公开(公告)号：US20150076359A1

公开(公告)日：2015-03-19

申请号：US14335442

申请日：2014-07-18

Applicant: KLA-Tencor Corporation

Inventor： Alexander Bykanov ,  Oleg Khodykin ,  Daniel C. Wack ,  Konstantin Tsigutkin ,  Layton Hale ,  Joseph Walsh ,  Frank Chilese

IPC: H05G2/00 ,  G01N21/956 ,  G03F7/20 ,  G01J1/16

CPC classification number: H05G2/008 ,  G01J1/16 ,  G01N21/956 ,  G01N2021/95676 ,  G01N2201/061 ,  G03F1/84 ,  G03F7/70033 ,  G03F7/70891 ,  H05H2240/00

Abstract: An EUV light source includes a rotatable, cylindrically-symmetric element having a surface coated with a plasma-forming target material, a drive laser source configured to generate one or more laser pulses sufficient to generate EUV light via formation of a plasma by excitation of the plasma-forming target material, a set of focusing optics configured to focus the one or more laser pulses onto the surface of the rotatable, cylindrically-symmetric element, a set of collection optics configured to receive EUV light emanated from the generated plasma and further configured to direct the illumination to an intermediate focal point, and a gas management system including a gas supply subsystem configured to supply plasma-forming target material to the surface of the rotatable, cylindrically-symmetric element.

Abstract translation: EUV光源包括可旋转的圆柱对称元件，其具有涂覆有等离子体形成目标材料的表面;驱动激光源，被配置为产生足以通过激发等离子体产生EUV光的一个或多个激光脉冲 等离子体形成目标材料，一组聚焦光学元件，其被配置为将一个或多个激光脉冲聚焦到可旋转的圆柱形对称元件的表面上;一组收集光学器件，被配置为接收从所产生的等离子体发出的EUV光，并进一步配置 将照明引导到中间焦点，以及气体管理系统，其包括被配置为将等离子体形成目标材料供应到可旋转的圆柱对称元件的表面的气体供应子系统。

公开(公告)号：US09544984B2

公开(公告)日：2017-01-10

申请号：US14335442

申请日：2014-07-18

Applicant: KLA-Tencor Corporation

Inventor： Alexander Bykanov ,  Oleg Khodykin ,  Daniel C. Wack ,  Konstantin Tsigutkin ,  Layton Hale ,  Joseph Walsh ,  Frank Chilese ,  Rudy F. Garcia ,  Brian Ahr

IPC: G01J1/42 ,  H05G2/00 ,  G01J1/16 ,  G01N21/956 ,  G03F7/20

CPC classification number: H05G2/008 ,  G01J1/16 ,  G01N21/956 ,  G01N2021/95676 ,  G01N2201/061 ,  G03F1/84 ,  G03F7/70033 ,  G03F7/70891 ,  H05H2240/00

Abstract: An EUV light source includes a rotatable, cylindrically-symmetric element having a surface coated with a plasma-forming target material, a drive laser source configured to generate one or more laser pulses sufficient to generate EUV light via formation of a plasma by excitation of the plasma-forming target material, a set of focusing optics configured to focus the one or more laser pulses onto the surface of the rotatable, cylindrically-symmetric element, a set of collection optics configured to receive EUV light emanated from the generated plasma and further configured to direct the illumination to an intermediate focal point, and a gas management system including a gas supply subsystem configured to supply plasma-forming target material to the surface of the rotatable, cylindrically-symmetric element.

Abstract translation: EUV光源包括可旋转的圆柱对称元件，其具有涂覆有等离子体形成目标材料的表面;驱动激光源，被配置为产生足以通过激发等离子体产生EUV光的一个或多个激光脉冲 等离子体形成目标材料，一组聚焦光学元件，其被配置为将一个或多个激光脉冲聚焦到可旋转的圆柱形对称元件的表面上;一组收集光学器件，被配置为接收从所产生的等离子体发出的EUV光，并进一步配置 将照明引导到中间焦点，以及气体管理系统，其包括被配置为将等离子体形成目标材料供应到可旋转的圆柱对称元件的表面的气体供应子系统。

公开(公告)号：US08767291B2

公开(公告)日：2014-07-01

申请号：US13789870

申请日：2013-03-08

Applicant: KLA-Tencor Corporation

Inventor： Konstantin Tsigutkin

IPC: H01S3/106 ,  H01S3/08 ,  H01S3/23 ,  H01S3/117 ,  H01S3/00 ,  H01S3/10

CPC classification number: H01S3/1003 ,  H01S3/005 ,  H01S3/10015 ,  H01S3/117 ,  H01S2301/02

Abstract: A pulsed laser system includes a variable attenuator located in a secondary optical path bounded by a target surface and one or more reflective surfaces outside of the primary laser oscillator of the laser system. The variable attenuator isolates an output optical amplifier of the laser system from light reflected from the target during time periods between laser pulses. In some embodiments, the variable attenuator is synchronously controlled with the primary laser oscillator. In some other embodiments, the variable attenuator is controlled separately from the primary laser oscillator to shape the generated laser pulses.

Abstract translation: 脉冲激光系统包括可变衰减器，其位于由目标表面和激光系统的主激光振荡器外部的一个或多个反射表面限定的辅光路中。 可变衰减器在激光脉冲之间的时间段期间将激光系统的输出光放大器与目标反射的光隔离。 在一些实施例中，可变衰减器与初级激光振荡器同步地控制。 在一些其他实施例中，可变衰减器与初级激光振荡器分开控制，以对所产生的激光脉冲进行整形。

公开(公告)号：US20130242380A1

公开(公告)日：2013-09-19

申请号：US13789870

申请日：2013-03-08

Applicant: KLA-TENCOR CORPORATION

Inventor： Konstantin Tsigutkin

IPC: H01S3/10

CPC classification number: H01S3/1003 ,  H01S3/005 ,  H01S3/10015 ,  H01S3/117 ,  H01S2301/02

Abstract: A pulsed laser system includes a variable attenuator located in a secondary optical path bounded by a target surface and one or more reflective surfaces outside of the primary laser oscillator of the laser system. The variable attenuator isolates an output optical amplifier of the laser system from light reflected from the target during time periods between laser pulses. In some embodiments, the variable attenuator is synchronously controlled with the primary laser oscillator. In some other embodiments, the variable attenuator is controlled separately from the primary laser oscillator to shape the generated laser pulses.

Abstract translation: 脉冲激光系统包括可变衰减器，其位于由目标表面和激光系统的主激光振荡器外部的一个或多个反射表面限定的辅光路中。 可变衰减器在激光脉冲之间的时间段期间将激光系统的输出光放大器与目标反射的光隔离。 在一些实施例中，可变衰减器与初级激光振荡器同步地控制。 在一些其他实施例中，可变衰减器与初级激光振荡器分开控制，以对所产生的激光脉冲进行整形。