公开(公告)号：US09348214B2

公开(公告)日：2016-05-24

申请号：US14170808

申请日：2014-02-03

Applicant: KLA-Tencor Corporation

Inventor： Daimian Wang ,  Li Wang ,  Frank Chilese ,  David Alles

IPC: G01N21/956 ,  G03F1/00 ,  G03F1/24 ,  G03F1/22 ,  G03F1/84 ,  G03F7/20

CPC classification number: G03F1/24 ,  G01N21/956 ,  G01N2021/95676 ,  G03F1/22 ,  G03F1/84 ,  G03F7/70033

Abstract: An extreme ultraviolet (EUM) mask inspection system, comprising a light source to project EUV light along an optical axis, an illumination system to receive the EUV light from the source, the illumination system comprising a spectral purity filter (SPF), the SPF transmits a first portion of the EUV light along the optical axis toward a mask and the SPF comprising a plurality of at least partially reflective elements, said elements reflects a second portion of the EUV light off the optical axis, a projection system adapted to receive the first portion of the EUV light after it has illuminated the mask, a first detector array adapted to receive the image, and a second detector array to receive the second portion of the EUV light. The SPF may comprise one or more multilayer interference-type filters. Alternatively, the SPF comprises a thin film filter disposed on a grazing incidence mirror array.

Abstract translation: 一种极光紫外线（EUM）掩模检查系统，包括沿着光轴投射EUV光的光源，用于接收来自源的EUV光的照明系统，该照明系统包括光谱纯度滤光片（SPF），SPF透射 EUV光的第一部分沿着光轴朝向掩模，并且所述SPF包括多个至少部分反射元件，所述元件将所述EUV光的第二部分反射离开所述光轴，所述投影系统适于接收所述第一 所述EUV光在其照亮所述掩模之后的部分，适于接收所述图像的第一检测器阵列，以及用于接收所述EUV光的第二部分的第二检测器阵列。 SPF可以包括一个或多个多层干涉型滤波器。 或者，SPF包括设置在掠入射镜阵列上的薄膜过滤器。

公开(公告)号：US20150076359A1

公开(公告)日：2015-03-19

申请号：US14335442

申请日：2014-07-18

Applicant: KLA-Tencor Corporation

Inventor： Alexander Bykanov ,  Oleg Khodykin ,  Daniel C. Wack ,  Konstantin Tsigutkin ,  Layton Hale ,  Joseph Walsh ,  Frank Chilese

IPC: H05G2/00 ,  G01N21/956 ,  G03F7/20 ,  G01J1/16

CPC classification number: H05G2/008 ,  G01J1/16 ,  G01N21/956 ,  G01N2021/95676 ,  G01N2201/061 ,  G03F1/84 ,  G03F7/70033 ,  G03F7/70891 ,  H05H2240/00

Abstract: An EUV light source includes a rotatable, cylindrically-symmetric element having a surface coated with a plasma-forming target material, a drive laser source configured to generate one or more laser pulses sufficient to generate EUV light via formation of a plasma by excitation of the plasma-forming target material, a set of focusing optics configured to focus the one or more laser pulses onto the surface of the rotatable, cylindrically-symmetric element, a set of collection optics configured to receive EUV light emanated from the generated plasma and further configured to direct the illumination to an intermediate focal point, and a gas management system including a gas supply subsystem configured to supply plasma-forming target material to the surface of the rotatable, cylindrically-symmetric element.

Abstract translation: EUV光源包括可旋转的圆柱对称元件，其具有涂覆有等离子体形成目标材料的表面;驱动激光源，被配置为产生足以通过激发等离子体产生EUV光的一个或多个激光脉冲 等离子体形成目标材料，一组聚焦光学元件，其被配置为将一个或多个激光脉冲聚焦到可旋转的圆柱形对称元件的表面上;一组收集光学器件，被配置为接收从所产生的等离子体发出的EUV光，并进一步配置 将照明引导到中间焦点，以及气体管理系统，其包括被配置为将等离子体形成目标材料供应到可旋转的圆柱对称元件的表面的气体供应子系统。