摘要:
A relay device includes a receiver, an information obtaining unit, a parameter storage unit, and a parameter setting unit, and relays a packet which is transmitted from a first network to a second network. The receiver receives the packet from the first network. The information obtaining unit obtains data type information for identifying a type of data which is transmitted and received by the packet. The parameter storage unit stores a control parameter which is used for controlling communication quality in the second network, so as to be associated with a type of transfer data indicating data transferred to the second network. The parameter setting unit sets to the packet the control parameter which is associated with transfer data of a same type as data identified by the data type information, and outputs the packet to which the control parameter is set to the second network.
摘要:
The present invention provides a communication system facilitating introduction into an existing network and improving a quality of service of communications. The communication system is configured by connecting a relay device performing wireless communications with a terminal, a management device managing the relay device and a server to each other via an IP network, the relay device has a packet generating unit generating an encapsulated packet containing, as a payload, and transferring unit transferring the encapsulated packet to the management device, and the management device has a receiving unit receiving the encapsulated packet transmitted from the relay device, and a transmitting unit transmitting a predetermined encapsulated packet in the encapsulated packets received by the receiving unit back to the relay device.
摘要:
A multilayer film-coated substrate having the stress of the film relaxed by depositing a multilayer film comprising a metal oxide film and a silicon oxide film on a substrate at a high speed by a sputtering method using a conductive sputtering material, and a process for producing a multilayer film-coated substrate having such a low stress, are presented. A multilayer film-coated substrate comprising a substrate and at least a metal oxide film and a silicon oxide film laminated thereon repeatedly at least once, wherein at least one layer of said metal oxide film is a metal oxide film deposited by sputtering by using, as the target material, a metal oxide MOX which is deficient in oxygen than the stoichiometric composition, to have the oxygen deficiency resolved, and the stress of the multilayer film is from −100 MPa to +100 MPa.
摘要翻译:通过使用导电性溅射材料的溅射法,通过在基板上高速沉积包含金属氧化物膜和氧化硅膜的多层膜而使薄膜的应力弛豫的多层膜被覆基板,以及制造方法 提出了具有如此低应力的多层膜涂覆的基板。 一种多层膜被覆基板,包括基板和至少一层金属氧化物膜和氧化硅膜,其上重复层叠至少一次,其中至少一层所述金属氧化物膜是通过溅射沉积的金属氧化物膜,其通过使用作为 目标材料,缺氧量低于化学计量组成的金属氧化物MO X X,以使氧缺陷分解,多层膜的应力为-100MPa〜+100MPa。
摘要:
A high reflectance mirror having a high reflectance in a visible-light region, being excellent in durability such as a moisture resistance, a saltwater resistance, etc. and having small dependence on incident angle (i.e., the fluctuation of the reflectance depending on an incident angle of light is little) is provided. The high reflectance mirror comprises a substrate and a silver film, a low refractive index film and a high refractive index film laminated on the substrate in this order wherein an adhesion improving film is formed on the silver film surface on the opposite side of the substrate, the extinction coefficient of the low refractive index film is at most 0.01, the extinction coefficient of the high refractive index film is at most 0.01, the adhesion improving film is an oxide film and the extinction coefficient of the adhesion improving film is at most 0.1.
摘要:
A protective plate for a plasma display comprises conductive substrate for protecting a plasma display and an electrode in electrical contact with the conductive substrate.
摘要:
An antireflection film for a window of a transport, which comprises a light absorbing film consisting essentially of a nitride and having a film thickness of from 3 to 12 nm, and an oxide film having a refractive index of from 1.45 to 1.70 and a film thickness of from 70 to 140 nm, formed in this order on a substrate, and which has adequately low reflection performance to the oblique incident light, an adequate abrasion resistance and a high transmittance of visible light, a glass provided with said film, a laminated glass and its production process.
摘要:
A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MOx as the main component, wherein MOx is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.
摘要:
A sputtering method comprises applying a negative voltage intermittently in a constant periodic cycle to a cathode disposed in a vacuum chamber, wherein the negative voltage is intermittently applied so that a time during which the negative voltage is not applied includes a time during which the voltage is controlled to be zero volt in a range of from 10 .mu.s to 10 ms, and the zero voltage time is equal to or longer than the time required by one arcing from its generation to extinction.
摘要:
A transparent laminated product comprising a transparent substrate and a 5-layered transparent coating composed of a first transparent oxide layer formed on the substrate, a second Ag layer formed on the first transparent oxide layer, a third first transparent oxide layer formed on the second layer, a fourth Ag layer formed on the third transparent oxide layer and a fifth transparent oxide layer formed on the fourth layer, and having a visible ray transmission of at least 60%, wherein the thickness of each Ag layer is from 60 to 250 A, and each transparent oxide layer comprises a material selected from the group consisting of SnO.sub.2, Sn.sub.1-x Zn.sub.x O.sub.y, and TiO.sub.2.
摘要:
A high-efficient sheet plasma sputtering method and an apparatus for carrying out the method which comprise means for deforming an arc plasma stream into a form of sheet by a magnetic field so that ions in the sheet plasma are accelerated to a target which is controlled to have a negative potential to the sheet plasma, whereby a coating layer is formed by sputtering on a substrate arranged opposite the target with respect to the sheet plasma.