrate having the following: a plurality of sensor elements provided as an integrated circuit in the substrate, for each one of the plurality of sensor elements associated electronic circuitry comprising a processing circuit connected to the sensor element and an input/output interface connected to the processing circuit, and a power supply unit configured to supply operating power only to the electronic circuitry associated with one or more of the plurality of sensor elements which are in use. The at least one sensor element and possibly the processing electronics, the input/output unit, and/or the power supply unit may be provided as one or more integrated circuits or other structures in the substrate.

摘要翻译： 可以使用传感器装置来测量布置成处理衬底的器件的性质，例如光学性质。 所述传感器装置包括具有以下基板：多个传感器元件，作为所述基板中的集成电路设置，所述多个传感器元件中的每一个相关联的电子电路包括连接到所述传感器元件的处理电路和输入/输出 接口连接到处理电路，以及电源单元，被配置为仅向与所使用的多个传感器元件中的一个或多个相关联的电子电路提供工作电力。 至少一个传感器元件以及可能的处理电子器件，输入/输出单元和/或电源单元可以被提供为衬底中的一个或多个集成电路或其他结构。

公开(公告)号：US06888151B2

公开(公告)日：2005-05-03

申请号：US10847687

申请日：2004-05-18

申请人： Mark Kroon ,  Jan Evert Van Der Werf ,  Haico Victor Kok

发明人： Mark Kroon ,  Jan Evert Van Der Werf ,  Haico Victor Kok

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G03B27/52

CPC分类号： G03F9/7088 ,  G03F7/706 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70716 ,  G03F7/7085

摘要： A lithographic apparatus according to one embodiment of the invention includes an image sensing device configured and arranged to measure a pattern in a patterned beam of radiation. The image sensing device comprises a slab on which at least two sensors are formed. The sensors are sensitive to radiation of the beam and are arranged on a first side of the slab. A film that is non-transparent to radiation of the beam is provided at the first side over the sensors. The film includes a patterned segment above each sensor.

摘要翻译： 根据本发明的一个实施例的光刻设备包括被配置和布置成测量图案化的辐射束中的图案的图像感测装置。 图像感测装置包括在其上形成有至少两个传感器的平板。 传感器对梁的辐射敏感，并且布置在板的第一侧上。 在传感器的第一侧设置对光束辐射不透明的胶片。 该膜包括每个传感器上方的图案化片段。

公开(公告)号：US06747282B2

公开(公告)日：2004-06-08

申请号：US10164706

申请日：2002-06-10

申请人： Mark Kroon ,  Jan Evert Van Der Werf ,  Haico Victor Kok

发明人： Mark Kroon ,  Jan Evert Van Der Werf ,  Haico Victor Kok

IPC分类号： G03B2752

CPC分类号： G03F9/7088 ,  G03F7/706 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70716 ,  G03F7/7085

摘要： One example of a lithographic projection apparatus includes an image sensing device configured and arranged to measure a pattern in a patterned projection beam. The image sensing device includes a slab and a radiation-sensitive sensor that is sensitive to the radiation of the projection beam. The image sensing device also includes a film of a material that is non-transparent to the radiation of the projection beam. This film is provided over the sensor and includes one or more patterned segments to selectively pass radiation of the projection beam to the sensor. The apparatus also includes an intermediate plate made from a material having a thermal expansion coefficient below approximately 12×10−6K−1 and having a slab-bearing surface.

摘要翻译： 光刻投影设备的一个示例包括被配置和布置为测量图案化投影光束中的图案的图像感测装置。 图像感测装置包括对投影光束的辐射敏感的平板和辐射敏感传感器。 图像感测装置还包括对投影光束的辐射不透明的材料的膜。 该膜设置在传感器上方并且包括一个或多个图案化区段以选择性地将投影光束的辐射传递到传感器。 该装置还包括由具有低于约12×10 -6 K -1的热膨胀系数的材料制成并具有承载板的表面的中间板。

公开(公告)号：US07274432B2

公开(公告)日：2007-09-25

申请号：US10976156

申请日：2004-10-29

申请人： Mark Kroon

发明人： Mark Kroon

IPC分类号： G02B6/32

CPC分类号： G03F7/70033 ,  G03F7/7005 ,  G03F7/702 ,  G03F7/70208

摘要： A radiation system for multiplexing radiation includes two radiation sub-sources. The sub-sources each provide a certain amount of radiation. The system further includes a member with reflecting surfaces. The surfaces are arranged in such a way that they receive the radiation from the sub-sources and combine this radiation. The radiation sub-sources may operate simultaneously or alternately. The surfaces may perform functions such as filtering or (de)magnifying.

摘要翻译： 用于复用辐射的辐射系统包括两个辐射子源。 这些子源各提供一定量的辐射。 该系统还包括具有反射表面的构件。 这些表面被布置成使得它们接收来自子源的辐射并且组合该辐射。 辐射子源可以同时或交替地操作。 表面可以执行诸如过滤或放大的功能。