公开(公告)号：US20170142817A1

公开(公告)日：2017-05-18

申请号：US15265515

申请日：2016-09-14

Applicant: KLA-Tencor Corporation

Inventor： Alexey Kuritsyn ,  Brian Ahr ,  Rudy F. Garcia ,  Frank Chilese ,  Oleg Khodykin

IPC: H05G2/00

CPC classification number: H05G2/008

Abstract: The present disclosure is directed to laser produced plasma light sources having a target material, such as Xenon, that is coated on the outer surface of a drum. Embodiments include bearing systems for rotating the drum that have structures for reducing leakage of contaminant material and/or bearing gas into the LPP chamber. Injection systems are disclosed for coating and replenishing target material on the drum. Wiper systems are disclosed for preparing the target material surface on the drum, e.g. smoothing the target material surface. Systems for cooling and maintaining the temperature of the drum and a housing overlying the drum are also disclosed.

公开(公告)号：US10777377B2

公开(公告)日：2020-09-15

申请号：US15879120

申请日：2018-01-24

Applicant: KLA-Tencor Corporation

Inventor： Robert Haynes ,  Frank Chilese ,  Moshe E. Preil

IPC: H01J37/06 ,  H01J37/28 ,  H01J37/20 ,  G03F1/86 ,  H01J37/244 ,  H01L21/66

Abstract: A multi-column assembly for a scanning electron microscopy (SEM) system is disclosed. The multi-column assembly includes a plurality of electron-optical columns arranged in an array defined by one or more spacings. Each electron-optical column includes one or more electron-optical elements. The plurality of electron-optical columns is configured to characterize one or more field areas on a surface of a sample secured on a stage. The number of electron-optical columns in the plurality of electron-optical columns equals an integer number of inspection areas in a field area of the one or more field areas. The one or more spacings of the plurality of electron-optical columns correspond to one or more dimensions of the inspection areas.

公开(公告)号：US10438769B1

公开(公告)日：2019-10-08

申请号：US15969555

申请日：2018-05-02

Applicant: KLA-Tencor Corporation

Inventor： Alex Lipkind ,  Alon Rosenthal ,  Frank Chilese ,  John Gerling ,  Lawrence Muray ,  Robert Haynes

IPC: H01J37/28 ,  G21K5/04 ,  H01J37/147 ,  H01J37/153 ,  H01J37/244

Abstract: A scanning electron microscopy (SEM) system includes a plurality of electron beam sources configured to generate a primary electron beam. The SEM system includes an electron-optical column array with a plurality of electron-optical columns. An electron-optical column includes a plurality of electron-optical elements. The plurality of electron-optical elements includes a deflector layer configured to be driven via a common controller shared by at least some of the plurality of electron-optical columns and includes a trim deflector layer configured to be driven by an individual controller. The plurality of electron-optical elements is arranged to form an electron beam channel configured to direct the primary electron beam to a sample secured on a stage, which emits an electron beam in response to the primary electron beam. The electron-optical column includes an electron detector. The electron beam channel is configured to direct the electron beam to the electron detector.

公开(公告)号：US09759912B2

公开(公告)日：2017-09-12

申请号：US14034273

申请日：2013-09-23

Applicant: KLA-Tencor Corporation ,  Sandia Corporation

Inventor： Frank Chilese ,  Gildardo R. Delgado ,  Daniel Wack ,  John R. Torczynski ,  Leonard E. Klebanoff

IPC: G02B27/00

CPC classification number: G02B27/0006

Abstract: An apparatus for contaminant control, having: a first optical assembly including: a first light homogenizer tunnel with: a first end connected to an extreme ultra-violet light source, a second end in communication with a destination chamber, a first enclosed space, and, a first gas input arranged to introduce a first gas such that the first gas flows in a first direction toward the first end and in a second direction toward the second end. The apparatus alternately having: a second optical assembly including: a second light homogenizer tunnel with: a third end connected to an extreme ultra-violet light source, a fourth end in communication with a destination chamber, a second enclosed space, a diffusion barrier tube including: a fifth end facing the fourth end and a sixth end in communication with a destination chamber, and a second gas input between the second light homogenizer tunnel and the diffusion tube.

公开(公告)号：US20140264051A1

公开(公告)日：2014-09-18

申请号：US13837765

申请日：2013-03-15

Applicant: KLA-TENCOR CORPORATION

Inventor： Damon Kvamme ,  Frank Chilese

IPC: G02B5/08 ,  G01N21/88

CPC classification number: G02B5/0891 ,  G01N21/8806 ,  G01N21/956 ,  G02B5/09 ,  G03F1/84

Abstract: An apparatus for inspecting a photomask, comprising an illumination source for generating a light which illuminates a target substrate, objective optics for receiving and projecting the light which is reflected from the target substrate, the objective optics includes a first mirror arranged to receive and reflect the light which is reflected from the target substrate, a second mirror which is arranged to receive and reflect the light which is reflected by the first mirror, a third mirror which is arranged to receive and reflect the light which is reflected by the second mirror, and a segmented mirror which is arranged to receive and reflect the light which is reflected by the third mirror. The segmented mirror includes at least two mirror segments. The apparatus further includes at least one sensor for detecting the light which is projected by the objective optics.

Abstract translation: 一种用于检查光掩模的装置，包括用于产生照射目标基板的光的照明源，用于接收和投射从目标基板反射的光的物镜，所述物镜包括：第一反射镜，被布置成接收和反射 从目标基板反射的光，被配置为接收和反射由第一反射镜反射的光的第二反射镜，布置成接收和反射由第二反射镜反射的光的第三反射镜，以及 被布置成接收和反射由第三反射镜反射的光的分段镜。 分段镜包括至少两个镜片段。 该装置还包括至少一个用于检测由物镜光学器件投影的光的传感器。

公开(公告)号：US20140217298A1

公开(公告)日：2014-08-07

申请号：US14170808

申请日：2014-02-03

Applicant: KLA-Tencor Corporation

Inventor： Daimian Wang ,  Li Wang ,  Frank Chilese ,  David Alles

IPC: G01N21/88

CPC classification number: G03F1/24 ,  G01N21/956 ,  G01N2021/95676 ,  G03F1/22 ,  G03F1/84 ,  G03F7/70033

Abstract: An extreme ultraviolet (EUM) mask inspection system, comprising a light source to project EUV light along an optical axis, an illumination system to receive the EUV light from the source, the illumination system comprising a spectral purity filter (SPF), the SPF transmits a first portion of the EUV light along the optical axis toward a mask and the SPF comprising a plurality of at least partially reflective elements, said elements reflects a second portion of the EUV light off the optical axis, a projection system adapted to receive the first portion of the EUV light after it has illuminated the mask, a first detector array adapted to receive the image, and a second detector array to receive the second portion of the EUV light. The SPF may comprise one or more multilayer interference-type filters. Alternatively, the SPF comprises a thin film filter disposed on a grazing incidence mirror array.

Abstract translation: 一种极光紫外线（EUM）掩模检查系统，包括沿着光轴投射EUV光的光源，用于接收来自源的EUV光的照明系统，该照明系统包括光谱纯度滤光片（SPF），SPF透射 EUV光的第一部分沿着光轴朝向掩模，并且所述SPF包括多个至少部分反射元件，所述元件将所述EUV光的第二部分反射离开所述光轴，所述投影系统适于接收所述第一 所述EUV光在其照亮所述掩模之后的部分，适于接收所述图像的第一检测器阵列，以及用于接收所述EUV光的第二部分的第二检测器阵列。 SPF可以包括一个或多个多层干涉型滤波器。 或者，SPF包括设置在掠入射镜阵列上的薄膜过滤器。

公开(公告)号：US20140085724A1

公开(公告)日：2014-03-27

申请号：US14034273

申请日：2013-09-23

Applicant: Sandia Corporation ,  KLA-Tencor Corporation

Inventor： Frank Chilese ,  Gildardo R. Delgado ,  Daniel Wack ,  John R. Torczynski ,  Leonard E. Klebanoff

IPC: G02B27/00

CPC classification number: G02B27/0006

Abstract: An apparatus for contaminant control, having: a first optical assembly including: a first light homogenizer tunnel with: a first end connected to an extreme ultra-violet light source, a second end in communication with a destination chamber, a first enclosed space, and, a first gas input arranged to introduce a first gas such that the first gas flows in a first direction toward the first end and in a second direction toward the second end. The apparatus alternately having: a second optical assembly including: a second light homogenizer tunnel with: a third end connected to an extreme ultra-violet light source, a fourth end in communication with a destination chamber, a second enclosed space, a diffusion barrier tube including: a fifth end facing the fourth end and a sixth end in communication with a destination chamber, and a second gas input between the second light homogenizer tunnel and the diffusion tube.

Abstract translation: 一种用于污染物控制的装置，具有：第一光学组件，包括：第一光均化器隧道，其具有：连接到极紫外光源的第一端，与目的地室连通的第二端，第一封闭空间，以及 第一气体输入装置，其被布置成引入第一气体，使得第一气体沿第一方向朝向第一端部流动，并沿第二方向朝向第二端部流动。 所述装置交替地具有：第二光学组件，其包括：第二光均化器隧道，其具有连接到极紫外光源的第三端，与目的地室连通的第四端，第二封闭空间，扩散阻挡管 包括：面向第四端的第五端和与目的地室连通的第六端，以及在第二光均化器通道和扩散管之间的第二气体输入。

公开(公告)号：US20130271827A1

公开(公告)日：2013-10-17

申请号：US13860377

申请日：2013-04-10

Applicant: KLA-TENCOR CORPORATION

Inventor： Gildardo Delgado ,  Frank Chilese

IPC: G02B5/20 ,  G02B27/00

CPC classification number: G02B27/0006 ,  G01N21/33 ,  G02B5/208 ,  G03F1/84 ,  G21K5/04 ,  G21K5/10

Abstract: A method for reducing damage and contamination to an optical element in an extreme ultra-violet (EUV) reticle inspection system, including, presenting an illumination source to a reticle inspection system, and displacing the optical element in the path of the illumination source from a first portion to a second portion, wherein the first portion is damaged and the second portion is not damaged, and the optical element has a plurality of portions.

Abstract translation: 一种用于减少对极紫外（EUV）掩模版检查系统中的光学元件的损伤和污染的方法，包括向光罩检查系统呈现照明源，以及将照明源路径中的光学元件从 第一部分到第二部分，其中第一部分被损坏并且第二部分没有被损坏，并且光学元件具有多个部分。

公开(公告)号：US10893599B2

公开(公告)日：2021-01-12

申请号：US16030693

申请日：2018-07-09

Applicant: KLA-Tencor Corporation

Inventor： Alexey Kuritsyn ,  Brian Ahr ,  Rudy F. Garcia ,  Frank Chilese ,  Oleg Khodykin

IPC: H05G2/00

Abstract: The present disclosure is directed to laser produced plasma light sources having a target material, such as Xenon, that is coated on the outer surface of a drum. Embodiments include bearing systems for rotating the drum that have structures for reducing leakage of contaminant material and/or bearing gas into the LPP chamber. Injection systems are disclosed for coating and replenishing target material on the drum. Wiper systems are disclosed for preparing the target material surface on the drum, e.g. smoothing the target material surface. Systems for cooling and maintaining the temperature of the drum and a housing overlying the drum are also disclosed.

公开(公告)号：US20190075641A1

公开(公告)日：2019-03-07

申请号：US16030693

申请日：2018-07-09

Applicant: KLA-Tencor Corporation

Inventor： Alexey Kuritsyn ,  Brian Ahr ,  Rudy F. Garcia ,  Frank Chilese ,  Oleg Khodykin

IPC: H05G2/00

Abstract: The present disclosure is directed to laser produced plasma light sources having a target material, such as Xenon, that is coated on the outer surface of a drum. Embodiments include bearing systems for rotating the drum that have structures for reducing leakage of contaminant material and/or bearing gas into the LPP chamber. Injection systems are disclosed for coating and replenishing target material on the drum. Wiper systems are disclosed for preparing the target material surface on the drum, e.g. smoothing the target material surface. Systems for cooling and maintaining the temperature of the drum and a housing overlying the drum are also disclosed.