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1.发明授权Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same 有权含氟化合物，含氟聚合物，负型抗蚀剂组合物和使用它们的图案化工艺公开(公告)号：US08513457B2
公开(公告)日：2013-08-20
申请号：US13474187
申请日：2012-05-17
IPC分类号： C07C59/58
CPC分类号： C07C69/653 , C08F220/24 , C08F220/28 , G03F7/0046 , G03F7/0382 , Y10S430/108 , Y10S430/115 , Y10S430/143 , Y10S430/167 , Y10T428/24802
摘要： A fluorine-containing unsaturated carboxylic acid represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a chemically amplified resist composition that is transparent to KrF or ArF excimer laser light and has a high resolution and is capable of forming a pattern having a rectangular section with no swelling.
摘要翻译： 由式（1）表示的含氟不饱和羧酸，其中R 1表示可聚合双键的基团，R 3表示氟原子或含氟烷基，W表示二价连接基团。 该化合物可以提供重均分子量为1,000〜1,000,000的含氟聚合物化合物，并且含有式（2）所示的重复单元，其中R 3和W如上定义，各自为R 4，R 5和R 6 独立地表示氢原子，氟原子或一价有机基团，R4，R5和R6中的至少两个可以组合形成环。 该高分子化合物可以提供对KrF或ArF准分子激光透明的化学放大抗蚀剂组合物，并且具有高分辨率，并且能够形成具有无膨胀的矩形截面的图案。
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2.发明授权Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same 有权含氟化合物，含氟聚合物，负型抗蚀剂组合物和使用它们的图案化工艺公开(公告)号：US08187787B2
公开(公告)日：2012-05-29
申请号：US12146889
申请日：2008-06-26
CPC分类号： C07C69/653 , C08F220/24 , C08F220/28 , G03F7/0046 , G03F7/0382 , Y10S430/108 , Y10S430/115 , Y10S430/143 , Y10S430/167 , Y10T428/24802
摘要： Disclosed is a fluorine-containing unsaturated carboxylic acid represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a chemically amplified resist composition that is transparent to KrF or ArF excimer laser light and has a high resolution and is capable of forming a pattern having a rectangular section with no swelling.
摘要翻译： 公开了式（1）表示的含氟不饱和羧酸，其中R1表示可聚合双键的基团，R3表示氟原子或含氟烷基，W表示二价连接基团。 该化合物可以提供重均分子量为1,000〜1,000,000的含氟聚合物化合物，并且含有式（2）所示的重复单元，其中R 3和W如上定义，各自为R 4，R 5和R 6 独立地表示氢原子，氟原子或一价有机基团，R4，R5和R6中的至少两个可以组合形成环。 该高分子化合物可以提供对KrF或ArF准分子激光透明的化学放大抗蚀剂组合物，并且具有高分辨率，并且能够形成具有无膨胀的矩形截面的图案。
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3.发明申请Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same 有权含氟化合物，含氟聚合物，负型抗蚀剂组合物和使用其的图案化方法公开(公告)号：US20090011199A1
公开(公告)日：2009-01-08
申请号：US12146889
申请日：2008-06-26
IPC分类号： B32B3/10 , C08F214/18 , C08F220/22 , C07C69/52 , G03F7/004 , G03F7/20
CPC分类号： C07C69/653 , C08F220/24 , C08F220/28 , G03F7/0046 , G03F7/0382 , Y10S430/108 , Y10S430/115 , Y10S430/143 , Y10S430/167 , Y10T428/24802
摘要： Disclosed is a fluorine-containing unsaturated carboxylic acid represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a chemically amplified resist composition that is transparent to KrF or ArF excimer laser light and has a high resolution and is capable of forming a pattern having a rectangular section with no swelling.
摘要翻译： 公开了式（1）表示的含氟不饱和羧酸，其中R1表示可聚合双键的基团，R3表示氟原子或含氟烷基，W表示二价连接基团。 该化合物可以提供重均分子量为1,000〜1,000,000的含氟聚合物化合物，并且含有式（2）所示的重复单元，其中R 3和W如上定义，各自为R 4，R 5和R 6 独立地表示氢原子，氟原子或一价有机基团，R4，R5和R6中的至少两个可以组合形成环。 该高分子化合物可以提供对KrF或ArF准分子激光透明的化学放大抗蚀剂组合物，并且具有高分辨率，并且能够形成具有无膨胀的矩形截面的图案。
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4.发明授权Fluorine-containing compound, fluorine-containing polymer, postive-type resist composition, and patterning process using same 有权含氟化合物，含氟聚合物，后置型抗蚀剂组合物和使用它们的图案化工艺公开(公告)号：US07887990B2
公开(公告)日：2011-02-15
申请号：US12137145
申请日：2008-06-11
CPC分类号： C07C69/54 , C07C69/618 , C07C69/653 , C07C69/67 , C08F20/22 , C08F220/26 , C08F220/28 , G03F7/0046 , G03F7/0395 , G03F7/0397 , Y02P20/55 , Y10S430/108 , Y10S430/111
摘要： Disclosed is a fluorine-containing compound represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R2 represents an acid-labile protecting group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R2, R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a resist composition capable of forming a pattern that is transparent to exposure light and superior in rectangularity.
摘要翻译： 公开了式（1）表示的含氟化合物，其中R1表示可聚合双键的基团，R2表示酸不稳定保护基，R3表示氟原子或含氟烷基，W表示 二价连接基团。 该化合物可以提供重均分子量为1,000〜1,000,000的含氟聚合物化合物，其含有式（2）表示的重复单元，其中，R2，R3和W如上所定义，R 4，R 5， R6独立地表示氢原子，氟原子或一价有机基团，R 4，R 5和R 6中的至少两个可以组合形成环。 该高分子化合物可以提供能够形成对曝光光透明并且矩形性优异的图案的抗蚀剂组合物。
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公开(公告)号：US07906269B2
公开(公告)日：2011-03-15
申请号：US12200393
申请日：2008-08-28
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38 , C08F214/18
CPC分类号： C08F214/18 , C08F220/18 , C08F220/22 , C08F220/28 , G03F7/0046 , G03F7/0397 , Y10S430/108 , Y10S430/115 , Y10S430/143 , Y10S430/167
摘要： Disclosed is a fluorine-containing polymer compound containing first and second repeating units respectively represented by formulas (a-1) and (a-2), wherein R3 represents a fluorine atom or fluorine-containing alkyl group, each of W and W1 independently represents a bivalent linking group, R2 represents an acid-labile protecting group, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, and at least two of R4, R5, R6 and W or W1 may be combined to form a cyclic structure in formula (a-1) or (a-2). This polymer compound has a weight-average molecular weight of 1,000 to 1,000,000 and can provide a resist composition capable of forming a pattern with no swelling and no pattern falling down.
摘要翻译： 公开了含有分别由式（a-1）和（a-2）表示的第一和第二重复单元的含氟聚合物化合物，其中R 3表示氟原子或含氟烷基，W和W1各自独立地表示 二价连接基团，R 2表示酸不稳定保护基，R4，R5和R6各自独立地表示氢原子，氟原子或一价有机基团，并且R4，R5，R6和W或W1中的至少两个可以是 合并形成式（a-1）或（a-2）中的环状结构。 该高分子化合物的重均分子量为1,000〜1,000,000，能够提供能够形成没有溶胀，无图案脱落的图案的抗蚀剂组合物。
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公开(公告)号：US08592622B2
公开(公告)日：2013-11-26
申请号：US12983916
申请日：2011-01-04
IPC分类号： C07C69/54 , C07C69/618 , C07C69/653 , C08F20/22 , G03F7/004 , G03F7/039
CPC分类号： C07C69/54 , C07C69/618 , C07C69/653 , C07C69/67 , C08F20/22 , C08F220/26 , C08F220/28 , G03F7/0046 , G03F7/0395 , G03F7/0397 , Y02P20/55 , Y10S430/108 , Y10S430/111
摘要： A polymerizable fluorine-containing compound represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R2 represents an acid-labile protecting group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R2, R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a resist composition capable of forming a pattern that is transparent to exposure light and superior in rectangularity.
摘要翻译： 由式（1）表示的可聚合的含氟化合物，其中R1表示可聚合双键的基团，R2表示酸不稳定保护基，R3表示氟原子或含氟烷基，W表示二价 连接组。 该化合物可以提供重均分子量为1,000〜1,000,000的含氟聚合物化合物，其含有式（2）表示的重复单元，其中，R2，R3和W如上所定义，R 4，R 5， R6独立地表示氢原子，氟原子或一价有机基团，R 4，R 5和R 6中的至少两个可以组合形成环。 该高分子化合物可以提供能够形成对曝光光透明并且矩形性优异的图案的抗蚀剂组合物。
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公开(公告)号：US20120064459A1
公开(公告)日：2012-03-15
申请号：US13320871
申请日：2010-05-14
申请人： Kazuhiko Maeda , Takamasa Kitamoto , Haruhiko Komoriya , Satoru Narizuka , Yoshimi Isono , Kazunori Mori
发明人： Kazuhiko Maeda , Takamasa Kitamoto , Haruhiko Komoriya , Satoru Narizuka , Yoshimi Isono , Kazunori Mori
CPC分类号： G03F7/20 , C08F20/26 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： Disclosed is a water repellent additive for an immersion resist, which is composed of a fluorine-containing polymer that has a repeating unit represented by general formula (1). By adding the water repellent additive to a resist composition, the resist composition can be controlled to have high water repellency during exposure and to exhibit improved solubility in a developing solution during development. [In the formula, R1 represents a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group; R2 represents a heat-labile protecting group; R3 represents a fluorine atom or a fluorine-containing alkyl group; and W represents a divalent linking group.]
摘要翻译： 公开了一种浸渍抗蚀剂的防水添加剂，其由具有由通式（1）表示的重复单元的含氟聚合物组成。 通过将防水添加剂添加到抗蚀剂组合物中，可以将抗蚀剂组合物控制为在曝光期间具有高的拒水性，并且在显影期间在显影液中表现出改善的溶解性。 [式中，R 1表示氢原子，氟原子，甲基或三氟甲基。 R2代表热不稳定保护基; R3表示氟原子或含氟烷基; W表示二价连接基。]
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公开(公告)号：US20110301305A1
公开(公告)日：2011-12-08
申请号：US13201766
申请日：2010-02-18
IPC分类号： C08G63/685 , C07C57/58 , C07C57/76 , C08G73/06 , C08G63/199 , C08G69/32 , C08G73/22 , C07C69/65 , C07C59/64
CPC分类号： C07C59/64 , C07C69/65 , C07C69/734 , C08G63/6826 , C08G69/42 , C08G73/06 , C08G73/1039 , C08G73/22
摘要： According to the present invention, a polymer is obtained by polycondensation of a fluorinated dicarboxylic acid derivative of the general formula (M-1) or an acid anhydride of the fluorinated dicarboxylic acid with a polyfunctional compound having two to four reactive groups corresponding in reactivity to carbonyl moieties of the fluorinated dicarboxylic acid derivative or acid anhydride. [Chem. 134] AOCF2C-Q-CF2COA′ (M-1) In the above formula, Q represents a divalent organic group having a substituted or unsubstituted aromatic ring; and A and A′ each independently represent an organic group. This polymer exhibits a sufficiently low dielectric constant for use as a semiconductor protection film and has the capability of forming a film at a relatively low temperature of 250° C. or lower.
摘要翻译： 根据本发明，通过使通式（M-1）的氟化二羧酸衍生物或氟化二羧酸的酸酐与具有2〜4个反应性对应的反应性基团的多官能化合物与反应性对应的反应性进行缩聚而获得聚合物 氟化二羧酸衍生物或酸酐的羰基部分。 [Chem。 134] AOCF2C-Q-CF2COA'（M-1）在上式中，Q表示具有取代或未取代的芳环的二价有机基团; A和A'各自独立地表示有机基团。 该聚合物表现出足够低的介电常数用作半导体保护膜，并且具有在250℃或更低的较低温度下形成膜的能力。
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公开(公告)号：US08663903B2
公开(公告)日：2014-03-04
申请号：US13264285
申请日：2010-04-20
申请人： Kazuhiko Maeda , Takamasa Kitamoto , Haruhiko Komoriya , Satoru Narizuka , Yoshimi Isono , Kazunori Mori
发明人： Kazuhiko Maeda , Takamasa Kitamoto , Haruhiko Komoriya , Satoru Narizuka , Yoshimi Isono , Kazunori Mori
CPC分类号： C08F20/22 , G03F7/11 , G03F7/2041
摘要： Disclosed is a top coating composition formed on a resist film, for protecting the resist film, the top coating composition being a top coating composition for photoresist, characterized by containing a fluorine-containing polymer having a repeating unit represented by the following general formula (1). This composition is capable of controlling developing solution solubility and has a high water repellency. [In the formula, R1 represents a hydrogen atom, fluorine atom, methyl group or trifluoromethyl group, R2 represents a heat-labile protecting group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W is a bivalent linking group.]
摘要翻译： 公开了一种形成在抗蚀剂膜上的用于保护抗蚀剂膜的顶部涂料组合物，该顶部涂料组合物是用于光致抗蚀剂的顶部涂料组合物，其特征在于含有具有由以下通式（1）表示的重复单元的含氟聚合物 ）。 该组合物能够控制显影溶液的溶解度并具有高斥水性。 [式中，R1表示氢原子，氟原子，甲基或三氟甲基，R2表示热不稳定保护基，R3表示氟原子或含氟烷基，W表示二价连接基。
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10.发明申请Fluorine-Containing Sulfonate Resin, Resist Composition and Pattern Formation Method 审中-公开含氟磺酸酯树脂，抗蚀剂组合物和图案形成方法公开(公告)号：US20120322006A1
公开(公告)日：2012-12-20
申请号：US13333322
申请日：2011-12-21
申请人： Misugi KATO , Yoshimi Isono , Satoru Narizuka
发明人： Misugi KATO , Yoshimi Isono , Satoru Narizuka
IPC分类号： G03F7/20 , C07C271/10 , G03F7/038 , G03F7/039 , C08F228/04 , C08F228/02
CPC分类号： G03F7/0045 , C07C25/18 , C07C309/12 , C07C381/12 , C08F228/04 , G03F7/0046 , G03F7/0382 , G03F7/0397 , G03F7/2041
摘要： A sulfonate resin according to the present invention has a repeating unit of the following general formula (3): where X each independently represents a hydrogen atom or a fluorine atom; n represents an integer of 1 to 10; R represents a hydrogen atom, a halogen atom or a C1-C3 alkyl or fluorine-containing alkyl group; J represents a divalent linking group; and M+ represents a monovalent cation.This sulfonate resin contains a sulfonic acid onium salt in a side chain thereof, with an anion moiety of the sulfonic acid onium salt fixed to the sulfonate resin, and thus functions as a resist resin with good resist characteristics such as DOF, LER, sensitivity and resolution.
摘要翻译： 本发明的磺酸树脂具有以下通式（3）的重复单元：其中X各自独立地表示氢原子或氟原子; n表示1〜10的整数， R表示氢原子，卤素原子或C1-C3烷基或含氟烷基; J表示二价连接基团; M +表示一价阳离子。 该磺酸树脂在其侧链中含有磺酸鎓盐，其中磺酸鎓盐的阴离子部分固定在磺酸盐树脂上，因此起到抗蚀剂树脂的作用，具有良好的抗蚀特性，例如DOF，LER，灵敏度和 解析度。
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