公开(公告)号：US07622050B2

公开(公告)日：2009-11-24

申请号：US11615530

申请日：2006-12-22

申请人： Koji Otsuka ,  Masabumi Ito

发明人： Koji Otsuka ,  Masabumi Ito

IPC分类号： H01L21/302

CPC分类号： C03C15/02

摘要： A process for polishing a glass substrate required to have high-degree of flatness and smoothness, is provided. A preliminarily polished glass substrate is applied with a surface treatment by a first-step gas-cluster ion beam etching to improve the flatness, and then, the glass substrate is applied with a surface treatment by a second-step gas-cluster ion beam etching having different irradiation conditions of those of the first-step gas-cluster ion beam etching to improve the surface roughness, whereby the glass substrate is finish-polished to have a flatness of at most 0.05 μm and a surface roughness (Rms) of at most 0.25 nm.

摘要翻译： 提供了要求具有高度平坦度和平滑度的玻璃基板的抛光工艺。 通过第一级气体 - 团簇离子束蚀刻对预先抛光的玻璃基板进行表面处理以提高平坦度，然后通过第二级气体簇离子束蚀刻对玻璃基板进行表面处理 具有与第一级气体簇离子束蚀刻不同的照射条件以改善表面粗糙度，由此玻璃基板被精抛光以具有至多0.05μm的平坦度和最多的表面粗糙度（Rms） 0.25nm。

公开(公告)号：US20110151752A1

公开(公告)日：2011-06-23

申请号：US12971705

申请日：2010-12-17

申请人： Takeaki ONO ,  Masabumi Ito

发明人： Takeaki ONO ,  Masabumi Ito

IPC分类号： B24B7/30

CPC分类号： B24B37/042

摘要： The present invention relates to a process for producing a glass substrate, the process including: a lapping step of grinding a main surface of a glass substrate; and a main-surface polishing step of polishing the main surface of the glass substrate after the lapping step, in which the lapping step includes: a primary lapping step of grinding the main surface of the glass substrate with a free abrasive or a fixed abrasive; a secondary lapping step of grinding the main surface of the glass substrate with a fixed abrasive having a smaller particle size than the free abrasive or the fixed abrasive used in the primary lapping step; and a cleaning step of cleaning the main surface of the glass substrate by at least one selected from the group consisting of ultrasonic cleaning, scrub cleaning and acid cleaning, after the primary lapping step but before the secondary lapping step.

摘要翻译： 玻璃基板的制造方法技术领域本发明涉及一种玻璃基板的制造方法，该方法包括：研磨玻璃基板的主面的研磨工序; 以及在研磨步骤之后研磨玻璃基板的主表面的主表面抛光步骤，其中研磨步骤包括：用研磨剂或固定研磨剂研磨玻璃基板的主表面的一次研磨步骤; 二次研磨步骤，用具有比在主研磨步骤中使用的游离研磨剂或固定磨料更小的粒度的固定磨料研磨玻璃基材的主表面; 以及在二次研磨步骤之后，在一次研磨步骤之后，从选自超声波清洗，擦洗和酸洗的组中的至少一种清洗玻璃基板的主表面的清洁步骤。

公开(公告)号：US07629089B2

公开(公告)日：2009-12-08

申请号：US11519078

申请日：2006-09-12

申请人： Masabumi Ito ,  Hitoshi Mishiro

发明人： Masabumi Ito ,  Hitoshi Mishiro

IPC分类号： G03F1/00 ,  B32B9/00

CPC分类号： G03F1/24 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70958

摘要： A low-expansion glass substrate for a reflective mask, wherein the glass substrate is suited for a base material of a reflective mask employed in a lithographic process in semiconductor fabrication, comprises a lateral surface, a chamfered portion and a notched portion formed along an outer periphery thereof, at least one of the lateral surface, the chamfered portion and the notched portion being provided with a mirror-finished surface.

摘要翻译： 一种用于反射掩模的低膨胀玻璃基板，其中玻璃基板适用于在半导体制造中用于光刻工艺中的反射掩模的基底材料，包括侧面，倒角部分和沿着外部形成的切口部分 在其周边中，侧面，倒角部分和切口部分中的至少一个设置有镜面抛光表面。

公开(公告)号：US07901843B2

公开(公告)日：2011-03-08

申请号：US12122407

申请日：2008-05-16

申请人： Takashi Sugiyama ,  Yoshiaki Ikuta ,  Masabumi Ito

发明人： Takashi Sugiyama ,  Yoshiaki Ikuta ,  Masabumi Ito

IPC分类号： G03F1/00

CPC分类号： G03F1/72 ,  B82Y10/00 ,  B82Y40/00 ,  C03C17/00 ,  C03C17/3665 ,  C03C23/007 ,  C03C2218/32 ,  G03F1/24

摘要： There is provided a process for smoothing a substrate surface having a concave defect, such as a pit or a scratch. A process for smoothing a surface of a glass substrate for a reflective mask blank used in EUV lithography, comprising disposing a thin film on a glass substrate; detecting a concave defect existing on the glass substrate; and locally heating or locally anodizing a portion of the thin film just above the detected concave defect to perform a chemical reaction accompanied by a volume increase in a material forming the thin film.

摘要翻译： 提供了用于平滑具有凹陷缺陷（如凹坑或划痕）的衬底表面的工艺。 一种用于平滑用于EUV光刻中的反射掩模板的玻璃基板的表面的方法，包括在玻璃基板上设置薄膜; 检测存在于玻璃基板上的凹陷缺陷; 并且局部加热或局部阳极氧化正好在检测到的凹陷缺陷上方的薄膜的一部分，以进行伴随着形成薄膜的材料体积增加的化学反应。

公开(公告)号：US20100315704A1

公开(公告)日：2010-12-16

申请号：US12858577

申请日：2010-08-18

申请人： Motoshi Ono ,  Mitsuru Watanabe ,  Masabumi Ito

发明人： Motoshi Ono ,  Mitsuru Watanabe ,  Masabumi Ito

IPC分类号： B23K26/08 ,  B23K26/36 ,  G02B5/08

CPC分类号： G21K1/062 ,  B82Y10/00 ,  C03C23/0025 ,  G03F1/24 ,  G03F1/60 ,  G03F1/72 ,  G21K2201/067

摘要： The present invention is to provide a method for smoothing the optical surface having a concave defect of an optical component for EUVL.The present invention relates to a method for smoothing the optical surface of an optical component for EUVL, comprising irradiating, with an excimer laser having a wavelength of 250 nm or less with a fluence of 0.5 to 2.0 J/cm2, the optical surface having a concave defect of an optical component for EUV lithography (EUVL), the optical component being made of a TiO2-containing silica glass material comprising SiO2 as a main component.

摘要翻译： 本发明提供一种用于平滑具有用于EUVL的光学部件的凹陷缺陷的光学表面的方法。 本发明涉及一种平滑EUVL用光学部件的光学面的方法，其特征在于，以0.5〜2.0J / cm 2的能量密度照射波长为250nm以下的准分子激光，所述光学面具有 用于EUV光刻（EUVL）的光学部件的凹陷缺陷，该光学部件由包含SiO 2作为主要成分的含TiO 2的二氧化硅玻璃材料制成。

公开(公告)号：US20070125747A1

公开(公告)日：2007-06-07

申请号：US11615530

申请日：2006-12-22

申请人： Koji Otsuka ,  Masabumi Ito

发明人： Koji Otsuka ,  Masabumi Ito

IPC分类号： C23F1/00

CPC分类号： C03C15/02

摘要： A process for polishing a glass substrate required to have high-degree of flatness and smoothness, is provided. A preliminarily polished glass substrate is applied with a surface treatment by a first-step gas-cluster ion beam etching to improve the flatness, and then, the glass substrate is applied with a surface treatment by a second-step gas-cluster ion beam etching having different irradiation conditions of those of the first-step gas-cluster ion beam etching to improve the surface roughness, whereby the glass substrate is finish-polished to have a flatness of at most 0.05 μm and a surface roughness (Rms) of at most 0.25 nm.

摘要翻译： 提供了要求具有高度平坦度和平滑度的玻璃基板的抛光工艺。 通过第一级气体 - 团簇离子束蚀刻对预先抛光的玻璃基板进行表面处理以提高平坦度，然后通过第二级气体簇离子束蚀刻对玻璃基板进行表面处理 具有与第一级气体簇离子束蚀刻不同的照射条件以改善表面粗糙度，由此玻璃基板被精抛光以具有至多0.05μm的平坦度和最多的表面粗糙度（Rms） 0.25nm。