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21.发明申请公开(公告)号：US20110112306A1
公开(公告)日：2011-05-12
申请号：US13000643
申请日：2009-07-06
IPC分类号： C07C309/03 , C07D209/76
CPC分类号： C07C381/12 , C07C25/18 , C07C303/22 , C07C309/12 , C07C309/82 , C07C2603/74 , C07D209/76 , C07D311/78 , C07D333/46 , C07D335/02 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： A fluorine-containing sulfonic acid salt or a compound having a fluorine-containing sulfonic acid group, either of which having a structure represented by the following general formula (1), is provided. Such a salt or compound can act as a suitable photo-acid generator, and can form a resist pattern having excellent sensitivity, resolution and mask-dependence. [In general formula (1), R represents a substituted or unsubstituted linear or branched monovalent hydrocarbon group having 1 to 30 carbon atoms, a substituted or unsubstituted monovalent hydrocarbon group having 3 to 30 carbon atoms and a cyclic or a partially cyclic structure, a substituted or unsubstituted aryl group having 6 to 30 carbon atoms, or a substituted or unsubstituted monovalent heterocyclic organic group having 4 to 30 carbon atoms.]
摘要翻译： 提供含氟磺酸盐或具有含氟磺酸基的化合物，其具有由以下通式（1）表示的结构。 这样的盐或化合物可以用作合适的光酸发生剂，并且可以形成具有优异的灵敏度，分辨率和掩模依赖性的抗蚀剂图案。 [通式（1）中，R表示取代或未取代的碳原子数1〜30的直链或支链一价烃基，取代或未取代的碳原子数3〜30的一价烃基和环状或部分环状结构， 取代或未取代的碳原子数为6〜30的芳基，取代或未取代的碳原子数为4〜30的1价杂环有机基。
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22.发明授权Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same 有权含氟化合物，含氟聚合物，负型抗蚀剂组合物和使用它们的图案化工艺公开(公告)号：US08513457B2
公开(公告)日：2013-08-20
申请号：US13474187
申请日：2012-05-17
IPC分类号： C07C59/58
CPC分类号： C07C69/653 , C08F220/24 , C08F220/28 , G03F7/0046 , G03F7/0382 , Y10S430/108 , Y10S430/115 , Y10S430/143 , Y10S430/167 , Y10T428/24802
摘要： A fluorine-containing unsaturated carboxylic acid represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a chemically amplified resist composition that is transparent to KrF or ArF excimer laser light and has a high resolution and is capable of forming a pattern having a rectangular section with no swelling.
摘要翻译： 由式（1）表示的含氟不饱和羧酸，其中R 1表示可聚合双键的基团，R 3表示氟原子或含氟烷基，W表示二价连接基团。 该化合物可以提供重均分子量为1,000〜1,000,000的含氟聚合物化合物，并且含有式（2）所示的重复单元，其中R 3和W如上定义，各自为R 4，R 5和R 6 独立地表示氢原子，氟原子或一价有机基团，R4，R5和R6中的至少两个可以组合形成环。 该高分子化合物可以提供对KrF或ArF准分子激光透明的化学放大抗蚀剂组合物，并且具有高分辨率，并且能够形成具有无膨胀的矩形截面的图案。
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23.发明授权Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same 有权含氟化合物，含氟聚合物，负型抗蚀剂组合物和使用它们的图案化工艺公开(公告)号：US08187787B2
公开(公告)日：2012-05-29
申请号：US12146889
申请日：2008-06-26
CPC分类号： C07C69/653 , C08F220/24 , C08F220/28 , G03F7/0046 , G03F7/0382 , Y10S430/108 , Y10S430/115 , Y10S430/143 , Y10S430/167 , Y10T428/24802
摘要： Disclosed is a fluorine-containing unsaturated carboxylic acid represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a chemically amplified resist composition that is transparent to KrF or ArF excimer laser light and has a high resolution and is capable of forming a pattern having a rectangular section with no swelling.
摘要翻译： 公开了式（1）表示的含氟不饱和羧酸，其中R1表示可聚合双键的基团，R3表示氟原子或含氟烷基，W表示二价连接基团。 该化合物可以提供重均分子量为1,000〜1,000,000的含氟聚合物化合物，并且含有式（2）所示的重复单元，其中R 3和W如上定义，各自为R 4，R 5和R 6 独立地表示氢原子，氟原子或一价有机基团，R4，R5和R6中的至少两个可以组合形成环。 该高分子化合物可以提供对KrF或ArF准分子激光透明的化学放大抗蚀剂组合物，并且具有高分辨率，并且能够形成具有无膨胀的矩形截面的图案。
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24.发明申请Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same 有权含氟化合物，含氟聚合物，负型抗蚀剂组合物和使用其的图案化方法公开(公告)号：US20090011199A1
公开(公告)日：2009-01-08
申请号：US12146889
申请日：2008-06-26
IPC分类号： B32B3/10 , C08F214/18 , C08F220/22 , C07C69/52 , G03F7/004 , G03F7/20
CPC分类号： C07C69/653 , C08F220/24 , C08F220/28 , G03F7/0046 , G03F7/0382 , Y10S430/108 , Y10S430/115 , Y10S430/143 , Y10S430/167 , Y10T428/24802
摘要： Disclosed is a fluorine-containing unsaturated carboxylic acid represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a chemically amplified resist composition that is transparent to KrF or ArF excimer laser light and has a high resolution and is capable of forming a pattern having a rectangular section with no swelling.
摘要翻译： 公开了式（1）表示的含氟不饱和羧酸，其中R1表示可聚合双键的基团，R3表示氟原子或含氟烷基，W表示二价连接基团。 该化合物可以提供重均分子量为1,000〜1,000,000的含氟聚合物化合物，并且含有式（2）所示的重复单元，其中R 3和W如上定义，各自为R 4，R 5和R 6 独立地表示氢原子，氟原子或一价有机基团，R4，R5和R6中的至少两个可以组合形成环。 该高分子化合物可以提供对KrF或ArF准分子激光透明的化学放大抗蚀剂组合物，并且具有高分辨率，并且能够形成具有无膨胀的矩形截面的图案。
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25.发明授权Fluorine-containing compound, fluorine-containing polymer, postive-type resist composition, and patterning process using same 有权含氟化合物，含氟聚合物，后置型抗蚀剂组合物和使用它们的图案化工艺公开(公告)号：US07887990B2
公开(公告)日：2011-02-15
申请号：US12137145
申请日：2008-06-11
CPC分类号： C07C69/54 , C07C69/618 , C07C69/653 , C07C69/67 , C08F20/22 , C08F220/26 , C08F220/28 , G03F7/0046 , G03F7/0395 , G03F7/0397 , Y02P20/55 , Y10S430/108 , Y10S430/111
摘要： Disclosed is a fluorine-containing compound represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R2 represents an acid-labile protecting group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R2, R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a resist composition capable of forming a pattern that is transparent to exposure light and superior in rectangularity.
摘要翻译： 公开了式（1）表示的含氟化合物，其中R1表示可聚合双键的基团，R2表示酸不稳定保护基，R3表示氟原子或含氟烷基，W表示 二价连接基团。 该化合物可以提供重均分子量为1,000〜1,000,000的含氟聚合物化合物，其含有式（2）表示的重复单元，其中，R2，R3和W如上所定义，R 4，R 5， R6独立地表示氢原子，氟原子或一价有机基团，R 4，R 5和R 6中的至少两个可以组合形成环。 该高分子化合物可以提供能够形成对曝光光透明并且矩形性优异的图案的抗蚀剂组合物。
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公开(公告)号：US08592622B2
公开(公告)日：2013-11-26
申请号：US12983916
申请日：2011-01-04
IPC分类号： C07C69/54 , C07C69/618 , C07C69/653 , C08F20/22 , G03F7/004 , G03F7/039
CPC分类号： C07C69/54 , C07C69/618 , C07C69/653 , C07C69/67 , C08F20/22 , C08F220/26 , C08F220/28 , G03F7/0046 , G03F7/0395 , G03F7/0397 , Y02P20/55 , Y10S430/108 , Y10S430/111
摘要： A polymerizable fluorine-containing compound represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R2 represents an acid-labile protecting group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R2, R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a resist composition capable of forming a pattern that is transparent to exposure light and superior in rectangularity.
摘要翻译： 由式（1）表示的可聚合的含氟化合物，其中R1表示可聚合双键的基团，R2表示酸不稳定保护基，R3表示氟原子或含氟烷基，W表示二价 连接组。 该化合物可以提供重均分子量为1,000〜1,000,000的含氟聚合物化合物，其含有式（2）表示的重复单元，其中，R2，R3和W如上所定义，R 4，R 5， R6独立地表示氢原子，氟原子或一价有机基团，R 4，R 5和R 6中的至少两个可以组合形成环。 该高分子化合物可以提供能够形成对曝光光透明并且矩形性优异的图案的抗蚀剂组合物。
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公开(公告)号：US20110098500A1
公开(公告)日：2011-04-28
申请号：US12983916
申请日：2011-01-04
IPC分类号： C07C69/675 , C07C69/73
CPC分类号： C07C69/54 , C07C69/618 , C07C69/653 , C07C69/67 , C08F20/22 , C08F220/26 , C08F220/28 , G03F7/0046 , G03F7/0395 , G03F7/0397 , Y02P20/55 , Y10S430/108 , Y10S430/111
摘要： A polymerizable fluorine-containing compound represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R2 represents an acid-labile protecting group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R2, R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a resist composition capable of forming a pattern that is transparent to exposure light and superior in rectangularity.
摘要翻译： 由式（1）表示的可聚合的含氟化合物，其中R1表示可聚合双键的基团，R2表示酸不稳定保护基，R3表示氟原子或含氟烷基，W表示二价 连接组。 该化合物可以提供重均分子量为1,000〜1,000,000的含氟聚合物化合物，其含有式（2）表示的重复单元，其中，R2，R3和W如上所定义，R 4，R 5， R6独立地表示氢原子，氟原子或一价有机基团，R 4，R 5和R 6中的至少两个可以组合形成环。 该高分子化合物可以提供能够形成对曝光光透明并且矩形性优异的图案的抗蚀剂组合物。
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公开(公告)号：US07906269B2
公开(公告)日：2011-03-15
申请号：US12200393
申请日：2008-08-28
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38 , C08F214/18
CPC分类号： C08F214/18 , C08F220/18 , C08F220/22 , C08F220/28 , G03F7/0046 , G03F7/0397 , Y10S430/108 , Y10S430/115 , Y10S430/143 , Y10S430/167
摘要： Disclosed is a fluorine-containing polymer compound containing first and second repeating units respectively represented by formulas (a-1) and (a-2), wherein R3 represents a fluorine atom or fluorine-containing alkyl group, each of W and W1 independently represents a bivalent linking group, R2 represents an acid-labile protecting group, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, and at least two of R4, R5, R6 and W or W1 may be combined to form a cyclic structure in formula (a-1) or (a-2). This polymer compound has a weight-average molecular weight of 1,000 to 1,000,000 and can provide a resist composition capable of forming a pattern with no swelling and no pattern falling down.
摘要翻译： 公开了含有分别由式（a-1）和（a-2）表示的第一和第二重复单元的含氟聚合物化合物，其中R 3表示氟原子或含氟烷基，W和W1各自独立地表示 二价连接基团，R 2表示酸不稳定保护基，R4，R5和R6各自独立地表示氢原子，氟原子或一价有机基团，并且R4，R5，R6和W或W1中的至少两个可以是 合并形成式（a-1）或（a-2）中的环状结构。 该高分子化合物的重均分子量为1,000〜1,000,000，能够提供能够形成没有溶胀，无图案脱落的图案的抗蚀剂组合物。
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29.发明授权Salt having fluorine-containing carbanion structure, derivative thereof, photoacid generator, resist material using the photoacid generator, and pattern forming method 有权具有含氟碳负离子结构的盐，其衍生物，光酸产生剂，使用光酸产生剂的抗蚀剂材料和图案形成方法公开(公告)号：US08580486B2
公开(公告)日：2013-11-12
申请号：US12922300
申请日：2009-03-10
申请人： Masashi Nagamori , Satoru Narizuka , Susumu Inoue , Takashi Kume
发明人： Masashi Nagamori , Satoru Narizuka , Susumu Inoue , Takashi Kume
CPC分类号： C07C381/12 , C07C317/18 , C07C2603/74 , C08F220/28 , G03F7/0045 , G03F7/0046 , G03F7/0397 , C08F220/18 , C08F220/24 , C08F232/08
摘要： There is provided an acid having a fluorine-containing carbanion structure or a salt having a fluorine-containing carbanion structure, which is represented by the following general formula (1). By using a photoacid generator for chemically amplified resist materials that generates this acid, it is possible to provide a photoacid generator which has a high sensitivity to the ArF excimer laser light or the like, of which acid (photo generated acid) to be generated has a sufficiently high acidity, and which has a high dissolution in resist solvent and a superior compatibility with resin, and a resist material containing such a photoacid generator.
摘要翻译： 提供具有含氟碳负离子结构的酸或具有含氟碳负离子结构的盐，其由以下通式（1）表示。 通过使用产生该酸的化学放大抗蚀剂材料的光酸产生剂，可以提供对ArF准分子激光等具有高灵敏度的光酸产生剂，其中产生的酸（光产生酸）具有 具有足够高的酸度，并且在抗蚀剂溶剂中具有高溶解性和与树脂的优异的相容性，以及含有这种光致酸产生剂的抗蚀剂材料。
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30.发明申请Novel Salt Having Fluorine-Containing Carbanion Structure, Derivative Thereof, Photoacid Generator, Resist Material Using the Photoacid Generator, and Pattern Forming Method 有权具有含氟碳酸盐结构的新型盐，其衍生物，光酸发生剂，使用光致酸发生剂的抗蚀材料和图案形成方法公开(公告)号：US20110070544A1
公开(公告)日：2011-03-24
申请号：US12922300
申请日：2009-03-10
申请人： Masashi Nagamori , Satoru Narizuka , Susumu Inoue , Takashi Kume
发明人： Masashi Nagamori , Satoru Narizuka , Susumu Inoue , Takashi Kume
IPC分类号： G03F7/004 , C07C315/00 , C07D327/04 , C07C69/00 , C07C69/74 , C07C309/00 , C07C261/00 , G03F7/20
CPC分类号： C07C381/12 , C07C317/18 , C07C2603/74 , C08F220/28 , G03F7/0045 , G03F7/0046 , G03F7/0397 , C08F220/18 , C08F220/24 , C08F232/08
摘要： There is provided an acid having a fluorine-containing carbanion structure or a salt having a fluorine-containing carbanion structure, which is represented by the following general formula (1). By using a photoacid generator for chemically amplified resist materials that generates this acid, it is possible to provide a photoacid generator which has a high sensitivity to the ArF excimer laser light or the like, of which acid (photo generated acid) to be generated has a sufficiently high acidity, and which has a high dissolution in resist solvent and a superior compatibility with resin, and a resist material containing such a photoacid generator.
摘要翻译： 提供具有含氟碳负离子结构的酸或具有含氟碳负离子结构的盐，其由以下通式（1）表示。 通过使用产生该酸的化学放大抗蚀剂材料的光酸产生剂，可以提供对ArF准分子激光等具有高灵敏度的光酸产生剂，其中产生的酸（光产生酸）具有 具有足够高的酸度，并且在抗蚀剂溶剂中具有高溶解性和与树脂的优异的相容性，以及含有这种光致酸产生剂的抗蚀剂材料。
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