公开(公告)号：US06334938B2

公开(公告)日：2002-01-01

申请号：US09729102

申请日：2000-12-05

申请人： Otojiro Kida ,  Akira Mitsui ,  Eri Suzuki ,  Hisashi Osaki ,  Atsushi Hayashi ,  Takuji Oyama ,  Kenichi Sasaki

发明人： Otojiro Kida ,  Akira Mitsui ,  Eri Suzuki ,  Hisashi Osaki ,  Atsushi Hayashi ,  Takuji Oyama ,  Kenichi Sasaki

IPC分类号： C23C1434

CPC分类号： C23C14/083 ,  C23C4/02 ,  C23C4/11 ,  C23C14/3414

摘要： A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MOx as the main component, wherein MOx is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.

公开(公告)号：US06193856B1

公开(公告)日：2001-02-27

申请号：US09011749

申请日：1998-03-12

申请人： Otojiro Kida ,  Akira Mitsui ,  Eri Suzuki ,  Hisashi Osaki ,  Atsushi Hayashi

发明人： Otojiro Kida ,  Akira Mitsui ,  Eri Suzuki ,  Hisashi Osaki ,  Atsushi Hayashi

IPC分类号： C23C1434

CPC分类号： C23C14/083 ,  C23C4/02 ,  C23C4/11 ,  C23C14/3414

摘要： A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MOx as the main component, wherein MOx is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.

摘要翻译： 1.一种溅射靶，包括在所述基板上形成的基板和靶材，其中所述靶材包含化学式MO x的金属氧化物为主要成分，其中MOx为与所述化学计量组成相比缺氧的金属氧化物 M是选自Ti，Nb，Ta，Mo，W，Zr和Hf中的至少一种金属，其制造方法以及具有高折射率的膜的形成方法。

公开(公告)号：US06743343B2

公开(公告)日：2004-06-01

申请号：US10191321

申请日：2002-07-10

申请人： Otojiro Kida ,  Akira Mitsui ,  Eri Suzuki ,  Hisashi Osaki ,  Atsushi Hayashi

发明人： Otojiro Kida ,  Akira Mitsui ,  Eri Suzuki ,  Hisashi Osaki ,  Atsushi Hayashi

IPC分类号： C23C1434

CPC分类号： C23C14/083 ,  C23C4/02 ,  C23C4/11 ,  C23C14/3414

摘要： A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MOx as the main component, wherein MOx is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.

摘要翻译： 1.一种溅射靶，包括在所述基板上形成的基板和靶材，其中所述靶材包含化学式MO x的金属氧化物为主要成分，其中MOx为与所述化学计量组成相比缺氧的金属氧化物 M是选自Ti，Nb，Ta，Mo，W，Zr和Hf中的至少一种金属，其制造方法以及具有高折射率的膜的形成方法。

公开(公告)号：US06440278B1

公开(公告)日：2002-08-27

申请号：US09964625

申请日：2001-09-28

申请人： Otojiro Kida ,  Akira Mitsui ,  Eri Suzuki ,  Hisashi Osaki ,  Atsushi Hayashi

发明人： Otojiro Kida ,  Akira Mitsui ,  Eri Suzuki ,  Hisashi Osaki ,  Atsushi Hayashi

IPC分类号： C23C1434

CPC分类号： C23C14/083 ,  C23C4/02 ,  C23C4/11 ,  C23C14/3414

摘要： A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MOx as the main component, wherein MOx is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.

摘要翻译： 1.一种溅射靶，包括在所述基板上形成的基板和靶材，其中所述靶材包含化学式MO x的金属氧化物为主要成分，其中MOx为与所述化学计量组成相比缺氧的金属氧化物 M是选自Ti，Nb，Ta，Mo，W，Zr和Hf中的至少一种金属，其制造方法以及具有高折射率的膜的形成方法。

公开(公告)号：US5354446A

公开(公告)日：1994-10-11

申请号：US936281

申请日：1992-08-28

申请人： Otojiro Kida ,  Akira Mitsui ,  Atsushi Hayashi

发明人： Otojiro Kida ,  Akira Mitsui ,  Atsushi Hayashi

IPC分类号： C03C17/245 ,  C03C17/34 ,  C23C14/08 ,  C23C14/34 ,  G02B1/10 ,  G02F1/1333 ,  G02F1/1335 ,  H01J37/34

CPC分类号： H01J37/3435 ,  C03C17/245 ,  C03C17/3417 ,  C23C14/08 ,  C23C14/3407 ,  C23C14/3414 ,  G02B1/105 ,  H01J37/3426 ,  H01J37/3491 ,  C03C2217/213 ,  C03C2217/23 ,  C03C2217/242 ,  C03C2218/154 ,  G02F1/133502 ,  G02F2001/133337 ,  Y02T10/88

摘要： A ceramics rotatable magnetron sputtering cathode target comprising a cylindrical target holder and a ceramics layer as a target to be sputtered, formed on the outer surface of the target holder, wherein at least one layer selected from the group consisting of a layer of a metal or alloy having a thermal expansion coefficient of an intermediate level between the thermal expansion coefficients of the ceramics layer and the target holder, and a layer of a metal or alloy having a thermal expansion coefficient approximating to the thermal expansion coefficient of the ceramics layer, is formed as an undercoat between the ceramics layer and the target holder.

摘要翻译： 一种陶瓷可旋转磁控溅射阴极靶，其包括圆柱形靶保持器和作为溅射靶的陶瓷层，形成在靶保持器的外表面上，其中至少一层选自金属层或 形成具有陶瓷层和靶保持体的热膨胀系数之间的中间水平的热膨胀系数的合金，以及具有接近于陶瓷层的热膨胀系数的热膨胀系数的金属或合金层 作为陶瓷层和靶保持体之间的底涂层。

公开(公告)号：US5783510A

公开(公告)日：1998-07-21

申请号：US671546

申请日：1996-06-27

申请人： Otojiro Kida ,  Eri Suzuki ,  Yasushi Ono

发明人： Otojiro Kida ,  Eri Suzuki ,  Yasushi Ono

IPC分类号： C04B22/04 ,  C04B28/06 ,  C04B35/66 ,  C01B35/10

CPC分类号： C04B35/6303 ,  C04B22/04 ,  C04B28/06 ,  C04B35/66 ,  C04B2111/00155 ,  C04B2235/3206 ,  C04B2235/3217 ,  C04B2235/3418 ,  C04B2235/3427 ,  C04B2235/3826 ,  C04B2235/422

摘要： A monolithic refractory composition, which can be rapidly dried after being mixed with water and applied to a desired portion by casting or spraying to form a furnace wall, and which comprises refractory aggregates, a refractory powder, an aluminum alloy powder and a dispersant, wherein the aluminum alloy powder is contained in an amount of from 0.04 to 5 parts by weight per 100 parts by weight of the total amount of the refractory aggregates and the refractory powder.

摘要翻译： 一种整体耐火材料组合物，其可以在与水混合后快速干燥并通过浇铸或喷涂施加到所需部分以形成炉壁，并且其包含耐火材料聚集体，耐火材料粉末，铝合金粉末和分散剂，其中 铝合金粉末的含量为每100重量份耐火骨料和耐火材料粉末的0.04-5重量份。

公开(公告)号：US6117373A

公开(公告)日：2000-09-12

申请号：US39259

申请日：1998-03-16

申请人： Otojiro Kida ,  Eri Suzuki ,  Yasushi Ono

发明人： Otojiro Kida ,  Eri Suzuki ,  Yasushi Ono

IPC分类号： C04B22/04 ,  C04B28/06 ,  C04B35/66 ,  F27D1/16

CPC分类号： C04B35/6303 ,  C04B22/04 ,  C04B28/06 ,  C04B35/66 ,  C04B2111/00155 ,  C04B2235/3206 ,  C04B2235/3217 ,  C04B2235/3418 ,  C04B2235/3427 ,  C04B2235/3826 ,  C04B2235/422

摘要： A monolithic refractory composition, which can be rapidly dried after being mixed with water and applied to a desired portion by casting or spraying to form a furnace wall, and which comprises refractory aggregates, a refractory powder, an aluminum alloy powder and a dispersant, wherein the aluminum alloy powder is contained in an amount of from 0.04 to 5 parts by weight per 100 parts by weight of the total amount of the refractory aggregates and the refractory powder.

摘要翻译： 一种整体耐火材料组合物，其可以在与水混合后快速干燥并通过浇铸或喷涂施加到所需部分以形成炉壁，并且其包含耐火材料聚集体，耐火材料粉末，铝合金粉末和分散剂，其中 铝合金粉末的含量为每100重量份耐火骨料和耐火材料粉末的0.04-5重量份。

公开(公告)号：US4678759A

公开(公告)日：1987-07-07

申请号：US916225

申请日：1986-10-07

申请人： Otojiro Kida ,  Yutaka Segawa

发明人： Otojiro Kida ,  Yutaka Segawa

IPC分类号： C04B35/58 ,  C04B35/56

CPC分类号： C04B35/645 ,  C04B35/58078

摘要： A ZrB.sub.2 composite sintered material consisting essentially of at least 1% by weight of SiC, at least 1% by weight of BN, at most 20% by weight of AlN, at most 20% by weight of B.sub.4 C, the rest being substantially ZrB.sub.2, provided that the total amount of SiC and BN is from 2 to 50% by weight.

公开(公告)号：US5612144A

公开(公告)日：1997-03-18

申请号：US107316

申请日：1993-08-17

申请人： Nobuhiro Shinohara ,  Otojiro Kida

发明人： Nobuhiro Shinohara ,  Otojiro Kida

IPC分类号： C04B35/584 ,  C04B35/593 ,  H01L21/48 ,  H05F1/00 ,  H05F3/02 ,  H05F3/04 ,  B32B15/00

CPC分类号： H05F3/04 ,  C04B35/5935 ,  H01L21/4807 ,  H05F3/02 ,  Y10T428/24975 ,  Y10T428/252 ,  Y10T428/256 ,  Y10T428/257 ,  Y10T428/265 ,  Y10T428/2982 ,  Y10T428/31678

摘要： An electrification removing component comprising:a ceramics for removing electrification of which surface resistivity is in a range of 2.times.10.sup.6 through 10.sup.10 .OMEGA./cm.sup.2 ; and an electric conductive material connected to the ground; said ceramics for removing electrification being electrically connected to the electric conductive material with an area by contact or bonding on surfaces of the ceramics for removing electrification and the electric conductive material.

摘要翻译： 1.一种带电除去部件，其特征在于，包括：表面电阻率在2×10 6〜10 10Ω/ cm 2的范围内去除带电的陶瓷; 和连接到地面的导电材料; 所述用于除去带电的陶瓷与导电材料电连接，具有通过接触或接合在用于去除带电的陶瓷的表面上的区域和导电材料。

公开(公告)号：US5528100A

公开(公告)日：1996-06-18

申请号：US267754

申请日：1994-07-05

申请人： Shunichi Igeta ,  Koji Nakamura ,  Makoto Ishizuka ,  Tsunehiko Sugawara ,  Otojiro Kida

发明人： Shunichi Igeta ,  Koji Nakamura ,  Makoto Ishizuka ,  Tsunehiko Sugawara ,  Otojiro Kida

IPC分类号： C23C4/10 ,  H01J9/26 ,  H01J29/86 ,  H01J29/88 ,  H01J31/12 ,  H01J31/00

CPC分类号： C23C4/10 ,  H01J29/863 ,  H01J29/88 ,  H01J9/261 ,  H01J2329/00

摘要： A flat cathode-ray tube in which a ceramics film or a glass film is formed by thermal spray on the coupled surface of a metal case. This assembly and a glass screen are coupled through crystallized frit glass or by glass fusion. The coupling between the metal case and the glass screen has a coupling strength sufficient to resist the vacuum stress. The metal case, which is not exposed for a long time to high temperatures during thermal spraying, can be made of a metal for realizing a lightweight without any thermal deformation or dimensional variations, thereby attaining satisfactory mechanical properties.

摘要翻译： 平面阴极射线管，其中通过热喷涂在金属壳体的耦合表面上形成陶瓷膜或玻璃膜。 该组件和玻璃屏幕通过结晶玻璃料或玻璃熔合物联接。 金属外壳和玻璃屏幕之间的耦合具有足以抵抗真空应力的耦合强度。 在热喷涂期间不长时间暴露于高温的金属壳体可以由实现轻量化的金属制成，而没有任何热变形或尺寸变化，从而获得令人满意的机械性能。