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    METHOD FOR EFFICIENTLY RECOVERING CARBON DIOXIDE IN GAS
    21.
    发明申请
    METHOD FOR EFFICIENTLY RECOVERING CARBON DIOXIDE IN GAS 有权
    有效地回收二氧化碳在气体中的方法

    公开(公告)号：US20100126348A1

    公开(公告)日：2010-05-27

    申请号：US12452223

    申请日：2008-06-24

    Applicant: Shinkichi Shimizu ,  Firoz Alam Chowdhury ,  Hiromichi Okabe ,  Kazuya Goto

    Inventor： Shinkichi Shimizu ,  Firoz Alam Chowdhury ,  Hiromichi Okabe ,  Kazuya Goto

    IPC: B01D53/14

    CPC classification number: B01D53/1493 ,  B01D53/1475 ,  B01D2257/504 ,  C01B32/50 ,  Y02C10/04 ,  Y02C10/06 ,  Y02P20/152

    Abstract: Disclosed is a method for recovering carbon dioxide from a gas containing carbon dioxide, comprising the step (1) of bringing a gas containing carbon dioxide into contact with an aqueous solution containing 2-isopropylaminoethanol and at least one substance selected from the group consisting of piperazines and alkanolamines to absorb carbon dioxide into the aqueous solution; and the step (2) of heating the aqueous solution containing carbon dioxide absorbed therein, which is obtained in the step (1), to separate and recover carbon dioxide from the solution.

    Abstract translation: 公开了一种从含有二氧化碳的气体中回收二氧化碳的方法，其包括使含有二氧化碳的气体与含有2-异丙基氨基乙醇的水溶液和至少一种选自哌嗪类的物质接触的步骤（1） 和链烷醇胺将二氧化碳吸收到水溶液中; 以及在步骤（1）中获得的加热其中吸收的二氧化碳的水溶液的步骤（2）从溶液中分离和回收二氧化碳。

    Method of Calibrating Beam Position in Charged-Particle Beam System
    22.
    发明申请
    Method of Calibrating Beam Position in Charged-Particle Beam System 有权
    电荷粒子束系统中光束位置的校准方法

    公开(公告)号：US20090189062A1

    公开(公告)日：2009-07-30

    申请号：US12351276

    申请日：2009-01-09

    Applicant: Kazuya Goto

    Inventor： Kazuya Goto

    IPC: G01D18/00

    CPC classification number: H01J37/3045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/21 ,  H01J37/3174 ,  H01J2237/21 ,  H01J2237/3045

    Abstract: A method of calibrating the beam position in a charged-particle beam system starts with finding a focus deviation on the material surface for each point within a deflection field. A focus correction voltage VF necessary to cancel out the focus deviation is determined. A beam position deviation fi per unit focus correction voltage is found. The deflection voltage is corrected so as to cancel out the product fi·VF. The deflection voltage is corrected so as to cancel out the sum of the product fi·VF and the measured deflection field distortion while correcting the focus based on the voltage VF.

    Abstract translation: 在带电粒子束系统中校准光束位置的方法从在偏转场内的每个点的材料表面上发现聚焦偏差开始。 确定消除聚焦偏差所需的聚焦校正电压VF。 找到单位聚焦校正电压的光束位置偏差fi。 校正偏转电压以抵消产品fi.VF。 校正偏转电压，以便在校正基于电压VF的焦点的同时抵消乘积fi.VF和测量的偏转场失真之和。

    Electrostatic deflector
    24.
    发明申请
    Electrostatic deflector 有权
    静电导流板

    公开(公告)号：US20070075258A1

    公开(公告)日：2007-04-05

    申请号：US11528942

    申请日：2006-09-28

    Applicant: Kazuya Goto

    Inventor： Kazuya Goto

    IPC: H01J37/147

    CPC classification number: H01J37/1477 ,  H01J2237/1516 ,  H01J2237/3175

    Abstract: There is disclosed an electrostatic deflector having four pillar-like identical electrodes spaced from each other by 90°. An even number of pillar-like electrodes are disposed in each space between the four electrodes. Spaces are formed on both sides of each one of the first electrodes and have bent portions. The even number of electrodes are arranged symmetrically relative to a third or fourth vertical plane including an axis spaced from the X-axis by 45° or −45°, respectively. Holes are formed across each of the third and fourth vertical planes. Rod-like members are inserted in the holes.

    Abstract translation: 公开了一种静电偏转器，其具有彼此间隔90°的四个柱状相同电极。 在四个电极之间的每个空间中设置偶数个柱状电极。 空间形成在每个第一电极的两侧上并且具有弯曲部分。 偶数个电极相对于包括分别与X轴分开45°或-45°的轴线的第三或第四垂直平面对称地布置。 在第三和第四垂直平面中的每一个上形成孔。 棒状构件插入孔中。

    Method of suppressing beam position drift, method of suppressing beam dimension drift, and charged particle beam lithography system
    27.
    发明授权
    Method of suppressing beam position drift, method of suppressing beam dimension drift, and charged particle beam lithography system 有权
    抑制光束位置漂移的方法，抑制光束尺寸漂移的方法和电荷 - 粒子束光刻系统

    公开(公告)号：US08049181B2

    公开(公告)日：2011-11-01

    申请号：US12369306

    申请日：2009-02-11

    Applicant: Kazuya Goto

    Inventor： Kazuya Goto

    IPC: G21K1/08 ,  H01J3/14

    CPC classification number: H01J37/3045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/24578 ,  H01J2237/30455

    Abstract: A lithography method and system have means for determining a convergence value dc from a relation of beam current to beam position drift (or beam dimension drift) produced in the past; means for finding a beam current i(t) as a function of the convergence value dc of beam position drift (or beam dimension drift), a measured value dm of beam position drift (or beam dimension drift), a gain constant g, and a convergence value c of beam position drift (or beam dimension drift) per unit beam current and using an equation given by i(t)={(1+g)·dc−g·dm(t)}/c; means for making a check regarding dm and dc as to whether dm approaches dc and, thus, a relationship given by |dm−dc| 0.

    Abstract translation: 光刻方法和系统具有用于确定从过去产生的束电流与光束位置漂移（或光束尺寸漂移）的关系的收敛值dc的装置; 用于根据波束位置漂移（或波束尺寸漂移）的收敛值dc，波束位置漂移（或波束尺寸漂移）的测量值dm，增益常数g以及增益常数g，找到波束电流i（t）的装置 使用由i（t）= {（1 + g）·dc-g·dm（t）} / c给出的方程式的每单位束电流的光束位置漂移（或光束尺寸漂移）的收敛值c; 关于dm和dc的检查关于dm是否接近dc的因素，因此，由| dm-dc | <＆egr; 持有，在哪里 是在光束电流i（t）的增益常数g满足由g> 0给出的关系的条件下提供决定标准的正数。

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