公开(公告)号：US11112691B2

公开(公告)日：2021-09-07

申请号：US16258118

申请日：2019-01-25

Applicant: KLA-Tencor Corporation

Inventor： Damon F. Kvamme ,  Rui-fang Shi ,  Daniel C. Wack ,  Sseunhyeun Jo ,  Xin Ye

IPC: G03F1/84 ,  G03F1/72 ,  G03F1/24

Abstract: An inspection system includes an illumination source configured to generate extreme ultraviolet (EUV) light, illumination optics to direct the EUV light to a sample within a range of off-axis incidence angles corresponding to an illumination pupil distribution, collection optics to collect light from the sample in response to the incident EUV light within a range of collection angles corresponding to an imaging pupil distribution, and a detector configured to receive at least a portion of the light collected by the collection optics. Further, a center of the illumination pupil distribution corresponds to an off-axis incidence angle along a first direction on the sample, and at least one of the illumination pupil distribution or the imaging pupil distribution is non-circular with a size along the first direction shorter than along a second direction perpendicular to the first direction.

公开(公告)号：US08941336B1

公开(公告)日：2015-01-27

申请号：US14300101

申请日：2014-06-09

Applicant: KLA-Tencor Corporation

Inventor： Yanwei Liu ,  Daniel C. Wack

IPC: H01J40/00 ,  H01J47/00 ,  H05H13/04 ,  H05G2/00

CPC classification number: H05H13/04 ,  H01J37/02 ,  H05G2/00 ,  H05G2/001 ,  H05H7/04 ,  H05H7/08

Abstract: A compact synchrotron radiation source includes an electron beam generator, an electron storage ring, one or more wiggler insertion devices disposed along one or more straight sections of the electron storage ring, the one or more wiggler insertion devices including a set of magnetic poles configured to generate a periodic alternating magnetic field suitable for producing synchrotron radiation emitted along the direction of travel of the electrons of the storage ring, wherein the one or more wiggler insertion devices are arranged to provide light to a set of illumination optics of a wafer optical characterization system or a mask optical characterization system, wherein the etendue of a light beam emitted by the one or more wiggler insertion devices is matched to the illumination optics of the at least one of a wafer optical characterization system and the mask optical characterization system.

Abstract translation: 紧凑型同步加速器辐射源包括电子束发生器，电子存储环，沿着电子存储环的一个或多个直线部分设置的一个或多个摆动插入装置，一个或多个摆动插入装置包括一组磁极， 产生适于产生沿着存储环的电子的行进方向发射的同步加速器辐射的周期性交变磁场，其中一个或多个摆动插入装置被布置成向晶片光学表征系统的一组照明光学器件提供光 或掩模光学表征系统，其中由一个或多个摆动插入装置发射的光束的光密度与晶片光学表征系统和掩模光学表征系统中的至少一个的照明光学器件相匹配。

公开(公告)号：US20150076359A1

公开(公告)日：2015-03-19

申请号：US14335442

申请日：2014-07-18

Applicant: KLA-Tencor Corporation

Inventor： Alexander Bykanov ,  Oleg Khodykin ,  Daniel C. Wack ,  Konstantin Tsigutkin ,  Layton Hale ,  Joseph Walsh ,  Frank Chilese

IPC: H05G2/00 ,  G01N21/956 ,  G03F7/20 ,  G01J1/16

CPC classification number: H05G2/008 ,  G01J1/16 ,  G01N21/956 ,  G01N2021/95676 ,  G01N2201/061 ,  G03F1/84 ,  G03F7/70033 ,  G03F7/70891 ,  H05H2240/00

Abstract: An EUV light source includes a rotatable, cylindrically-symmetric element having a surface coated with a plasma-forming target material, a drive laser source configured to generate one or more laser pulses sufficient to generate EUV light via formation of a plasma by excitation of the plasma-forming target material, a set of focusing optics configured to focus the one or more laser pulses onto the surface of the rotatable, cylindrically-symmetric element, a set of collection optics configured to receive EUV light emanated from the generated plasma and further configured to direct the illumination to an intermediate focal point, and a gas management system including a gas supply subsystem configured to supply plasma-forming target material to the surface of the rotatable, cylindrically-symmetric element.

Abstract translation: EUV光源包括可旋转的圆柱对称元件，其具有涂覆有等离子体形成目标材料的表面;驱动激光源，被配置为产生足以通过激发等离子体产生EUV光的一个或多个激光脉冲 等离子体形成目标材料，一组聚焦光学元件，其被配置为将一个或多个激光脉冲聚焦到可旋转的圆柱形对称元件的表面上;一组收集光学器件，被配置为接收从所产生的等离子体发出的EUV光，并进一步配置 将照明引导到中间焦点，以及气体管理系统，其包括被配置为将等离子体形成目标材料供应到可旋转的圆柱对称元件的表面的气体供应子系统。

公开(公告)号：US08749179B2

公开(公告)日：2014-06-10

申请号：US13964880

申请日：2013-08-12

Applicant: KLA-Tencor Corporation

Inventor： Yanwei Liu ,  Daniel C. Wack

IPC: H01J40/00 ,  H01J47/00

CPC classification number: H05H13/04 ,  H01J37/02 ,  H05G2/00 ,  H05G2/001 ,  H05H7/04 ,  H05H7/08

Abstract: A compact synchrotron radiation source includes an electron beam generator, an electron storage ring, one or more wiggler insertion devices disposed along one or more straight sections of the electron storage ring, the one or more wiggler insertion devices including a set of magnetic poles configured to generate a periodic alternating magnetic field suitable for producing synchrotron radiation emitted along the direction of travel of the electrons of the storage ring, wherein the one or more wiggler insertion devices are arranged to provide light to a set of illumination optics of a wafer optical characterization system or a mask optical characterization system, wherein the etendue of a light beam emitted by the one or more wiggler insertion devices is matched to the illumination optics of the at least one of a wafer optical characterization system and the mask optical characterization system.

Abstract translation: 紧凑型同步加速器辐射源包括电子束发生器，电子存储环，沿着电子存储环的一个或多个直线部分设置的一个或多个摆动插入装置，一个或多个摆动插入装置包括一组磁极， 产生适于产生沿着存储环的电子的行进方向发射的同步加速器辐射的周期性交变磁场，其中一个或多个摆动插入装置被布置成向晶片光学表征系统的一组照明光学器件提供光 或掩模光学表征系统，其中由一个或多个摆动插入装置发射的光束的光密度与晶片光学表征系统和掩模光学表征系统中的至少一个的照明光学器件相匹配。

公开(公告)号：US20200225574A1

公开(公告)日：2020-07-16

申请号：US16258118

申请日：2019-01-25

Applicant: KLA-Tencor Corporation

Inventor： Damon F. Kvamme ,  Rui-fang Shi ,  Daniel C. Wack ,  Sseunhyeun Jo ,  Xin Ye

IPC: G03F1/84 ,  G03F1/24 ,  G03F1/72

Abstract: An inspection system includes an illumination source configured to generate extreme ultraviolet (EUV) light, illumination optics to direct the EUV light to a sample within a range of off-axis incidence angles corresponding to an illumination pupil distribution, collection optics to collect light from the sample in response to the incident EUV light within a range of collection angles corresponding to an imaging pupil distribution, and a detector configured to receive at least a portion of the light collected by the collection optics. Further, a center of the illumination pupil distribution corresponds to an off-axis incidence angle along a first direction on the sample, and at least one of the illumination pupil distribution or the imaging pupil distribution is non-circular with a size along the first direction shorter than along a second direction perpendicular to the first direction.

公开(公告)号：US09544984B2

公开(公告)日：2017-01-10

申请号：US14335442

申请日：2014-07-18

Applicant: KLA-Tencor Corporation

Inventor： Alexander Bykanov ,  Oleg Khodykin ,  Daniel C. Wack ,  Konstantin Tsigutkin ,  Layton Hale ,  Joseph Walsh ,  Frank Chilese ,  Rudy F. Garcia ,  Brian Ahr

IPC: G01J1/42 ,  H05G2/00 ,  G01J1/16 ,  G01N21/956 ,  G03F7/20

CPC classification number: H05G2/008 ,  G01J1/16 ,  G01N21/956 ,  G01N2021/95676 ,  G01N2201/061 ,  G03F1/84 ,  G03F7/70033 ,  G03F7/70891 ,  H05H2240/00

Abstract: An EUV light source includes a rotatable, cylindrically-symmetric element having a surface coated with a plasma-forming target material, a drive laser source configured to generate one or more laser pulses sufficient to generate EUV light via formation of a plasma by excitation of the plasma-forming target material, a set of focusing optics configured to focus the one or more laser pulses onto the surface of the rotatable, cylindrically-symmetric element, a set of collection optics configured to receive EUV light emanated from the generated plasma and further configured to direct the illumination to an intermediate focal point, and a gas management system including a gas supply subsystem configured to supply plasma-forming target material to the surface of the rotatable, cylindrically-symmetric element.

Abstract translation: EUV光源包括可旋转的圆柱对称元件，其具有涂覆有等离子体形成目标材料的表面;驱动激光源，被配置为产生足以通过激发等离子体产生EUV光的一个或多个激光脉冲 等离子体形成目标材料，一组聚焦光学元件，其被配置为将一个或多个激光脉冲聚焦到可旋转的圆柱形对称元件的表面上;一组收集光学器件，被配置为接收从所产生的等离子体发出的EUV光，并进一步配置 将照明引导到中间焦点，以及气体管理系统，其包括被配置为将等离子体形成目标材料供应到可旋转的圆柱对称元件的表面的气体供应子系统。

公开(公告)号：US20140048707A1

公开(公告)日：2014-02-20

申请号：US13964880

申请日：2013-08-12

Applicant: KLA-Tencor Corporation

Inventor： Yanwei Liu ,  Daniel C. Wack

IPC: H05H13/04 ,  H01J37/02

CPC classification number: H05H13/04 ,  H01J37/02 ,  H05G2/00 ,  H05G2/001 ,  H05H7/04 ,  H05H7/08

Abstract: A compact synchrotron radiation source includes an electron beam generator, an electron storage ring, one or more wiggler insertion devices disposed along one or more straight sections of the electron storage ring, the one or more wiggler insertion devices including a set of magnetic poles configured to generate a periodic alternating magnetic field suitable for producing synchrotron radiation emitted along the direction of travel of the electrons of the storage ring, wherein the one or more wiggler insertion devices are arranged to provide light to a set of illumination optics of a wafer optical characterization system or a mask optical characterization system, wherein the etendue of a light beam emitted by the one or more wiggler insertion devices is matched to the illumination optics of the at least one of a wafer optical characterization system and the mask optical characterization system.

Abstract translation: 紧凑型同步加速器辐射源包括电子束发生器，电子存储环，沿着电子存储环的一个或多个直线部分设置的一个或多个摆动插入装置，一个或多个摆动插入装置包括一组磁极， 产生适于产生沿着存储环的电子的行进方向发射的同步加速器辐射的周期性交变磁场，其中一个或多个摆动插入装置被布置成向晶片光学表征系统的一组照明光学器件提供光 或掩模光学表征系统，其中由一个或多个摆动插入装置发射的光束的光密度与晶片光学表征系统和掩模光学表征系统中的至少一个的照明光学器件相匹配。