公开(公告)号：US20050205998A1

公开(公告)日：2005-09-22

申请号：US11110849

申请日：2005-04-21

申请人： Tomohiro Yamada ,  Eiji Shidoji ,  Akira Mitsui ,  Takuji Oyama ,  Toshihisa Kamiyama

发明人： Tomohiro Yamada ,  Eiji Shidoji ,  Akira Mitsui ,  Takuji Oyama ,  Toshihisa Kamiyama

IPC分类号： C23C14/08 ,  C23C14/10 ,  H01L21/4763 ,  H01L23/48 ,  H01Q1/12

CPC分类号： C23C14/10 ,  C23C14/083 ,  H01Q1/1271 ,  Y10T428/26 ,  Y10T428/266

摘要： A multilayer film-coated substrate having the stress of the film relaxed by depositing a multilayer film comprising a metal oxide film and a silicon oxide film on a substrate at a high speed by a sputtering method using a conductive sputtering material, and a process for producing a multilayer film-coated substrate having such a low stress, are presented. A multilayer film-coated substrate comprising a substrate and at least a metal oxide film and a silicon oxide film laminated thereon repeatedly at least once, wherein at least one layer of said metal oxide film is a metal oxide film deposited by sputtering by using, as the target material, a metal oxide MOX which is deficient in oxygen than the stoichiometric composition, to have the oxygen deficiency resolved, and the stress of the multilayer film is from −100 MPa to +100 MPa.

摘要翻译： 通过使用导电性溅射材料的溅射法，通过在基板上高速沉积包含金属氧化物膜和氧化硅膜的多层膜而使薄膜的应力弛豫的多层膜被覆基板，以及制造方法 提出了具有如此低应力的多层膜涂覆的基板。 一种多层膜被覆基板，包括基板和至少一层金属氧化物膜和氧化硅膜，其上重复层叠至少一次，其中至少一层所述金属氧化物膜是通过溅射沉积的金属氧化物膜，其通过使用作为 目标材料，缺氧量低于化学计量组成的金属氧化物MO X X，以使氧缺陷分解，多层膜的应力为-100MPa〜+100MPa。

公开(公告)号：US06596135B1

公开(公告)日：2003-07-22

申请号：US09622069

申请日：2000-08-31

申请人： Akira Mitsui

发明人： Akira Mitsui

IPC分类号： C23C1434

CPC分类号： C23C14/3414 ,  C23C14/08 ,  H01L31/022466 ,  H01L31/022483 ,  H01L31/1884 ,  Y02E10/50

摘要： A sputtering target which comprises an oxide containing Zn, Al and Y, which can be used for a DC sputtering method, and with which a transparent conductive film having a resistivity of from 10−2 to 1010 &OHgr;·cm can be produced stably, and a transparent conductive film which comprises an oxide containing Zn, Al and Y, and which has a resistivity of from 10−2 to 1010 &OHgr;·cm and a low light absorptivity.

摘要翻译： 可以稳定地制造包含可用于DC溅射法的含有Zn，Al和Y的氧化物的溅射靶，并且可以稳定地制造电阻率为10-2至1010ΩEGA.cm的透明导电膜，并且 透明导电膜，其包含含有Zn，Al和Y的氧化物，并且具有10-2至1010欧姆·厘米的电阻率和低的光吸收率。

公开(公告)号：US06521735B2

公开(公告)日：2003-02-18

申请号：US09883264

申请日：2001-06-19

申请人： Akira Mitsui ,  Yuji Takeda

发明人： Akira Mitsui ,  Yuji Takeda

IPC分类号： C08G6538

CPC分类号： C08G65/44

摘要： A process for producing a polyphenylene ether by oxidative polymerization of a phenol compound using a catalyst and an oxygen-containing gas, wherein said catalyst comprises a copper compound, a bromine compound, a diamine compound of formula (1) as recited in the specification, a tertiary monoamine compound and a secondary monoamine compound, and wherein said process comprises the steps of: preparing a catalyst component (P1) in a container which is under a substantially oxygen-free inert atmosphere by mixing the copper compound and the bromine compound to obtain a mixture and then mixing the mixture with the secondary monoamine compound in an amount of at least 2 times the molar amount of the copper atom; separately preparing a catalyst component (P2) by mixing the diamine compound of formula (1) and the tertiary monoamine compound together with a solvent in an oxidative polymerization vessel; adding a predetermined amount of the catalyst component (P1) to the polymerization vessel containing the catalyst component (P2), and mixing the catalyst components (P1) and (P2); and initiating oxidative polymerization.

公开(公告)号：US06334938B2

公开(公告)日：2002-01-01

申请号：US09729102

申请日：2000-12-05

申请人： Otojiro Kida ,  Akira Mitsui ,  Eri Suzuki ,  Hisashi Osaki ,  Atsushi Hayashi ,  Takuji Oyama ,  Kenichi Sasaki

发明人： Otojiro Kida ,  Akira Mitsui ,  Eri Suzuki ,  Hisashi Osaki ,  Atsushi Hayashi ,  Takuji Oyama ,  Kenichi Sasaki

IPC分类号： C23C1434

CPC分类号： C23C14/083 ,  C23C4/02 ,  C23C4/11 ,  C23C14/3414

摘要： A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MOx as the main component, wherein MOx is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.

公开(公告)号：US5210073A

公开(公告)日：1993-05-11

申请号：US589616

申请日：1990-09-28

申请人： Junji Yodoi ,  Atsushi Uchida ,  Yutaka Tagaya ,  Akira Mitsui ,  Tadashi Hirakawa

发明人： Junji Yodoi ,  Atsushi Uchida ,  Yutaka Tagaya ,  Akira Mitsui ,  Tadashi Hirakawa

IPC分类号： A61K38/00 ,  C12N9/02

CPC分类号： C12N9/0036 ,  C12Y108/01008 ,  A61K38/00 ,  Y10S514/824 ,  Y10S514/886 ,  Y10S514/917

摘要： A composition and method for the treatment of inflammation, rheumatism, autoimmune disease, ischemic damage of organs, drug toxicity and arteriosclerosis comprising human ADF is disclosed.

公开(公告)号：USD298643S

公开(公告)日：1988-11-22

申请号：US845064

申请日：1986-03-19

申请人： Akira Mitsui

设计人： Akira Mitsui

公开(公告)号：US07749622B2

公开(公告)日：2010-07-06

申请号：US11110849

申请日：2005-04-21

申请人： Tomohiro Yamada ,  Eiji Shidoji ,  Akira Mitsui ,  Takuji Oyama ,  Toshihisa Kamiyama

发明人： Tomohiro Yamada ,  Eiji Shidoji ,  Akira Mitsui ,  Takuji Oyama ,  Toshihisa Kamiyama

IPC分类号： G11B11/105 ,  C09J7/02 ,  B32B9/00 ,  B32B19/00 ,  F21V9/04 ,  G02B1/10 ,  G02B27/14

CPC分类号： C23C14/10 ,  C23C14/083 ,  H01Q1/1271 ,  Y10T428/26 ,  Y10T428/266

摘要： A multilayer film-coated substrate having the stress of the film relaxed by depositing a multilayer film comprising a metal oxide film and a silicon oxide film on a substrate at a high speed by a sputtering method using a conductive sputtering material, and a process for producing a multilayer film-coated substrate having such a low stress, are presented.A multilayer film-coated substrate comprising a substrate and at least a metal oxide film and a silicon oxide film laminated thereon repeatedly at least once, wherein at least one layer of said metal oxide film is a metal oxide film deposited by sputtering by using, as the target material, a metal oxide MOX which is deficient in oxygen than the stoichiometric composition, to have the oxygen deficiency resolved, and the stress of the multilayer film is from −100 MPa to +100 MPa.

摘要翻译： 通过使用导电性溅射材料的溅射法，通过在基板上高速沉积包含金属氧化物膜和氧化硅膜的多层膜而使薄膜的应力弛豫的多层膜被覆基板，以及制造方法 提出了具有如此低应力的多层膜涂覆的基板。 一种多层膜被覆基板，包括基板和至少一层金属氧化物膜和氧化硅膜，其上重复层叠至少一次，其中至少一层所述金属氧化物膜是通过溅射沉积的金属氧化物膜，其通过使用作为 目标材料，缺氧比化学计量组成的金属氧化物MOX，氧缺陷分解，多层膜的应力为-100MPa〜+100MPa。

公开(公告)号：US07544741B2

公开(公告)日：2009-06-09

申请号：US10491490

申请日：2002-11-28

申请人： Akira Mitsui ,  Mutsumi Maeda

发明人： Akira Mitsui ,  Mutsumi Maeda

IPC分类号： C08K5/49 ,  C08L71/12

CPC分类号： C08L71/123 ,  C08G65/46

摘要： A polyphenylene ether resin composition comprising a polyphenylene ether, wherein the polyphenylene ether has a polymer chain comprising recurring units each represented by the following formula (1): and has the following characteristics (a), (b) and (c): (a) when the polyphenylene ether is analyzed by 1H-NMR, the polyphenylene ether exhibits a triplet signal (S1) at 3.55 ppm, wherein the triplet signal (S1) has a relative intensity of 0.05 to 0.25 in terms of the percentage of the integrated intensity of the triplet signal (S1), based on the integrated intensity of a signal (S2) observed at 6.47 ppm; (b) the polyphenylene ether exhibits an absorbance of from 0.01 to 0.40 at a wavelength of 480 nm; and (c) the polyphenylene ether has a weight average molecular weight of from 30,000 to 100,000.

摘要翻译： 一种聚苯醚树脂组合物，其包含聚苯醚，其中所述聚苯醚具有包含由下式（1）表示的重复单元的聚合物链：并具有以下特征（a），（b）和（c）：（a ）当聚苯醚通过1H-NMR分析时，聚苯醚在3.55ppm显示出三重态信号（S1），其中三重态信号（S1）的累计强度百分比相对强度为0.05-0.25 基于在6.47ppm处观察到的信号（S2）的积分强度的三重态信号（S1） （b）聚苯醚在波长480nm处的吸光度为0.01〜0.40; 和（c）聚苯醚的重均分子量为30,000〜100,000。

公开(公告)号：US07282534B2

公开(公告)日：2007-10-16

申请号：US10517833

申请日：2003-07-15

申请人： Teruaki Sakuma ,  Akira Mitsui

发明人： Teruaki Sakuma ,  Akira Mitsui

IPC分类号： C08L71/12 ,  C08G65/38

CPC分类号： C08G65/44 ,  C08L71/123

摘要： A resin composition comprising a polyphenylene ether produced by polymerizing a monomer component consisting of 100 parts by weight of 2,6-dimethylphenol and 0.5 to 7.5 parts by weight of o-cresol in the presence of both a catalyst and an oxygen-containing gas and a flame retardant. When the polyphenylene ether has a molecular weight distribution of 2.8 to 8.0, the resulting resin composition is more excellent in flame retardance, particularly anti-dripping properties in burning. The resin composition is applicable to not only electric and electronic applications necessitating high flame retardance but also other fields of application of polyphenylene ether resins.

摘要翻译： 一种树脂组合物，其包含通过在催化剂和含氧气体的存在下聚合由100重量份的2,6-二甲基苯酚和0.5至7.5重量份的邻甲酚组成的单体组分而制备的聚苯醚和 阻燃剂。 当聚苯醚的分子量分布为2.8〜8.0时，所得到的树脂组合物的阻燃性更优异，特别是燃烧时的防滴落性。 该树脂组合物不仅适用于需要高阻燃性的电气和电子应用，还适用于聚苯醚树脂的其它应用领域。

公开(公告)号：US20060225999A1

公开(公告)日：2006-10-12

申请号：US11448874

申请日：2006-06-08

申请人： Makoto Fukawa ,  Hidefumi Odaka ,  Takuji Oyama ,  Akira Mitsui

发明人： Makoto Fukawa ,  Hidefumi Odaka ,  Takuji Oyama ,  Akira Mitsui

IPC分类号： C23C14/00

CPC分类号： B01J21/063 ,  B01D53/007 ,  B01D53/885 ,  B01D2255/802 ,  B01J35/004 ,  B01J37/347 ,  C03C17/2456 ,  C03C17/256 ,  C03C17/3417 ,  C03C2217/71 ,  C23C14/083

摘要： To provide a visible light responsible Ti oxide film which has hydrophilicity and antifogging property and is excellent in transparency and which has an ability to decompose gas by UV radiation, and a process for its production, as well as a Ti oxide film-coated substrate. A Ti oxide film formed on a substrate, characterized in that when a voltage is applied to the Ti oxide film while the Ti oxide film is irradiated with light of a xenon lamp having a luminance of 100 mW/cm2 and having ultraviolet light of less than 400 nm cutoff, the electric current value is at least 1,000 times the electric current value when the same voltage as said voltage is applied to the Ti oxide film in a dark place.

摘要翻译： 为了提供具有亲水性和防雾性的可见光负载Ti氧化物膜，透明性优异，并且具有通过UV辐射分解气体的能力，以及其制造方法以及Ti氧化物膜被覆基板。 形成在基板上的Ti氧化膜，其特征在于，当对所述Ti氧化物膜施加电压时，在所述Ti氧化物膜用亮度为100mW / cm 2的氙灯的光照射的同时， 并且具有小于400nm截止的紫外线，当在暗处加有与所述电压相同的电压至Ti氧化物膜时，电流值为电流值的至少1,000倍。