公开(公告)号：US07916273B2

公开(公告)日：2011-03-29

申请号：US11559084

申请日：2006-11-13

申请人： Masaru Nyui ,  Keiko Chiba ,  Keiji Yamashita

发明人： Masaru Nyui ,  Keiko Chiba ,  Keiji Yamashita

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70916 ,  G03F7/70341

摘要： An exposure apparatus includes an illumination optical system for illuminating a reticle using a light from a light source, and a projection optical system for projecting a pattern of the reticle onto a substrate, the exposure apparatus exposing the substrate through a liquid that is supplied to a space between the substrate and a lens of the projection optical system closest to the substrate, a surface of the lens on which the light does not pass having a polished surface.

摘要翻译： 曝光装置包括：照明光学系统，用于使用来自光源的光照射光罩;以及投影光学系统，用于将掩模版的图案投射到基板上，所述曝光装置通过供给到 基板和最靠近基板的投影光学系统的透镜之间的空间，光线不通过的透镜的表面具有抛光表面。

公开(公告)号：US06455203B1

公开(公告)日：2002-09-24

申请号：US09545464

申请日：2000-04-07

申请人： Mitsuaki Amemiya ,  Shunichi Uzawa ,  Keiko Chiba

发明人： Mitsuaki Amemiya ,  Shunichi Uzawa ,  Keiko Chiba

IPC分类号： G03F900

CPC分类号： G03F9/00 ,  G03F1/22 ,  G03F7/2022

摘要： A mask manufacturing method includes performing a multiple exposure process to a substrate so that a number of latent images are formed on the substrate, and processing the exposed substrate to produce actual mask patterns, wherein the multiple exposure process includes a first exposure step for forming a latent image of relatively-fine periodic patterns on the substrate by use of a first master mask having absorptive periodic patterns, and a second exposure step for forming a latent image of relatively-rough patterns on the substrate by use of a second master mask having absorptive patterns.

摘要翻译： 掩模制造方法包括对基板进行多次曝光处理，使得在基板上形成多个潜像，并处理曝光的基板以产生实际的掩模图案，其中多次曝光处理包括第一曝光步骤，用于形成 通过使用具有吸收性周期性图案的第一主掩模在基板上的相对精细的周期性图案的潜像，以及第二曝光步骤，用于通过使用具有吸收性的第二主掩模在基板上形成相对粗糙的图案的潜像 模式。

公开(公告)号：US5770335A

公开(公告)日：1998-06-23

申请号：US687782

申请日：1996-07-31

申请人： Akira Miyake ,  Keiko Chiba

发明人： Akira Miyake ,  Keiko Chiba

IPC分类号： G03F1/22 ,  G03F1/68 ,  G21K1/10 ,  H01L21/027 ,  G03F9/00 ,  G21K5/00

CPC分类号： G21K1/10 ,  G03F1/22 ,  G03F1/29

摘要： A mask for use with radiation including one of X-rays and vacuum ultraviolet rays. The mask includes a transmissive member for supporting a pattern of a radiation absorptive material, and a phase shifter material provided on the transmissive member. The phase shifter material has a radiation absorptivity less than that of the radiation absorptive material. The thickness of the transmissive member at a portion where the phase shifter material is provided is less than that of another portion thereof.

摘要翻译： 用于辐射的掩模，包括X射线和真空紫外线之一。 掩模包括用于支撑辐射吸收材料的图案的透射构件和设置在透射构件上的移相器材料。 移相器材料的辐射吸收率小于辐射吸收材料的辐射吸收率。 在设置移相器材料的部分处的透射构件的厚度小于其另一部分的厚度。

公开(公告)号：US5589304A

公开(公告)日：1996-12-31

申请号：US404959

申请日：1995-03-16

申请人： Keiko Chiba ,  Takeshi Miyachi

发明人： Keiko Chiba ,  Takeshi Miyachi

IPC分类号： G03F1/22 ,  H01L21/027 ,  G03F9/00

CPC分类号： G03F1/22

摘要： Disclosed is a mask structure which includes a membrane on which a pattern is formed or to be formed, a holding frame for holding the membrane, and a reinforcing member for reinforcing the holding frame, wherein the reinforcing member comprises ceramics and wherein the reinforcing member and the holding frame are bonded to each other through a film oxide of the ceramics. Also disclosed is a mask structure which includes a membrane on which a pattern is formed or to be formed, a holding frame for holding the membrane, and a reinforcing member for reinforcing the holding frame, wherein the reinforcing member has a major constituent the same as that of the membrane.

摘要翻译： 公开了一种掩模结构，其包括其上形成有图案或要形成图案的膜，用于保持膜的保持框架和用于加强保持框架的加强构件，其中，加强构件包括陶瓷，并且其中加强构件和 保持框通过陶瓷的氧化膜彼此接合。 还公开了一种掩模结构，其包括其上形成有图案或要形成图案的膜，用于保持膜的保持框架和用于加强保持框架的加强构件，其中，加强构件具有与 膜的那个。

公开(公告)号：US20090225290A1

公开(公告)日：2009-09-10

申请号：US12395947

申请日：2009-03-02

申请人： Shinichi Shima ,  Tomohiko Yoshida ,  Ichiro Tanaka ,  Keiko Chiba

发明人： Shinichi Shima ,  Tomohiko Yoshida ,  Ichiro Tanaka ,  Keiko Chiba

IPC分类号： G03B27/52

CPC分类号： G03B27/52 ,  G03F7/70341 ,  G03F7/70916

摘要： The present invention provides an exposure apparatus which exposes a substrate via a liquid, the apparatus including a projection optical system configured to project a pattern of a reticle onto the substrate, a liquid supply unit configured to supply the liquid between the projection optical system and the substrate, a blowing nozzle which is arranged around the projection optical system on a side of the substrate and configured to blow a gas around the liquid supplied between the projection optical system and the substrate, and an exhaust unit configured to exhaust the gas in a space between the blowing nozzle and the liquid supplied between the projection optical system and the substrate, the exhaust unit including a removal member configured to remove a volatile component which volatilizes from the liquid and is contained in the gas in the space.

摘要翻译： 本发明提供了一种通过液体曝光基板的曝光装置，该装置包括投影光学系统，该投影光学系统被配置为将掩模版的图案投影到基板上;液体供应单元，被配置为在投影光学系统和 基板，喷射喷嘴，其布置在所述基板的所述投影光学系统的周围，并且被配置为围绕所述投影光学系统和所述基板之间供应的液体吹送气体;以及排气单元，其构造成将空气排出空间 在喷射喷嘴和投影光学系统与基板之间供应的液体之间，排气单元包括移除部件，该去除部件被构造成去除从液体挥发并包含在空间中的气体中的挥发性成分。

公开(公告)号：US20070177119A1

公开(公告)日：2007-08-02

申请号：US11670279

申请日：2007-02-01

申请人： Keiko Chiba

发明人： Keiko Chiba

IPC分类号： G03B27/42

CPC分类号： G03D3/00 ,  G03F7/70341 ,  G03F7/707

摘要： An exposure apparatus exposes a substrate via liquid, and includes a liquid holding plate configured to hold the liquid, and arranged around the substrate, and a chuck configured to hold the substrate, at least one of at least part of a surface of the liquid holding plate and at least part of a surface of the chuck being made of polyparaxylene resin or including a modified layer of polyparaxylene resin.

摘要翻译： 曝光装置通过液体使基板曝光，并且包括被配置为保持液体并且布置在基板周围的液体保持板和构造成保持基板的卡盘，液体保持的表面的至少一部分中的至少一个 并且卡盘的表面的至少一部分由聚对二甲苯树脂制成或者包括聚对二甲苯树脂的改性层。

公开(公告)号：US06645707B2

公开(公告)日：2003-11-11

申请号：US09534334

申请日：2000-03-24

申请人： Mitsuaki Amemiya ,  Shunichi Uzawa ,  Keiko Chiba ,  Yutaka Watanabe

发明人： Mitsuaki Amemiya ,  Shunichi Uzawa ,  Keiko Chiba ,  Yutaka Watanabe

IPC分类号： G03C556

CPC分类号： G03F7/70466 ,  G03F7/2022

摘要： A device manufacturing method includes a first exposure step for executing a multiple exposure of a first layer of a substrate by use of plural first masks, a development step for developing the first layer of the substrate and a second exposure step, executed after the development step, for executing a multiple exposure of a second layer of the substrate by use of plural second masks. A portion of at least one of the first masks has a pattern the same as a pattern formed in a portion of at least one of the second masks.

摘要翻译： 一种器件制造方法包括：第一曝光步骤，用于通过使用多个第一掩模来执行衬底的第一层的多次曝光;显影步骤，用于显影衬底的第一层;以及第二曝光步骤，在显影步骤之后执行 ，用于通过使用多个第二掩模来执行所述基板的第二层的多次曝光。 第一掩模中的至少一个的一部分具有与形成在至少一个第二掩模的部分中的图案相同的图案。

公开(公告)号：US06449332B1

公开(公告)日：2002-09-10

申请号：US09538302

申请日：2000-03-30

申请人： Keiko Chiba

发明人： Keiko Chiba

IPC分类号： G21K500

CPC分类号： G03F1/22 ,  G03F1/82 ,  G03F7/70741 ,  G03F7/70866 ,  G03F7/70925

摘要： An exposure apparatus including an exposure system for executing an exposure operation by use of an exposure beam to transfer a pattern of a mask onto a substrate, the mask having a photocatalyst portion, an auxiliary space for irradiating, therewithin, the mask with an auxiliary radiation different from the exposure beam to accelerate photocatalytic reaction of the photocatalyst portion, and a humidity control system for controlling humidity inside the auxiliary space.

摘要翻译： 一种曝光装置，包括用于通过使用曝光光束进行曝光操作以将掩模图案转印到基板上的曝光系统，所述掩模具有光催化部分，用于照射的辅助空间，所述掩模具有辅助辐射 与曝光光束不同，以加速光催化剂部分的光催化反应，以及用于控制辅助空间内的湿度的湿度控制系统。

公开(公告)号：US06418187B1

公开(公告)日：2002-07-09

申请号：US09349490

申请日：1999-07-09

申请人： Keiko Chiba ,  Shigeru Terashima

发明人： Keiko Chiba ,  Shigeru Terashima

IPC分类号： G21K500

CPC分类号： G03F1/64 ,  G03F1/22 ,  G03F7/70866 ,  G03F7/70933 ,  G03F7/70983

摘要： An X-ray mask structure and X-ray exposure method using the same are disclosed, wherein the mask has an X-ray absorptive material pattern, a supporting film for supporting the pattern, and a holding frame for holding the supporting film, wherein a suction port is arranged to be communicated with an external gas drawing system, and wherein a supply port is provided so that a gas can be supplied therethrough, for prevention of dust adhesion to the mask.

摘要翻译： 公开了使用其的X射线掩模结构和X射线曝光方法，其中掩模具有X射线吸收材料图案，用于支撑图案的支撑膜和用于保持支撑膜的保持框架，其中 吸入口被设置成与外部气体抽吸系统连通，并且其中设置供应口以便可以通过其供应气体，以防止与面罩的灰尘附着。

公开(公告)号：US5846676A

公开(公告)日：1998-12-08

申请号：US710979

申请日：1996-09-25

申请人： Keiko Chiba ,  Takayuki Yagi

发明人： Keiko Chiba ,  Takayuki Yagi

IPC分类号： G21K1/02 ,  B81B1/00 ,  B81C1/00 ,  H01L21/027 ,  H01L21/306 ,  G03F9/00

CPC分类号： G03F1/22

摘要： An X-ray mask structure is produced by a procedure including the steps of preparing a substrate having a surface provided thereon with an X-ray transmitting film, forming, on the substrate, one of a metal film and a multilayered film, having alkali resistivity, removing a predetermined limited portion of the metal film, bonding the substrate and a reinforcing member through the remaining metal film, by an anodic bonding process wherein the remaining metal film functions as an electrically conductive material in the anodic bonding process, etching the substrate with the remaining metal film functioning as an etching mask, to define an X-ray transmitting portion of the X-ray transmitting film and forming a mask pattern by use of an X-ray absorptive material.

摘要翻译： 通过以下步骤制造X射线掩模结构，该方法包括以下步骤制备其表面上设置有X射线透射膜的基板，在基板上形成具有碱电阻率的金属膜和多层膜之一 通过阳极接合工艺去除金属膜的预定限定部分，通过剩余的金属膜将衬底和加强构件接合，其中剩余的金属膜在阳极接合工艺中用作导电材料，用 用作蚀刻掩模的剩余金属膜，以限定X射线透射膜的X射线透射部分并且通过使用X射线吸收材料形成掩模图案。